CN107238733B - 扫描型探针显微镜及其探针接触检测方法 - Google Patents
扫描型探针显微镜及其探针接触检测方法 Download PDFInfo
- Publication number
- CN107238733B CN107238733B CN201710178412.8A CN201710178412A CN107238733B CN 107238733 B CN107238733 B CN 107238733B CN 201710178412 A CN201710178412 A CN 201710178412A CN 107238733 B CN107238733 B CN 107238733B
- Authority
- CN
- China
- Prior art keywords
- probe
- sample
- contact
- cantilever
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
- G01Q10/02—Coarse scanning or positioning
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
- G01Q10/04—Fine scanning or positioning
- G01Q10/06—Circuits or algorithms therefor
- G01Q10/065—Feedback mechanisms, i.e. wherein the signal for driving the probe is modified by a signal coming from the probe itself
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q20/00—Monitoring the movement or position of the probe
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/30—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring roughness or irregularity of surfaces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
- G01Q10/04—Fine scanning or positioning
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q20/00—Monitoring the movement or position of the probe
- G01Q20/02—Monitoring the movement or position of the probe by optical means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016-065007 | 2016-03-29 | ||
| JP2016065007A JP2017181135A (ja) | 2016-03-29 | 2016-03-29 | 走査型プローブ顕微鏡及びそのプローブ接触検出方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107238733A CN107238733A (zh) | 2017-10-10 |
| CN107238733B true CN107238733B (zh) | 2020-07-03 |
Family
ID=58412975
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710178412.8A Active CN107238733B (zh) | 2016-03-29 | 2017-03-23 | 扫描型探针显微镜及其探针接触检测方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10151773B2 (https=) |
| EP (1) | EP3226009A1 (https=) |
| JP (1) | JP2017181135A (https=) |
| KR (1) | KR102427580B1 (https=) |
| CN (1) | CN107238733B (https=) |
| TW (1) | TWI719119B (https=) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6848640B2 (ja) * | 2017-04-17 | 2021-03-24 | 株式会社島津製作所 | 走査型プローブ顕微鏡 |
| JP2019128302A (ja) * | 2018-01-26 | 2019-08-01 | 株式会社日立ハイテクサイエンス | 走査プローブ顕微鏡 |
| JP7048964B2 (ja) * | 2018-03-26 | 2022-04-06 | 株式会社日立ハイテクサイエンス | 走査型プローブ顕微鏡及びその走査方法 |
| JP6939686B2 (ja) * | 2018-04-16 | 2021-09-22 | 株式会社島津製作所 | 走査型プローブ顕微鏡及びカンチレバー移動方法 |
| JP6631650B2 (ja) * | 2018-04-18 | 2020-01-15 | 株式会社島津製作所 | 走査型プローブ顕微鏡 |
| EP3591410A1 (en) | 2018-07-06 | 2020-01-08 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Probe chip, scan head, scanning probe microscopy device and use of a probe chip |
| JP6631674B1 (ja) * | 2018-10-16 | 2020-01-15 | 株式会社島津製作所 | 表面分析装置 |
| CN110736715B (zh) * | 2019-10-25 | 2022-05-24 | 深圳市太赫兹科技创新研究院有限公司 | 探针防误触方法、装置及系统 |
| CN110907663B (zh) * | 2019-12-18 | 2021-12-21 | 哈尔滨工业大学 | 基于t状悬臂梁探针的开尔文探针力显微镜测量方法 |
| JP7351778B2 (ja) * | 2020-03-18 | 2023-09-27 | 株式会社日立ハイテクサイエンス | 走査型プローブ顕微鏡及び設定方法 |
| KR102382918B1 (ko) * | 2020-10-16 | 2022-04-06 | 서울과학기술대학교 산학협력단 | 전도식 원자현미경과 횡력현미경의 동시 신호측정을 통한 ZnO 나노선의 압전 전위 특성 측정 방법 및 장치 |
| US12253539B2 (en) | 2021-07-13 | 2025-03-18 | Ceske Vysoke Uceni Technicke V Praze | Method of examining a sample in an atomic force microscope using attractive tip-to-sample interaction |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0727560A (ja) * | 1993-07-15 | 1995-01-27 | Matsushita Electric Ind Co Ltd | 走査型探針顕微鏡及びその制御方法 |
| JPH07248334A (ja) * | 1994-03-10 | 1995-09-26 | Nikon Corp | 原子間力顕微鏡 |
| CN1490606A (zh) * | 2003-09-15 | 2004-04-21 | 北京中科奥纳科技有限公司 | 扫描探针显微镜 |
| CN1710403A (zh) * | 2004-06-19 | 2005-12-21 | 鸿富锦精密工业(深圳)有限公司 | 原子力显微镜及其操作方法 |
| CN1854793A (zh) * | 2005-04-28 | 2006-11-01 | 株式会社日立制作所 | 扫描探针显微镜、使用其的试样观察方法及装置制造方法 |
| CN102721834A (zh) * | 2011-03-04 | 2012-10-10 | 精工电子纳米科技有限公司 | 摩擦力显微镜 |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5386720A (en) * | 1992-01-09 | 1995-02-07 | Olympus Optical Co., Ltd. | Integrated AFM sensor |
| US5444244A (en) * | 1993-06-03 | 1995-08-22 | Park Scientific Instruments Corporation | Piezoresistive cantilever with integral tip for scanning probe microscope |
| JPH07181028A (ja) * | 1993-12-22 | 1995-07-18 | Olympus Optical Co Ltd | 走査型プローブ顕微鏡 |
| JPH09196933A (ja) * | 1996-01-19 | 1997-07-31 | Canon Inc | プローブとプローブの作製方法、及びプローブユニット、並びにこれを用いた情報記録再生装置 |
| US5700953A (en) * | 1996-04-03 | 1997-12-23 | University Of Utah Research Foundation | Method for mapping mechanical property of a material using a scanning force microscope |
| JP2964317B2 (ja) | 1996-08-26 | 1999-10-18 | セイコーインスツルメンツ株式会社 | 原子間力顕微鏡型表面粗さ計 |
| JP3466067B2 (ja) * | 1997-11-20 | 2003-11-10 | セイコーインスツルメンツ株式会社 | カンチレバーユニット |
| DE19900114B4 (de) * | 1999-01-05 | 2005-07-28 | Witec Wissenschaftliche Instrumente Und Technologie Gmbh | Verfahren und Vorrichtung zur gleichzeitigen Bestimmung zumindest zweier Materialeigenschaften einer Probenoberfläche, umfassend die Adhäsion, die Reibung, die Oberflächentopographie sowie die Elastizität und Steifigkeit |
| DE10007617B4 (de) * | 1999-03-20 | 2006-04-20 | International Business Machines Corp. | Charakterisierung von Magnetfeldern |
| US20020042081A1 (en) * | 2000-10-10 | 2002-04-11 | Eric Henderson | Evaluating binding affinities by force stratification and force panning |
| JP2001033373A (ja) | 1999-07-27 | 2001-02-09 | Hitachi Constr Mach Co Ltd | 走査型プローブ顕微鏡 |
| US6349591B1 (en) * | 2000-01-13 | 2002-02-26 | Universite Pierre & Marie Curie | Device and method for controlling the interaction of a tip and a sample, notably for atomic force microscopy and nano-indentation |
| US6567715B1 (en) * | 2000-04-19 | 2003-05-20 | Sandia Corporation | Method and system for automated on-chip material and structural certification of MEMS devices |
| US7279046B2 (en) * | 2002-03-27 | 2007-10-09 | Nanoink, Inc. | Method and apparatus for aligning patterns on a substrate |
| US6945099B1 (en) * | 2002-07-02 | 2005-09-20 | Veeco Instruments Inc. | Torsional resonance mode probe-based instrument and method |
| US7168301B2 (en) * | 2002-07-02 | 2007-01-30 | Veeco Instruments Inc. | Method and apparatus of driving torsional resonance mode of a probe-based instrument |
| JP3925380B2 (ja) * | 2002-10-01 | 2007-06-06 | 株式会社日立製作所 | 走査プローブ顕微鏡 |
| US7596990B2 (en) * | 2004-04-14 | 2009-10-06 | Veeco Instruments, Inc. | Method and apparatus for obtaining quantitative measurements using a probe based instrument |
| US7632361B2 (en) * | 2004-05-06 | 2009-12-15 | Tini Alloy Company | Single crystal shape memory alloy devices and methods |
| TWI265286B (en) * | 2004-06-18 | 2006-11-01 | Hon Hai Prec Ind Co Ltd | Atomic force microscope and method for operating the same |
| US7089787B2 (en) * | 2004-07-08 | 2006-08-15 | Board Of Trustees Of The Leland Stanford Junior University | Torsional harmonic cantilevers for detection of high frequency force components in atomic force microscopy |
| JP2006053028A (ja) * | 2004-08-11 | 2006-02-23 | Hitachi Kenki Fine Tech Co Ltd | 走査型プローブ顕微鏡の探針走査方法 |
| TWI388834B (zh) * | 2005-01-14 | 2013-03-11 | Infinitesima Ltd | 用於原子力顯微鏡或奈米微影術之探針、原子力顯微鏡、以及自具有奈米特徵圖案之樣本之掃描區域中收集影像資料的方法 |
| JP2007085764A (ja) * | 2005-09-20 | 2007-04-05 | Hitachi Kenki Fine Tech Co Ltd | 走査型プローブ顕微鏡の探針制御方法 |
| WO2007094365A1 (ja) * | 2006-02-14 | 2007-08-23 | Japan Science And Technology Agency | 測定プローブ、試料表面測定装置、及び試料表面測定方法 |
| JP2008089542A (ja) * | 2006-10-05 | 2008-04-17 | Hitachi Kenki Fine Tech Co Ltd | 走査型プローブ顕微鏡の探針制御方法 |
| US7555940B2 (en) * | 2006-07-25 | 2009-07-07 | Veeco Instruments, Inc. | Cantilever free-decay measurement system with coherent averaging |
| EP2131180A4 (en) * | 2007-03-05 | 2013-01-23 | Univ Yokohama Nat | ATOMIC FORCE MICROSCOPE |
| JP5031609B2 (ja) * | 2007-04-10 | 2012-09-19 | 株式会社日立製作所 | 走査プローブ顕微鏡 |
| JP2009150696A (ja) * | 2007-12-19 | 2009-07-09 | Hitachi Kenki Fine Tech Co Ltd | 走査プローブ顕微鏡 |
| WO2010022521A1 (en) * | 2008-08-27 | 2010-03-04 | Specs Zurich Gmbh | Method for measuring a piezoelectric response by means of a scanning probe microscope |
| US20100175155A1 (en) * | 2009-01-06 | 2010-07-08 | President And Fellows Of Harvard College | Measurement and Mapping of Molecular Stretching and Rupture Forces |
| JP5340119B2 (ja) * | 2009-02-10 | 2013-11-13 | 株式会社日立ハイテクサイエンス | 走査型プローブ顕微鏡における探針とサンプルの近接方法 |
| JP5410880B2 (ja) * | 2009-08-07 | 2014-02-05 | 株式会社日立ハイテクサイエンス | 摩擦力測定方法および摩擦力測定装置 |
| WO2012104625A1 (en) * | 2011-01-31 | 2012-08-09 | Infinitesima Limited | Adaptive mode scanning probe microscope |
| EP2848997A1 (en) * | 2013-09-16 | 2015-03-18 | SwissLitho AG | Scanning probe nanolithography system and method |
| KR101628557B1 (ko) * | 2014-12-05 | 2016-06-08 | 현대자동차주식회사 | 시편 표면의 마찰계수 측정방법 |
-
2016
- 2016-03-29 JP JP2016065007A patent/JP2017181135A/ja active Pending
-
2017
- 2017-01-17 TW TW106101562A patent/TWI719119B/zh active
- 2017-03-21 KR KR1020170035437A patent/KR102427580B1/ko active Active
- 2017-03-23 CN CN201710178412.8A patent/CN107238733B/zh active Active
- 2017-03-24 EP EP17162737.5A patent/EP3226009A1/en not_active Withdrawn
- 2017-03-24 US US15/468,668 patent/US10151773B2/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0727560A (ja) * | 1993-07-15 | 1995-01-27 | Matsushita Electric Ind Co Ltd | 走査型探針顕微鏡及びその制御方法 |
| JPH07248334A (ja) * | 1994-03-10 | 1995-09-26 | Nikon Corp | 原子間力顕微鏡 |
| CN1490606A (zh) * | 2003-09-15 | 2004-04-21 | 北京中科奥纳科技有限公司 | 扫描探针显微镜 |
| CN1710403A (zh) * | 2004-06-19 | 2005-12-21 | 鸿富锦精密工业(深圳)有限公司 | 原子力显微镜及其操作方法 |
| CN1854793A (zh) * | 2005-04-28 | 2006-11-01 | 株式会社日立制作所 | 扫描探针显微镜、使用其的试样观察方法及装置制造方法 |
| CN102721834A (zh) * | 2011-03-04 | 2012-10-10 | 精工电子纳米科技有限公司 | 摩擦力显微镜 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102427580B1 (ko) | 2022-07-29 |
| US10151773B2 (en) | 2018-12-11 |
| CN107238733A (zh) | 2017-10-10 |
| JP2017181135A (ja) | 2017-10-05 |
| TW201800757A (zh) | 2018-01-01 |
| TWI719119B (zh) | 2021-02-21 |
| KR20170113160A (ko) | 2017-10-12 |
| EP3226009A1 (en) | 2017-10-04 |
| US20170285067A1 (en) | 2017-10-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107238733B (zh) | 扫描型探针显微镜及其探针接触检测方法 | |
| EP3270096B1 (en) | Measurement system, measurement method, and measurement program | |
| JP2017181135A5 (https=) | ||
| CN108663010B (zh) | 扫描型探针显微镜及其扫描方法 | |
| JP6199205B2 (ja) | 真直形状測定方法及び真直形状測定装置 | |
| CN110726378B (zh) | 一种基于四象限光电探测器的三维微接触式测量装置及方法 | |
| JP4388896B2 (ja) | 座標測定装置及び物体の位置を測定するための方法 | |
| KR100324321B1 (ko) | 반도체 장치의 트랜치 깊이 및 경사면의 경사도 측정장치 및 방법 | |
| JP7190203B2 (ja) | 走査型プローブ顕微鏡及びそのプローブ接触検出方法 | |
| CN108732386B (zh) | 扫描型探针显微镜 | |
| CN113495171B (zh) | 扫描型探针显微镜以及设定方法 | |
| CN109313215B (zh) | 扫描型探针显微镜用数据处理装置 | |
| CN104183516A (zh) | 半导体装置的评价装置 | |
| JP6294111B2 (ja) | 表面形状計測装置 | |
| JP2017219454A (ja) | 原子間力顕微鏡用探針の評価方法 | |
| JPH08233562A (ja) | 顕微atrマッピング測定装置 | |
| JP2003130774A (ja) | 超微小硬度計 | |
| JP2012167928A (ja) | 表面性状測定装置及びその走査方法 | |
| KR0134558Y1 (ko) | 반도체 소자의 표면 상태 감지장치 | |
| KR101543252B1 (ko) | 교육용 원자현미경 장치의 구동방법 | |
| JP2001050781A (ja) | 地盤の変状計測装置 | |
| JPH08320222A (ja) | 変位測定装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: Tokyo, Japan Patentee after: Hitachi High Tech Analysis Co.,Ltd. Country or region after: Japan Address before: Tokyo, Japan Patentee before: HITACHI HIGH-TECH SCIENCE Corp. Country or region before: Japan |
|
| CP03 | Change of name, title or address |