CN107786120A - Piezoelectricity rotation positioning platform and control method with grand microring array kinetic characteristic - Google Patents
Piezoelectricity rotation positioning platform and control method with grand microring array kinetic characteristic Download PDFInfo
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- CN107786120A CN107786120A CN201711162923.7A CN201711162923A CN107786120A CN 107786120 A CN107786120 A CN 107786120A CN 201711162923 A CN201711162923 A CN 201711162923A CN 107786120 A CN107786120 A CN 107786120A
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Classifications
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
- H02N2/02—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors
- H02N2/04—Constructional details
- H02N2/043—Mechanical transmission means, e.g. for stroke amplification
- H02N2/046—Mechanical transmission means, e.g. for stroke amplification for conversion into rotary motion
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
- H02N2/02—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors
- H02N2/06—Drive circuits; Control arrangements or methods
Abstract
The present invention relates to a kind of piezoelectricity rotation positioning platform and control method with grand microring array kinetic characteristic, belong to precision optical machinery field.The platform includes base unit, driver element and subunit.Two groups of driver elements are arranged on the left and right sides of base unit base, and its installation site can be adjusted between different screw thread hole sites.Subunit is by being interference fitted in the bearing of base unit.Gap between the rotating disk of subunit and the hemispherical contact part of driver element fine adjustment is realized by pre-loading screw.The control method of the platform realizes continuous rotary motion by continuous sawtooth drive waveforms；Small range precise motion is realized by Linear Driving waveform；Big stroke, the grand microring array rotational positioning of high accuracy are realized by the two coupling driving.Advantage is：It is simple in construction, compact, process, be easy to assembly, being had a good application prospect in fields such as precision optics, Precision Machining, micromanipulation, micro- clamping, Micro Mechanical Properties rests.
Description
Technical field
The present invention relates to precision optical machinery field, more particularly to a kind of piezoelectricity rotational positioning with grand microring array kinetic characteristic
Platform and control method, available for fields such as precision optics, Precision Machining, micromanipulation, micro- clamping, Micro Mechanical Properties rests
Realize grand microring array precision positioning.
Background technology
Precision linear and rotation positioning platform are widely used and demand in scientific circles and industrial quarters, such as atomic force microscopy
Mirror, precision/Ultra-precision Turning, optical correction/alignment, micro- clamping, micro nanometer mechanics test etc..In the effect of inverse piezoelectric effect
Under, piezoelectric element can extend output micro-displacement under driving voltage effect.Based on the effect, researcher utilizes Piezoelectric Driving
Element devises the locating platform of different principle and structure, typically have piezoelectric direct drive type, flexible structure amplifying type, inertia-type,
The locating platform such as stick-slip formula and looper bionic type.However, most of Precision Piezoelectric locating platforms are set for linear motion at present
Meter, only small part can realize certain rotary motion.Such as document（Sensors and Actuators A: Physical,
2013, 194: 269-276）In, a piezoelectricity rotation positioning platform is devised using looper bionic principle, however, its structure,
Processing, assembling and control are sufficiently complex, limit its practical application.Document（Review of Scientific
Instruments, 2013, 84: 096105）A piezoelectricity is devised based on parasitic motion principle using single piezoelectric element
Rotation positioning platform, although its structure compares the simple many of Inchworm type, the more significant motion that retracts be present, one need to be entered
Walk Curve guide impeller.Document（Sensors and Actuators A: Physical, 2016, 251: 179-187）Report
A inertia-type piezoelectricity rotation positioning platform, but it retracts, motion is larger, and bearing capacity is limited.To sum up, it can be seen that grind
Fixture has structure and controls the piezoelectricity rotational positioning of the practical performance indexs such as simple, grand microring array driving force, large carrying capacity
Platform is still a difficult point, and urgently need.
The content of the invention
It is an object of the invention to provide a kind of piezoelectricity rotation positioning platform with grand microring array kinetic characteristic and control
Method, solves above mentioned problem existing for prior art.The piezoelectricity rotational positioning with grand microring array kinetic characteristic of the present invention
Platform structure is simple, and can conveniently realize output performance regulation by adjusting the installation site of driver element；In addition, it is controlled
System is also simple, and continuous rotary motion can be conveniently realized by sawtooth drive waveforms, is positioned for big stroke, coupled linear driving
Waveform can realize small range precision positioning, and a kind of available solutions are provided for big stroke, the grand microring array rotational positioning of high accuracy.
The above-mentioned purpose of the present invention is achieved through the following technical solutions：
Piezoelectricity rotation positioning platform with grand microring array kinetic characteristic, including base unit, driver element and subunit three
Part, the driver element are connected by screw 8 with the base 1 of base unit, and subunit is single with basis by interference fit
The bearing 2 of member connects.
Described base unit is made up of base 1 and bearing 2；The bearing 2 is arranged in base 1 by interference fit
In heart hole；Multiple rows of screwed hole is distributed with the base 1, driver element realizes output performance installed in different screw thread hole sites
Regulation.
Described driver element includes structure identicalxForward drive unit andxTwo groups of negative sense driver element, passes through respectively
Screw is arranged on the left and right sides of base 1 of base unit, and the installation site on base 1 can be between different screw thread hole sites
It is adjusted；It is describedxForward drive unit by hemispherical contact part 4,xPositive piezoelectric stack 5, voussoir 6,xPositive flexible hinge 7
WithxPositive pre-loading screw 10 forms；The hemispherical contact part 4 is pasted onto by solid gumxThe output end of positive flexible hinge 7
On；It is describedxPositive piezoelectric stack 5 is arranged on by voussoir 6xIn the groove of positive flexible hinge 7；It is describedxPositive pre-loading screw
10 are screwed into the length of base 1 by changing it, carry out micro-positioning regulatorsxPositive flexible hinge 7 alongzTo deformation, and then realize half
The gap adjustment of ball contact 4 and subunit turntable 9.
Described subunit includes transition connecting rod 3 and rotating disk 9, and the rotating disk 9 is connected by screw thread and transition connecting rod 3
Connect.
Another object of the present invention is to provide a kind of piezoelectricity rotation positioning platform with grand microring array kinetic characteristic
Control method, comprise the following steps：
a）Fine adjustmentxPositive pre-loading screw 10 makes hemispherical contact part 4 realize that gap coordinates with rotating disk 9；
b）GivexIn forward drive unitxPositive piezoelectric stack 5 applies zigzag driving voltage, and piezoelectric stack 5 is imitated in inverse piezoelectricity
In the presence of answering, first slowly elongation, in this process,xCorresponding elasticity can occur for the flexible structure on positive flexible hinge 7
Deformation, so as to cause the hemispherical contact part 4 in its output end to produce edgexPositive displacement, rotating disk 9 is promoted to realize positive fortune
Dynamic, during voltage rapid decrease, due to motional inertia, rotating disk 9 only has small rollback motion, so as to which rotating disk 9 is one
The individual period of motion realizes positive movement on the whole, and the process of repetition can realize continuous positive movement；Similarly, controlxNegative sense drives
Moving cell can realize negative movement；
c）The driving voltage amplitude and frequency of piezoelectric stack 5 are adjusted, the regulation and control to the speed of rotating disk 9 can be achieved；
d）Pass through first continuous sawtooth waveforms linear waveform complex controll again, it is possible to achieve the first grand dynamic adjustment of rotating disk 9, then fine motion adjustment,
And then realize the grand microring array motion of rotating disk 9.
The beneficial effects of the present invention are：Piezoelectric Driving rotation positioning platform provided by the invention, it is simple in construction, compact,
Processing, assemble, be easy to control, by setting a variety of driver element installation sites, realizing the mechanical adjustment of output performance；Pass through
Change driving voltage and frequency, realize the electrical control adjustment of output performance；Pass through continuous sawtooth drive waveforms and Linear Driving
The coupling control of waveform, realize the grand microring array precision rotation positioning of big stroke, high accuracy.Based on structure proposed by the present invention and control
Method processed, the optimization of physical dimension and parameter can be carried out according to specific needs, it is convenient to obtain Different structural parameters and output
The piezoelectricity rotation positioning platform of performance, surveyed available for precision optics, Precision Machining, micromanipulation, micro- clamping, Micro Mechanical Properties
Realize grand microring array precision positioning in the fields such as examination.It is applied widely, it is practical.
Brief description of the drawings
Accompanying drawing described herein is used for providing a further understanding of the present invention, forms the part of the application, this hair
Bright illustrative example and its illustrate to be used to explain the present invention, do not form inappropriate limitation of the present invention.
Fig. 1 is the dimensional structure diagram of the piezoelectricity rotation positioning platform with grand microring array kinetic characteristic of the present invention；
Fig. 2 is the left view of the present invention；
Fig. 3 is the rearview of the present invention；
Fig. 4 is the upward view of the present invention；
Fig. 5 is the structure of driving unit of the present invention（Without pre-loading screw）Schematic diagram；
Fig. 6 is the flexible hinge structure of the driver element of the present invention（Part containing hemispherical contact）Schematic diagram；
Fig. 7 is the flexible hinge structure of the driver element of the present invention（Part containing hemispherical contact）Realized under pre-loading screw effect pre-
The schematic diagram tightly adjusted；
Fig. 8 is the flexible hinge structure of the driver element of the present invention（Part containing hemispherical contact）In piezoelectric stack displacement output action
Under deformation schematic diagram；
Fig. 9 is the SECO figure of the present invention.
In figure：1st, base；2nd, bearing；3rd, transition connecting rod；4th, hemispherical contact part；5、xPositive piezoelectric stack；6th, wedge
Block；7、xPositive flexible hinge；8th, screw；9th, rotating disk；10、xPositive pre-loading screw.
Embodiment
The detailed content and its embodiment of the present invention is further illustrated below in conjunction with the accompanying drawings.
Referring to shown in Fig. 1 to Fig. 4, the piezoelectricity rotation positioning platform with grand microring array kinetic characteristic of the invention, including
Base unit, driver element and subunit three parts, the driver element are connected by screw 8 with the base 1 of base unit,
Subunit is connected by being interference fitted with the bearing 2 of base unit.
Referring to shown in Fig. 1 and Fig. 4, described base unit is made up of base 1 and bearing 2；The bearing 2 is matched somebody with somebody by interference
Close in the centre bore of base 1；Multiple rows of screwed hole is distributed with the base 1, driver element is arranged on different screw threads
Realize that output performance is adjusted in hole site.
Referring to shown in Fig. 1 to Fig. 7, described driver element includesxForward drive unit andxTwo groups of negative sense driver element,
Two groups of structure of driving unit are identical, are arranged on the left and right sides of base 1 of base unit by screw respectively, and it is on base 1
Installation site can be adjusted between different screw thread hole sites（Shown in Fig. 4）；It is describedxForward drive unit is connect by hemispherical
Contact element 4,xPositive piezoelectric stack 5, voussoir 6,xThe positive He of flexible hinge 7xPositive pre-loading screw 10 forms；The hemispherical contact
Part 4 is pasted onto by the solid gum of high bond strengthxIn the output end of positive flexible hinge 7（Shown in Fig. 5 and Fig. 6）；It is describedxJust
It is arranged on to piezoelectric stack 5 by voussoir 6xIn the groove of positive flexible hinge 7（Shown in Fig. 5）；It is describedxPositive pre-loading screw 10
The length of base 1 is screwed into by changing it, carrys out micro-positioning regulatorsxPositive flexible hinge 7 alongzTo deformation, and then realize hemisphere
The gap adjustment of shape contact 4 and subunit turntable 9（Shown in Fig. 7）.
Referring to shown in Fig. 1 and Fig. 3, described subunit includes transition connecting rod 3 and rotating disk 9, and the rotating disk 9 passes through spiral shell
Line is connected with transition connecting rod 3.
Below, withxExemplified by forward drive unit, illustrate the piezoelectricity rotational positioning with grand microring array kinetic characteristic and put down
The control method of platform, is mainly included the following steps that：
a）Fine adjustmentxPositive pre-loading screw 10 makes hemispherical contact part 4 realize that gap coordinates with rotating disk 9；
b）GivexIn forward drive unitxPositive piezoelectric stack 5 applies zigzag driving voltage（Shown in Fig. 9）, piezoelectric stack 5
In the presence of inverse piezoelectric effect, first slowly elongation, in this process,xFlexible structure on positive flexible hinge 7 can occur
Corresponding elastic deformation, so as to cause the hemispherical contact part 4 in its output end to produce edgexPositive displacement（Shown in Fig. 8）, push away
Turn disk 9 realizes positive movement, and during voltage rapid decrease, due to factors such as motional inertias, rotating disk 9 only has small
Retract motion, and so as to which rotating disk 9 realizes positive movement in a period of motion on the whole, the process of repetition can realize continuous forward direction
Motion；Similarly, controlxNegative sense driver element can realize negative movement；
c）The driving voltage amplitude and frequency of piezoelectric stack 5 are adjusted, the regulation and control to the speed of rotating disk 9 can be achieved；
d）Pass through first continuous sawtooth waveforms linear waveform complex controll again（Shown in Fig. 9）, it is possible to achieve the first a wide range of grand dynamic tune of rotating disk 9
It is whole, then fine motion adjustment, and then realize the grand microring array motion of rotating disk 9.
The preferred embodiment of the present invention is the foregoing is only, is not intended to limit the invention, for the technology of this area
For personnel, the present invention can have various modifications and variations.All any modification, equivalent substitution and improvements made for the present invention etc.,
It should be included in the scope of the protection.
Claims (5)
- A kind of 1. piezoelectricity rotation positioning platform with grand microring array kinetic characteristic, it is characterised in that：Including base unit, driving Unit and subunit three parts, the driver element pass through screw（8）With the base of base unit（1）Connection, subunit By being interference fitted the bearing with base unit（2）Connection.
- 2. the piezoelectricity rotation positioning platform according to claim 1 with grand microring array kinetic characteristic, it is characterised in that：Institute The base unit stated is by base（1）And bearing（2）Composition；The bearing（2）Base is arranged on by interference fit（1）Center In hole；The base（1）On multiple rows of screwed hole is distributed with, driver element realizes output performance installed in different screw thread hole sites Regulation.
- 3. the piezoelectricity rotation positioning platform according to claim 1 with grand microring array kinetic characteristic, it is characterised in that：Institute The driver element stated includes structure identicalxForward drive unit andxTwo groups of negative sense driver element, is arranged on by screw respectively The base of base unit（1）The left and right sides, and in base（1）On installation site can be adjusted between different screw thread hole sites Section；It is describedxForward drive unit is by hemispherical contact part（4）、xPositive piezoelectric stack（5）, voussoir（6）、xPositive flexible hinge （7）WithxPositive pre-loading screw（10）Composition；The hemispherical contact part（4）It is pasted onto by solid gumxPositive flexible hinge （7）Output end on；It is describedxPositive piezoelectric stack（5）Pass through voussoir（6）It is arranged onxPositive flexible hinge（7）Groove in； It is describedxPositive pre-loading screw（10）Base is screwed into by changing it（1）Length, carry out micro-positioning regulatorsxPositive flexible hinge（7）Edge zTo deformation, and then realize hemispherical contact part（4）With subunit turntable（9）Gap adjustment.
- 4. the piezoelectricity rotation positioning platform according to claim 1 with grand microring array kinetic characteristic, it is characterised in that：Institute The subunit stated includes transition connecting rod（3）And rotating disk（9）, the rotating disk（9）Pass through screw thread and transition connecting rod（3）Even Connect.
- A kind of 5. control method of the piezoelectricity rotation positioning platform with grand microring array kinetic characteristic, it is characterised in that：Including with Lower step：a）Fine adjustmentxPositive pre-loading screw（10）Make hemispherical contact part（4）With rotating disk（9）Realize that gap coordinates；b）GivexIn forward drive unitxPositive piezoelectric stack（5）Apply zigzag driving voltage, piezoelectric stack（5）In inverse pressure In the presence of electrical effect, first slowly elongation, in this process,xPositive flexible hinge（7）On flexible structure can occur accordingly Elastic deformation, so as to cause the hemispherical contact part in its output end（4）Produce edgexPositive displacement, promote rotating disk（9）It is real Existing positive movement, during voltage rapid decrease, due to motional inertia, rotating disk（9）Only small rollback motion, so as to Rotating disk（9）Realize positive movement on the whole in a period of motion, the process of repetition can realize continuous positive movement；Similarly, ControlxNegative sense driver element can realize negative movement；c）Adjust piezoelectric stack（5）Driving voltage amplitude and frequency, can be achieved to rotating disk（9）The regulation and control of speed；d）Pass through first continuous sawtooth waveforms linear waveform complex controll again, it is possible to achieve rotating disk（9）First grand dynamic adjustment, then fine motion are adjusted It is whole, and then realize rotating disk（9）Grand microring array motion.
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Cited By (4)
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| CN108696182A (en) * | 2018-05-30 | 2018-10-23 | 东北大学 | A kind of rotatable stage and control method towards Multi-station precision operation |
| CN109921682A (en) * | 2019-03-27 | 2019-06-21 | 吉林大学 | Optical element multiple degrees of freedom precision adjustment unit and control method under vacuum environment |
| CN110912447A (en) * | 2019-04-08 | 2020-03-24 | 浙江师范大学 | Piezoelectric rotary driving platform based on crawling principle |
| CN114526406A (en) * | 2022-02-14 | 2022-05-24 | 中国电子科技集团公司第四十一研究所 | Self-aligning spherical support device and method for laser outer cavity base |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108696182A (en) * | 2018-05-30 | 2018-10-23 | 东北大学 | A kind of rotatable stage and control method towards Multi-station precision operation |
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| CN109921682A (en) * | 2019-03-27 | 2019-06-21 | 吉林大学 | Optical element multiple degrees of freedom precision adjustment unit and control method under vacuum environment |
| CN109921682B (en) * | 2019-03-27 | 2023-10-24 | 吉林大学 | Multi-degree-of-freedom precise adjusting device for optical element in vacuum environment and control method |
| CN110912447A (en) * | 2019-04-08 | 2020-03-24 | 浙江师范大学 | Piezoelectric rotary driving platform based on crawling principle |
| CN110912447B (en) * | 2019-04-08 | 2023-01-31 | 浙江师范大学 | Piezoelectric rotary driving platform based on crawling principle |
| CN114526406A (en) * | 2022-02-14 | 2022-05-24 | 中国电子科技集团公司第四十一研究所 | Self-aligning spherical support device and method for laser outer cavity base |
| CN114526406B (en) * | 2022-02-14 | 2024-03-22 | 中国电子科技集团公司第四十一研究所 | Device and method for supporting self-aligning spherical surface of laser external cavity base |
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