CN107919371B - 光电转换装置和系统 - Google Patents
光电转换装置和系统 Download PDFInfo
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- CN107919371B CN107919371B CN201710912815.0A CN201710912815A CN107919371B CN 107919371 B CN107919371 B CN 107919371B CN 201710912815 A CN201710912815 A CN 201710912815A CN 107919371 B CN107919371 B CN 107919371B
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/026—Wafer-level processing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/182—Colour image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/804—Containers or encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
- H10F39/8053—Colour filters
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
- H10F39/8063—Microlenses
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016197546A JP2018060921A (ja) | 2016-10-05 | 2016-10-05 | 光電変換装置及びシステム |
| JP2016-197546 | 2016-10-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107919371A CN107919371A (zh) | 2018-04-17 |
| CN107919371B true CN107919371B (zh) | 2022-05-27 |
Family
ID=61759112
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710912815.0A Active CN107919371B (zh) | 2016-10-05 | 2017-09-30 | 光电转换装置和系统 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US10497733B2 (enExample) |
| JP (1) | JP2018060921A (enExample) |
| CN (1) | CN107919371B (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108292689B (zh) * | 2015-11-27 | 2021-07-20 | 京瓷株式会社 | 光电转换膜和光电转换装置 |
| US11069729B2 (en) * | 2018-05-01 | 2021-07-20 | Canon Kabushiki Kaisha | Photoelectric conversion device, and equipment |
| JP2019195051A (ja) * | 2018-05-01 | 2019-11-07 | キヤノン株式会社 | 光電変換装置および機器 |
| CN109065560A (zh) * | 2018-08-17 | 2018-12-21 | 苏州晶方半导体科技股份有限公司 | 影像传感芯片的封装方法以及封装结构 |
| JP2020031136A (ja) | 2018-08-22 | 2020-02-27 | キヤノン株式会社 | 撮像装置およびカメラ |
| WO2020054272A1 (ja) * | 2018-09-11 | 2020-03-19 | ソニーセミコンダクタソリューションズ株式会社 | 固体撮像装置及び電子機器 |
| US11462580B2 (en) * | 2019-06-27 | 2022-10-04 | Semiconductor Components Industries, Llc | Image sensor packages and related methods |
| JP7303698B2 (ja) * | 2019-08-08 | 2023-07-05 | キヤノン株式会社 | 半導体装置および機器 |
| US11257858B2 (en) * | 2020-04-28 | 2022-02-22 | Himax Technologies Limited | Method of fabricating a sensor device |
| WO2023203919A1 (ja) * | 2022-04-20 | 2023-10-26 | ソニーセミコンダクタソリューションズ株式会社 | 固体撮像装置 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003037257A (ja) * | 2001-07-23 | 2003-02-07 | Toppan Printing Co Ltd | 固体撮像素子 |
| JP2007142207A (ja) * | 2005-11-18 | 2007-06-07 | Matsushita Electric Ind Co Ltd | 固体撮像装置及びその製造方法 |
| JP2015082566A (ja) * | 2013-10-22 | 2015-04-27 | キヤノン株式会社 | 固体撮像装置、その製造方法及びカメラ |
| TW201529587A (zh) * | 2014-01-21 | 2015-08-01 | Fujifilm Corp | 近紅外線吸收性組成物、近紅外線截止濾波器及其製造方法以及照相機模組及其製造方法 |
| TW201603256A (zh) * | 2014-06-12 | 2016-01-16 | 新力股份有限公司 | 固態成像裝置,固態成像元件之製造方法及成像設備 |
| JP2016041481A (ja) * | 2014-08-18 | 2016-03-31 | 旭硝子株式会社 | 防眩性反射防止膜付き透明基材および物品 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1901215A (zh) | 2005-07-20 | 2007-01-24 | 松下电器产业株式会社 | 固体摄像装置及其制造方法 |
| JP4469781B2 (ja) | 2005-07-20 | 2010-05-26 | パナソニック株式会社 | 固体撮像装置及びその製造方法 |
| JP4110192B1 (ja) | 2007-02-23 | 2008-07-02 | キヤノン株式会社 | 光電変換装置及び光電変換装置を用いた撮像システム |
| JP2008305562A (ja) * | 2007-06-05 | 2008-12-18 | Panasonic Corp | プラズマディスプレイパネル |
| JP2009016574A (ja) | 2007-07-04 | 2009-01-22 | Panasonic Corp | 固体撮像装置およびその製造方法 |
| JP4457142B2 (ja) * | 2007-10-17 | 2010-04-28 | シャープ株式会社 | 固体撮像素子、カメラモジュールおよび電子情報機器 |
| JP5185019B2 (ja) | 2008-08-25 | 2013-04-17 | パナソニック株式会社 | 半導体装置及びそれを用いた電子機器 |
| JP2010073819A (ja) * | 2008-09-17 | 2010-04-02 | Canon Inc | 光電変換装置及び撮像システム |
| JP5644341B2 (ja) * | 2010-10-04 | 2014-12-24 | ソニー株式会社 | 固体撮像素子、および、その製造方法、電子機器 |
| JP2013012653A (ja) * | 2011-06-30 | 2013-01-17 | Panasonic Corp | 光学素子およびその製造方法 |
| JP2013084722A (ja) * | 2011-10-07 | 2013-05-09 | Toshiba Corp | 固体撮像装置および固体撮像装置の製造方法 |
| JP2013105846A (ja) * | 2011-11-11 | 2013-05-30 | Asahi Glass Co Ltd | 防曇性膜を有する光学部品、半導体装置 |
| JP6302650B2 (ja) * | 2012-11-30 | 2018-03-28 | 富士フイルム株式会社 | 硬化性樹脂組成物、これを用いた、色素含有層の形成方法、イメージセンサチップの製造方法及びイメージセンサチップ |
| JP6103947B2 (ja) | 2013-01-16 | 2017-03-29 | キヤノン株式会社 | 固体撮像装置及びその製造方法 |
| JP6300029B2 (ja) | 2014-01-27 | 2018-03-28 | ソニー株式会社 | 撮像素子、製造装置、製造方法 |
| JP5825398B2 (ja) * | 2014-05-19 | 2015-12-02 | ソニー株式会社 | 固体撮像素子及び固体撮像素子の製造方法、電子機器 |
| JP2016033972A (ja) | 2014-07-31 | 2016-03-10 | キヤノン株式会社 | 撮像装置及び撮像システム |
-
2016
- 2016-10-05 JP JP2016197546A patent/JP2018060921A/ja active Pending
-
2017
- 2017-09-27 US US15/717,111 patent/US10497733B2/en active Active
- 2017-09-30 CN CN201710912815.0A patent/CN107919371B/zh active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003037257A (ja) * | 2001-07-23 | 2003-02-07 | Toppan Printing Co Ltd | 固体撮像素子 |
| JP2007142207A (ja) * | 2005-11-18 | 2007-06-07 | Matsushita Electric Ind Co Ltd | 固体撮像装置及びその製造方法 |
| JP2015082566A (ja) * | 2013-10-22 | 2015-04-27 | キヤノン株式会社 | 固体撮像装置、その製造方法及びカメラ |
| TW201529587A (zh) * | 2014-01-21 | 2015-08-01 | Fujifilm Corp | 近紅外線吸收性組成物、近紅外線截止濾波器及其製造方法以及照相機模組及其製造方法 |
| TW201603256A (zh) * | 2014-06-12 | 2016-01-16 | 新力股份有限公司 | 固態成像裝置,固態成像元件之製造方法及成像設備 |
| JP2016041481A (ja) * | 2014-08-18 | 2016-03-31 | 旭硝子株式会社 | 防眩性反射防止膜付き透明基材および物品 |
Also Published As
| Publication number | Publication date |
|---|---|
| US10497733B2 (en) | 2019-12-03 |
| JP2018060921A (ja) | 2018-04-12 |
| CN107919371A (zh) | 2018-04-17 |
| US20180097029A1 (en) | 2018-04-05 |
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