CN106842966B - 一种温度控制器 - Google Patents
一种温度控制器 Download PDFInfo
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- CN106842966B CN106842966B CN201611218907.0A CN201611218907A CN106842966B CN 106842966 B CN106842966 B CN 106842966B CN 201611218907 A CN201611218907 A CN 201611218907A CN 106842966 B CN106842966 B CN 106842966B
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Images
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32522—Temperature
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B15/00—Systems controlled by a computer
- G05B15/02—Systems controlled by a computer electric
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
- H01J37/32724—Temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32908—Utilities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/3299—Feedback systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US34907310P | 2010-05-27 | 2010-05-27 | |
| US61/349,073 | 2010-05-27 | ||
| US13/040,149 | 2011-03-03 | ||
| US13/040,149 US8880227B2 (en) | 2010-05-27 | 2011-03-03 | Component temperature control by coolant flow control and heater duty cycle control |
| CN201180025294.8A CN102907181B (zh) | 2010-05-27 | 2011-05-20 | 通过冷却剂流量控制及加热器占空比控制的组件温度控制 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180025294.8A Division CN102907181B (zh) | 2010-05-27 | 2011-05-20 | 通过冷却剂流量控制及加热器占空比控制的组件温度控制 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106842966A CN106842966A (zh) | 2017-06-13 |
| CN106842966B true CN106842966B (zh) | 2020-07-03 |
Family
ID=45004685
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611218907.0A Active CN106842966B (zh) | 2010-05-27 | 2011-05-20 | 一种温度控制器 |
| CN201180025294.8A Expired - Fee Related CN102907181B (zh) | 2010-05-27 | 2011-05-20 | 通过冷却剂流量控制及加热器占空比控制的组件温度控制 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180025294.8A Expired - Fee Related CN102907181B (zh) | 2010-05-27 | 2011-05-20 | 通过冷却剂流量控制及加热器占空比控制的组件温度控制 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8880227B2 (enExample) |
| JP (1) | JP2013536539A (enExample) |
| KR (1) | KR101476727B1 (enExample) |
| CN (2) | CN106842966B (enExample) |
| TW (3) | TWI564930B (enExample) |
| WO (1) | WO2011149790A2 (enExample) |
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| JP5465954B2 (ja) * | 2008-09-29 | 2014-04-09 | 株式会社日立国際電気 | 基板処理装置及び判断プログラムを格納する記憶媒体及び基板処理装置の表示方法 |
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| US8880227B2 (en) | 2010-05-27 | 2014-11-04 | Applied Materials, Inc. | Component temperature control by coolant flow control and heater duty cycle control |
| US8580693B2 (en) * | 2010-08-27 | 2013-11-12 | Applied Materials, Inc. | Temperature enhanced electrostatic chucking in plasma processing apparatus |
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| JP5712741B2 (ja) * | 2011-03-31 | 2015-05-07 | 東京エレクトロン株式会社 | プラズマ処理装置、プラズマ処理方法及び記憶媒体 |
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| JP5998010B2 (ja) | 2012-10-24 | 2016-09-28 | 株式会社Screenホールディングス | 基板処理装置、基板処理システム、基板処理装置の制御方法、プログラムおよび記録媒体 |
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| JP6230437B2 (ja) * | 2014-02-04 | 2017-11-15 | 東京エレクトロン株式会社 | 温度測定方法及びプラズマ処理システム |
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-
2011
- 2011-03-03 US US13/040,149 patent/US8880227B2/en active Active
- 2011-05-20 JP JP2013512105A patent/JP2013536539A/ja active Pending
- 2011-05-20 CN CN201611218907.0A patent/CN106842966B/zh active Active
- 2011-05-20 CN CN201180025294.8A patent/CN102907181B/zh not_active Expired - Fee Related
- 2011-05-20 WO PCT/US2011/037436 patent/WO2011149790A2/en not_active Ceased
- 2011-05-20 KR KR1020127032509A patent/KR101476727B1/ko active Active
- 2011-05-24 TW TW104106858A patent/TWI564930B/zh active
- 2011-05-24 TW TW100118159A patent/TWI480918B/zh not_active IP Right Cessation
- 2011-05-24 TW TW105137549A patent/TWI615883B/zh not_active IP Right Cessation
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2014
- 2014-09-25 US US14/497,253 patent/US9639097B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI480918B (zh) | 2015-04-11 |
| TWI615883B (zh) | 2018-02-21 |
| CN106842966A (zh) | 2017-06-13 |
| KR20130020802A (ko) | 2013-02-28 |
| JP2013536539A (ja) | 2013-09-19 |
| TW201528330A (zh) | 2015-07-16 |
| TW201205637A (en) | 2012-02-01 |
| TW201709256A (zh) | 2017-03-01 |
| US9639097B2 (en) | 2017-05-02 |
| US20120048467A1 (en) | 2012-03-01 |
| KR101476727B1 (ko) | 2014-12-26 |
| US8880227B2 (en) | 2014-11-04 |
| WO2011149790A3 (en) | 2012-01-26 |
| CN102907181A (zh) | 2013-01-30 |
| CN102907181B (zh) | 2017-02-15 |
| US20150134128A1 (en) | 2015-05-14 |
| WO2011149790A2 (en) | 2011-12-01 |
| TWI564930B (zh) | 2017-01-01 |
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