CN108026412B - 用于加工介电基板的方法及组合物 - Google Patents

用于加工介电基板的方法及组合物 Download PDF

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Publication number
CN108026412B
CN108026412B CN201680051105.7A CN201680051105A CN108026412B CN 108026412 B CN108026412 B CN 108026412B CN 201680051105 A CN201680051105 A CN 201680051105A CN 108026412 B CN108026412 B CN 108026412B
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China
Prior art keywords
substrate
abrasive particles
polishing composition
removal rate
polishing
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CN201680051105.7A
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English (en)
Chinese (zh)
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CN108026412A (zh
Inventor
崔骥
林越
S.格拉宾
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CMC Materials LLC
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Cabot Microelectronics Corp
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/31051—Planarisation of the insulating layers
    • H01L21/31053—Planarisation of the insulating layers involving a dielectric removal step
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/32115—Planarisation
    • H01L21/3212—Planarisation by chemical mechanical polishing [CMP]

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
CN201680051105.7A 2015-09-03 2016-08-31 用于加工介电基板的方法及组合物 Active CN108026412B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562213955P 2015-09-03 2015-09-03
US62/213,955 2015-09-03
PCT/US2016/049563 WO2017040571A1 (en) 2015-09-03 2016-08-31 Methods and compositions for processing dielectric substrate

Publications (2)

Publication Number Publication Date
CN108026412A CN108026412A (zh) 2018-05-11
CN108026412B true CN108026412B (zh) 2021-08-31

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CN201680051105.7A Active CN108026412B (zh) 2015-09-03 2016-08-31 用于加工介电基板的方法及组合物

Country Status (7)

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US (1) US20170066944A1 (enExample)
EP (1) EP3344716A4 (enExample)
JP (1) JP6989493B2 (enExample)
KR (1) KR102670778B1 (enExample)
CN (1) CN108026412B (enExample)
TW (1) TWI605114B (enExample)
WO (1) WO2017040571A1 (enExample)

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US10619075B2 (en) 2015-07-13 2020-04-14 Cabot Microelectronics Corporation Self-stopping polishing composition and method for bulk oxide planarization
WO2017081835A1 (ja) * 2015-11-10 2017-05-18 信越化学工業株式会社 合成石英ガラス基板用研磨剤及びその製造方法、並びに合成石英ガラス基板の研磨方法
CN110520493B (zh) * 2017-04-17 2022-11-22 Cmc材料股份有限公司 自停止性抛光组合物及用于块状氧化物平坦化的方法
JP7438211B2 (ja) * 2018-11-15 2024-02-26 インテグリス・インコーポレーテッド 窒化ケイ素エッチング組成物及び方法
KR102814738B1 (ko) * 2019-08-06 2025-05-30 삼성디스플레이 주식회사 연마 슬러리, 이를 이용한 표시 장치의 제조방법 및 표시 장치
CN113004798B (zh) 2019-12-19 2024-04-12 安集微电子（上海）有限公司 一种化学机械抛光液
KR20210079573A (ko) 2019-12-20 2021-06-30 주식회사 케이씨텍 유기막 연마용 슬러리 조성물
JP7489250B2 (ja) * 2020-07-15 2024-05-23 花王株式会社 エッチング液
JPWO2022065022A1 (enExample) * 2020-09-24 2022-03-31
CN114621683A (zh) * 2020-12-11 2022-06-14 安集微电子（上海）有限公司 一种化学机械抛光液及其使用方法
CN114621684A (zh) * 2020-12-11 2022-06-14 安集微电子（上海）有限公司 一种化学机械抛光液及其使用方法
TWI826878B (zh) * 2020-12-21 2023-12-21 美商Ｃｍｃ材料有限責任公司 用於高拓樸選擇性的自停止性拋光組合物與方法
WO2022240842A1 (en) * 2021-05-13 2022-11-17 Araca, Inc. Silicon carbide (sic) wafer polishing with slurry formulation and process
US12199091B2 (en) * 2021-05-13 2025-01-14 Texas Instruments Incorporated Shallow trench isolation processing with local oxidation of silicon
WO2023028197A1 (en) * 2021-08-25 2023-03-02 Cmc Materials, Inc. Cmp composition including an anionic abrasive
CN115160933B (zh) * 2022-07-27 2023-11-28 河北工业大学 一种用于钴互连集成电路钴cmp的碱性抛光液及其制备方法
TWI873734B (zh) * 2022-07-29 2025-02-21 美商聖高拜陶器塑膠公司 用於進行材料移除操作之組成物及方法
KR20240062236A (ko) * 2022-10-28 2024-05-09 솔브레인 주식회사 화학적 기계적 연마 슬러리 조성물 및 반도체 소자의 제조 방법
US20250277135A1 (en) * 2024-03-04 2025-09-04 Cmc Materials Llc Silane modification of ceria nanoparticles in colloidally stable solutions
WO2025188720A1 (en) * 2024-03-04 2025-09-12 Cmc Materials Llc Silane modification of ceria nanoparticles in colloidally stable solutions

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CN1742066A (zh) * 2003-02-03 2006-03-01 卡伯特微电子公司 抛光含硅电介质的方法
CN104334674A (zh) * 2012-05-22 2015-02-04 嘉柏微电子材料股份公司 包含氧化锆颗粒的cmp组合物及使用方法

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US20030176151A1 (en) * 2002-02-12 2003-09-18 Applied Materials, Inc. STI polish enhancement using fixed abrasives with amino acid additives
US20050279733A1 (en) * 2004-06-18 2005-12-22 Cabot Microelectronics Corporation CMP composition for improved oxide removal rate
US7955520B2 (en) * 2007-11-27 2011-06-07 Cabot Microelectronics Corporation Copper-passivating CMP compositions and methods
US8247327B2 (en) * 2008-07-30 2012-08-21 Cabot Microelectronics Corporation Methods and compositions for polishing silicon-containing substrates
JP2012069785A (ja) * 2010-09-24 2012-04-05 Fujimi Inc 研磨用組成物および研磨方法
JP5906254B2 (ja) * 2010-12-28 2016-04-20 サン−ゴバン セラミックス アンド プラスティクス，インコーポレイティド ジルコニア粒子を含む研磨スラリーおよびその研磨スラリーを使用する方法
SG191909A1 (en) * 2011-01-11 2013-08-30 Cabot Microelectronics Corp Metal-passivating cmp compositions and methods
EP2693459A4 (en) * 2011-03-30 2015-04-22 Fujimi Inc POLISHING COMPOSITION AND POLISHING METHOD
KR101385043B1 (ko) * 2011-12-30 2014-04-15 제일모직주식회사 Ｃｍｐ 슬러리 조성물 및 이를 이용한 연마 방법
US9340706B2 (en) * 2013-10-10 2016-05-17 Cabot Microelectronics Corporation Mixed abrasive polishing compositions
WO2017011451A1 (en) * 2015-07-13 2017-01-19 Cabot Microelectronics Corporation Methods and compositions for processing dielectric substrate

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Publication number Priority date Publication date Assignee Title
CN1742066A (zh) * 2003-02-03 2006-03-01 卡伯特微电子公司 抛光含硅电介质的方法
CN104334674A (zh) * 2012-05-22 2015-02-04 嘉柏微电子材料股份公司 包含氧化锆颗粒的cmp组合物及使用方法

Also Published As

Publication number Publication date
TWI605114B (zh) 2017-11-11
KR102670778B1 (ko) 2024-05-29
US20170066944A1 (en) 2017-03-09
CN108026412A (zh) 2018-05-11
WO2017040571A1 (en) 2017-03-09
JP6989493B2 (ja) 2022-01-05
TW201718817A (zh) 2017-06-01
EP3344716A4 (en) 2019-04-10
JP2018532828A (ja) 2018-11-08
EP3344716A1 (en) 2018-07-11
KR20180038051A (ko) 2018-04-13

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