CN106886128B - 一种负性光刻胶 - Google Patents
一种负性光刻胶 Download PDFInfo
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- CN106886128B CN106886128B CN201710194201.3A CN201710194201A CN106886128B CN 106886128 B CN106886128 B CN 106886128B CN 201710194201 A CN201710194201 A CN 201710194201A CN 106886128 B CN106886128 B CN 106886128B
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- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 37
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- 239000000178 monomer Substances 0.000 claims abstract description 33
- 239000004925 Acrylic resin Substances 0.000 claims abstract description 19
- 229920000178 Acrylic resin Polymers 0.000 claims abstract description 19
- 125000002723 alicyclic group Chemical group 0.000 claims abstract description 17
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- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 11
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- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 5
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 claims description 5
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- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 claims description 3
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- KOFLVDBWRHFSAB-UHFFFAOYSA-N 1,2,4,5-tetrahydro-1-(phenylmethyl)-5,9b(1',2')-benzeno-9bh-benz(g)indol-3(3ah)-one Chemical compound C1C(C=2C3=CC=CC=2)C2=CC=CC=C2C23C1C(=O)CN2CC1=CC=CC=C1 KOFLVDBWRHFSAB-UHFFFAOYSA-N 0.000 abstract description 8
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- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
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- 229920002521 macromolecule Polymers 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
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- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
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- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000004383 yellowing Methods 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 description 1
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- UBRWOYCTUYUNTR-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-yl formate Chemical compound C1C(OC=O)CCC2OC21 UBRWOYCTUYUNTR-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
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- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
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- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
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- UYAAVKFHBMJOJZ-UHFFFAOYSA-N diimidazo[1,3-b:1',3'-e]pyrazine-5,10-dione Chemical compound O=C1C2=CN=CN2C(=O)C2=CN=CN12 UYAAVKFHBMJOJZ-UHFFFAOYSA-N 0.000 description 1
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 1
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- 230000005693 optoelectronics Effects 0.000 description 1
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- 238000004806 packaging method and process Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
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- 230000001105 regulatory effect Effects 0.000 description 1
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- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L sodium carbonate Substances [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/06—Polythioethers from cyclic thioethers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Epoxy Resins (AREA)
Abstract
一种负性光刻胶，其由按照质量份数计算的下列组分组成：透明高折射率光敏碱溶性树脂A 100份；光引发剂B 0.005~20份；活性稀释剂C 10~80份；溶剂D20‑60份；所述透明高折射率光敏碱溶性树脂A由脂环族环硫丙烯酸树脂a1用酸酐类固化剂a2改性后得到的；所述脂环族环硫丙烯酸树脂a1是脂环族环硫单体a11与烯丙基丙烯酸类化合物a12共聚而成；所述脂环族环硫单体a11由脂环族环氧单体a111置换得到。本发明负性光刻胶，在保证树脂具有光敏性、碱溶等特性的同时，使体系达到透明，提高了树脂的折射率，能有效应用于负性光刻胶中，增加了光刻胶的消影特性。
Description
技术领域
本发明涉及一种负性光刻胶。
背景技术
光刻胶是一种感光材料，是利用光化学反应进行图形转移的媒体，主要应用于集成电路，封装，光电子器件光子器件，平板显示等领域。光刻胶主要由成膜树脂、光引发剂和溶剂助剂及填料等组成的对光敏感的混合液体。根据化学反应机理和显影原理，光刻胶可分为正性光刻胶和负性光刻胶两类。
负性光刻胶经曝光后发生聚合反应，生成不可溶性物质。曝光前光刻胶是线形高分子化合物，在有机溶剂中可溶解；曝光后，高分子化合物发生交联形成三维网状结构，成为不可溶的物质，从而形成与掩膜板相反的负图像。与正性光刻胶相比，负性光刻胶的分辨率要差些，但具有针孔少、腐蚀图形精度高、耐酸碱性好，与基片粘附性特别好以及灵敏度高而稳定等优点。
负性光刻胶主要由成膜树脂、活性稀释剂、光引发剂、溶剂等组成，其中成膜树脂是光刻胶的骨架和基础材料，它对光刻胶有决定性的影响。
含有乙烯基的高聚物常常被用作光聚合体系的成膜树脂，其所含的双键，易被受光照激发的自由基引发打开，产生类似于链增长的快速反应，使线型高分子瞬间交联形成网状结构。这类感光树脂通常具有以下特性：（1）环氧类树脂的分子结构决定其具有良好的耐热性；（2）由于分子链上引入了不饱和官能团，因而具有了环氧树脂所不具备的优异的光固化特性；（3）由于分子链上引入了羧基，所以具有良好的碱溶性，即在碱的水溶液中具有良好的显影特性。
环氧丙烯酸树脂是目前紫外光固化胶领域应用较多的一类感光树脂，但是传统的酚醛、双酚A等环氧丙烯酸树脂折射率低、耐光老化、耐黄变性都较差，影响其在光刻胶中的使用。
发明内容
本发明要解决的技术问题在于：克服现有的负性光刻胶的缺陷，提供一种负性光刻胶，主要通过脂环族环氧单体与烯丙基丙烯酸酯类制取的环硫树脂，并用无色透明的酸酐固化剂改性得到一种透明的高折射率的光敏碱溶树脂，在保证树脂具有光敏性、碱溶等特性的同时，使体系达到透明，提高了树脂的折射率，能有效应用于负性光刻胶中，增加了光刻胶的消影特性。
为了解决上述技术问题，本发明提出下列技术方案：一种负性光刻胶，其由下列组分组成：透明高折射率光敏碱溶性树脂A；光引发剂B；活性稀释剂；溶剂D。
上述技术方案的进一步限定在于，该负性光刻胶由按照质量份数计算的下列组分组成：
透明高折射率光敏碱溶性树脂A 100份；
光引发剂B 0.005 ~20份；
活性稀释剂C 10 ~80份；
溶剂D 20-60份。
上述技术方案的进一步限定在于，所述透明高折射率光敏碱溶性树脂A 由脂环族环硫丙烯酸树脂a1用酸酐类固化剂a2改性后得到的；
所述脂环族环硫丙烯酸树脂a1是脂环族环硫单体a11与烯丙基丙烯酸类化合物a12共聚而成；
所述脂环族环硫单体a11由脂环族环氧单体a111置换得到。
上述技术方案的进一步限定在于，上述脂环族环氧单体a111是下述物质中的一种或者多种的混合物：3,4-环氧环己基甲基 3,4-环氧环己基甲酸酯、双((3,4-环氧环己基)己二酸酯、1,4-环己烷二甲醇双(3,4-环氧环己烷甲酸)酯、2-(3,4-环氧环己基)-5,5-螺(3,4-环氧环己基)-1,3-二氧六环、1,2-环己醇二缩水甘油醚、1,4-环己烷二甲醇二缩水甘油醚。
上述技术方案的进一步限定在于，上述烯丙基丙烯酸类化合物a12为下述通式1所示的甲基丙烯酸或丙烯酸：
[通式1]
上述通式1中，X为氢或甲基。
上述技术方案的进一步限定在于，上述酸酐类固化剂a2是下述物质中的一种或者多种的混合物：甲基六氢邻苯二甲酸酐、六氢苯酐、甲基四氢邻苯二甲酸酐、四氢苯酐、纳迪克酸酐、甲基纳迪克酸酐。
上述技术方案的进一步限定在于，所述透明高折射率光敏碱溶性树脂A的制备方法包括下列步骤：
步骤1：脂环族环硫单体a11的合成：准确称取43质量份的脂环族环氧单体a111和70质量份的乙醇置于三口烧瓶中混合均匀，然后加入40质量份的去离子水溶解的14质量份KSCN混合物，50℃下搅拌反应30min后停止反应，分离提纯后得到脂环族环硫单体a11；
步骤2：脂环族环硫丙烯酸树脂a1的合成：在装有搅拌器、冷凝管、温度计和恒压滴液漏斗的四口烧瓶中，加入50质量份步骤1制得的脂环族环硫单体a11、400*10-6质量份的阻聚剂于60℃条件下搅拌均匀，升温至80℃，滴加28质量份的烯丙基丙烯酸类化合物a12和1质量份的催化剂的混合物，滴加完毕后，升温至90℃恒温反应2h，再升温至100~108℃反应5~6h，当酸值<5mgKOH/g后停止反应，得到脂环族环硫丙烯酸树脂a1；
步骤3：透明高折射率光敏碱溶性树脂A的合成：将脂环族环硫丙烯酸树脂a1温度调节至60℃，加入50质量份的酸酐类固化剂a2，混合均匀，升温至75~80℃反应，监测体系酸值，当酸值在15分钟内稳定不变后结束反应，得到透明高折射率光敏碱溶性树脂A。
与现有技术相比，本发明具有下列有益效果：本发明负性光刻胶，主要通过脂环族环氧单体与烯丙基丙烯酸酯类制取的环硫树脂，并用无色透明的酸酐固化剂改性得到一种透明的高折射率的光敏碱溶树脂，在保证树脂具有光敏性、碱溶等特性的同时，使体系达到透明，提高了树脂的折射率，能有效应用于负性光刻胶中，增加了光刻胶的消影特性。
具体实施方式
一种负性光刻胶，其由按照质量份数计算的下列组分组成：
透明高折射率光敏碱溶性树脂A 100份；
光引发剂B 0.005 ~20份；
活性稀释剂C 10 ~80份；
溶剂D 20-60份。
所述透明高折射率光敏碱溶性树脂A 由脂环族环硫丙烯酸树脂a1用酸酐类固化剂a2改性后得到的。
所述脂环族环硫丙烯酸树脂a1是脂环族环硫单体a11与烯丙基丙烯酸类化合物a12共聚而成。
所述脂环族环硫单体a11由脂环族环氧单体a111置换得到。
上述脂环族环氧单体a111是下述物质中的一种或者多种的混合物：3,4-环氧环己基甲基3,4-环氧环己基甲酸酯、双((3,4-环氧环己基)己二酸酯、1,4-环己烷二甲醇双(3,4-环氧环己烷甲酸)酯、2-(3,4-环氧环己基)-5,5-螺(3,4-环氧环己基)-1,3-二氧六环、1,2-环己醇二缩水甘油醚、1,4-环己烷二甲醇二缩水甘油醚。
上述烯丙基丙烯酸类化合物a12为下述通式1所示的甲基丙烯酸或丙烯酸：
[通式1]
上述通式1中，X为氢或甲基。
上述酸酐类固化剂a2是下述物质中的一种或者多种的混合物：甲基六氢邻苯二甲酸酐、六氢苯酐、甲基四氢邻苯二甲酸酐、四氢苯酐、纳迪克酸酐、甲基纳迪克酸酐。
光引发剂B是下述物质中的一种或者多种的混合物： 1-羟基-环己基-苯基甲酮、2-甲基-2-(4-吗啉基)-1-[4-(甲硫基)苯基]-1-丙酮、2,4,6-三甲基苯甲酰基-二苯基氧化膦、2-羟基-甲基苯基丙烷-1-酮、安息香双甲醚、2-苯基苄-2-二甲基胺-1-（4-吗啉苄苯基）丁酮、二苯甲酮。
活性稀释剂C是下述物质中的一种或者多种的混合物：乙二醇二丙烯酸酯、三羟甲基丙烷二丙烯酸酯、三羟甲基丙烷三丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇三丙烯酸酯、二季戊四醇六丙烯酸酯、三乙二醇二丙烯酸酯、1,4-丁二醇二丙烯酸酯。
溶剂D是下述物质中的一种或者多种的混合物：二乙二醇一甲醚、二乙二醇一乙醚、二丙二醇二甲基醚、二乙二醇二甲醚、丙二醇甲醚醋酸酯（PMA）、乙二醇二乙酸酯、丙二醇二乙酸酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、二丙酮醇、二丙酮醇甲基醚、丁内酯、二甲基甲酰胺、二甲基乙酰胺。
溶剂D使负性光刻胶组合物内的固体成分的含量为30质量%~70质量%。
其中使用脂环族环氧单体a111合成的脂环族环硫单体a11来制备脂环族环硫丙烯酸树脂a1，使得树脂本身的折射率提高，且由于树脂体系内无双键及苯环，使得其热稳定性能及抗黄变性能优良。用酸酐类固化剂a2来改性已合成的脂环族环硫丙烯酸树脂a1，使得树脂本身具有碱溶性。
所述负性光刻胶的制备方法，包括下列步骤：
步骤1：脂环族环硫单体a11的合成：准确称取43质量份的脂环族环氧单体a111和70质量份的乙醇置于三口烧瓶中混合均匀，然后加入40质量份的去离子水溶解的14质量份KSCN混合物，50℃下搅拌反应30min后停止反应，分离提纯后得到脂环族环硫单体a11；
步骤2：脂环族环硫丙烯酸树脂a1的合成：在装有搅拌器、冷凝管、温度计和恒压滴液漏斗的四口烧瓶中，加入50质量份步骤1制得的脂环族环硫单体a11、400*10-6质量份的阻聚剂于60℃条件下搅拌均匀，升温至80℃，滴加28质量份的烯丙基丙烯酸类化合物a12和1质量份的催化剂的混合物。滴加完毕后，升温至90℃恒温反应2h，再升温至100~108℃反应5~6h，当酸值<5mgKOH/g后停止反应，得到脂环族环硫丙烯酸树脂a1；
步骤3：透明高折射率光敏碱溶性树脂A的合成：将脂环族环硫丙烯酸树脂a1温度调节至60℃，加入50质量份的酸酐类固化剂a2，混合均匀，升温至75~80℃反应，监测体系酸值，当酸值在15分钟内稳定不变后结束反应，得到透明高折射率光敏碱溶性树脂A；
步骤4：透明高折射率光敏碱溶性树脂A、光引发剂B、活性稀释剂C、溶剂D依次加入烧瓶，磁力搅拌至混合均匀，得到液态的负性光刻胶。
将上述制得的负性光刻胶涂覆在镀有ITO的玻璃基板上预烘；将菲林覆盖在已烘干的样品上进行紫外曝光，将曝光好的玻璃样品置于Na2CO3水溶液中显影，得到与菲林相反的图形。
制备实施例1
步骤1：脂环族环硫单体a11的合成：称取43质量份的脂环族环氧单体a111（采用3,4-环氧环己基甲基 3,4-环氧环己基甲酸酯单体）和70质量份的乙醇置于三口圆底烧瓶中混合均匀，然后加入40质量份去离子水溶解的14质量份KSCN混合物，50℃下搅拌反应30min后停止反应，分离提纯后得到脂环族环硫单体a11。
步骤2：脂环族环硫丙烯酸树脂a1的合成：在装有搅拌器、冷凝管、温度计和恒压滴液漏斗的四口烧瓶中，加入50质量份步骤1制得的脂环族环硫单体a11和400*10-6质量份的阻聚剂对甲氧基苯酚，于60℃条件下搅拌均匀，升温至80℃，滴加28质量份烯丙基丙烯酸类化合物a12（采用甲基丙烯酸）和1质量份催化剂四乙基溴化铵的混合物，滴加完毕后，升温至90℃恒温反应2h，再升温至100~108℃反应5~6h，当酸值<5mgKOH/g时结束反应，得到脂环族环硫丙烯酸树脂a1。
步骤3：透明高折射率光敏碱溶性树脂A的合成：将脂环族环硫丙烯酸树脂a1温度调节至60℃，加入50质量份酸酐类固化剂a2（采用甲基六氢苯酐），混合均匀，升温至75~80℃，监测体系酸值，当酸值在15分钟内稳定不变后结束反应，得到透明高折射率光敏碱溶性树脂A。
步骤4：透明高折射率光敏碱溶性树脂A 100份、光引发剂B（采用1-羟基-环己基-苯基甲酮）0.005份、活性稀释剂C（采用乙二醇二丙烯酸酯）30份、溶剂D（采用二乙二醇一甲醚）25份依次加入烧瓶，磁力搅拌至混合均匀，得到液态的负性光刻胶。
制备实施例2至制备实施例6，配方如表一所示，制备透明高折射率光敏碱溶性树脂A的过程与制备实施例1相同。
对比例
在装有搅拌器、冷凝管、温度计和恒压滴液漏斗的四口烧瓶中，加入50质量份3,4-环氧环己基甲酸酯单体和400*10-6质量份的对甲氧基苯酚，搅匀，升温至80℃，滴加28质量份甲基丙烯酸和1质量份四乙基溴化铵混合液，90℃反应2h，升温至100~108℃反应5~6h，当酸值<5mgKOH/g时结束反应，得到产物B1。将产物B1温度调节至60℃，加入50质量份甲基六氢苯酐，混合均匀，升温至75~80℃，监测体系酸值，当酸值稳定不变后结束反应。得到脂环族环氧树脂O1
不同配方见表一
| 实施例1 | 实施例2 | 实施例3 | 实施例4 | 实施例5 | 实施例6 | 对比例 | |
| 树脂O1 | —— | —— | —— | —— | —— | —— | 100 |
| 透明高折射率光敏碱溶性树脂A | 100 | 100 | 100 | 100 | 100 | 100 | —— |
| 光引发剂B | 0.005 | 0.01 | 20 | 10 | 15 | 12 | 3 |
| 活性稀释剂C | 30 | 10 | 70 | 50 | 80 | 40 | 5 |
| 溶剂D | 25 | 30 | 40 | 60 | 50 | 20 | 43 |
*以上配方按质量份添加配制
将上述负性光刻胶涂覆在镀有ITO的玻璃基板上90℃下预烘3分钟；将菲林覆盖在已烘干的样品上在200mJ/cm2紫外曝光，将曝光好的玻璃样品置于0.5质量份KOH水溶液中显影，得到与菲林相反的图形。
然后将上述显影完成的ITO玻璃放入烘箱，230℃烘烤30min，测分辨率、铅笔硬度、胶膜折射率。
结果见表二
| 实施例1 | 实施例2 | 实施例3 | 实施例4 | 实施例5 | 实施例6 | 对比例 | |
| 分辨率(μm) | 10 | 10 | 8 | 10 | 10 | 8 | 10 |
| 铅笔硬度 | 3H | 2H | 2H | 3H | 2H | 2H | 3H |
| 折射率 | 1.62 | 1.60 | 1.61 | 1.62 | 1.60 | 1.61 | 1.53 |
Claims (2)
1.一种负性光刻胶，由按照质量份数计算的下列组分组成：
透明高折射率光敏碱溶性树脂A 100份；
光引发剂B 0.005~20份；
活性稀释剂C 10~80份；
溶剂D 20-60份；
所述透明高折射率光敏碱溶性树脂A由脂环族环硫丙烯酸树脂a1用酸酐类固化剂a2改性后得到的；
所述脂环族环硫丙烯酸树脂a1是脂环族环硫单体a11与甲基丙烯酸或丙烯酸a12共聚而成；
所述脂环族环硫单体a11由脂环族环氧单体a111置换得到；
所述脂环族环氧单体a111是下述物质中的一种或者多种的混合物：3,4-环氧环己基甲基3,4-环氧环己基甲酸酯、双((3,4-环氧环己基)己二酸酯、1,4-环己烷二甲醇双(3,4-环氧环己烷甲酸)酯、2-(3,4-环氧环己基)-5,5-螺(3,4-环氧环己基)-1,3-二氧六环、1,2-环己醇二缩水甘油醚、1,4-环己烷二甲醇二缩水甘油醚。
2.根据权利要求1所述的负性光刻胶，其特征在于，上述酸酐类固化剂a2是下述物质中的一种或者多种的混合物：甲基六氢邻苯二甲酸酐、六氢苯酐、甲基四氢邻苯二甲酸酐、四氢苯酐、纳迪克酸酐、甲基纳迪克酸酐。
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