CN107743425A - 金属胶及其用于连接组件的用途 - Google Patents

金属胶及其用于连接组件的用途 Download PDF

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CN107743425A
CN107743425A CN201680033210.8A CN201680033210A CN107743425A CN 107743425 A CN107743425 A CN 107743425A CN 201680033210 A CN201680033210 A CN 201680033210A CN 107743425 A CN107743425 A CN 107743425A
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metal
weight
component
particle
silver
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CN107743425B (zh
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T·克雷布斯
M·舍费尔
W·施米特
S·K·杜赫
J·纳赫赖纳
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Heraeus Deutschland GmbH and Co KG
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Heraeus Precious Metals GmbH and Co KG
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Abstract

一种金属胶,其包含(A)75至90重量%的包含含有至少一种有机化合物的涂层的铜和/或银颗粒、(B)5至20重量%的有机溶剂、及(C)2至20重量%的至少一种类型的不同于颗粒(A)且具有在0.2至10μm范围内的平均粒度(d50)的金属颗粒,其中组分(C)的所述金属颗粒选自由钼颗粒及具有10至90重量%银含量的镍核心‑银夹套颗粒组成的群。

Description

金属胶及其用于连接组件的用途
本发明涉及一种金属胶,及一种用于连接组件的方法,该方法中使用所述金属胶。
在电力及消费电子产品中,对压力及温度高度敏感的组件诸如LED或极薄硅晶片的连接特别具有挑战性。
有鉴于此,这些压力及温度敏感性组件通常借助于胶合彼此连接。但粘着技术的缺点在于,会在介于组件之间产生仅包含低导热性和/或导电性的接触位点。
为解决这个问题,通常对待连接的组件进行烧结。烧结技术是一种以稳定方式连接组件的极简单方法。
已知在电力电子产品中在烧结制程中使用金属胶来连接组件。例如,WO2011/026623 A1揭示一种金属胶,其含有75至90重量%(重量百分比)的至少一种呈包含含有至少一种有机化合物的涂层的颗粒形式存在的金属、0至12重量%的至少一种金属前驱物、6至20重量%的至少一种溶剂、及0.1至15重量%的至少一种烧结助剂,以及这种金属胶借助烧结法连接组件的用途。
DE 10 2009 000 192 A1揭示烧结材料,其可于用于连接组件的烧结法中使用且包含经有机方式涂覆的铜、银和/或金颗粒作为结构颗粒及经非有机方式涂覆(未经涂覆)的金属和/或陶瓷辅助颗粒。金属辅助颗粒可由与结构颗粒相同(但不含有机涂层)的材料制成。
本发明的目的为提供一种以稳定方式连接组件的烧结方法。所述方法意欲用于在待连接的组件之间产生具有低孔隙度及高导电性及导热性的接触位点。所述烧结方法适用于在压力烧结条件下及在少压力烧结中稳定地连接组件。由所述方法制得的呈设于经连接的组件之间的烧结层(经烧结的层)形式的烧结连接即使在如可在正常使用条件下发生的持续温度压迫后,也不应变成具脆性并不应或几乎不会形成内部机械张力。连接组件的烧结层中的脆性及机械张力会减弱该连接的强度或可甚至破坏这种连接,这是在连接大表面组件例如大表面散热片或大表面晶片时具有重大意义的问题。大表面组件的实例包括具有>16mm2,例如在>16至12000mm2范围内的接触表面积的组件。实例包括矩形接触表面各具有>4mm的边缘长度的矩形组件,其中较长的边缘可例如为长度长达150mm。本发明的另一目的为提供一种特别适于实施这种烧结方法的金属胶。
本发明涉及一种用于连接组件的方法,所述方法包括提供(a)夹层配置,其包含至少(a1)一个组件1、(a2)一个组件2、及(a3)位于组件1与组件2间的金属胶,(b)烧结所述夹层配置,其中所述金属胶包含(A)75至90重量%的包含含有至少一种有机化合物的涂层的铜和/或银颗粒、(B)5至20重量%的有机溶剂、及(C)2至20重量%的至少一种类型的不同于颗粒(A)且具有在0.2至10μm范围内的平均粒度(d50)的金属颗粒,其中组分(C)的所述金属颗粒选自由钼颗粒及具有10至90重量%银含量的镍核心-银夹套颗粒组成的群。
本发明进一步涉及一种金属胶,其包含(A)75至90重量%的包含含有至少一种有机化合物的涂层的铜和/或银颗粒、(B)5至20重量%的有机溶剂、及(C)2至20重量%的至少一种类型的不同于颗粒(A)且具有在0.2至10μm范围内的平均粒度(d50)的金属颗粒,其中组分(C)的所述金属颗粒选自由钼颗粒及具有10至90重量%银含量的镍核心-银夹套颗粒组成的群。
说明书和权利要求书中所使用的术语“平均粒度”指的是可借助于激光绕射测得的一级平均粒径(d50)。激光绕射测量可利用适宜粒度测量装置,例如由MalvernInstruments制造的Mastersizer 3000进行。
根据本发明的金属胶就组分(A)而言包含75至90重量%,优选77至89重量%,更佳78至87重量%,及甚至更佳78至86重量%的包含含有至少一种有机化合物的涂层的铜和/或银颗粒。本文中的重量包括位于这些颗粒上的涂层化合物的重量。
术语铜和/或银颗粒(A)指的是包括由纯金属(纯度至少99.9重量%)以及含有至多10重量%的至少一种其他合金金属的合金组成的颗粒。合适的合金金属的实例为铜、银、金、镍、钯、铂及铝。
就组分(A)而言,银颗粒,特别是由纯银制成的银颗粒为优选。
铜和/或银颗粒(A)可具有不同形状。它们可例如呈薄片形式存在或具有球形(似球)形状。根据一特别优选实施例,这些铜和/或银颗粒采用薄片形状。然而,此不排除使用的小部分铜和/或银颗粒具有不同形状。然而,优选至少70重量%,更佳至少80重量%,甚至更佳至少90重量%或100重量%的铜和/或银颗粒为呈薄片形式存在。
所述铜和/或银颗粒经涂覆。
术语颗粒的涂层指的是颗粒的表面上的坚固粘着层。
这些铜和/或银颗粒的涂层包含至少一种类型的涂层化合物。
这些涂层化合物为有机化合物。
用作涂层化合物的有机化合物指的是防止这些铜和/或银颗粒聚结的含碳化合物。
根据一优选实施例,所述涂层化合物具有至少一个官能基。可设想的官能基尤其包括羧酸基、羧酸酯基、酯基、酮基、醛基、胺基、酰胺基、偶氮基、酰亚胺基或腈基。羧酸基及羧酸酯基为优选的官能基。羧酸基可为去质子化。
这些具有至少一个官能基的涂层化合物优选为饱和、单不饱和或多不饱和有机化合物。
除此之外,这些具有至少一个官能基的涂层化合物可为分支链或非分支链。
这些具有至少一个官能基的涂层化合物优选包含1至50个,更佳2至24个,甚至更佳6至24个,及又更佳8至20个碳原子。
这些涂层化合物可为离子性或非离子性。
优选使用游离脂肪酸、脂肪酸盐或脂肪酸酯作为涂层化合物。
这些游离脂肪酸、脂肪酸盐、及脂肪酸酯优选为非分支链。
除此之外,这些游离脂肪酸、脂肪酸盐、及脂肪酸酯优选为饱和。
优选的脂肪酸盐包括铵盐、单烷基铵盐、二烷基铵盐、三烷基铵盐、铝盐、铜盐、锂盐、钠盐、及钾盐。
烷酯,特定而言甲酯、乙酯、丙酯、及丁酯为优选的酯。
根据一优选实施例,这些游离脂肪酸、脂肪酸盐或脂肪酸酯为具有8至24个,更佳8至18个碳原子的化合物。
优选的涂层化合物为羊脂酸(辛酸)、羊蜡酸(癸酸)、月桂酸(十二烷酸)、肉豆蔻酸(十四烷酸)、棕榈酸(十六烷酸)、珍珠酸(十七烷酸)、硬脂酸(十八烷酸)、花生四烯酸(花生酸/二十烷酸)、山萮酸(二十二烷酸)、木蜡酸(二十四烷酸)以及对应的酯及盐。
特别优选的涂层化合物包括十二烷酸、十八烷酸、硬脂酸铝、硬脂酸铜、硬脂酸钠、硬脂酸钾、棕榈酸钠、及棕榈酸钾。
这些涂层化合物可借由自现有技术已知的已知方法施覆至铜和/或银颗粒(A)的表面。
可例如在溶剂中浆化这些涂层化合物,特定而言上文提及的硬质酸盐或棕榈酸盐,及在球磨机中一起研磨这些浆化的涂层化合物与铜和/或银颗粒。在研磨之后,干燥经这些涂层化合物涂覆的铜和/或银颗粒且接着移除粉尘。
优选地,相对于整个涂层的有机化合物的分率,特定而言选自由游离脂肪酸、脂肪酸盐及脂肪酸酯组成的群的化合物的分率,为至少60重量%,更佳至少70重量%,甚至更佳至少80重量%,又更佳至少90重量%,尤其至少95重量%,至少99重量%或100重量%。
相对于经涂覆的铜和/或银颗粒的重量的这些涂层化合物的分率,优选选自由游离脂肪酸、脂肪酸盐及脂肪酸酯组成的群的涂层化合物的分率为<5重量%,例如0.01至2重量%,优选0.3至1.5重量%。
定义为涂层化合物的质量与铜和/或银颗粒的表面积之比的涂覆程度优选为0.00005至0.03g,更佳0.0001至0.02g涂层化合物每平方米(m2)铜和/或银颗粒表面积。
本发明金属胶就组分(B)而言包含6至20重量%,优选7至18重量%,更佳8至17重量%,及又更佳10至15重量%的有机溶剂(即,一种有机溶剂或至少两种有机溶剂的混合物)。
所述一或多种有机溶剂(B)为常用于金属胶的有机溶剂。实例包括萜品醇、N-甲基-2-吡咯啶酮、乙二醇、二甲基乙酰胺、1-十三醇、2-十三醇、3-十三醇、4-十三醇、5-十三醇、6-十三醇、异十三醇(除了倒数第二个C原子上的甲基取代以外)、未经取代的1-羟基-C16-C20-烷烃(诸如16-甲基十七烷-1-醇)、二元酯(优选为戊二酸、己二酸或琥珀酸的二甲酯或其混合物)、甘油、二乙二醇、三乙二醇、及具有5至32个C原子、更佳10至25个C原子、及甚至更佳16至20个C原子的脂族烃(尤其为饱和脂族烃)。这些脂族烃为例如由Exxon Mobil以商标名ExxsolTMD140或以商标名Isopar MTM销售。
对本发明必要的是:金属胶就组分(C)而言包含2至20重量%的至少一种类型的不同于颗粒(A)且具有在0.2至10μm范围内的平均粒度(d 50)的金属颗粒,其中组分(C)的这些金属颗粒为选自由钼颗粒及具有10至90重量%,优选15至30重量%,特定而言25重量%的银含量的镍核心-银夹套颗粒组成的群。
这些形成组分(C)的颗粒不同于铜和/或银颗粒(A)。其为钼颗粒或具有10至90重量%,优选15至30重量%,特定而言25重量%的银含量的镍核心-银夹套颗粒[经银涂覆(包封)的镍颗粒]中任何一个或钼颗粒与具有10至90重量%,优选15至30重量%,特定而言25重量%的银含量的镍核心-银夹套颗粒的组合。换言之,这些镍核心-银夹套颗粒的银夹套占镍核心-银夹套颗粒总重量的10至90重量%,优选15至30重量%,特定而言25重量%。
特定而言,这些颗粒(C)既不包含薄片又不包含针状物,具体而言,其包含在例如1至3,优选1至2范围内的形状因子。
本文使用的术语“形状因子”指的是颗粒的形状并意指颗粒的最大及最小纵向延伸的比率。其可通过分析显微图借由测量统计上合理数目的颗粒例如2500至3000个个别颗粒的尺寸来确定。例如,可使用在完整放大5000倍下,耦合至自动图像分析系统的光学显微镜来达成这一点。
包含在1至3或1至2的指定范围内的形状因子的颗粒的特征在于,例如,具有球形(形状因子1)、基本上球形、椭圆或卵形状、不规则但紧凑的形状、所谓纽扣的形状等,但在任何情况中,具有偏离片状(薄片)针状的形状。颗粒(C)的表面可为平滑或不规则,例如,粗糙或格子化。
在一个实施例中,这些形成组分(C)的镍核心-银夹套颗粒不具有涂层。
本发明金属胶可包含0至12重量%,优选0.1至12重量%,更佳1至10重量%,及甚至更佳2至8重量%的至少一种金属前驱物(D)。
在本发明的范畴中,金属前驱物指的是含有至少一种金属的化合物。优选地,该化合物在低于200℃的温度下分解同时释放金属。因此,在烧结制程中使用金属前驱物优选地与原位产生金属相关联。容易确定化合物是否为金属前驱物。例如,可在具有银表面的衬底上沉积含有待测试的化合物的胶,接着加热至200℃,且维持该温度20分钟。接着,测试待测试的化合物是否在此等条件下分解形成金属。针对此目的,例如,可在测试之前对含金属的胶组分的内容物称重以计算金属的理论质量。于该测试后,借由重量分析方法来测定沉积于衬底上的材料的质量。若沉积于衬底上的材料的质量等于金属的理论质量,考虑到常见的测量误差,则所测试化合物为金属前驱物。
根据一优选实施例,所述金属前驱物为可吸热分解的金属前驱物。可吸热分解的金属前驱物指的是其优选在保护性气体氛围中的热分解为吸热过程的金属前驱物。该热分解是与金属自该金属前驱物的释放相关联。
所述金属前驱物优选包含至少一种选自由铜、银、金、镍、钯及铂组成的群,特定而言由铜及银组成的群的元素作为金属。
可优选使用以上指定金属的可吸热分解的碳酸盐、乳酸盐、甲酸盐、柠檬酸盐、氧化物或脂肪酸盐(优选为具有6至24个碳原子的脂肪酸盐)作为金属前驱物。
碳酸银、乳酸银、甲酸银、柠檬酸银、氧化银(例如AgO或Ag2O)、乳酸铜、硬脂酸铜、氧化铜(例如Cu2O或CuO)在特别实施例中用作金属前驱物。
根据一特别优选实施例,使用碳酸银和/或氧化银作为金属前驱物。
所述金属前驱物(若存在于金属胶中)优选呈颗粒形式存在。
所述金属前驱物颗粒可采用薄片或球形(似球)形状。优选地,这些金属前驱物颗粒呈薄片形式存在。
除此之外,所述金属胶可包含0至10重量%,优选0至8重量%的至少一种烧结助剂(E)。烧结助剂的实例包括有机过氧化物、无机过氧化物、及无机酸,诸如例如WO2011/026623 A1中所述者。
除以上所示成分(A)至(E)外,本发明金属胶还可含有0至15重量%,优选0至12重量%,更佳0.1至10重量%的一或多种其他成分(F)。这些其他成分可优选为常用于金属胶中的成分。所述金属胶可含有例如分散剂、界面活性剂、消泡剂、粘合剂、聚合物(诸如纤维素衍生物,例如甲基纤维素、乙基纤维素、乙基甲基纤维素、羧基纤维素、羟丙基纤维素、羟乙基纤维素、羟甲基纤维素)和/或粘度控制(流变)剂作为其他成分。
相对于本发明金属胶(即,其施覆之前)计,针对成分(A)至(F)指定的重量%分率总和累加(例如)达100重量%。因此,本发明金属胶可借由混合成分(A)至(F)来制得。本文中可使用本领域技术人员已知的装置,诸如搅拌器及三辊研磨机。
本发明金属胶可特定而言用作烧结胶(即,用于烧结方法中)。烧结指的是借由加热使两个或更多个组件连接而无需铜和/或银颗粒(A)达成液相。
通过使用本发明金属胶实施的烧结方法可在施加压力或不施加压力来实施。能够在无压力下实施该烧结方法意指不论先前施加压力达成组件间的足够坚固连接。能够在无压力下实施烧结制程容许在该烧结方法中使用压力敏感性例如易碎性组件或具有机械敏感性微结构的组件。具有机械敏感性微结构的电子组件在暴曝露于无法接受的压力时遭遇到电故障问题。
使至少两个组件连接指的是使第一组件固定在第二组件上。在此上下文中,“在…上”仅指将该第一组件的表面连接至该第二组件的表面,而与这两个组件或含有该至少两个组件的配置的相对定位无关。
在本发明的范畴中,术语组件优选包含单一部件。优选地,这些单一部件无法进一步拆卸。
根据特别实施例,术语组件指的是用于电子产品中的部件。
因此,所述组件可例如为二极管、LED(light emitting diodes,发光二极管)、DCB(直接铜结合)衬底、引线框架、晶粒、IGBT(insulated-gate bipolar transistors,绝缘闸极双极性晶体管)、IC(integrated circuits,集成电路)、传感器、散热元件(优选为铝散热元件或铜散热元件)或其他被动组件(诸如电阻器、电容器或线圈)。如自本发明目的的说明显而易见,组件可具体而言包括如上所述的大表面组件。
待连接的组件可为相同或不同组件。
本发明的实施例涉及的是连接LED与引线框架,连接LED与陶瓷衬底,连接晶粒、二极管、IGBT或IC与引线框架、陶瓷衬底或DCB衬底,连接传感器与引线框架或陶瓷衬底。
组件例如组件1及2中的至少一个可(无论如何只要其非由金属组成)包括至少一个例如呈金属化层形式的金属接触表面,借此在根据本发明的方法的范畴中实现上述夹层配置。该金属化层优选为该组件的一部分。优选地,该金属化层位于该组件的至少一个表面上。
优选地,借由本发明金属胶连接这些组件是借由所述金属化层来实现。
所述金属化层可包含纯金属。因此,所述金属化层可优选包含至少50重量%,更佳至少70重量%,甚至更佳至少90重量%或100重量%的纯金属。该纯金属为(例如)选自由铝、铜、银、金、钯、及铂组成的群。
另一方面,所述金属化层也可以包含合金。该金属化层的合金优选含有至少一种选自由铝、银、铜、金、镍、钯、及铂组成的群的金属。
所述金属化层也可以具有多层结构。因此,待连接的组件的至少一个表面可优选包含由多个包含上文指定的纯金属和/或合金的层制成的金属化层。
在本发明的方法中,至少两个组件借由烧结彼此连接。
为此,首先使这两个组件彼此接触。在此上下文中,借助于本发明金属胶来实现该接触。针对此目的,提供一种配置,其中本发明金属胶位于每两个该至少两个组件之间。
因此,若意欲使两个组件(即,组件1及组件2)彼此连接,则在烧结制程之前使本发明金属胶位于组件1与组件2之间。另一方面,可设想使多于两个组件彼此连接。例如,三个组件(即,组件1、组件2、及组件3)可以适宜方式彼此连接,使得组件2位于组件1与组件3之间。在此情况中,本发明金属胶位于组件1与组件2之间而且位于组件2与组件3之间。
这些个别组件呈夹层配置存在且彼此连接。夹层配置指的是其中两个组件中的一个位于另一个之上且这两个组件基本上相对于彼此平行配置的配置。
可根据现有技术中已知的任何方法产生至少两个组件及本发明金属胶的配置,其中该金属胶位于该配置的两个组件之间。
优选地,首先,使组件1的至少一个表面提供有本发明金属胶。接着,另一组件2以其一个表面置于已施覆至组件1的表面的金属胶上。
施覆本发明金属胶至组件的表面上可借助已知方法,例如借助印刷方法(诸如丝网印刷或模版印刷)来进行。另一方面,本发明金属胶也可借由施配技术,借助针转移或借由浸渍来施覆。
在施覆本发明金属胶后,优选借助于金属胶使该组件的已提供有金属胶的表面与该组件的待与其连接的表面接触。因此,本发明金属胶的层位于待连接的组件之间。
优选地,介于待连接的组件间的湿层的厚度在20至100μm范围内。在此上下文中,该湿层的厚度指的是在干燥前(若存在的话)及在烧结前待连接的组件的相对表面之间的距离。该湿层的优选厚度取决于针对施覆金属胶而选用的方法。若例如借助于丝网印刷法来施覆金属胶,则该湿层的优选厚度可为20至50μm。若借助于模版印刷来施覆金属胶,则该湿层的优选厚度可在20至100μm范围内。在施配技术中,该湿层的优选厚度可在20至100μm范围内。
作为一选项,在烧结之前引入干燥步骤,即,自经施覆的金属胶移除有机溶剂。根据一优选实施例,干燥后金属胶中的有机溶剂的分率为相对于本发明金属胶中(即,准备用于施覆的金属胶中)的有机溶剂的初始分率计为例如0至5重量%。换言之,根据该优选实施例,于干燥期间移除例如95至100重量%的在本发明金属胶中初始存在的有机溶剂。
若在无压力的烧结制程中进行干燥,则该干燥可在产生该配置之后,即,在使待连接的组件接触之后进行。若在涉及施加压力的烧结制程中进行干燥,则该干燥也可以在施覆该金属胶至该组件的至少一个表面上之后但与待连接的组件接触之前进行。
优选地,干燥温度在100至150℃范围内。
明显地,干燥时间取决于本发明金属胶的组成及待烧结的配置的连接表面的尺寸。常用干燥时间在5至45分钟范围内。
使由至少两个组件及位于这些组件之间的金属胶组成的配置最终经历烧结制程。
实际烧结在施加或未施加压力的制程中在例如200至280℃的温度下进行。
在压力烧结中的制程压力优选为小于30MPa且更佳小于5MPa。例如,该制程压力为在1至30MPa范围内且更佳为在1至5MPa范围内。
烧结时间(例如)在压力烧结中为2至60分钟范围内,例如在2至5分钟范围内及例如在无压力烧结中为30至60分钟范围内。
烧结制程可在不受任何具体限制的氛围中进行。因此,一方面,该烧结可在含氧氛围中进行。另一方面,该烧结也可以在无氧氛围中进行。在本发明的范畴中,无氧氛围指的是氧含量不大于10ppm,优选不大于1ppm,及甚至更佳不大于0.1ppm的氛围。
烧结在已知合适的烧结装置中进行,在这些装置中可设定上述制程参数。
除了满足诸如剪切强度的基础要求之外,由本发明金属胶和/或在本发明方法中使用本发明金属胶制得且呈连接组件的烧结层形式存在的复合物的特征在于其甚至在200℃下持续例如100或200小时的长时间温度压迫后的有利行为。结果,几乎无脆性且仅形成低程度的内部张力。可在实验室中使用免烧结层来研究脆性行为及内部张力形成的程度。针对此目的,可借由以下制得例如2.5cm长、1cm宽及100μm厚的免烧结层:借由模版印刷将待测试的金属胶施覆至经氧化的铜箔上,在高温下以常用方式烧结,及随后使其自经氧化的铜箔拆卸。经氧化的铜膜的氧化层可起到在拆卸烧结层时简单释放的作用。随后如此制得的免烧结层可在例如于200℃下持续100或200小时的长时间温度压迫的前及之后借由测定弹性模量及翘曲或弯曲(其为测量内部张力的形成的量度)来测试其脆性行为。弹性模量E可由弯曲力X确定,弯曲力X是在弯曲测试中使用具有两个支撑辊及一个弯曲模具的弯曲装置依DIN EN ISO 7438:2012-03根据以下公式确定:
E=(l3·X):(4D·b·a3)
·1:间距,单位为mm
·X:力,单位为kN,在测定挠曲模量结束时测得(在开始测定挠曲模量时为0kN)
·D:下垂量,单位为mm
·b:样品宽度,单位为mm
·a:样品厚度,单位为mm。
在该上下文中,弹性模量越高指示脆性越大;换言之,烧结层的样品本体在长时间温度压迫后弹性模量相比烧结层的未受压样品本体的初始值的增量越小,则非期望的显示脆度的倾向越低。长时间温度压迫后曲率的测定可作为多点测量依DIN EN ISO 25178-6:2010-06,使用共焦显微镜(参见该标准的项3.3.6)进行,其中低曲率指示低的内部张力形成。
借由下文实例来说明本发明,然而,此等实例不应理解为对本发明构成任何限制。
实例:
1.制备金属胶:
首先,借由混合根据下表的个别成分来制备参考胶P1至P7及本发明金属胶P8至P13。给定的所有量以重量%单位计。
参考胶 P1 P2 P3 P4 P5 P6 P7
银颗粒 85 75 75 75 80 70 75
α-萜品醇 14.8 14.8 14.8 14.8 14.8 14.8 14.8
乙基纤维素 0.2 0.2 0.2 0.2 0.2 0.2 0.2
氧化铝 0 10 0 0 0 0 0
0 0 10 0 0 0 0
氮化铝 0 0 0 10 5 10 0
二氧化钛 0 0 0 0 0 0 10
银颗粒:具有d50=4μm的银薄片,其涂覆有0.6重量%的脂肪酸混合物(25:75重量比的月桂酸/硬脂酸)
氧化铝:具有d50=2.5μm的颗粒
钨:具有d50=1.5μm的颗粒
氮化铝:具有d50=1.5μm的颗粒
二氧化钛:具有d50=3μm的颗粒
钼:具有d50=2.1μm的颗粒
经银涂覆的镍颗粒:具有d50=5μm的镍核心-银夹套颗粒(银:镍的重量比=75:25)
2.金属胶的施覆及烧结:
a)制备免烧结层以测定弹性模量及测定曲率
借由模版印刷以150μm的湿层厚度将特定金属胶施覆至铜箔的氧化铜表面。经印刷的表面在各情况中为具有2.5cm·1.0cm尺寸的矩形的全表面。随后,干燥(30min,120℃,在循环空气干燥烘箱中)所施覆的金属胶并在250℃及4MPa的压力下烧结2分钟。烧结后的层厚度为100μm。使经烧结的金属层自经氧化的铜箔拆卸以用于随后的测试。
b)制备样品以用于测定剪切强度
借由模版印刷以75μm的湿层厚度施覆特定金属胶至DCB衬底的4mm·4mm的整个表面区域。接着于循环空气干燥烘箱中在120℃下干燥该样品30min。借由其4mm·4mm的银接触表面在150℃的温度下将硅晶片置于经干燥的胶上。在4MPa及250℃下加热硅晶片2min以将这些组件烧结至DCB。
在烧结之后,借由测试剪切强度来确定结合。在此上下文中,利用剪切凿在260℃下以0.3mm/s的速率剪切掉硅晶片。借助于负载电池(DAGE 2000装置,由德国DAGE制造)测量力。
免烧结层的弹性模量及曲率借助弯曲测试于不存在长时间温度压迫下或于200℃持续100小时的长时间温度压迫后,在各情况中遵循上文所说明的方法来测定。下表显示所获得的测量结果:

Claims (12)

1.一种金属胶,其包含(A)75至90重量%的包含含有至少一种有机化合物的涂层的铜和/或银颗粒、(B)5至20重量%的有机溶剂、及(C)2至20重量%的至少一种类型的不同于颗粒(A)且具有在0.2至10μm范围内的平均粒度(d50)的金属颗粒,其中组分(C)的所述金属颗粒选自由钼颗粒及具有10至90重量%银含量的镍核心-银夹套颗粒组成的群。
2.根据权利要求1所述的金属胶,其中所述铜和/或银颗粒(A)呈薄片形状。
3.根据权利要求1或2所述的金属胶,其中所述至少一种有机化合物选自由游离脂肪酸、脂肪酸盐及脂肪酸酯组成的群。
4.根据上述权利要求中任一项所述的金属胶,其中所述镍核心-银夹套颗粒的银含量在15至30重量%范围内。
5.根据权利要求4所述的金属胶,其中所述镍核心-银夹套颗粒具有25重量%的银含量。
6.根据上述权利要求中任一项所述的金属胶,其中所述颗粒(C)既不包含薄片又不包含针状物。
7.根据权利要求6所述的金属胶,其中所述颗粒(C)包含在1至3范围内的形状因子。
8.根据上述权利要求中任一项所述的金属胶,其除成分(A)至(C)之外还含有0至12重量%的至少一种金属前驱物(D)、0至10重量%的至少一种烧结助剂(E)、及0至15重量%的一或多种选自分散剂、界面活性剂、消泡剂、粘合剂、聚合物和/或粘度控制(流变)剂的其他成分(F)。
9.一种用于连接组件的方法,在所述方法中,(a)提供夹层配置,其包括至少(a1)一个组件1、(a2)一个组件2、及(a3)位于组件1与组件2之间的根据权利要求1所述的金属胶,及(b)烧结所述夹层配置。
10.根据权利要求9所述的方法,其中在存在压力或不存在压力下进行烧结。
11.根据权利要求9或10中任一项所述的方法,其中所述组件为用于电子产品中的部件。
12.根据权利要求11所述的方法,其中所述组件为具有在>16至12000mm2范围内的接触表面的组件。
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