CN106997876A - 一种三维PoP堆叠封装结构及其制造方法 - Google Patents

一种三维PoP堆叠封装结构及其制造方法 Download PDF

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CN106997876A
CN106997876A CN201610043246.6A CN201610043246A CN106997876A CN 106997876 A CN106997876 A CN 106997876A CN 201610043246 A CN201610043246 A CN 201610043246A CN 106997876 A CN106997876 A CN 106997876A
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encapsulation
contact pin
dimensional pop
solder bump
stack package
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夏国峰
尤显平
葛卫国
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Chongqing Three Gorges University
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Abstract

本发明公开了一种三维PoP堆叠封装结构及其制造方法。该三维PoP堆叠封装通过上、下封装堆叠形成,其中下封装为塑封型BGA、CSP封装等表面贴装型封装,上封装为至少具有一个插针的PGA封装等插装型封装。上封装的插针完全插入下封装的塑封材料中,并与下封装基板上的焊料凸点形成互联。制造该封装结构的主要方法:在基板上表面通过引线键合或者倒装上芯方式贴装芯片,在基板上表面制作形成焊料凸点,上封装的插针与所述焊料凸点进行回流焊接形成互联,采用塑封材料进行包覆密封,在基板下表面制作焊球,回流后形成三维PoP堆叠封装。

Description

一种三维 PoP 堆叠封装结构及其制造方法
技术领域
本发明涉及微电子封装技术以及三维集成技术领域,特别涉及一种三维PoP 封装技术及其制造方法。
背景技术
随着电子封装产品向高密度、多功能、低功耗、小型化方向的不断发展,采用三维集成技术的系统级封装(System in Package,SiP)取得了突飞猛进的发展。现有成熟的三维集成技术主要为堆叠封装(Package on Package,PoP)。在PoP封装中,上封装通过焊球作为互联结构实现与下封装,以及外部环境的三维导通。由于上、下封装结构的差异,导致制造工艺过程中封装翘曲难以得到有效控制,严重影响焊球互联结构的可靠性。另外,由于焊球互联结构的存在,PoP封装的高度无法进一步的降低,难以满足小型化的要求。
因此,仍然需要新的封装结构和制造技术,以解决现有技术所存在的问题。
发明内容
本发明针对三维PoP 封装技术提出一种封装结构和制造方法,以解决现有PoP 封装技术所存在的封装密度和成本问题。
为了实现上述目的,本发明采用下述技术方案。
本发明提出一种三维PoP堆叠封装结构,包括PoP封装的第一封装体(下封装体)和第二封装体(上封装体)。三维PoP堆叠封装通过上、下封装堆叠形成,其中下封装为塑封型BGA、CSP封装等表面贴装型封装,上封装为至少具有一个插针的PGA封装等插装型封装。上封装的插针完全插入下封装的塑封材料中,并与下封装基板上表面的焊料凸点形成互联。
利用该结构,上封装的插针完全插入下封装的塑封材料中,并与下封装基板上的焊料凸点形成互联,从而实现上封装与下封装体之间,以及与外部环境的互联。由于上、下封装之间无需传统形式的焊球互联结构,而是直接通过插针实现互联,不仅提高了封装的热-机械可靠性,而且还降低了封装的整体高度。
根据本发明的实施例,焊料凸点为Sn、SnAg、SnCu、SnAgCu、SnIn、SnBi等钎焊料或焊膏。
根据本发明的实施例,上封装的插针的高度小于塑封材料的高度。
根据本发明的实施例,塑封材料为环氧树脂塑封料、下填料等绝缘材料。
本发明公开了一种三维PoP堆叠封装结构的制造方法,所述方法包括以下步骤:
步骤1:在基板上表面通过贴片或者倒装上芯贴装芯片。
步骤2:在基板上表面制作形成焊料凸点。
步骤3:准备至少具有一个插针的PGA封装等插装型封装,作为PoP堆叠封装的上封装。
步骤4:上封装的插针与所述焊料凸点进行回流焊接形成互联。
步骤5:采用塑封材料进行包覆密封。
步骤6:在基板下表面制作焊球,回流后形成三维PoP堆叠封装。
根据本发明的实施例,焊料凸点通过植球工艺制作,或者采用电镀、钎料膏印刷或者液态金属填充等方法并经过回流工艺制作。
附图说明
图1是在基板上表面通过引线键合方式贴装芯片的示意图。
图2是在基板上表面制作形成焊料凸点的示意图。
图3是准备三维PoP堆叠封装的上封装的示意图。
图4是上封装的插针与焊料凸点进行回流焊接形成互联的示意图。
图5是采用塑封材料进行包覆密封的示意图。
图6是三维PoP堆叠封装的一实施例的示意图。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚,下面结合附图对本发明的具体实施方式作进一步详细描述。
图6为根据本发明的一实施例绘制的三维PoP堆叠封装的示意图。三维PoP堆叠封装通过上、下封装堆叠形成。在本发明中,上、下封装中芯片的数量不限,芯片的配置方式不限,可以为引线键合方式,也可以为倒装上芯方式,或者为两者的混合模式。本实施例中,上、下封装均采用引线键合方式。三维PoP堆叠封装的下封装包含基板1、芯片2、粘贴材料3、金属导线4、焊料凸点5、塑封料6和焊球7。三维PoP堆叠封装的上封装包含基板21、芯片23、粘贴材料22、金属导线24、塑封料25和插针26。上封装的插针26完全插入下封装的塑封材料6中,并与下封装基板1上表面的焊料凸点5形成互联,从而实现上封装与下封装体之间,以及与外部环境的互联。
下面将以图6所述实施例的三维PoP堆叠封装结构为例,以图1至图6来详细说明三维PoP堆叠封装结构的制造流程。
步骤1:在基板上表面通过引线键合或者倒装上芯方式贴装芯片,如图1所示。
请参照图1,在基板1上表面通过引线键合方式贴装芯片2。在本发明中,芯片的数量不限,芯片的配置方式不限,可以为引线键合方式,也可以为倒装上芯方式,或者为两者的混合模式。本实施例中,芯片采用引线键合方式进行配置。芯片2通过粘贴材料3配置于基板1上,并通过金属导线4实现芯片2与基板1的电气互联。
步骤2:在基板上表面制作形成焊料凸点,如图2所示。
请参照图2,在基板1上表面制作形成焊料凸点5。在本发明中,焊料凸点通过植球工艺制作,或者采用电镀、钎料膏印刷或者液态金属填充等方法并经过回流工艺制作。
步骤3:准备至少具有一个插针的PGA封装等插装型封装,作为三维PoP堆叠封装的上封装,如图3所示。
请参照图3,准备至少具有一个插针的PGA封装等插装型封装,作为三维PoP堆叠封装的上封装。在本发明中,上封装中芯片的数量不限,芯片的配置方式不限,可以为引线键合方式,也可以为倒装上芯方式,或者为两者的混合模式。本实施例中,下封装采用引线键合方式。三维PoP堆叠封装的上封装包含基板21、芯片23、粘贴材料22、金属导线24、塑封料25和插针26。
步骤4:上封装的插针与焊料凸点进行回流焊接形成互联,如图4所示。
请参照图4,上封装的插针26与焊料凸点5进行回流焊形成互联。插针26和与焊料凸点5的互联实现上封装与下封装体之间,以及与外部环境的互联。
步骤5:采用塑封材料进行包覆密封,如图5所示。
请参照图5,采用塑封材料6进行包覆密封。通过塑封材料6包覆密封芯片2和焊料凸点5,塑封后进行烘烤后固化工艺。在本发明中,塑封材料6可以为环氧树脂塑封料或下填料等绝缘材料。
步骤6:在基板下表面制作焊球,回流后形成三维PoP堆叠封装,如图6所示。
请参照图6,在基板1下表面制作焊球7,回流后形成三维PoP堆叠封装。通过植球和回流工艺制作形成焊球7的阵列,形成三维PoP堆叠封装。
对本发明的实施例的描述是出于有效说明和描述本发明的目的,并非用以限定本发明,任何所属本领域的技术人员应当理解:凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。

Claims (6)

1. 一种三维PoP堆叠封装结构,其特征在于,所述封装结构包括:
三维PoP堆叠封装结构通过上、下封装堆叠形成,其中下封装为塑封型BGA、CSP封装等表面贴装型封装,上封装为至少具有一个插针的PGA封装等插装型封装;上封装的插针完全插入下封装的塑封材料中,并与下封装基板上的焊料凸点形成互联。
2.根据权利要求1所述一种三维PoP堆叠封装结构,其特征在于,焊料凸点为Sn、SnAg、SnCu、SnAgCu、SnIn、SnBi等钎焊料或焊膏。
3.根据权利要求1所述一种三维PoP堆叠封装结构,其特征在于,上封装的插针的高度小于塑封材料的高度。
4.根据权利要求1所述三维PoP堆叠封装结构的制造方法,其特征在于,塑封材料为环氧树脂塑封料、下填料等绝缘材料。
5.一种三维PoP堆叠封装结构的制造方法,其特征在于,所述方法包括:
步骤1:在基板上表面通过贴片或者倒装上芯贴装芯片;
步骤2:在基板上表面制作形成焊料凸点;
步骤3:准备至少具有一个插针的PGA封装等插装型封装,作为PoP堆叠封装的上封装;
步骤4:上封装的插针与所述焊料凸点进行回流焊接形成互联;
步骤5:采用塑封材料进行包覆密封;
步骤6:在基板下表面制作焊球,回流后形成三维PoP堆叠封装。
6.根据权利要求5所述三维PoP堆叠封装结构的制造方法,其特征在于,焊料凸点通过植球工艺制作,或者采用电镀、钎料膏印刷或者液态金属填充等方法并经过回流工艺制作。
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CN110335858A (zh) * 2019-06-27 2019-10-15 深圳第三代半导体研究院 一种垂直式堆叠封装芯片及其制备方法
CN110335858B (zh) * 2019-06-27 2021-04-02 深圳第三代半导体研究院 一种垂直式堆叠封装芯片及其制备方法
CN110411559A (zh) * 2019-08-07 2019-11-05 深圳中科系统集成技术有限公司 一种震动探测器及其制作方法

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