CN106460160B - W-Ti溅射靶 - Google Patents

W-Ti溅射靶 Download PDF

Info

Publication number
CN106460160B
CN106460160B CN201580021546.8A CN201580021546A CN106460160B CN 106460160 B CN106460160 B CN 106460160B CN 201580021546 A CN201580021546 A CN 201580021546A CN 106460160 B CN106460160 B CN 106460160B
Authority
CN
China
Prior art keywords
concentration
powder
mass
sputtering targets
max
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201580021546.8A
Other languages
English (en)
Chinese (zh)
Other versions
CN106460160A (zh
Inventor
野中庄平
斋藤淳
大友健志
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of CN106460160A publication Critical patent/CN106460160A/zh
Application granted granted Critical
Publication of CN106460160B publication Critical patent/CN106460160B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F5/00—Manufacture of workpieces or articles from metallic powder characterised by the special shape of the product
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/04—Alloys based on tungsten or molybdenum
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
CN201580021546.8A 2014-10-08 2015-09-30 W-Ti溅射靶 Active CN106460160B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014-207343 2014-10-08
JP2014207343A JP5999161B2 (ja) 2014-10-08 2014-10-08 Ｗ−Ｔｉスパッタリングターゲット
PCT/JP2015/077729 WO2016056441A1 (fr) 2014-10-08 2015-09-30 Cible de pulvérisation en w-ti

Publications (2)

Publication Number Publication Date
CN106460160A CN106460160A (zh) 2017-02-22
CN106460160B true CN106460160B (zh) 2018-08-17

Family

ID=55653056

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201580021546.8A Active CN106460160B (zh) 2014-10-08 2015-09-30 W-Ti溅射靶

Country Status (5)

Country Link
JP (1) JP5999161B2 (fr)
KR (1) KR20160133571A (fr)
CN (1) CN106460160B (fr)
TW (1) TWI572722B (fr)
WO (1) WO2016056441A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6743867B2 (ja) * 2018-11-06 2020-08-19 三菱マテリアル株式会社 Ｗ−Ｔｉスパッタリングターゲット
CN111155061A (zh) * 2018-11-07 2020-05-15 宁波江丰电子材料股份有限公司 WTi合金靶材的制备方法
CN112111713B (zh) * 2020-09-11 2022-09-30 宁波江丰电子材料股份有限公司 一种WTi合金溅射靶材的制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2606946B2 (ja) * 1990-03-13 1997-05-07 日立金属株式会社 Ｔｉ‐Ｗターゲット材およびその製造方法
JPH05295531A (ja) * 1992-04-21 1993-11-09 Toshiba Corp Ｔｉ−Ｗ系スパッタリングターゲットおよびその製造方法
JP4747368B2 (ja) * 2007-03-05 2011-08-17 三菱マテリアル株式会社 Ｗ−Ｔｉ拡散防止膜を形成するためのスパッタリング用Ｗ−Ｔｉターゲット
JP5156591B2 (ja) * 2008-11-17 2013-03-06 出光興産株式会社 有機エレクトロルミネッセンス素子
JP2011058078A (ja) * 2009-09-14 2011-03-24 Toshiba Corp スパッタリングターゲットとそれを用いたＴａ−Ｗ合金膜および液晶表示装置
US20140360871A1 (en) * 2012-05-22 2014-12-11 Jx Nippon Mining & Metals Corporation Fe-Pt-Ag-C-Based Sputtering Target Having C Grains Dispersed Therein, and Method for Producing Same
WO2014148588A1 (fr) * 2013-03-22 2014-09-25 Jx日鉱日石金属株式会社 Cible de pulvérisation à corps de tungstène fritté et son procédé de fabrication

Also Published As

Publication number Publication date
JP2016074962A (ja) 2016-05-12
JP5999161B2 (ja) 2016-09-28
KR20160133571A (ko) 2016-11-22
TWI572722B (zh) 2017-03-01
TW201619405A (zh) 2016-06-01
CN106460160A (zh) 2017-02-22
WO2016056441A1 (fr) 2016-04-14

Similar Documents

Publication Publication Date Title
JP5933887B2 (ja) タッチスクリーン
TWI245076B (en) Tungsten spattering target and method of manufacturing the target
CN106460160B (zh) W-Ti溅射靶
JP7040561B2 (ja) 窒化ガリウム系焼結体及びその製造方法
JP6883103B2 (ja) カルコゲナイドスパッタリングターゲット及びその製造方法
CN105637114B (zh) 溅射靶及溅射靶的制造方法
TW201538431A (zh) 氧化物燒結體及濺鍍靶、與該氧化物燒結體之製造方法
KR20200135436A (ko) 텅스텐 실리사이드 타깃 및 그 제조 방법, 그리고 텅스텐 실리사이드막의 제조 방법
KR20210049815A (ko) 스퍼터링 타깃 및 스퍼터링 타깃의 제조 방법
TWI715466B (zh) 鉬合金靶材及其製造方法
TWI727460B (zh) Ｗ－Ｔｉ濺鍍靶
JP6459058B2 (ja) Ｍｏ合金ターゲット
TWI518185B (zh) 碳化物／結合金屬之複合粉體
TWI674325B (zh) MoNb靶材
JP2021127494A (ja) Ｃｒ−Ａｌ合金スパッタリングターゲット
TWI715467B (zh) 鉬合金靶材及其製造方法
JP2019002064A (ja) ＭｏＷターゲット材
KR20220032523A (ko) 니켈 합금 스퍼터링 타겟
JP2019173055A (ja) Ｍｏ系ターゲットおよびその製造方法
KR20170046723A (ko) 텅스텐 스퍼터링 타깃 및 그 제조 방법

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant