CN105209955B - 用于分析透明或低对比度样本的自动显微镜聚焦系统和方法 - Google Patents

用于分析透明或低对比度样本的自动显微镜聚焦系统和方法 Download PDF

Info

Publication number
CN105209955B
CN105209955B CN201380042661.4A CN201380042661A CN105209955B CN 105209955 B CN105209955 B CN 105209955B CN 201380042661 A CN201380042661 A CN 201380042661A CN 105209955 B CN105209955 B CN 105209955B
Authority
CN
China
Prior art keywords
focal plane
depth
object lens
sample
focus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201380042661.4A
Other languages
English (en)
Chinese (zh)
Other versions
CN105209955A (zh
Inventor
M·C·普特曼
J·B·普特曼
J·S·阿彻
J·A·奥兰多
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
M.C. Putman
Nanotronics Imaging Inc
Original Assignee
Photoelectron Image Ltd By Share Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Photoelectron Image Ltd By Share Ltd filed Critical Photoelectron Image Ltd By Share Ltd
Publication of CN105209955A publication Critical patent/CN105209955A/zh
Application granted granted Critical
Publication of CN105209955B publication Critical patent/CN105209955B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/24—Base structure
    • G02B21/241—Devices for focusing
    • G02B21/244—Devices for focusing using image analysis techniques

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Microscoopes, Condenser (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Automatic Focus Adjustment (AREA)
CN201380042661.4A 2012-08-31 2013-08-29 用于分析透明或低对比度样本的自动显微镜聚焦系统和方法 Active CN105209955B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/600,962 US9488819B2 (en) 2012-08-31 2012-08-31 Automatic microscopic focus system and method for analysis of transparent or low contrast specimens
US13/600,962 2012-08-31
PCT/US2013/057311 WO2014036276A2 (en) 2012-08-31 2013-08-29 Automatic microscopic focus system and method for analysis of transparent or low contrast specimens

Publications (2)

Publication Number Publication Date
CN105209955A CN105209955A (zh) 2015-12-30
CN105209955B true CN105209955B (zh) 2017-11-28

Family

ID=50184636

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380042661.4A Active CN105209955B (zh) 2012-08-31 2013-08-29 用于分析透明或低对比度样本的自动显微镜聚焦系统和方法

Country Status (6)

Country Link
US (1) US9488819B2 (enExample)
EP (1) EP2891005A4 (enExample)
JP (1) JP6310460B2 (enExample)
KR (1) KR101755651B1 (enExample)
CN (1) CN105209955B (enExample)
WO (1) WO2014036276A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108254853B (zh) * 2018-01-17 2023-08-11 宁波舜宇仪器有限公司 一种显微成像系统及其实时对焦方法
US10247910B1 (en) 2018-03-14 2019-04-02 Nanotronics Imaging, Inc. Systems, devices and methods for automatic microscopic focus
US10146041B1 (en) 2018-05-01 2018-12-04 Nanotronics Imaging, Inc. Systems, devices and methods for automatic microscope focus
US10545096B1 (en) * 2018-10-11 2020-01-28 Nanotronics Imaging, Inc. Marco inspection systems, apparatus and methods
US10812701B2 (en) * 2018-12-13 2020-10-20 Mitutoyo Corporation High-speed tag lens assisted 3D metrology and extended depth-of-field imaging
US10901327B2 (en) 2018-12-20 2021-01-26 Canon Kabushiki Kaisha Automatic defect analyzer for nanoimprint lithography using image analysis
US10915992B1 (en) 2019-08-07 2021-02-09 Nanotronics Imaging, Inc. System, method and apparatus for macroscopic inspection of reflective specimens
US11593919B2 (en) 2019-08-07 2023-02-28 Nanotronics Imaging, Inc. System, method and apparatus for macroscopic inspection of reflective specimens
JP7623360B2 (ja) * 2019-08-30 2025-01-28 株式会社ミツトヨ 高速計測撮像のための高速高パワーパルス光源システム
US12301990B2 (en) 2020-08-07 2025-05-13 Nanotronics Imaging, Inc. Deep learning model for auto-focusing microscope systems
CN115342918B (zh) * 2021-05-14 2024-12-06 刘承贤 可携式观察微流道用环型萤光光路系统及其运作方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4945220A (en) * 1988-11-16 1990-07-31 Prometrix Corporation Autofocusing system for microscope having contrast detection means
US6043475A (en) * 1996-04-16 2000-03-28 Olympus Optical Co., Ltd. Focal point adjustment apparatus and method applied to microscopes
US20070152130A1 (en) * 2005-12-30 2007-07-05 General Electric Company System and method for utilizing an autofocus feature in an automated microscope
US7345814B2 (en) * 2003-09-29 2008-03-18 Olympus Corporation Microscope system and microscope focus maintaining device for the same

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0124241B1 (en) * 1983-03-29 1988-11-02 Olympus Optical Co., Ltd. Microscope provided with automatic focusing device
JPH05236315A (ja) * 1992-02-20 1993-09-10 Tdk Corp コントラスト検出による自動焦点合せ方法
US5594235A (en) 1993-06-17 1997-01-14 Ultrapointe Corporation Automated surface acquisition for a confocal microscope
JP3431300B2 (ja) * 1994-09-02 2003-07-28 オリンパス光学工業株式会社 顕微鏡用自動焦点検出装置
IL111229A (en) * 1994-10-10 1998-06-15 Nova Measuring Instr Ltd Autofocusing microscope
JPH1068888A (ja) * 1996-08-29 1998-03-10 Olympus Optical Co Ltd 顕微鏡装置
JP3226861B2 (ja) * 1996-12-18 2001-11-05 株式会社不二越 自動焦点合わせ方法
US6396039B1 (en) * 1999-03-11 2002-05-28 Corning Incorporated Focusing filament for autofocus system
US6847480B2 (en) * 2000-04-03 2005-01-25 Pocketscope.Com Llc Lenses and uses, including microscopes
US6518554B1 (en) * 2000-05-24 2003-02-11 Chromavision Medical Systems, Inc. Reverse focusing methods and systems
DE10112639A1 (de) 2001-03-16 2002-09-19 Zeiss Carl Jena Gmbh Mikroskop mit Autofokussiereinrichtung
IL148664A0 (en) * 2002-03-13 2002-09-12 Yeda Res & Dev Auto-focusing method and device
US20030184856A1 (en) 2002-04-02 2003-10-02 Nikon Corporation Focus point detection device and microscope using the same
JP3480730B2 (ja) * 2002-05-20 2003-12-22 沖電気工業株式会社 フォーカス深度決定方法
JP4712334B2 (ja) * 2004-09-03 2011-06-29 オリンパス株式会社 顕微鏡装置、顕微鏡ユニット、プログラム
US7417213B2 (en) * 2005-06-22 2008-08-26 Tripath Imaging, Inc. Apparatus and method for rapid microscopic image focusing having a movable objective
EP1840623B1 (en) * 2006-03-31 2013-05-08 Yokogawa Electric Corporation Microscope comprising a focus error detecting optical system
DE102006027836B4 (de) * 2006-06-16 2020-02-20 Carl Zeiss Microscopy Gmbh Mikroskop mit Autofokuseinrichtung
US7729049B2 (en) * 2007-05-26 2010-06-01 Zeta Instruments, Inc. 3-d optical microscope
US8154647B2 (en) * 2008-03-05 2012-04-10 Applied Minds, Llc Automated extended depth of field imaging apparatus and method
JP5189509B2 (ja) * 2009-01-21 2013-04-24 オリンパス株式会社 顕微鏡用照明光学系、及び顕微鏡
JP5272823B2 (ja) * 2009-03-17 2013-08-28 ソニー株式会社 焦点情報生成装置及び焦点情報生成方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4945220A (en) * 1988-11-16 1990-07-31 Prometrix Corporation Autofocusing system for microscope having contrast detection means
US6043475A (en) * 1996-04-16 2000-03-28 Olympus Optical Co., Ltd. Focal point adjustment apparatus and method applied to microscopes
US7345814B2 (en) * 2003-09-29 2008-03-18 Olympus Corporation Microscope system and microscope focus maintaining device for the same
US20070152130A1 (en) * 2005-12-30 2007-07-05 General Electric Company System and method for utilizing an autofocus feature in an automated microscope

Also Published As

Publication number Publication date
KR101755651B1 (ko) 2017-07-10
WO2014036276A2 (en) 2014-03-06
WO2014036276A3 (en) 2015-07-16
JP2015528590A (ja) 2015-09-28
US20140063222A1 (en) 2014-03-06
CN105209955A (zh) 2015-12-30
EP2891005A2 (en) 2015-07-08
EP2891005A4 (en) 2016-08-17
KR20150034757A (ko) 2015-04-03
US9488819B2 (en) 2016-11-08
JP6310460B2 (ja) 2018-04-11

Similar Documents

Publication Publication Date Title
CN105209955B (zh) 用于分析透明或低对比度样本的自动显微镜聚焦系统和方法
JP2015528590A5 (enExample)
CN106338809B (zh) 可调放大率光学系统中的可变焦距透镜的可适应操作频率
KR102458592B1 (ko) 자동 현미경 초점을 위한 시스템, 장치 및 방법
JP6363382B2 (ja) 膜厚測定装置及び方法
TW201945786A (zh) 自動顯微鏡聚焦系統、裝置及方法
CN208289218U (zh) 基于图像处理的激光微加工自动调焦装置
JP2005043624A (ja) 顕微鏡制御装置、顕微鏡装置、及び顕微鏡対物レンズ
JP6848995B2 (ja) 全反射顕微鏡及び全反射顕微鏡の調整方法
JP6886464B2 (ja) 試料媒質の波長依存性屈折率を決定するための光学顕微鏡及び方法
JP5909902B2 (ja) オートフォーカス装置、顕微鏡装置
JP2010038868A (ja) 光学的粘度測定システム
JP6219257B2 (ja) 近接場測定方法および近接場光学顕微鏡
JP4807659B2 (ja) セル内膜厚測定装置
JP4381687B2 (ja) 全反射蛍光顕微測定装置
KR101394799B1 (ko) 현미경 초점 면 안정화 방법 및 장치
JP4892294B2 (ja) 微小穴の深さ測定方法
WO2024090177A1 (ja) 顕微ラマン装置および顕微ラマン装置の制御方法
WO2019244275A1 (ja) 観察装置
JP3125124U (ja) 赤外顕微鏡
CN110799879A (zh) 显微镜以及在可变机械参数下显微检查样本的方法
ITPI20110119A1 (it) "un metodo per digitalizzare delle immagini di un vetrino in una analisi di auto-immunita' e relativo macchinario"
JP2008233041A (ja) 硬さ試験機
Nagose Automated Magnetic Particle Attachment to an Atomic Force Microscope Cantilever
JP2007147756A (ja) 光学測定装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
TA01 Transfer of patent application right

Effective date of registration: 20170531

Address after: Ohio, USA

Applicant after: NANOTRONICS IMAGING, Inc.

Address before: Ohio, USA

Applicant before: M.C. Putman

Effective date of registration: 20170531

Address after: Ohio, USA

Applicant after: M.C. Putman

Address before: American Florida

Applicant before: NANOTRONICS IMAGING, LLC

GR01 Patent grant
GR01 Patent grant