CN105543940B - A kind of device and method of lifting VCP plating line electroplating evenness - Google Patents

A kind of device and method of lifting VCP plating line electroplating evenness Download PDF

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Publication number
CN105543940B
CN105543940B CN201510965086.6A CN201510965086A CN105543940B CN 105543940 B CN105543940 B CN 105543940B CN 201510965086 A CN201510965086 A CN 201510965086A CN 105543940 B CN105543940 B CN 105543940B
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China
Prior art keywords
electroplating
fixture
bar
kickboard
circuit board
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CN201510965086.6A
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CN105543940A (en
Inventor
黄彪
彭卫东
刘�东
韩焱林
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Shenzhen Suntak Multilayer PCB Co Ltd
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Shenzhen Suntak Multilayer PCB Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating

Abstract

The invention discloses a kind of device of lifting VCP plating line electroplating evenness, including, electroplating bath, electroplating liquid medicine is filled with inside the electroplating bath, winged bar is provided with above the electroplating bath, the fixture for clamping circuit board is fixed with described winged bar, each winged bar is made of at least three fixture, each bar upper adjoining clips that fly are electrically connected with conducting wire, and adjacent winged bar is electrically connected with conducting wire.It is described fly bar, jig main body material be stainless steel, it is electrically conductive.Adjacent fixture, winged bar are electrically connected with conducting wire, resistance is reduced, improves electroplating efficiency, meanwhile, source current, which is averaged, is assigned to each fixture, effectively reduces the very poor of copper electroplating layer thickness, greatly improves the electroplating evenness of circuit board.A kind of method of lifting VCP plating line electroplating evenness is also disclosed, between fixture on the basis of mutual Electricity Federation, electroplating voltage, electric current is adjusted, further improves the electroplating evenness of circuit board.

Description

A kind of device and method of lifting VCP plating line electroplating evenness
Technical field
The invention belongs to printed circuit board technology field, relates in particular to a kind of lifting VCP plating line electroplating evenness Device and electro-plating method.
Background technology
The electronic production line of vertical continuous (Vertical Conveyor Plating, abbreviation VCP) is printed circuit board Using injection copper-plating technique and the full plate of vertical continuous conveying device in (Printed Circuit Board, abbreviation PCB) production (once) copper plating production line, compared with traditional vertical plating production line, its floor space is small, has stable plating efficiency; In electroplating process, circuit board is held on fixture, and all workpiece mobile device driving under continuously from the one of electroplating bath Sidesway is toward opposite side, and the working condition of every workpiece is identical, and circuit board is in electroplating cell body by the way of continuous moving It is mobile, without departing from liquid, be not exposed in air, can upper and lower plate the degree of automation height automatically, and it is low in energy consumption, operate steadily.
The key of printed circuit board plating is to ensure that coating is uniform inside circuit board two sides and via hole, the uniformity of coating Always it is the important indicator of evaluation plating efficiency, for conventional vertical continuously in electronic production line, circuit board clamp is connected to stainless steel On crossbearer, conduction is connected by stainless steel crossbearer between fixture, but mutually Electricity Federation, this device are not asked there are following between fixture Topic:(1) stainless steel crossbearer poorly conductive, current utilization rate is low, influences electroplating efficiency;(2) it is separately positioned between fixture, not mutually Connection so that folder points disunity, current distribution is uneven on circuit board, it is larger to ultimately result in copper electroplating layer thickness difference, and plating is equal Even property can not ensure, it is big to electroplate the probability of failure, and electroplating solution is of high cost.
The content of the invention
For this reason, the technical problems to be solved by the invention are in existing VCP plating lines, by not between circuit board clamp Steel crossbearer connection of becoming rusty is conductive, mutual not Electricity Federation between fixture, and stainless steel crossbearer poorly conductive, current utilization rate are low, between fixture not Interconnection causes current distribution is uneven on circuit board, and finally so that plating thickness is uneven, electroplating efficiency is low, so as to propose that one kind carries Rise the device and method of VCP plating line electroplating evenness.
In order to solve the above technical problems, the technical scheme is that:
The present invention provides a kind of device of lifting VCP plating line electroplating evenness, including electroplating bath, inside the electroplating bath Electroplating liquid medicine is filled with, winged bar is provided with above the electroplating bath, the fixture for clamping circuit board is fixed with described winged bar, Each it is made of at least three fixture for winged bar, each bar upper adjoining clips that fly are electrically connected with conducting wire, and adjacent winged bar is electrically connected with conducting wire Connect.
Preferably, the conducting wire is encapsulated copper conductor, resistance is 5-8 between the adjoining clips after conducting wire connection Milliohm.
Preferably, the kickboard that can be lifted along the electroplating bath short transverse, the kickboard are provided with the electroplating bath Top is provided with two pieces of anode baffles.
Preferably, the kickboard is connected to kickboard elevating lever, the kickboard elevating lever is used for the height for adjusting the kickboard Degree;The space of circuit board can be accommodated by being left between the anode baffle.
Preferably, it is provided with regulation scale at the top of the kickboard elevating lever.
It is described to fly bar to be fixed on the guide rail, on chain preferably, further include guide rail, chain, the guide rail and chain Described winged bar is driven to do shuttling movement above the electroplating bath.
Preferably, fixed described winged bar of guide rail centre position and the anode of supply unit connect.
Fly bar and the main material of the fixture is stainless steel preferably, described.
The present invention also provides a kind of method of lifting VCP plating line electroplating evenness, include the following steps,
Circuit board to be electroplated, be held on the fixture by S1, flies bar to move circuit board described in the plating chain-driving Into electroplating bath, the kickboard elevating lever according to the size adjusting of circuit board, and then adjust the height of kickboard and anode baffle;
S2, connect power supply and set electroplating voltage, electric current, starts to electroplate.
Preferably, in the step S2, electroplating voltage is not more than 1.54V, current density for the voltage at each fixture For 3.0-3.5ASD.
The above technical solution of the present invention has the following advantages over the prior art:
(1) device of lifting VCP plating line electroplating evenness of the present invention, including electroplating bath, inside are filled with electricity Plating liquid medicine, electroplating bath top set winged bar to be driven under guide rail, chain effect, are fixed with described winged bar and are used to clamp electricity The fixture of road plate, each flies bar device and is made of at least three fixture, and each adjoining clips are electrically connected in winged bar device, adjacent folder Have device to be electrically connected.Adjacent fixture, clamping device are electrically connected with conducting wire, reduce resistance, improves electroplating efficiency, together When, source current, which is averaged, is assigned to each fixture, effectively reduces the very poor of copper electroplating layer thickness, greatly improves circuit board Electroplating evenness.
(2) device of lifting VCP plating line electroplating evenness of the present invention, further includes what can be lifted along short transverse Kickboard, is provided with two pieces of anode baffles in kickboard, circuit board to be electroplated is placed in the gap between two pieces of anode baffles, Ke Yitong The height for overregulating kickboard and anode baffle handles various sizes of circuit board, without electroplating device is needed to change, reduces and is produced into This, improves production efficiency.
(3) method of lifting VCP plating line electroplating evenness of the present invention, the basis of mutual Electricity Federation between fixture On, electroplating voltage, electric current are adjusted, further improves the electroplating evenness of circuit board.
Brief description of the drawings
In order to make the content of the present invention more clearly understood, the specific embodiment below according to the present invention and combination Attached drawing, the present invention is described in further detail, wherein
Fig. 1 is winged bar of structure diagram described in the embodiment of the present invention;
Fig. 2 is the structure diagram of the fixture described in the embodiment of the present invention;
Fig. 3 is the apparatus structure schematic diagram of the lifting electroplating evenness described in the embodiment of the present invention.
Reference numeral is expressed as in figure:1- electroplating baths;2- flies bar;3- fixtures;4- conducting wires;5- kickboards;6- anode baffles;7- Kickboard elevating lever;8- regulation scales;9- jet pipes.
Embodiment
Embodiment
The present embodiment provides a kind of device of lifting VCP plating line electroplating evenness, as shown in Figs. 1-3, including electroplating bath 1, the electroplating bath 1 is square groove, and electroplating liquid medicine is filled with inside groove, and the top of electroplating bath 1 is provided with winged bar 2, and described winged bar 2 is consolidated Due on guide rail and chain, shuttling movement is done above the electroplating bath 1 for winged bar 2 described in the guide rail and chain-driving, it is fixed Fly bar 2 guide rail centre position and the anode of installation's power source connects, be fixedly installed on described winged bar 2 and be useful for clamping circuit board Fixture 3, each winged bar device be made of at least three fixtures 3, it is described fly bars 2 and 3 main material of fixture be stainless steel, can lead Electricity, it is each to fly bars 2 and be made of three fixtures 3 in the present embodiment, it is each fly bars 2 in adjoining clips 3 be electrically connected by conducting wire 4, together Shi Xianglin is electrically connected between flying bars 2 also by conducting wire 4, and the conducting wire 4 is encapsulated copper conductor, the electricity after connection between adjoining clips 3 Hinder for 5-8 milliohms, in the present embodiment, the resistance is 6 milliohms;
The kickboard 5 that can be lifted along 1 short transverse of electroplating bath is additionally provided with electroplating bath 1, kickboard 5 is two pieces, respectively It is connected on kickboard elevating lever 7, the kickboard elevating lever 7 can control kickboard 5 to be adjusted along the position in short transverse, be arranged at institute The lifting distance of kickboard 5 can be measured by stating the regulation scale 8 at the top of kickboard elevating lever 7, be accurately positioned kickboard 5, described in every piece Put in kickboard 5 and be provided with anode baffle 6, the gap that can accommodate circuit board is left between anode baffle 6.Can be by adjusting kickboard 5 and the height of anode baffle 6 handle various sizes of circuit board, without electroplating device is needed to change, reduce production cost, improve Production efficiency.
The present embodiment also provides a kind of method of lifting VCP plating line electroplating evenness, it includes the following steps,
Circuit board to be electroplated, be held on the fixture 3 by S1, and fixture 3, which is fixed on, flies bars 2, guide rail and chain-driving institute State winged bar 2 and circuit board is moved into 1 position of electroplating bath, and adjust kickboard elevating lever 7, and then adjust the height of kickboard 5 and anode baffle 6 Degree is to suitable position, the gap for making circuit board be placed between the anode baffle 6;
S2, connection power supply, the cathode of power supply are connected with the anode in electroplating bath, and the anode of power supply passes through winged bar and fixture With circuit board communication, circuit board is become anode, electroplating voltage, electric current be set, the jet pipe 9 in electroplating bath 1 is sprayed to circuit board Electroplate liquid, starts to electroplate, and the voltage that magnitude of voltage is arranged at each fixture is not more than 1.54V, current density 3.0-3.5ASD, It is 3.2ASD in the present embodiment.
Fixture 3 on each winged bar 2, adjacent winged bar 2 are electrically connected by the present embodiment with conducting wire 4, between reduction fixture 3 and are flown Resistance between bars 2, improves electroplating efficiency, source current, which is averaged, is assigned to each fixture 3, while adjusts the electricity in electroplating work procedure Current voltage parameter, effectively reduces the very poor of copper electroplating layer thickness, greatly improves the electroplating evenness of circuit board.
Obviously, the above embodiments are merely examples for clarifying the description, and the restriction not to embodiment.It is right For those of ordinary skill in the art, can also make on the basis of the above description it is other it is various forms of change or Change.There is no necessity and possibility to exhaust all the enbodiments.And the obvious change thus extended out or Among changing still in the protection domain of the invention.

Claims (4)

1. a kind of device of lifting VCP plating line electroplating evenness, including electroplating bath, plating medicine is filled with inside the electroplating bath Water, it is characterised in that winged bar is provided with above the electroplating bath;The fixture for clamping circuit board is fixed with described winged bar, Each it is made of at least three fixture for winged bar, each bar upper adjoining clips that fly are electrically connected with conducting wire, and adjacent winged bar is electrically connected with conducting wire Connect;The kickboard that can be lifted along the electroplating bath short transverse is provided with the electroplating bath, two pieces are provided with above the kickboard Anode baffle, the kickboard are connected to kickboard elevating lever, and the kickboard elevating lever is used for the height for adjusting the kickboard;The sun The space of circuit board can be accommodated by being left between the baffle of pole;The conducting wire is encapsulated copper conductor, the phase after conducting wire connection Resistance is 5-8 milliohms between adjacent fixture;Regulation scale is provided with the top of the kickboard elevating lever;Among fixed described winged bar of guide rail The anode of position and supply unit connects.
2. the device of lifting VCP plating line electroplating evenness according to claim 1, it is characterised in that further include guide rail, Chain, it is described to fly bar to be fixed on the guide rail, on chain, fly described in the guide rail and chain-driving bar above the electroplating bath Do shuttling movement.
3. the device of lifting VCP plating line electroplating evenness according to claim 2, it is characterised in that it is described fly bar and The main material of the fixture is stainless steel.
4. a kind of method using such as claim 1-3 any one of them device lifting VCP plating line electroplating evenness, it is special Sign is, includes the following steps,
Circuit board to be electroplated, be held on the fixture by S1, flies bar circuit board to be moved to electricity described in the plating chain-driving In coating bath, the kickboard elevating lever according to the size adjusting of circuit board, and then adjust the height of kickboard and anode baffle;
S2, connect power supply and set electroplating voltage, electric current, starts to electroplate;
In the step S2, electroplating voltage is not more than 1.54V, current density 3.0-3.5ASD for the voltage at each fixture.
CN201510965086.6A 2015-12-21 2015-12-21 A kind of device and method of lifting VCP plating line electroplating evenness Active CN105543940B (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109972188A (en) * 2017-12-28 2019-07-05 亚硕企业股份有限公司 The movable protective mechanism of electroplating device
CN110724987A (en) * 2019-11-07 2020-01-24 珠海市凯诺微电子有限公司 VCP copper plating method
CN110760917A (en) * 2019-11-29 2020-02-07 无锡星亿智能环保装备股份有限公司 Elastic conductive device for electroplating line

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5989799A (en) * 1982-11-15 1984-05-24 Hitachi Ltd Plating jig
CN2579913Y (en) * 2002-11-25 2003-10-15 瑞盈机电有限公司 Floating type anode cover plate
CN201525899U (en) * 2009-11-13 2010-07-14 北大方正集团有限公司 Clamping plate tool for electroplating a circuit board
CN201809473U (en) * 2010-07-27 2011-04-27 广州明毅电子机械有限公司 Movable substrate clamping mechanism for electroplating of substrates
CN202175732U (en) * 2011-07-18 2012-03-28 上达电子(深圳)有限公司 Gold plating hanging tool
CN202272979U (en) * 2011-01-20 2012-06-13 俊杰机械(深圳)有限公司 Electroplating hanger provided with injection molding hanger head and injection molding coated chuck
CN102605414A (en) * 2012-03-31 2012-07-25 深圳崇达多层线路板有限公司 Device and method for improving uniformity of plating layer of PCB (printed circuit board) vertical plating line
CN202898583U (en) * 2012-11-01 2013-04-24 北大方正集团有限公司 Electroplating board feeding rack and equipment
CN203096217U (en) * 2013-01-25 2013-07-31 昆山博通机械设备有限公司 Novel electroplated conductive plate
CN104302815A (en) * 2014-08-11 2015-01-21 深圳崇达多层线路板有限公司 Plating slot and plating device
CN104878424A (en) * 2015-04-29 2015-09-02 深圳崇达多层线路板有限公司 Method for improving electroplating layer uniformity of PCB (printed circuit board) vertical electroplating line
CN204752883U (en) * 2015-06-30 2015-11-11 深圳市翔宇电路有限公司 Electroplate frid and plate homogeneity improvement device

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5989799A (en) * 1982-11-15 1984-05-24 Hitachi Ltd Plating jig
CN2579913Y (en) * 2002-11-25 2003-10-15 瑞盈机电有限公司 Floating type anode cover plate
CN201525899U (en) * 2009-11-13 2010-07-14 北大方正集团有限公司 Clamping plate tool for electroplating a circuit board
CN201809473U (en) * 2010-07-27 2011-04-27 广州明毅电子机械有限公司 Movable substrate clamping mechanism for electroplating of substrates
CN202272979U (en) * 2011-01-20 2012-06-13 俊杰机械(深圳)有限公司 Electroplating hanger provided with injection molding hanger head and injection molding coated chuck
CN202175732U (en) * 2011-07-18 2012-03-28 上达电子(深圳)有限公司 Gold plating hanging tool
CN102605414A (en) * 2012-03-31 2012-07-25 深圳崇达多层线路板有限公司 Device and method for improving uniformity of plating layer of PCB (printed circuit board) vertical plating line
CN202898583U (en) * 2012-11-01 2013-04-24 北大方正集团有限公司 Electroplating board feeding rack and equipment
CN203096217U (en) * 2013-01-25 2013-07-31 昆山博通机械设备有限公司 Novel electroplated conductive plate
CN104302815A (en) * 2014-08-11 2015-01-21 深圳崇达多层线路板有限公司 Plating slot and plating device
CN104878424A (en) * 2015-04-29 2015-09-02 深圳崇达多层线路板有限公司 Method for improving electroplating layer uniformity of PCB (printed circuit board) vertical electroplating line
CN204752883U (en) * 2015-06-30 2015-11-11 深圳市翔宇电路有限公司 Electroplate frid and plate homogeneity improvement device

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