CN107810383B - 高灵敏度系数应变仪 - Google Patents

高灵敏度系数应变仪 Download PDF

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Publication number
CN107810383B
CN107810383B CN201680027918.2A CN201680027918A CN107810383B CN 107810383 B CN107810383 B CN 107810383B CN 201680027918 A CN201680027918 A CN 201680027918A CN 107810383 B CN107810383 B CN 107810383B
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CN
China
Prior art keywords
strain
metallic element
sensitive metallic
strain gage
strain gauge
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CN201680027918.2A
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English (en)
Chinese (zh)
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CN107810383A (zh
Inventor
T·P·基弗
R·B·沃森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vishay Measurements Group Inc
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Vishay Measurements Group Inc
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Publication of CN107810383A publication Critical patent/CN107810383A/zh
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Publication of CN107810383B publication Critical patent/CN107810383B/zh
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/16—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge
    • G01B7/18—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge using change in resistance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/18—Measuring force or stress, in general using properties of piezo-resistive materials, i.e. materials of which the ohmic resistance varies according to changes in magnitude or direction of force applied to the material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C1/00—Details
    • H01C1/16—Resistor networks not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C13/00—Resistors not provided for elsewhere

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Measurement Of Force In General (AREA)
CN201680027918.2A 2015-05-14 2016-05-16 高灵敏度系数应变仪 Active CN107810383B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/712,602 US9933321B2 (en) 2015-05-14 2015-05-14 High gage factor strain gage
US14/712,602 2015-05-14
PCT/US2016/032666 WO2016183569A1 (en) 2015-05-14 2016-05-16 High gage factor strain gage

Publications (2)

Publication Number Publication Date
CN107810383A CN107810383A (zh) 2018-03-16
CN107810383B true CN107810383B (zh) 2020-08-11

Family

ID=56369169

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680027918.2A Active CN107810383B (zh) 2015-05-14 2016-05-16 高灵敏度系数应变仪

Country Status (6)

Country Link
US (1) US9933321B2 (enExample)
EP (1) EP3295139B1 (enExample)
JP (1) JP6799008B2 (enExample)
CN (1) CN107810383B (enExample)
IL (1) IL255548B (enExample)
WO (1) WO2016183569A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019066313A (ja) 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ
JP2019066454A (ja) 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ、センサモジュール
JP6793103B2 (ja) * 2017-09-29 2020-12-02 ミネベアミツミ株式会社 ひずみゲージ
JP2019184344A (ja) 2018-04-05 2019-10-24 ミネベアミツミ株式会社 ひずみゲージ及びその製造方法
JPWO2020085247A1 (ja) 2018-10-23 2021-09-16 ミネベアミツミ株式会社 アクセルペダル、ステアリング、ドア、ドア開閉システム
CN109883316B (zh) * 2019-03-22 2021-01-29 中国科学院力学研究所 一种电阻式应变传感器及应变测量方法
CN110095054B (zh) * 2019-04-03 2020-06-30 中国科学院力学研究所 一种电阻式应变片
JP1669298S (enExample) * 2019-07-17 2020-10-05
JP1661600S (ja) * 2019-07-17 2020-06-15 ひずみゲージ
FR3116339B1 (fr) * 2020-11-16 2022-11-11 Commissariat Energie Atomique Jauge d’extensométrie inorganique
LU102298B1 (en) * 2020-12-16 2022-06-20 Univ Luxembourg Abrasive waterjet cutting nozzle with a resistive strain gauge sensor

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US2899658A (en) * 1959-08-11 Leaf-type electrical resistance strain gage
US3134953A (en) * 1952-08-28 1964-05-26 Technograph Printed Circuits L Electric resistance devices
NL282500A (enExample) 1962-08-24
US3922628A (en) * 1970-08-03 1975-11-25 Gen Electric Strain gage
US4325048A (en) * 1980-02-29 1982-04-13 Gould Inc. Deformable flexure element for strain gage transducer and method of manufacture
US4696188A (en) * 1981-10-09 1987-09-29 Honeywell Inc. Semiconductor device microstructure
JPS6017058A (ja) * 1983-07-06 1985-01-28 Toshiba Corp 高照射領域内機器用合金
JPS60174903A (ja) * 1984-02-22 1985-09-09 Hitachi Ltd 温度補償型ひずみゲ−ジ
DE3502008A1 (de) * 1985-01-23 1986-07-24 Standard Elektrik Lorenz Ag, 7000 Stuttgart Dehnungsaufnehmer
JPH066774B2 (ja) 1989-07-24 1994-01-26 財団法人電気磁気材料研究所 ストレインゲージ用合金およびその製造方法
US5184516A (en) * 1991-07-31 1993-02-09 Hughes Aircraft Company Conformal circuit for structural health monitoring and assessment
US5230252A (en) * 1991-09-30 1993-07-27 Eastman Kodak Company Force transducer
JP3166937B2 (ja) * 1991-10-16 2001-05-14 株式会社安川電機 磁歪式歪センサ
FR2693795B1 (fr) * 1992-07-15 1994-08-19 Commissariat Energie Atomique Jauge de contrainte sur support souple et capteur muni de ladite jauge.
US5915285A (en) * 1993-01-21 1999-06-22 Optical Coating Laboratory, Inc. Transparent strain sensitive devices and method
JPH06248399A (ja) * 1993-02-23 1994-09-06 Kyowa Electron Instr Co Ltd ひずみゲージ用アモルファス合金およびひずみゲージ
JPH0887375A (ja) * 1994-09-16 1996-04-02 Fujitsu Ltd ポインティングデバイス
JP2000235911A (ja) * 1998-12-14 2000-08-29 Fujitsu Ltd 磁性材料およびそれを用いた磁気ヘッド並びに磁気記録装置
CN100477025C (zh) * 2004-05-28 2009-04-08 金重勋 三元及多元铁基块状非晶合金及纳米晶合金
JP2007271285A (ja) * 2006-03-30 2007-10-18 Millenium Gate Technology Co Ltd ひずみゲージの製造方法
JP5408533B2 (ja) * 2009-05-28 2014-02-05 独立行政法人国立高等専門学校機構 ひずみゲージ用のＦｅ−Ｎｉ−Ｃｒ系アイソエラスティック組成物、及び、該組成物を用いて製造されるひずみゲージ
CN102243058B (zh) * 2011-04-15 2013-03-27 中国船舶重工集团公司第七○二研究所 应变传感器灵敏度系数的标定装置和方法
GB2491806B (en) * 2011-05-25 2013-07-10 Microvisk Ltd Apparatus and method for measuring properties of a fluid
US9771642B2 (en) * 2012-07-04 2017-09-26 Apple Inc. BMG parts having greater than critical casting thickness and method for making the same

Also Published As

Publication number Publication date
CN107810383A (zh) 2018-03-16
WO2016183569A1 (en) 2016-11-17
EP3295139A1 (en) 2018-03-21
US9933321B2 (en) 2018-04-03
HK1245878A1 (zh) 2018-08-31
EP3295139B1 (en) 2019-10-16
US20160334289A1 (en) 2016-11-17
IL255548B (en) 2021-07-29
IL255548A (en) 2018-01-31
JP2018518665A (ja) 2018-07-12
JP6799008B2 (ja) 2020-12-09

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