CN107648060A - A kind of facial mask without preservative - Google Patents

A kind of facial mask without preservative Download PDF

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Publication number
CN107648060A
CN107648060A CN201710870904.3A CN201710870904A CN107648060A CN 107648060 A CN107648060 A CN 107648060A CN 201710870904 A CN201710870904 A CN 201710870904A CN 107648060 A CN107648060 A CN 107648060A
Authority
CN
China
Prior art keywords
facial mask
acid
preservative
derivative
preservative according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710870904.3A
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Chinese (zh)
Inventor
伍华兵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changsha Huachen Biotechnology Co., Ltd.
Original Assignee
Changsha Huachen Biotechnology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changsha Huachen Biotechnology Co Ltd filed Critical Changsha Huachen Biotechnology Co Ltd
Priority to CN201710870904.3A priority Critical patent/CN107648060A/en
Publication of CN107648060A publication Critical patent/CN107648060A/en
Priority to PCT/CN2018/080780 priority patent/WO2019056725A1/en
Pending legal-status Critical Current

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Classifications

    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/19Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
    • A61K8/23Sulfur; Selenium; Tellurium; Compounds thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/19Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
    • A61K8/20Halogens; Compounds thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/72Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
    • A61K8/73Polysaccharides
    • A61K8/731Cellulose; Quaternized cellulose derivatives
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/72Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
    • A61K8/73Polysaccharides
    • A61K8/735Mucopolysaccharides, e.g. hyaluronic acid; Derivatives thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/96Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution
    • A61K8/97Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution from algae, fungi, lichens or plants; from derivatives thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00Preparations for care of the skin
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K2800/00Properties of cosmetic compositions or active ingredients thereof or formulation aids used therein and process related aspects
    • A61K2800/40Chemical, physico-chemical or functional or structural properties of particular ingredients
    • A61K2800/52Stabilizers
    • A61K2800/524Preservatives

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  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Birds (AREA)
  • Epidemiology (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Biotechnology (AREA)
  • Botany (AREA)
  • Microbiology (AREA)
  • Mycology (AREA)
  • Dermatology (AREA)
  • Cosmetics (AREA)

Abstract

The present invention relates to a kind of facial mask without preservative, each raw materials by weight is composed of the following components in the face pack prescription:Electrolyte 10%~60%, NMF 0.01%~50%, thickener 0.01%~5%, essence 0.01%~2%, pigment 0%~2%, pH adjusting agent 0~2%, chelating agent 0%~2%, functional components 0.01%~60%, surplus are water.The present invention provides a kind of facial mask without preservative, it is entirely avoided negative effect of the preservative to human body in facial mask, and assign facial mask natural gentle sterilizing and itch-relieving acne-removing.

Description

A kind of facial mask without preservative
Technical field
The present invention relates to a kind of facial mask without preservative, belong to cosmetic technical field.
Background technology
Facial mask contains abundant nutrients due to that can not accomplish integral asepsis in production, packaging process in facial mask Matter, this provides good hotbed for bacteria breed, therefore, preservative must be added in facial mask, otherwise easily because bacterium grows Give birth to and cause to go bad.Product after rotten often occurs pungent or allows the offending smell of people, or causes consumer's allergy, produces It is raw to stimulate.But there is increasing scientific experiment to confirm that the preservative in facial mask easily causes allergy and contact dermatitis, part Preservative can also induce breast cancer, therefore, as consumption upgrading and the raising of consumer spending consciousness, no anti-corrosion have become Consumer selects important trend of facial mask.
And under the conditions of existing for high concentration electrolyte, due to the infiltration of microorganism and the intracellular protein solution of bacterium Pressure is much smaller than the osmotic pressure of extracellular electrolyte, and now, the intracellular hydrone of microorganism and bacterium can then pass through cell membrane A side small from osmotic pressure penetrates into the big side of osmotic pressure, that is, is penetrated into out of cell membrane outside cell membrane, and cell is therefore And it is dehydrated lethal.Thus, the electrolyte of high concentration has the effect of anti-corrosion.
But the electrolyte of high concentration can destroy the stability of face pack prescription so that facial mask is easily layered, and therefore, is ground in formula Need carefully to assess the stability of formula during hair.Suitable raw material is only selected to be compounded, its stability is It can be up to state standards.
The facial mask being up to state standards containing high concentration electrolyte and stability, can effectively prevent microorganism and bacterium Growth, so as to no longer need to add preservative, completely eliminate and negatively affect caused by preservative.Meanwhile these are electrolysed Matter can also gently kill face bacterium, have fine effect for scytitis, long acne etc..
The content of the invention
It is an object of the present invention to provide a kind of facial mask without preservative.
Technical scheme:In a kind of face pack prescription without preservative, by weight percentage by following components group Into:
Electrolyte 10%~70%,
NMF 0.01%~50%,
Thickener 0.01%~5%,
Essence 0.01%~2%,
Pigment 0%~2%,
PH adjusting agent 0~2%,
Chelating agent 0%~2%,
Functional components 0.01%~60%,
Surplus is water.
Further, described electrolyte is ionic compound soluble in water.
Further, it is sweet to include glycerine, propane diols, butanediol, pentanediol, hexylene glycol, ethylhexyl for described NMF Oil, D-sorbite, xylitol, sodium hyaluronate, white fungus hyaluronic acid, hyaluronic acid, collagen, trehalose, ceramide, poly- second One or more in glycol, polyglycereol, polyaminoacid, urea, sodium lactate, 2-pyrrolidone-5-carboxylic acid.
Further, described thickener includes cellulose thickener, acrylic acid and methacrylic acid derivative class, formed sediment One or more in powder class, melon glue and its derivative, vegetalitas colloid class, polyoxyethylene.
Further, described pH adjusting agent is citric acid, citrate, lactic acid, sodium lactate, hydrochloric acid, sulfuric acid, phosphoric acid hydrogen Disodium, sodium dihydrogen phosphate, sodium hydroxide, potassium hydroxide or triethanolamine the aqueous solution in one or more.
Further, described chelating agent include ethylenediamine tetra-acetic acid and its salt, diethylene-triamine pentaacetic acid and its salt, One or more in aminotriacetic acid.
Further, described functional components include plant extracts, animal extracts, grease and its derivative, dimension One or more compositions in raw element and its derivative, phosphatide, amino acid, polypeptide, protein and its derivative.
Beneficial effects of the present invention:Preservative is instead of with the electrolyte of high concentration, it is therefore prevented that using with the addition of preservative Facial mask caused by negative effect to skin of face and human body, have very well simultaneously for facial skin inflammation and long acne etc. The effect of.
Embodiment
Further detailed description is done to the present invention in conjunction with the embodiments, but the implementation of the present invention is not limited to this.
Embodiment 1:
A kind of moisture saver mask for not adding preservative, it is composed of the following components:
Sodium sulphate 25%,
Potassium sulfate 5%,
Glycerine 10%,
Propane diols 2%,
Hyaluronic acid 0.5%,
Hydroxyethyl cellulose 0.5%,
Essence 0.1%,
Citric acid 0.05%,
EDETATE DISODIUM 0.1%,
Dried tremella extract 1%,
Surplus is water.
Embodiment 2:
A kind of cleawhite pack for not adding preservative, it is composed of the following components:
Potassium chloride 20%,
Sodium chloride 10%,
Glycerine 10%,
Propane diols 2%,
Hydroxyethyl cellulose 0.5%,
Essence 0.12%,
Citric acid 0.03%,
EDETATE DISODIUM 0.1%,
Ethyl vitamin C 1%,
Angelica Dahurica extract 1%,
Gotu Kola P.E 0.5%,
Surplus is water.
Embodiment 3:
A kind of Deacne pack for not adding preservative, it is composed of the following components:
Sodium chloride 35%,
Potassium sulfate 10%,
Glycerine 8%,
Propane diols 5%,
Hydroxyethyl cellulose 0.5%,
Essence 0.1%,
EDETATE DISODIUM 0.1%,
Dipotassium glycyrrhizinate 1%,
Allantoin 1%,
Salicylic acid 1%
Dried orange peel extracts 0.5%,
Surplus is water.
In order to verify the stability of face pack prescription, we use the stability test method in QB/T2872-2007 to reality Apply example 1,2 and 3 and carried out stability test, acquired results are as shown in table 1.
Table 1
Project Experiment condition Embodiment 1 Embodiment 2 Embodiment 3
It is heat-resisting (40±1)DEG C keep 24h, recover to room temperature, with being contrasted before experiment Without significant change Without significant change Without significant change
It is cold-resistant (- 5~-10)DEG C keep 24h, recover to room temperature, with being contrasted before experiment Without significant change Without significant change Without significant change
The result of the test of table 1 illustrates that the stability of embodiment 1,2 and 3 has reached the requirement of national standard.
In order to verify the preservative efficacy of high concentration electrolyte, we use American Pharmacopeia USP32<51>To embodiment 1,2 and 3 have carried out antimicrobial preservation efficacy test, and acquired results are as shown in table 2.
Table 2
American Pharmacopeia USP32<51>Judgment criteria be:1)Total number of bacteria from initially to 14 days bacterial population log reduction not 2.0 can be less than, and from 14 days to 28 days, bacterial population can not increase;2)Mould is with saccharomycete sum from initially by 14 days and 28 My god, mould can not increase with saccharomycete.
According to American Pharmacopeia USP32<51>Judgment criteria, the experimental result in table 1 confirms the electrolysis mass-energy of high concentration Effectively kill and suppress embodiment 1, embodiment 2 and implement all kinds of bacteriums in 3, embodiment 1, embodiment 2 and real can be caused Any preservative need not be added in applying 3.

Claims (7)

1. a kind of facial mask without preservative, it is characterised in that composed of the following components by weight percentage:
Electrolyte 10%~70%,
NMF 0.01%~50%,
Thickener 0.01%~5%,
Essence 0.01%~2%,
Pigment 0%~2%,
PH adjusting agent 0~2%,
Chelating agent 0%~2%,
Functional components 0.01%~60%,
Surplus is water.
2. a kind of facial mask without preservative according to claim 1, it is characterised in that the electrolyte is soluble in water Ionic compound in.
A kind of 3. facial mask without preservative according to claim 1, it is characterised in that the NMF include glycerine, Propane diols, butanediol, pentanediol, hexylene glycol, Sensiva SC50, D-sorbite, xylitol, sodium hyaluronate, white fungus hyaluronic acid, Hyaluronic acid, collagen, trehalose, ceramide, polyethylene glycol, polyglycereol, polyaminoacid, urea, sodium lactate, pyrrolidines One or more in keto carboxylic acid.
4. a kind of facial mask without preservative according to claim 1, it is characterised in that the thickener includes cellulose Class thickener, acrylic acid and methacrylic acid derivative class, starch, melon glue and its derivative, vegetalitas colloid class, polyoxy One or more in vinyl.
5. a kind of facial mask without preservative according to claim 1, it is characterised in that the pH adjusting agent is lemon Acid, citrate, lactic acid, sodium lactate, hydrochloric acid, sulfuric acid, disodium hydrogen phosphate, sodium dihydrogen phosphate, sodium hydroxide, potassium hydroxide or three One or more in the aqueous solution of monoethanolamine.
6. a kind of facial mask without preservative according to claim 1, it is characterised in that the chelating agent includes ethylenediamine One or more in tetraacethyl and its salt, diethylene-triamine pentaacetic acid and its salt, aminotriacetic acid.
7. a kind of facial mask without preservative according to claim 1, it is characterised in that the functional components, which include, plants Thing extract, animal extracts, grease and its derivative, vitamin and its derivative, phosphatide, amino acid, polypeptide, protein and One or more compositions in its derivative.
CN201710870904.3A 2017-09-24 2017-09-24 A kind of facial mask without preservative Pending CN107648060A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201710870904.3A CN107648060A (en) 2017-09-24 2017-09-24 A kind of facial mask without preservative
PCT/CN2018/080780 WO2019056725A1 (en) 2017-09-24 2018-03-28 Preservative-free mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710870904.3A CN107648060A (en) 2017-09-24 2017-09-24 A kind of facial mask without preservative

Publications (1)

Publication Number Publication Date
CN107648060A true CN107648060A (en) 2018-02-02

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CN (1) CN107648060A (en)
WO (1) WO2019056725A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110615838A (en) * 2019-08-14 2019-12-27 浙江珂瑞康生物医疗科技有限公司 Sterile instant undenatured natural collagen freeze-dried product and preparation method thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11696888B2 (en) 2020-05-27 2023-07-11 Mary Kay Inc. Topical compositions and methods

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CN1579364A (en) * 2004-05-21 2005-02-16 云南盐化股份有限公司 Emulsified salt type skin-cleaning product and its preparation method
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CN102319200A (en) * 2011-09-28 2012-01-18 广东海洋大学 Gracilaria algae facial mask and preparation method thereof
CN103720623A (en) * 2013-12-26 2014-04-16 南宁市化工研究设计院 Method for preparing medical-stone bamboo-salt skin-strengthening agent
CN105616172A (en) * 2016-01-19 2016-06-01 广州市美姿贺化妆品有限公司 Pure mulberry silk facial mask and preparation method thereof

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Publication number Priority date Publication date Assignee Title
CN110615838A (en) * 2019-08-14 2019-12-27 浙江珂瑞康生物医疗科技有限公司 Sterile instant undenatured natural collagen freeze-dried product and preparation method thereof

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PB01 Publication
CB03 Change of inventor or designer information
CB03 Change of inventor or designer information

Inventor after: Wu Huabing

Inventor after: Liang Yao

Inventor after: Zhan Kai

Inventor after: Zhao Yingxiang

Inventor after: Yu Qi

Inventor before: Wu Huabing

TA01 Transfer of patent application right
TA01 Transfer of patent application right

Effective date of registration: 20180214

Address after: 410000 Changsha City, Hunan province high tech Development Zone, Yuelu Avenue West, No. 588, Changsha core city science and Technology Park, building 6, building 6

Applicant after: China Polytron Technologies Inc

Address before: 410000 room B4088 of Tianma village University of Tianma village, Changsha City, Yuelu District, Hunan

Applicant before: Changsha Huachen Biotechnology Co., Ltd.

SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
TA01 Transfer of patent application right
TA01 Transfer of patent application right

Effective date of registration: 20180725

Address after: 410000 Xiaoxiang Road, Tianma Road, Tianma Road, Hunan, Changsha, Yuelu District, B4088

Applicant after: Changsha Huachen Biotechnology Co., Ltd.

Address before: 410000 6, 6 Changsha road core technology park, 588 Yuelu Avenue West, Changsha high tech Development Zone, Hunan.

Applicant before: China Polytron Technologies Inc

RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20180202