CN105873665A - 用亚硝酸后处理的复合聚酰胺膜 - Google Patents
用亚硝酸后处理的复合聚酰胺膜 Download PDFInfo
- Publication number
- CN105873665A CN105873665A CN201480062096.2A CN201480062096A CN105873665A CN 105873665 A CN105873665 A CN 105873665A CN 201480062096 A CN201480062096 A CN 201480062096A CN 105873665 A CN105873665 A CN 105873665A
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- Prior art keywords
- acid
- monomer
- thin film
- cooh
- acyl halide
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- 239000004952 Polyamide Substances 0.000 title claims abstract description 53
- 229920002647 polyamide Polymers 0.000 title claims abstract description 53
- 239000012528 membrane Substances 0.000 title claims abstract description 30
- 239000002253 acid Substances 0.000 title claims abstract description 21
- 239000002131 composite material Substances 0.000 title claims abstract description 21
- 239000000178 monomer Substances 0.000 claims abstract description 79
- -1 arene compound Chemical class 0.000 claims abstract description 50
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 claims abstract description 41
- 150000001266 acyl halides Chemical class 0.000 claims abstract description 39
- 150000001412 amines Chemical class 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 28
- 239000010409 thin film Substances 0.000 claims abstract description 22
- 125000000524 functional group Chemical group 0.000 claims abstract description 21
- 150000003839 salts Chemical class 0.000 claims abstract description 14
- 150000001732 carboxylic acid derivatives Chemical group 0.000 claims abstract description 13
- 150000001491 aromatic compounds Chemical class 0.000 claims description 22
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 21
- 229910006069 SO3H Inorganic materials 0.000 claims description 20
- 125000004432 carbon atom Chemical group C* 0.000 claims description 19
- 125000000217 alkyl group Chemical group 0.000 claims description 18
- 239000004215 Carbon black (E152) Substances 0.000 claims description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims description 15
- 229930195733 hydrocarbon Natural products 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 14
- 125000003118 aryl group Chemical group 0.000 claims description 13
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 12
- 229910052736 halogen Inorganic materials 0.000 claims description 11
- 125000001931 aliphatic group Chemical group 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- 150000008064 anhydrides Chemical class 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
- 239000002798 polar solvent Substances 0.000 claims description 6
- 238000012545 processing Methods 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 125000001118 alkylidene group Chemical group 0.000 claims description 3
- 229910019142 PO4 Inorganic materials 0.000 abstract 1
- 239000010452 phosphate Substances 0.000 abstract 1
- 230000000379 polymerizing effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 60
- 239000000243 solution Substances 0.000 description 41
- 238000012805 post-processing Methods 0.000 description 24
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 21
- 150000001875 compounds Chemical class 0.000 description 20
- 239000004760 aramid Substances 0.000 description 19
- 229920003235 aromatic polyamide Polymers 0.000 description 19
- 239000002585 base Substances 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 14
- 238000012360 testing method Methods 0.000 description 14
- 239000007864 aqueous solution Substances 0.000 description 13
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 12
- 239000012634 fragment Substances 0.000 description 12
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 11
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 11
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 11
- 229940018564 m-phenylenediamine Drugs 0.000 description 11
- 229910052709 silver Inorganic materials 0.000 description 11
- 239000004332 silver Substances 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 10
- DUWWHGPELOTTOE-UHFFFAOYSA-N n-(5-chloro-2,4-dimethoxyphenyl)-3-oxobutanamide Chemical compound COC1=CC(OC)=C(NC(=O)CC(C)=O)C=C1Cl DUWWHGPELOTTOE-UHFFFAOYSA-N 0.000 description 10
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 10
- 235000019260 propionic acid Nutrition 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 230000007062 hydrolysis Effects 0.000 description 9
- 238000006460 hydrolysis reaction Methods 0.000 description 9
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 239000008367 deionised water Substances 0.000 description 7
- 229910021641 deionized water Inorganic materials 0.000 description 7
- 238000001728 nano-filtration Methods 0.000 description 7
- 229920002492 poly(sulfone) Polymers 0.000 description 7
- 238000000197 pyrolysis Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000004907 flux Effects 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 239000011780 sodium chloride Substances 0.000 description 6
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 6
- 239000005711 Benzoic acid Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- YGSDEFSMJLZEOE-UHFFFAOYSA-N Salicylic acid Natural products OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000013461 design Methods 0.000 description 5
- 239000000539 dimer Substances 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 239000012530 fluid Substances 0.000 description 5
- 150000004820 halides Chemical group 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- PWAXUOGZOSVGBO-UHFFFAOYSA-N adipoyl chloride Chemical compound ClC(=O)CCCCC(Cl)=O PWAXUOGZOSVGBO-UHFFFAOYSA-N 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 4
- 150000002118 epoxides Chemical class 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(I) nitrate Inorganic materials [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 4
- 238000002791 soaking Methods 0.000 description 4
- CMXPERZAMAQXSF-UHFFFAOYSA-M sodium;1,4-bis(2-ethylhexoxy)-1,4-dioxobutane-2-sulfonate;1,8-dihydroxyanthracene-9,10-dione Chemical compound [Na+].O=C1C2=CC=CC(O)=C2C(=O)C2=C1C=CC=C2O.CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC CMXPERZAMAQXSF-UHFFFAOYSA-M 0.000 description 4
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 238000012695 Interfacial polymerization Methods 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical class OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002390 adhesive tape Substances 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 235000010233 benzoic acid Nutrition 0.000 description 3
- 125000004744 butyloxycarbonyl group Chemical group 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 150000001261 hydroxy acids Chemical group 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000002803 maceration Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000010606 normalization Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229960004889 salicylic acid Drugs 0.000 description 3
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 3
- KVNYFPKFSJIPBJ-UHFFFAOYSA-N 1,2-diethylbenzene Chemical compound CCC1=CC=CC=C1CC KVNYFPKFSJIPBJ-UHFFFAOYSA-N 0.000 description 2
- RFBZPOTVVHLWBP-UHFFFAOYSA-N 11-chloro-11-oxoundecanoic acid Chemical compound OC(=O)CCCCCCCCCC(Cl)=O RFBZPOTVVHLWBP-UHFFFAOYSA-N 0.000 description 2
- LDQMZKBIBRAZEA-UHFFFAOYSA-N 2,4-diaminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C(N)=C1 LDQMZKBIBRAZEA-UHFFFAOYSA-N 0.000 description 2
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 2
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 2
- OHFLNNVKHIOKKU-UHFFFAOYSA-N 3-carbonochloridoylbenzoic acid Chemical compound OC(=O)C1=CC=CC(C(Cl)=O)=C1 OHFLNNVKHIOKKU-UHFFFAOYSA-N 0.000 description 2
- ZCLXQTGLKVQKFD-UHFFFAOYSA-N 3-hydroxybenzenesulfonic acid Chemical compound OC1=CC=CC(S(O)(=O)=O)=C1 ZCLXQTGLKVQKFD-UHFFFAOYSA-N 0.000 description 2
- IJFXRHURBJZNAO-UHFFFAOYSA-N 3-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1 IJFXRHURBJZNAO-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- 238000012696 Interfacial polycondensation Methods 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 2
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- RWZYAGGXGHYGMB-UHFFFAOYSA-N anthranilic acid Chemical compound NC1=CC=CC=C1C(O)=O RWZYAGGXGHYGMB-UHFFFAOYSA-N 0.000 description 2
- 229920005601 base polymer Polymers 0.000 description 2
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 2
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
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- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
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- 239000003431 cross linking reagent Substances 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 238000002338 electrophoretic light scattering Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
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- UQDUPQYQJKYHQI-UHFFFAOYSA-N methyl laurate Chemical compound CCCCCCCCCCCC(=O)OC UQDUPQYQJKYHQI-UHFFFAOYSA-N 0.000 description 2
- 238000001471 micro-filtration Methods 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N nitrous oxide Inorganic materials [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 238000005001 rutherford backscattering spectroscopy Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 238000004448 titration Methods 0.000 description 2
- 238000000108 ultra-filtration Methods 0.000 description 2
- RELMFMZEBKVZJC-UHFFFAOYSA-N 1,2,3-trichlorobenzene Chemical class ClC1=CC=CC(Cl)=C1Cl RELMFMZEBKVZJC-UHFFFAOYSA-N 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N 1,3,5-trimethylbenzene Chemical compound CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- YLMXJINLTYLWAR-UHFFFAOYSA-N 1-carbonochloridoylcyclopentane-1-carboxylic acid Chemical compound ClC(=O)C1(CCCC1)C(=O)O YLMXJINLTYLWAR-UHFFFAOYSA-N 0.000 description 1
- GPSHWNLDDARPCO-UHFFFAOYSA-N 10-chloro-10-oxodecanoic acid Chemical compound OC(=O)CCCCCCCCC(Cl)=O GPSHWNLDDARPCO-UHFFFAOYSA-N 0.000 description 1
- KKTUQAYCCLMNOA-UHFFFAOYSA-N 2,3-diaminobenzoic acid Chemical group NC1=CC=CC(C(O)=O)=C1N KKTUQAYCCLMNOA-UHFFFAOYSA-N 0.000 description 1
- BAHPQISAXRFLCL-UHFFFAOYSA-N 2,4-Diaminoanisole Chemical compound COC1=CC=C(N)C=C1N BAHPQISAXRFLCL-UHFFFAOYSA-N 0.000 description 1
- JVMSQRAXNZPDHF-UHFFFAOYSA-N 2,4-diaminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C(N)=C1 JVMSQRAXNZPDHF-UHFFFAOYSA-N 0.000 description 1
- RSWBDNVBJPQFAN-UHFFFAOYSA-N 2-amino-6-hydroxybenzenesulfonic acid Chemical compound NC1=CC=CC(O)=C1S(O)(=O)=O RSWBDNVBJPQFAN-UHFFFAOYSA-N 0.000 description 1
- ZMCHBSMFKQYNKA-UHFFFAOYSA-N 2-aminobenzenesulfonic acid Chemical compound NC1=CC=CC=C1S(O)(=O)=O ZMCHBSMFKQYNKA-UHFFFAOYSA-N 0.000 description 1
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- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- GGHDAUPFEBTORZ-UHFFFAOYSA-N propane-1,1-diamine Chemical compound CCC(N)N GGHDAUPFEBTORZ-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 238000011064 split stream procedure Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229950000244 sulfanilic acid Drugs 0.000 description 1
- 125000004646 sulfenyl group Chemical group S(*)* 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- SFENPMLASUEABX-UHFFFAOYSA-N trihexyl phosphate Chemical compound CCCCCCOP(=O)(OCCCCCC)OCCCCCC SFENPMLASUEABX-UHFFFAOYSA-N 0.000 description 1
- 150000005199 trimethylbenzenes Chemical class 0.000 description 1
- QJAVUVZBMMXBRO-UHFFFAOYSA-N tripentyl phosphate Chemical compound CCCCCOP(=O)(OCCCCC)OCCCCC QJAVUVZBMMXBRO-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- MGMXGCZJYUCMGY-UHFFFAOYSA-N tris(4-nonylphenyl) phosphite Chemical compound C1=CC(CCCCCCCCC)=CC=C1OP(OC=1C=CC(CCCCCCCCC)=CC=1)OC1=CC=C(CCCCCCCCC)C=C1 MGMXGCZJYUCMGY-UHFFFAOYSA-N 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0093—Chemical modification
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0002—Organic membrane manufacture
- B01D67/0006—Organic membrane manufacture by chemical reactions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/125—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction
- B01D69/1251—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction by interfacial polymerisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/56—Polyamides, e.g. polyester-amides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
- B05D3/107—Post-treatment of applied coatings
- B05D3/108—Curing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/40—Details relating to membrane preparation in-situ membrane formation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/20—Specific permeability or cut-off range
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Polyamides (AREA)
Abstract
Description
Claims (10)
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US201361910559P | 2013-12-02 | 2013-12-02 | |
US61/910559 | 2013-12-02 | ||
PCT/US2014/062830 WO2015084511A1 (en) | 2013-12-02 | 2014-10-29 | Composite polyamide membrane post treated with nitrious acid |
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CN105873665A true CN105873665A (zh) | 2016-08-17 |
CN105873665B CN105873665B (zh) | 2019-01-01 |
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CN201480062096.2A Active CN105873665B (zh) | 2013-12-02 | 2014-10-29 | 用亚硝酸后处理的复合聚酰胺膜 |
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US (1) | US9808769B2 (zh) |
EP (1) | EP3077088B1 (zh) |
JP (1) | JP6577468B2 (zh) |
CN (1) | CN105873665B (zh) |
ES (1) | ES2659569T3 (zh) |
WO (1) | WO2015084511A1 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110404417A (zh) * | 2019-07-19 | 2019-11-05 | 中国石油大学(华东) | 聚酰胺膜的改性方法及改性聚酰胺膜 |
CN113634133A (zh) * | 2021-08-05 | 2021-11-12 | 宁波水艺膜科技发展有限公司 | 一种高产水量半透膜及其制备方法 |
CN115228290A (zh) * | 2022-08-03 | 2022-10-25 | 万华化学集团股份有限公司 | 一种耐清洗反渗透膜的制备方法 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9452391B1 (en) | 2013-12-02 | 2016-09-27 | Dow Global Technologies Llc | Composite polyamide membrane treated with dihyroxyaryl compounds and nitrous acid |
ES2786928T3 (es) | 2014-01-09 | 2020-10-14 | Ddp Speciality Electronic Mat Us Inc | Membrana de material compuesto de poliamida con alto contenido de ácido y bajo contenido azoico |
JP6535011B2 (ja) * | 2014-01-09 | 2019-06-26 | ダウ グローバル テクノロジーズ エルエルシー | アゾ含有量及び高酸含有量を有する複合ポリアミド皮膜 |
CN105848765B (zh) | 2014-01-09 | 2020-02-14 | 陶氏环球技术有限责任公司 | 具有优选偶氮含量的复合聚酰胺膜 |
CN106257977B (zh) | 2014-04-28 | 2019-10-29 | 陶氏环球技术有限责任公司 | 用亚硝酸后处理的复合聚酰胺膜 |
EP3142777B1 (en) * | 2014-05-14 | 2018-10-24 | Dow Global Technologies LLC | Composite polyamide membrane post treated with nitrous acid |
US9943810B2 (en) | 2014-05-14 | 2018-04-17 | Dow Global Technologies Llc | Composite polyamide membrane post-treated with nitrous acid |
CN108079806B (zh) * | 2018-02-07 | 2020-09-08 | 浙江大学 | 一种聚酰胺半透膜、制备方法及其应用 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0421916A2 (en) * | 1989-04-14 | 1991-04-10 | Membrane Products Kiryat Weizmann Ltd. | Composite membranes and processes using them |
CN1370796A (zh) * | 2001-02-23 | 2002-09-25 | 世韩工业株式会社 | 复合聚酰胺反渗透膜和其制备方法 |
CN101421336A (zh) * | 2006-03-31 | 2009-04-29 | 罗地亚管理公司 | 高流动性聚酰胺 |
AU2009279188A1 (en) * | 2008-08-05 | 2010-02-11 | Polymers Crc Limited | Functionalized thin film polyamide membranes |
WO2011078047A1 (ja) * | 2009-12-24 | 2011-06-30 | 東レ株式会社 | 複合半透膜およびその製造方法 |
WO2011078131A1 (ja) * | 2009-12-22 | 2011-06-30 | 東レ株式会社 | 半透膜およびその製造方法 |
WO2012020680A1 (ja) * | 2010-08-11 | 2012-02-16 | 東レ株式会社 | 分離膜エレメントおよび複合半透膜の製造方法 |
WO2013048765A1 (en) * | 2011-09-29 | 2013-04-04 | Dow Global Technologies Llc | Composite polyamide membrane derived from carboxylic acid containing acyl halide monomer |
CN103328082A (zh) * | 2011-01-24 | 2013-09-25 | 陶氏环球技术有限责任公司 | 复合聚酰胺膜 |
Family Cites Families (104)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH462993A (de) | 1961-06-12 | 1968-09-30 | Ciba Geigy | Verfahren zur Herstellung von Küpenfarbstoffen |
FR1587787A (zh) | 1968-10-02 | 1970-03-27 | ||
US3694390A (en) | 1970-03-30 | 1972-09-26 | Alfred Edwards Winslow | Epoxidized polyamide resin forming stable aqueous solutions of high concentration |
JPS5223346B2 (zh) | 1972-08-30 | 1977-06-23 | ||
US4265745A (en) | 1977-05-25 | 1981-05-05 | Teijin Limited | Permselective membrane |
US4259183A (en) | 1978-11-07 | 1981-03-31 | Midwest Research Institute | Reverse osmosis membrane |
US4277344A (en) | 1979-02-22 | 1981-07-07 | Filmtec Corporation | Interfacially synthesized reverse osmosis membrane |
US4606943A (en) | 1983-03-18 | 1986-08-19 | Culligan International Company | Method for preparation of semipermeable composite membrane |
US4529646A (en) | 1984-07-30 | 1985-07-16 | E. I. Du Pont De Nemours And Company | Production of composite membranes |
US4643829A (en) | 1984-07-30 | 1987-02-17 | E. I. Du Pont De Nemours And Company | Multilayer reverse osmosis membrane in which one layer is poly-meta-phenylene cyclohexane-1,3,5-tricarboxamide |
US4761234A (en) | 1985-08-05 | 1988-08-02 | Toray Industries, Inc. | Interfacially synthesized reverse osmosis membrane |
US4758343A (en) | 1985-09-20 | 1988-07-19 | Toray Industries, Inc. | Interfacially synthesized reverse osmosis membrane |
US4626468A (en) | 1986-04-23 | 1986-12-02 | E. I. Du Pont De Nemours And Company | Microporous support layer with interfacially polymerized copolyamide thereon |
US4719062A (en) | 1986-04-23 | 1988-01-12 | E. I. Du Pont De Nemours And Company | Extractant-surfactant post-treatments of permselective composite membranes |
US4812270A (en) | 1986-04-28 | 1989-03-14 | Filmtec Corporation | Novel water softening membranes |
US4888116A (en) | 1987-01-15 | 1989-12-19 | The Dow Chemical Company | Method of improving membrane properties via reaction of diazonium compounds or precursors |
US4830885A (en) | 1987-06-08 | 1989-05-16 | Allied-Signal Inc. | Chlorine-resistant semipermeable membranes |
US4769148A (en) | 1987-11-18 | 1988-09-06 | The Dow Chemical Company | Novel polyamide reverse osmosis membranes |
US4783346A (en) | 1987-12-10 | 1988-11-08 | E. I. Du Pont De Nemours And Company | Process for preparing composite membranes |
JPH01180208A (ja) | 1988-01-11 | 1989-07-18 | Toray Ind Inc | 複合半透膜の製造方法およびその膜 |
US4948507A (en) | 1988-09-28 | 1990-08-14 | Hydranautics Corporation | Interfacially synthesized reverse osmosis membrane containing an amine salt and processes for preparing the same |
US4872984A (en) | 1988-09-28 | 1989-10-10 | Hydranautics Corporation | Interfacially synthesized reverse osmosis membrane containing an amine salt and processes for preparing the same |
CN1035338A (zh) | 1988-12-16 | 1989-09-06 | 北京市海洋综合技术开发部 | 塑胶无胎卷材 |
US5032282A (en) * | 1989-04-14 | 1991-07-16 | Aligena Ag | Solvent-stable semipermeable composite membranes |
US5024765A (en) * | 1989-10-02 | 1991-06-18 | Aligena Ag | Composite membranes and processes using them |
GB2247419B (en) | 1989-10-30 | 1993-08-25 | Aligena Ag | Semipermeable composite membranes |
US5015382A (en) | 1989-04-20 | 1991-05-14 | E. I. Du Pont De Nemours And Company | Microporous support layer with interfacially polymerized copolyamide membrane thereon |
US5015380A (en) | 1989-04-20 | 1991-05-14 | E. I. Du Pont De Nemours And Company | Microporous support layer with interfacially polymerized copolyamide membrane thereon |
US4950404A (en) | 1989-08-30 | 1990-08-21 | Allied-Signal Inc. | High flux semipermeable membranes |
US4960517A (en) | 1989-12-13 | 1990-10-02 | Filmtec Corporation | Treatment of composite polyamide membranes via substitution with amine reactive reagents |
US5180802A (en) | 1990-07-18 | 1993-01-19 | Rheox, Inc. | Monoamine capped non-reactive polyamide composition |
US5019264A (en) | 1990-07-31 | 1991-05-28 | E. I. Du Pont De Nemours And Company | Multilayer reverse osmosis membrane of polyamide-urea |
JP3031763B2 (ja) | 1990-09-14 | 2000-04-10 | 日東電工株式会社 | 複合逆浸透膜およびその製造方法 |
US5254261A (en) | 1991-08-12 | 1993-10-19 | Hydranautics | Interfacially synthesized reverse osmosis membranes and processes for preparing the same |
US5290452A (en) | 1991-12-05 | 1994-03-01 | Exxon Research & Engineering Co. | Crosslinked polyester amide membranes and their use for organic separations |
US5246587A (en) | 1991-12-23 | 1993-09-21 | Hydranautics | Interfacially synthesized reverse osmosis membranes and processes for preparing the same |
CA2087421A1 (en) | 1992-01-22 | 1993-07-23 | Hisao Hachisuka | Composite reverse osmosis membrane and novel acid chloride |
US5616249A (en) | 1993-05-20 | 1997-04-01 | Ionics, Incorporated | Nanofiltration apparatus and processes |
JP3006976B2 (ja) | 1993-06-24 | 2000-02-07 | 日東電工株式会社 | 高透過性複合逆浸透膜の製造方法 |
JPH07178327A (ja) | 1993-11-12 | 1995-07-18 | Nitto Denko Corp | 複合半透膜及びその製造方法 |
US5783079A (en) | 1994-08-29 | 1998-07-21 | Toyo Boseki Kabushiki Kaisha | Composite hollow fiber membrane and process for its production |
US5693227A (en) | 1994-11-17 | 1997-12-02 | Ionics, Incorporated | Catalyst mediated method of interfacial polymerization on a microporous support, and polymers, fibers, films and membranes made by such method |
JP3489922B2 (ja) | 1994-12-22 | 2004-01-26 | 日東電工株式会社 | 高透過性複合逆浸透膜の製造方法 |
US5614099A (en) | 1994-12-22 | 1997-03-25 | Nitto Denko Corporation | Highly permeable composite reverse osmosis membrane, method of producing the same, and method of using the same |
US5582725A (en) | 1995-05-19 | 1996-12-10 | Bend Research, Inc. | Chlorine-resistant composite membranes with high organic rejection |
US5989426A (en) | 1995-07-05 | 1999-11-23 | Nitto Denko Corp. | Osmosis membrane |
KR0183370B1 (ko) | 1995-07-07 | 1999-04-15 | 김은영 | 방향족 폴리에스테르 또는 방향족 폴리에스테르와 폴리아미드 공중합체의 활성층을 갖는 역삼투용 복합막 |
JP3681214B2 (ja) | 1996-03-21 | 2005-08-10 | 日東電工株式会社 | 高透過性複合逆浸透膜 |
IL121046A (en) | 1997-06-10 | 2001-07-24 | Weizmann Kiryat Membrane Prod | Semipermeable encapsulated membranes with improved acid and base stability and process for their manufacture and their use |
DE69814891T2 (de) | 1997-07-02 | 2004-05-13 | Nitto Denko Corp., Ibaraki | Zusammengesetzte umkehrosmosemembran und verfahren zu ihrer herstellung |
US5876602A (en) | 1997-11-04 | 1999-03-02 | The Dow Chemical Company | Treatment of composite polyamide membranes to improve performance |
US6162358A (en) | 1998-06-05 | 2000-12-19 | Nl Chemicals Technologies, Inc. | High flux reverse osmosis membrane |
WO2000041800A1 (fr) | 1999-01-14 | 2000-07-20 | Toray Industries, Inc. | Membrane semi-permeable composite, procede de fabrication et procede de purification d'eau a l'aide de cette membrane |
JP4404988B2 (ja) | 1999-04-21 | 2010-01-27 | 住友精化株式会社 | ポリアミド樹脂水性分散液の製造方法 |
US6245234B1 (en) | 1999-06-03 | 2001-06-12 | Saehan Industries Incorporation | Composite polyamide reverse osmosis membrane and method of producing the same |
US6280853B1 (en) | 1999-06-10 | 2001-08-28 | The Dow Chemical Company | Composite membrane with polyalkylene oxide modified polyamide surface |
US6464873B1 (en) | 1999-06-15 | 2002-10-15 | Hydranautics | Interfacially polymerized, bipiperidine-polyamide membranes for reverse osmosis and/or nanofiltration and process for making the same |
DE69940981D1 (de) | 1999-09-28 | 2009-07-23 | Toray Industries | Verfahren zur herstellung einer semipermeablen verbundmembran |
US6337018B1 (en) | 2000-04-17 | 2002-01-08 | The Dow Chemical Company | Composite membrane and method for making the same |
US7279097B2 (en) | 2003-06-18 | 2007-10-09 | Toray Industries, Inc. | Composite semipermeable membrane, and production process thereof |
WO2007069626A1 (ja) | 2005-12-16 | 2007-06-21 | Toray Industries, Inc. | 複合半透膜、その製造方法、およびその用途 |
US20070251883A1 (en) | 2006-04-28 | 2007-11-01 | Niu Q Jason | Reverse Osmosis Membrane with Branched Poly(Alkylene Oxide) Modified Antifouling Surface |
KR100905901B1 (ko) | 2006-09-07 | 2009-07-02 | 웅진코웨이주식회사 | 폴리아미드 역삼투 복합막 활성층 형성용 아민 수용액,이를 이용한 폴리아미드 역삼투 복합막, 및 이의 제조방법 |
CN100443150C (zh) | 2006-09-22 | 2008-12-17 | 中国科学院长春应用化学研究所 | 含联苯结构的芳香聚酰胺反渗透复合膜 |
CN101605592B (zh) | 2007-02-05 | 2011-10-12 | 陶氏环球技术公司 | 改性的聚酰胺膜 |
US7806275B2 (en) | 2007-05-09 | 2010-10-05 | The United States Of America As Represented By The Secretary Of The Interior, The Bureau Of Reclamation | Chlorine resistant polyamides and membranes made from the same |
US20090107922A1 (en) | 2007-10-26 | 2009-04-30 | General Electric Company | Membrane, water treatment system, and associated method |
US8177978B2 (en) | 2008-04-15 | 2012-05-15 | Nanoh20, Inc. | Reverse osmosis membranes |
US8147735B2 (en) | 2008-07-09 | 2012-04-03 | Eltron Research & Development, Inc. | Semipermeable polymers and method for producing same |
US7815987B2 (en) | 2008-12-04 | 2010-10-19 | Dow Global Technologies Inc. | Polyamide membrane with coating of polyalkylene oxide and polyacrylamide compounds |
AU2010273709B2 (en) | 2009-06-29 | 2015-08-20 | Nanoh2O, Inc. | Improved hybrid TFC RO membranes with nitrogen additives |
US20110049055A1 (en) | 2009-08-31 | 2011-03-03 | General Electric Company | Reverse osmosis composite membranes for boron removal |
SG183398A1 (en) | 2010-02-23 | 2012-09-27 | Toray Industries | Composite semipermeable membrane and process for production thereof |
NO335286B1 (no) | 2010-06-04 | 2014-11-03 | Tom-Nils Nilsen | Tynnfilmkompositter |
JP5817330B2 (ja) * | 2010-08-24 | 2015-11-18 | 東レ株式会社 | 分離膜および分離膜エレメント |
US9216385B2 (en) | 2010-10-04 | 2015-12-22 | Saudi Arabian Oil Company | Application of rejection enhancing agents (REAs) that do not have cloud point limitations on desalination membranes |
US20130256215A1 (en) | 2010-12-28 | 2013-10-03 | Toray Industries, Inc. | Composite semipermeable membrane |
WO2012102942A1 (en) | 2011-01-24 | 2012-08-02 | Dow Global Technologies Llc | Composite polyamide membrane |
KR101920194B1 (ko) | 2011-01-24 | 2019-02-08 | 다우 글로벌 테크놀로지스 엘엘씨 | 복합 폴리아미드 막 |
CN102219673B (zh) | 2011-05-06 | 2014-07-02 | 中国科学院长春应用化学研究所 | 荷正电纳滤复合膜及其制备方法 |
CN103764264B (zh) | 2011-08-31 | 2016-11-16 | 陶氏环球技术有限责任公司 | 源自包含胺反应性官能团和含磷官能团的单体的复合聚酰胺膜 |
WO2013048763A1 (en) | 2011-09-29 | 2013-04-04 | Dow Global Technologies Llc | Method for solubilizing carboxylic acid-containing compound in hydrocarbon solvent |
JP6030657B2 (ja) | 2011-09-29 | 2016-11-24 | ダウ グローバル テクノロジーズ エルエルシー | 加水分解アシルハライド化合物を調製するためのインサイチュ法 |
JP6032011B2 (ja) | 2011-09-29 | 2016-11-24 | 東レ株式会社 | 複合半透膜 |
WO2013048764A1 (en) | 2011-09-29 | 2013-04-04 | Dow Global Technologies Llc | Method for preparing high purity mono-hydrolyzed acyl halide compound |
CN104039429B (zh) | 2012-01-06 | 2016-05-04 | 陶氏环球技术有限责任公司 | 复合聚酰胺膜 |
US9662615B2 (en) | 2012-07-19 | 2017-05-30 | Dow Global Technologies Llc | Composite polyamide membrane |
US10137418B2 (en) | 2013-01-14 | 2018-11-27 | Dow Global Technologies Llc | Composite polyamide membrane made via interfacial polymerization using a blend of non-polar solvents |
CN105377406A (zh) | 2013-01-14 | 2016-03-02 | 陶氏环球技术有限责任公司 | 包括磷酸三烃酯的复合聚酰胺膜 |
CN104918688B (zh) | 2013-01-14 | 2016-12-14 | 陶氏环球技术有限责任公司 | 包含经取代苯甲酰胺单体的复合聚酰胺膜 |
US9051417B2 (en) | 2013-03-16 | 2015-06-09 | Dow Global Technologies Llc | Method for solubilizing carboxylic acid-containing compound in hydrocarbon solvent |
US9051227B2 (en) | 2013-03-16 | 2015-06-09 | Dow Global Technologies Llc | In-situ method for preparing hydrolyzed acyl halide compound |
US9289729B2 (en) | 2013-03-16 | 2016-03-22 | Dow Global Technologies Llc | Composite polyamide membrane derived from carboxylic acid containing acyl halide monomer |
US8999449B2 (en) | 2013-03-27 | 2015-04-07 | Dow Global Technologies Llc | Composite polyamide membrane derived from aromatic monomer including anhydride and sulfonyl halide functional groups |
US9452391B1 (en) | 2013-12-02 | 2016-09-27 | Dow Global Technologies Llc | Composite polyamide membrane treated with dihyroxyaryl compounds and nitrous acid |
EP3092057B1 (en) | 2014-01-07 | 2018-09-19 | Dow Global Technologies LLC | Treatment of aqueous mixtures containing anionic surfactants using fouling resistant reverse osmosis membrane |
CN105848758B (zh) | 2014-01-07 | 2020-01-17 | 陶氏环球技术有限责任公司 | 使用防积垢反渗透膜从水性混合物分离烃 |
EP3092056B1 (en) | 2014-01-07 | 2018-08-01 | Dow Global Technologies LLC | Desalination of aqueous mixture containing nano-sized particles using fouling resistant reverse osmosis membrane |
CN105848765B (zh) | 2014-01-09 | 2020-02-14 | 陶氏环球技术有限责任公司 | 具有优选偶氮含量的复合聚酰胺膜 |
JP6535011B2 (ja) | 2014-01-09 | 2019-06-26 | ダウ グローバル テクノロジーズ エルエルシー | アゾ含有量及び高酸含有量を有する複合ポリアミド皮膜 |
ES2786928T3 (es) | 2014-01-09 | 2020-10-14 | Ddp Speciality Electronic Mat Us Inc | Membrana de material compuesto de poliamida con alto contenido de ácido y bajo contenido azoico |
KR20160107206A (ko) | 2014-01-13 | 2016-09-13 | 다우 글로벌 테크놀로지스 엘엘씨 | 고 팽창성 복합 폴리아마이드 멤브레인 |
EP3142777B1 (en) | 2014-05-14 | 2018-10-24 | Dow Global Technologies LLC | Composite polyamide membrane post treated with nitrous acid |
KR102357884B1 (ko) | 2014-05-14 | 2022-02-03 | 다우 글로벌 테크놀로지스 엘엘씨 | 아질산으로 후-처리된 복합 폴리아미드 멤브레인 |
-
2014
- 2014-10-29 EP EP14799275.4A patent/EP3077088B1/en active Active
- 2014-10-29 JP JP2016533194A patent/JP6577468B2/ja active Active
- 2014-10-29 US US15/030,919 patent/US9808769B2/en active Active
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- 2014-10-29 CN CN201480062096.2A patent/CN105873665B/zh active Active
- 2014-10-29 ES ES14799275.4T patent/ES2659569T3/es active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0421916A2 (en) * | 1989-04-14 | 1991-04-10 | Membrane Products Kiryat Weizmann Ltd. | Composite membranes and processes using them |
CN1370796A (zh) * | 2001-02-23 | 2002-09-25 | 世韩工业株式会社 | 复合聚酰胺反渗透膜和其制备方法 |
CN101421336A (zh) * | 2006-03-31 | 2009-04-29 | 罗地亚管理公司 | 高流动性聚酰胺 |
AU2009279188A1 (en) * | 2008-08-05 | 2010-02-11 | Polymers Crc Limited | Functionalized thin film polyamide membranes |
WO2011078131A1 (ja) * | 2009-12-22 | 2011-06-30 | 東レ株式会社 | 半透膜およびその製造方法 |
WO2011078047A1 (ja) * | 2009-12-24 | 2011-06-30 | 東レ株式会社 | 複合半透膜およびその製造方法 |
WO2012020680A1 (ja) * | 2010-08-11 | 2012-02-16 | 東レ株式会社 | 分離膜エレメントおよび複合半透膜の製造方法 |
CN103328082A (zh) * | 2011-01-24 | 2013-09-25 | 陶氏环球技术有限责任公司 | 复合聚酰胺膜 |
WO2013048765A1 (en) * | 2011-09-29 | 2013-04-04 | Dow Global Technologies Llc | Composite polyamide membrane derived from carboxylic acid containing acyl halide monomer |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110404417A (zh) * | 2019-07-19 | 2019-11-05 | 中国石油大学(华东) | 聚酰胺膜的改性方法及改性聚酰胺膜 |
CN113634133A (zh) * | 2021-08-05 | 2021-11-12 | 宁波水艺膜科技发展有限公司 | 一种高产水量半透膜及其制备方法 |
CN113634133B (zh) * | 2021-08-05 | 2023-11-07 | 宁波水艺膜科技发展有限公司 | 一种高产水量半透膜及其制备方法 |
CN115228290A (zh) * | 2022-08-03 | 2022-10-25 | 万华化学集团股份有限公司 | 一种耐清洗反渗透膜的制备方法 |
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ES2659569T3 (es) | 2018-03-16 |
US20160271567A1 (en) | 2016-09-22 |
EP3077088A1 (en) | 2016-10-12 |
EP3077088B1 (en) | 2017-12-27 |
JP2016539787A (ja) | 2016-12-22 |
WO2015084511A1 (en) | 2015-06-11 |
JP6577468B2 (ja) | 2019-09-18 |
US9808769B2 (en) | 2017-11-07 |
CN105873665B (zh) | 2019-01-01 |
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