CN107058948A - 一种软硬复合涂层刀具及其制备方法 - Google Patents

一种软硬复合涂层刀具及其制备方法 Download PDF

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CN107058948A
CN107058948A CN201710078141.9A CN201710078141A CN107058948A CN 107058948 A CN107058948 A CN 107058948A CN 201710078141 A CN201710078141 A CN 201710078141A CN 107058948 A CN107058948 A CN 107058948A
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连云崧
穆晨亮
姚斌
陈彬强
陈汇丰
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Abstract

本发明公开了一种软硬复合涂层刀具及其制备方法,包括基体以及涂覆在该基体外表面的软硬复合涂层,该基体的材质为硬质合金,该软硬复合涂层从内到外依次包括一ZrN过渡层、一CNx硬涂层和一WS2软涂层,该ZrN过渡层通过直流反应磁控溅射法制备,该CNx硬涂层和WS2软涂层均通过射频磁控溅射法制备。本发明中的软硬复合涂层综合了WS2软涂层和CNx硬涂层的优点,将硬涂层的高硬度、高耐磨性与软涂层的减摩性相结合,使刀具既能拥有高的耐磨性又具有极低的摩擦系数。

Description

一种软硬复合涂层刀具及其制备方法
技术领域
本发明属于机械切削刀具制造技术领域,具体涉及一种软硬复合涂层刀具及其制备方法。
背景技术
根据涂层材料的性质,涂层刀具可分为两大类,即硬涂层刀具和软涂层刀具。硬涂层刀具的特点是硬度高,耐磨性好,但其缺点是刀具与工件摩擦系数较高,切削力较大,导致切削温度较高,加工工件表面质量受影响。软涂层刀具的特点是具有较低的剪切强度,刀具与工件的摩擦系数低,但是软涂层刀具耐磨性较差,刀具寿命较低。目前涂层刀具的发展是涂层成分趋于多元化和复合化。复合多涂层及其相关技术的出现,既可提高涂层与基体的结合强度,又综合了多种材料的物理化学特性,使涂层刀具的性能和寿命有了较大改善。
中国专利(专利号ZL200610068975.3)公开了自润滑复合软涂层刀具及其制备方法,采用中频磁控+多弧法镀膜方法制备的MoS2/Zr/Ti复合涂层刀具,刀具表面为MoS2层,MoS2层与刀具基体之间具有Ti、MoS2/Zr/Ti和MoS2/Zr/过渡层。该刀具进行干切削时,刀具表面能形成具有润滑作用的连续固态润滑层,从而实现刀具的自润滑功能。但该涂层硬度较低,而且MoS2层在350℃时剧烈氧化,严重影响了涂层刀具的应用范围和使用寿命。
中国专利(专利号ZL201310465488.0)公开了一种激光熔覆软硬复合涂层自润滑刀具的制备方法,采用CO2激光同步送粉方式在刀具前刀面首先熔覆纳米Al2O3陶瓷或超细硬质合金硬质涂层,然后采用镍包MoS2或镍包WS2粉末熔覆自润滑软涂层。该刀具具有韧性好,硬度高及自润滑作用等特点。在干切削时,硬质涂层承受载荷,前刀面自润滑软涂层剪切强度较低,能够减少刀屑之间的摩擦,降低切削温度和切削力,从而减小刀具的磨损。但由于该复合涂层没有设计过渡层结构,并且涂层设计厚度较厚,导致涂层残余应力上升,与基体结合力明显下降,用于切削时涂层易剥落。
发明内容
本发明的目的在于克服现有技术缺陷,提供一种软硬复合涂层刀具。
本发明的另一目的在于提供上述软硬复合涂层刀具的制备方法。
本发明的技术方案如下:
一种软硬复合涂层刀具,其特征在于:包括基体以及涂覆在该基体外表面的软硬复合涂层,该基体的材质为硬质合金,该软硬复合涂层从内到外依次包括一ZrN过渡层、一CNx硬涂层和一WS2软涂层,该ZrN过渡层通过直流反应磁控溅射法制备,该CNx硬涂层和WS2软涂层均通过射频磁控溅射法制备。
在本发明的一个优选实施方案中,所述ZrN过渡层的厚度为0.2~0.3μm。
在本发明的一个优选实施方案中,所述CNx硬涂层的厚度为0.9~1.2μm。
在本发明的一个优选实施方案中,所述WS2软涂层的厚度为0.6~0.8μm。
上述软硬复合涂层刀具的制备方法,包括如下步骤:
(1)前处理:将基体经镜面抛光,再进行丙酮超声波清洗和酒精超声波清洗,去除基体表面的各种污渍,充分干燥后迅速放入镀膜机真空室,真空室抽真空3.5×10-4~4.5×10-4Pa,加热至290~310℃,保温25~35min,得前处理后的基体;
(2)辉光清洗:接着通入氩气,工作气压1.4~1.6Pa,偏压680~720V,进行辉光放电清洗25~35min,去除前处理后的基体的表面附着物;
(3)制备ZrN过渡层:采用直流反应磁控溅射,选用纯Zr靶放置于直流靶源上,通入氩气和氮气,氮气和氩气流量比1∶1,沉积气压0.4~0.6Pa,溅射电压480~520V,溅射功率240~260W;
(4)制备CNx硬涂层:关闭Zr靶,开启射频源上的石墨靶,采用射频磁控溅射,射频源频率为13.56MHz,在沉积之前对石墨靶进行预溅射,调整氮气和氩气流量比3~5∶1,沉积气压0.8~1.0Pa,基片偏压0~-200V,溅射功率190~210W;
(5)制备WS2软涂层:关闭石墨靶,关闭氮气,仅通入氩气,打开WS2靶,采用射频磁控溅射,射频源频率为13.56MHz,氩气压强0.8~1.1Pa,基体偏压-30~-160V,溅射功率28~32W;
(6)后处理:关闭WS2靶,关闭各电源及气体源,涂层结束,得到所述软硬复合涂层刀具。
在本发明的一个优选实施方案中,所述丙酮超声波清洗的时间为20~25min。
在本发明的一个优选实施方案中,所述酒精超声波清洗的时间为20~25min。
本发明的有益效果:
1、本发明中WS2相较MoS2更易形成转移膜,摩擦系数更低,抗氧化能力更强。
2、本发明中ZrN作为过渡层起到隔绝基体材料中的Co元素进而保护CNx硬涂层的作用,该涂层还可利用通入N2/氩气之比来控制沉积的CNx层的N含量,从而控制涂层的硬度以适应不同切削场合的需要。
3、本发明中的软硬复合涂层综合了WS2软涂层和CNx硬涂层的优点,将硬涂层的高硬度、高耐磨性与软涂层的减摩性相结合,使刀具既能拥有高的耐磨性又具有极低的摩擦系数,使用该刀具进行干切削时,由于软硬复合涂层的双重作用,一方面大大提高了刀具的耐磨性,另一方面极大地降低了刀具与工件间的摩擦系数,明显改善刀具切削性能,提升了刀具耐用度。
附图说明
图1为本发明制备的软硬复合涂层的结构示意图,其中,1为基体,2为ZrN过渡层,3为CNx硬涂层,4为WS2软涂层。
具体实施方式
以下通过具体实施方式结合附图对本发明的技术方案进行进一步的说明和描述。
实施例1
一种软硬复合涂层及其制备方法,该刀具的基体材料为:YS8硬质合金;涂层材料为:ZrN、CNx和WS2;沉积CNx时通入氮气和氩气流量比5∶1(150sccm/30sccm),以沉积“较硬”的CNx,该涂层可用于切削ZL108高硅铝合金等高硬材料,沉积方式为:直流反应磁控溅射+射频磁控溅射。其制备方法的步骤如下:
(1)前处理:将硬质合金基体1经镜面抛光,再进行丙酮超声波清洗20min,酒精超声波清洗20min,去除基体1表面各种污渍,试样镀膜前后均不得用手接触。充分干燥后迅速放入镀膜机真空室,真空室抽真空4.0×10-4Pa,加热至300℃,保温30min;
(2)辉光清洗:通入氩气,工作气压1.5Pa,偏压700V,进行辉光放电清洗20min,去除表面附着物;
(3)制备ZrN过渡层2:采用直流反应磁控溅射技术,选用纯Zr靶放置于直流靶源上,通入高纯氩气和氮气,氮气和氩气流量比1∶1(100sccm/100sccm),沉积气压0.5Pa,溅射电压500V,溅射功率250W,沉积厚度0.2μm;
(4)制备CNx硬涂层3:关闭Zr靶,开启石墨靶,采用射频磁控溅射技术,射频源频率为13.56MHz,在沉积之前对石墨靶进行预溅射,调整氮气和氩气流量比5∶1(150sccm/30sccm),沉积气压0.8~1.0Pa,基片偏压-150V,溅射功率200W,沉积厚度1μm;
(5)制备WS2软涂层4:关闭石墨靶,关闭氮气,仅通入氩气,打开WS2靶,采用射频磁控溅射技术,射频源频率为13.56MHz,氩气压强1Pa,基体偏压-160V,溅射功率30W,沉积厚度0.8μm;
(6)后处理:关闭WS2靶,关闭各电源及气体源,涂层结束,制得如图1所示的结构。
实施例2
一种软硬复合涂层及其制备方法,该刀具的基体1材料为:YS8硬质合金;涂层材料为:ZrN、CNx和WS2;沉积CNx时通入氮气和氩气流量比3∶1(90sccm/30sccm),以沉积“较软”的CNx,该涂层可用于切削45号钢等较软材料,沉积方式为:直流反应磁控溅射+射频磁控溅射。其制备方法的步骤如下:
(1)前处理:将硬质合金基体1经镜面抛光,再进行丙酮超声波清洗20min,酒精超声波清洗20min,去除基体1表面各种污渍,试样镀膜前后均不得用手接触。充分干燥后迅速放入镀膜机真空室,真空室抽真空4.0×10-4Pa,加热至300℃,保温30min;
(2)辉光清洗:通入氩气,工作气压1.5Pa,偏压700V,进行辉光放电清洗20min,去除表面附着物;
(3)制备ZrN过渡层2:采用直流反应磁控溅射技术,选用纯Zr靶放置于直流靶源上,通入高纯氩气和氮气,氮气和氩气流量比1∶1(100sccm/100sccm),沉积气压0.5Pa,溅射电压500V,溅射功率250W,沉积厚度0.2μm;
(4)制备CNx硬涂层3:关闭Zr靶,开启石墨靶,采用射频磁控溅射技术,射频源频率为13.56MHz,在沉积之前对石墨靶进行预溅射,调整氮气和氩气流量比3∶1(90sccm/30sccm),沉积气压0.8~1.0Pa,基片偏压-150V,溅射功率200W,沉积厚度1μm;
(5)制备WS2软涂层4:关闭石墨靶,关闭氮气,仅通入氩气,打开WS2靶,采用射频磁控溅射技术,射频源频率为13.56MHz,氩气压强1Pa,基体偏压-160V,溅射功率30W,沉积厚度0.8μm;
(6)后处理:关闭WS2靶,关闭各电源及气体源,涂层结束,制得如图1所示的结构。
本领域普通技术人员可知,本发明的技术方案在下述范围内变化时,仍然能够得到与上述实施例相同或相近的技术效果,仍然属于本发明的保护范围:
一种软硬复合涂层刀具,其特征在于:包括基体以及涂覆在该基体外表面的软硬复合涂层,该基体的材质为硬质合金,该软硬复合涂层从内到外依次包括一ZrN过渡层、一CNx硬涂层和一WS2软涂层,该ZrN过渡层通过直流反应磁控溅射法制备,该CNx硬涂层和WS2软涂层均通过射频磁控溅射法制备。
优选的,所述ZrN过渡层的厚度为0.2~0.3μm,所述CNx硬涂层的厚度为0.9~1.2μm,所述WS2软涂层的厚度为0.6~0.8μm。
上述软硬复合涂层刀具的制备方法,包括如下步骤:
(1)前处理:将基体经镜面抛光,再进行丙酮超声波清洗和酒精超声波清洗,去除基体表面的各种污渍,充分干燥后迅速放入镀膜机真空室,真空室抽真空3.5×10-4~4.5×10-4Pa,加热至290~310℃,保温25~35min,得前处理后的基体;
(2)辉光清洗:接着通入氩气,工作气压1.4~1.6Pa,偏压680~720V,进行辉光放电清洗25~35min,去除前处理后的基体的表面附着物;
(3)制备ZrN过渡层:采用直流反应磁控溅射,选用纯Zr靶放置于直流靶源上,通入氩气和氮气,氮气和氩气流量比1∶1,沉积气压0.4~0.6Pa,溅射电压480~520V,溅射功率240~260W;
(4)制备CNx硬涂层:关闭Zr靶,开启射频源上的石墨靶,采用射频磁控溅射,射频源频率为13.56MHz,在沉积之前对石墨靶进行预溅射,调整氮气和氩气流量比3~5∶1,沉积气压0.8~1.0Pa,基片偏压0~-200V,溅射功率190~210W;
(5)制备WS2软涂层:关闭石墨靶,关闭氮气,仅通入氩气,打开WS2靶,采用射频磁控溅射,射频源频率为13.56MHz,氩气压强0.8~1.1Pa,基体偏压-30~-160V,溅射功率28~32W;
(6)后处理:关闭WS2靶,关闭各电源及气体源,涂层结束,得到所述软硬复合涂层刀具。
以上所述,仅为本发明的较佳实施例而已,故不能依此限定本发明实施的范围,即依本发明专利范围及说明书内容所作的等效变化与修饰,皆应仍属本发明涵盖的范围内。

Claims (7)

1.一种软硬复合涂层刀具,其特征在于:包括基体以及涂覆在该基体外表面的软硬复合涂层,该基体的材质为硬质合金,该软硬复合涂层从内到外依次包括一ZrN过渡层、一CNx硬涂层和一WS2软涂层,该ZrN过渡层通过直流反应磁控溅射法制备,该CNx硬涂层和WS2软涂层均通过射频磁控溅射法制备。
2.如权利要求1所述的一种软硬复合涂层刀具,其特征在于:所述ZrN过渡层的厚度为0.2~0.3μm。
3.如权利要求1所述的一种软硬复合涂层刀具,其特征在于:所述CNx硬涂层的厚度为0.9~1.2μm。
4.如权利要求1所述的一种软硬复合涂层刀具,其特征在于:所述WS2软涂层的厚度为0.6~0.8μm。
5.权利要求1至4中任一权利要求所述的软硬复合涂层刀具的制备方法,其特征在于:包括如下步骤:
(1)前处理:将基体经镜面抛光,再进行丙酮超声波清洗和酒精超声波清洗,去除基体表面的各种污渍,充分干燥后迅速放入镀膜机真空室,真空室抽真空3.5×10-4~4.5×10- 4Pa,加热至290~310℃,保温25~35min,得前处理后的基体;
(2)辉光清洗:接着通入氩气,工作气压1.4~1.6Pa,偏压680~720V,进行辉光放电清洗25~35min,去除前处理后的基体的表面附着物;
(3)制备ZrN过渡层:采用直流反应磁控溅射,选用纯Zr靶放置于直流靶源上,通入氩气和氮气,氮气和氩气流量比1∶1,沉积气压0.4~0.6Pa,溅射电压480~520V,溅射功率240~260W;
(4)制备CNx硬涂层:关闭Zr靶,开启射频源上的石墨靶,采用射频磁控溅射,射频源频率为13.56MHz,在沉积之前对石墨靶进行预溅射,调整氮气和氩气流量比3~5∶1,沉积气压0.8~1.0Pa,基片偏压0~-200V,溅射功率190~210W;
(5)制备WS2软涂层:关闭石墨靶,关闭氮气,仅通入氩气,打开WS2靶,采用射频磁控溅射,射频源频率为13.56MHz,氩气压强0.8~1.1Pa,基体偏压-30~-160V,溅射功率28~32W;
(6)后处理:关闭WS2靶,关闭各电源及气体源,涂层结束,得到所述软硬复合涂层刀具。
6.如权利要求5所述的制备方法,其特征在于:所述丙酮超声波清洗的时间为20~25min。
7.如权利要求5所述的制备方法,其特征在于:所述酒精超声波清洗的时间为20~25min。
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