CN1049045C - 监测薄膜厚度的方法和设备 - Google Patents

监测薄膜厚度的方法和设备 Download PDF

Info

Publication number
CN1049045C
CN1049045C CN93117694A CN93117694A CN1049045C CN 1049045 C CN1049045 C CN 1049045C CN 93117694 A CN93117694 A CN 93117694A CN 93117694 A CN93117694 A CN 93117694A CN 1049045 C CN1049045 C CN 1049045C
Authority
CN
China
Prior art keywords
coating
thickness
light
monitoring
equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN93117694A
Other languages
English (en)
Chinese (zh)
Other versions
CN1085655A (zh
Inventor
M·汉诺逖奥
G·列纳德
R·特努
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Glass Europe SA
Original Assignee
Glaverbel Belgium SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Glaverbel Belgium SA filed Critical Glaverbel Belgium SA
Publication of CN1085655A publication Critical patent/CN1085655A/zh
Application granted granted Critical
Publication of CN1049045C publication Critical patent/CN1049045C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G01N2021/8427—Coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Textile Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Surface Treatment Of Glass (AREA)
CN93117694A 1992-09-15 1993-09-14 监测薄膜厚度的方法和设备 Expired - Fee Related CN1049045C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9219450.5 1992-09-15
GB929219450A GB9219450D0 (en) 1992-09-15 1992-09-15 Thin film thickness monitoring and control

Publications (2)

Publication Number Publication Date
CN1085655A CN1085655A (zh) 1994-04-20
CN1049045C true CN1049045C (zh) 2000-02-02

Family

ID=10721896

Family Applications (1)

Application Number Title Priority Date Filing Date
CN93117694A Expired - Fee Related CN1049045C (zh) 1992-09-15 1993-09-14 监测薄膜厚度的方法和设备

Country Status (17)

Country Link
US (1) US5396080A (https=)
JP (1) JPH06201333A (https=)
CN (1) CN1049045C (https=)
AU (1) AU664474B2 (https=)
BE (1) BE1006795A3 (https=)
CA (1) CA2105635A1 (https=)
CZ (1) CZ289962B6 (https=)
DE (1) DE4331355A1 (https=)
ES (1) ES2078864B1 (https=)
FI (1) FI933971A7 (https=)
FR (1) FR2695721B1 (https=)
GB (2) GB9219450D0 (https=)
IT (1) IT1261253B (https=)
LU (1) LU88402A1 (https=)
NL (1) NL194246C (https=)
PT (1) PT101364B (https=)
SE (1) SE515115C2 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105115430A (zh) * 2015-05-26 2015-12-02 雷艳梅 一种点栅透射式化学药液涂抹均匀性检测方法及装置
CN106461373A (zh) * 2014-03-12 2017-02-22 晓温-威廉姆斯公司 用于涂层预测、施涂和检查的实时数字增强成像
CN108474732A (zh) * 2016-01-07 2018-08-31 阿科玛股份有限公司 测量高速移动的弯曲物体上沉积涂层厚度的不依赖于物体位置的方法

Families Citing this family (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4413745A1 (de) * 1994-04-20 1995-10-26 Gramm Gmbh & Co Kg Verfahren und Vorrichtung zur Kontrolle der Oberfläche von Gegenständen
JP2648098B2 (ja) * 1994-07-29 1997-08-27 日本電気株式会社 薄膜形成装置
JP3308135B2 (ja) * 1994-11-01 2002-07-29 松下電器産業株式会社 インプロセス膜厚モニター装置及び方法
US5835225A (en) * 1994-11-30 1998-11-10 Micron Technology, Inc. Surface properties detection by reflectance metrology
DE19509345A1 (de) * 1995-03-15 1996-09-19 Ver Glaswerke Gmbh Verfahren zum Erkennen und Bewerten von Fehlern in teilreflektierenden Oberflächenschichten
US5619330A (en) * 1995-12-22 1997-04-08 Thomson Consumer Electronics, Inc. Method and apparatus for determining thickness of an OPC layer on a CRT faceplate panel
DE19735246C2 (de) * 1997-08-14 1999-07-15 Bayern Freistaat Verfahren zur Bestimmung eines Volumens
DE19821401C2 (de) * 1998-05-13 2000-05-18 Storz Endoskop Gmbh Schaffhaus Endoskop zur Inspektion eines Beobachtungsraumes
US6392756B1 (en) 1999-06-18 2002-05-21 N&K Technology, Inc. Method and apparatus for optically determining physical parameters of thin films deposited on a complex substrate
EP1069401A1 (en) * 1999-07-13 2001-01-17 ODME International B.V. Optical film thickness measuring device
US6091485A (en) * 1999-12-15 2000-07-18 N & K Technology, Inc. Method and apparatus for optically determining physical parameters of underlayers
US6472238B1 (en) * 2000-02-09 2002-10-29 Therma-Wave, Inc. Evaluation of etching processes in semiconductors
US6570650B1 (en) * 2001-06-21 2003-05-27 Kla-Tenor Corporation Apparatus and methods for reducing thin film color variation in optical inspection of semiconductor devices and other surfaces
US6825933B2 (en) 2002-06-07 2004-11-30 N&K Technology, Inc. Computer-implemented reflectance system and method for non-destructive low dose ion implantation monitoring
TWI372463B (en) 2003-12-02 2012-09-11 Semiconductor Energy Lab Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device
EP1553643A3 (en) 2003-12-26 2009-01-21 Sel Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method and method for manufacturing crystalline semiconductor film
DE502004006191D1 (de) * 2004-06-01 2008-03-27 Applied Materials Gmbh & Co Kg Messvorrichtung für die Messung des Transmissionsgrads einer Beschichtung
DE102004034693B4 (de) * 2004-07-17 2006-05-18 Schott Ag Verfahren und Vorrichtung zur berührungslosen optischen Messung der Dicke von heißen Glaskörpern mittels der chromatischen Aberration
DE102004037555B4 (de) * 2004-08-03 2012-09-06 Erlus Aktiengesellschaft Verfahren zur berührungslosen und/oder zerstörungsfreien Prüfung einer photokatalytischen Oberflächenbeschichtung
US20060054843A1 (en) * 2004-09-13 2006-03-16 Electronic Design To Market, Inc. Method and apparatus of improving optical reflection images of a laser on a changing surface location
US8084260B2 (en) * 2004-11-24 2011-12-27 Applied Biosystems, Llc Spectral calibration method and system for multiple instruments
JP4930748B2 (ja) * 2005-01-28 2012-05-16 大日本印刷株式会社 被膜検査装置および方法
CN100337091C (zh) * 2005-11-07 2007-09-12 友达光电股份有限公司 光学膜层厚度均匀性的监测方法
US20100087015A1 (en) * 2008-03-05 2010-04-08 Global Solar Energy, Inc. Feedback for buffer layer deposition
JP5738601B2 (ja) 2008-03-05 2015-06-24 ハナジー・ハイ−テク・パワー・（エイチケー）・リミテッド 薄膜太陽電池セルのための緩衝層蒸着
US7985188B2 (en) * 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
PT2251454E (pt) 2009-05-13 2014-10-01 Sio2 Medical Products Inc Revestimento e inspeção de vaso
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9066072B2 (en) * 2010-07-20 2015-06-23 Semiconductor Components Industries, Llc Systems and methods for calibrating image sensors
US20120041583A1 (en) * 2010-08-16 2012-02-16 Joshua Conley Measurement system and method
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US8982362B2 (en) * 2011-10-04 2015-03-17 First Solar, Inc. System and method for measuring layer thickness and depositing semiconductor layers
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
CA2855353C (en) 2011-11-11 2021-01-19 Sio2 Medical Products, Inc. Passivation, ph protective or lubricity coating for pharmaceutical package, coating process and apparatus
US8855450B2 (en) 2012-02-20 2014-10-07 Cardinal Cg Company System and method for measuring properties of a thin film coated glass
US8666202B2 (en) 2012-02-20 2014-03-04 Cardinal Ig Company System and method for measuring properties of a thin film coated glass
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
KR101897835B1 (ko) * 2012-07-24 2018-09-12 삼성에스디아이 주식회사 극판 두께 측정 장치 및 방법
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
WO2014078666A1 (en) 2012-11-16 2014-05-22 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
AU2013352436B2 (en) 2012-11-30 2018-10-25 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
CN105392916B (zh) 2013-03-11 2019-03-08 Sio2医药产品公司 涂布包装材料
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
DE102014100594A1 (de) 2014-01-20 2015-07-23 Isra Surface Vision Gmbh Vorrichtung zur Inspektion eines mit einer beschichteten Oberfläche versehenen Materials und entsprechendes Verfahren
US9996765B2 (en) 2014-03-12 2018-06-12 The Sherwin-Williams Company Digital imaging for determining mix ratio of a coating
WO2015148471A1 (en) 2014-03-28 2015-10-01 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
WO2015165503A1 (en) * 2014-04-29 2015-11-05 Hewlett-Packard Indigo B.V. Transparent layer thickness measurement
ES2706877T3 (es) 2014-11-13 2019-04-01 Gerresheimer Glas Gmbh Filtro de partículas de máquina para conformar vidrio, unidad de émbolo, cabeza de soplado, soporte de cabeza de soplado y máquina para conformar vidrio adaptada a dicho filtro o que lo comprende
US9702689B2 (en) * 2015-06-18 2017-07-11 Xerox Corporation Use of a full width array imaging sensor to measure real time film thicknesses on film manufacturing equipment
JP2017013408A (ja) * 2015-07-02 2017-01-19 株式会社リコー 被処理物改質装置、被処理物改質システム、画像形成システムおよび画像形成方法
KR102786617B1 (ko) 2015-08-18 2025-03-26 에스아이오2 메디컬 프로덕츠, 엘엘씨 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기
CN108474739B (zh) * 2016-01-07 2021-10-01 阿科玛股份有限公司 测量基材上沉积的涂层的厚度的光学方法
US11125549B2 (en) 2016-01-07 2021-09-21 Arkema Inc. Optical intensity method to measure the thickness of coatings deposited on substrates
CN107179055B (zh) * 2017-05-28 2019-11-01 中国计量大学 用于bopp薄膜生产的薄膜厚度监测方法
CN107782280B (zh) * 2017-10-20 2020-09-01 维沃移动通信有限公司 一种贴膜厚度的检测方法和移动终端
WO2019099415A1 (en) * 2017-11-14 2019-05-23 Kateeva, Inc. Systems and methods for profiling material layers on a substrate
US10138539B1 (en) * 2018-04-03 2018-11-27 Shiping Cheng Method of managing coating uniformity with an optical thickness monitoring system
DE102018110931C5 (de) 2018-05-07 2023-06-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und System zum Erfassen der Oberflächenbelegung einer Beschichtung auf einer Oberfläche eines bandförmigen Prüflings
US12265327B2 (en) * 2018-07-30 2025-04-01 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor manufacturing apparatus and method thereof
DE102019112238A1 (de) * 2019-05-10 2020-11-12 HELLA GmbH & Co. KGaA Verfahren zur Kontrolle der Beschichtung eines elektronischen Bauteils
DE102019114242A1 (de) * 2019-05-28 2020-12-03 Infineon Technologies Ag Verfahren zum bereitstellen von beschichteten leadframes oder zum messen einer adhäsionskraft eines verkapselungsmittels auf einem leadframe
JP7400617B2 (ja) * 2020-05-08 2023-12-19 コニカミノルタ株式会社 被覆率検出装置、画像形成装置、被覆率検出方法、および被覆率検出プログラム
FR3116118B1 (fr) * 2020-11-12 2024-07-12 Exelsius Dispositif de caractérisation de l’état de réticulation d’un matériau d’un objet.
CN114292032B (zh) * 2021-12-30 2023-07-25 凯盛信息显示材料(洛阳)有限公司 一种导电玻璃的在线镀膜方法及在线镀膜装置
CN119173756A (zh) * 2022-04-27 2024-12-20 浜松光子学株式会社 折射率分布测量装置、膜厚分布测量装置、折射率分布测量方法及膜厚分布测量方法
CN115046588A (zh) * 2022-06-19 2022-09-13 上海市建筑科学研究院有限公司 钢构件防火防腐涂层厚度和缺陷的检测方法
CN115807219B (zh) * 2023-02-13 2023-05-30 南昌大学 一种光电薄膜材料制备控制系统及方法
CN116603716B (zh) * 2023-04-28 2024-03-29 宁波市融嘉轻合金科技有限公司 一种压铸件表面处理方法、系统、智能终端及存储介质
CN117865447A (zh) * 2023-12-29 2024-04-12 威海中玻新材料技术研发有限公司 浮法在线镀膜热端实时质量检测装置
CN118051069B (zh) * 2024-03-29 2024-07-16 广州泽亨实业有限公司 一种涂层厚度自动控制方法和系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4743775A (en) * 1985-11-19 1988-05-10 Infrared Engineering, Ltd. Absorption gauge for determining the thickness, moisture content or other parameter of a film of coating
US4748329A (en) * 1987-02-17 1988-05-31 Canadian Patents And Development Ltd. Method for on-line thickness monitoring of a transparent film
US4957370A (en) * 1984-06-21 1990-09-18 Kabushiki Kaisha Toshiba Method and apparatus for determining the degree of oxidation of an oxide coating

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2229323A5 (https=) * 1973-01-11 1974-12-06 Saint Gobain
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
GB2016678B (en) * 1978-03-10 1982-09-15 Asahi Dow Ltd Infrared multilayer film thickness measuring method and apparatus
US4355903A (en) * 1980-02-08 1982-10-26 Rca Corporation Thin film thickness monitor
JPS5830605A (ja) * 1981-08-18 1983-02-23 Kawasaki Steel Corp 表面被膜厚さ測定方法
JPS5840973A (ja) * 1981-09-03 1983-03-10 Toshiba Corp 光学式情報読取装置
US4785336A (en) * 1986-12-04 1988-11-15 Libbey-Owens-Ford Co. Device for monitoring characteristics of a film on a substrate
ES2007965A6 (es) * 1988-07-15 1989-07-01 Serrano Juan Jose Monzon Procedimiento y aparato para medir simultaneamente el indice de refraccion, el coeficiente de absorcion y el espesor de laminas planoparalelas.
US4977330A (en) * 1989-02-13 1990-12-11 Batchelder Tom W In-line photoresist thickness monitor
US5101111A (en) * 1989-07-13 1992-03-31 Dainippon Screen Mfg. Co., Ltd. Method of measuring thickness of film with a reference sample having a known reflectance
DE4017440C2 (de) * 1990-05-30 1994-02-10 Fraunhofer Ges Forschung Verfahren zur Messung der Schichtdicke und des Brechungsindex einer dünnen Schicht auf einem Substrat und Vorrichtung zur Durchführung des Verfahrens
IL96483A (en) * 1990-11-27 1995-07-31 Orbotech Ltd Optical inspection method and apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4957370A (en) * 1984-06-21 1990-09-18 Kabushiki Kaisha Toshiba Method and apparatus for determining the degree of oxidation of an oxide coating
US4743775A (en) * 1985-11-19 1988-05-10 Infrared Engineering, Ltd. Absorption gauge for determining the thickness, moisture content or other parameter of a film of coating
US4748329A (en) * 1987-02-17 1988-05-31 Canadian Patents And Development Ltd. Method for on-line thickness monitoring of a transparent film

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106461373A (zh) * 2014-03-12 2017-02-22 晓温-威廉姆斯公司 用于涂层预测、施涂和检查的实时数字增强成像
CN106461373B (zh) * 2014-03-12 2019-08-13 宣伟投资管理有限公司 用于涂层预测、施涂和检查的实时数字增强成像
CN105115430A (zh) * 2015-05-26 2015-12-02 雷艳梅 一种点栅透射式化学药液涂抹均匀性检测方法及装置
CN105115430B (zh) * 2015-05-26 2016-08-31 山东建筑大学 一种点栅透射式化学药液涂抹均匀性检测方法及装置
CN108474732A (zh) * 2016-01-07 2018-08-31 阿科玛股份有限公司 测量高速移动的弯曲物体上沉积涂层厚度的不依赖于物体位置的方法
CN108474732B (zh) * 2016-01-07 2022-04-15 阿科玛股份有限公司 测量高速移动的弯曲物体上沉积涂层厚度的不依赖于物体位置的方法

Also Published As

Publication number Publication date
PT101364A (pt) 1994-12-30
ES2078864R (https=) 1996-12-16
SE9302985L (sv) 1994-03-16
CZ289962B6 (cs) 2002-05-15
SE515115C2 (sv) 2001-06-11
ITTO930654A0 (it) 1993-09-08
GB9318814D0 (en) 1993-10-27
NL9301577A (nl) 1994-04-05
FR2695721A1 (fr) 1994-03-18
GB2270561B (en) 1996-07-17
US5396080A (en) 1995-03-07
IT1261253B (it) 1996-05-09
ITTO930654A1 (it) 1995-03-08
PT101364B (pt) 1999-11-30
FI933971A0 (fi) 1993-09-10
FR2695721B1 (fr) 1995-02-24
CZ9301924A3 (cs) 2001-12-12
AU4487393A (en) 1994-03-24
NL194246B (nl) 2001-06-01
GB9219450D0 (en) 1992-10-28
AU664474B2 (en) 1995-11-16
JPH06201333A (ja) 1994-07-19
BE1006795A3 (fr) 1994-12-13
LU88402A1 (fr) 1995-04-05
DE4331355A1 (de) 1994-03-17
SE9302985D0 (sv) 1993-09-14
ES2078864A2 (es) 1995-12-16
CA2105635A1 (en) 1994-03-16
GB2270561A (en) 1994-03-16
FI933971A7 (fi) 1994-03-16
NL194246C (nl) 2001-10-02
CN1085655A (zh) 1994-04-20
ES2078864B1 (es) 1997-05-16

Similar Documents

Publication Publication Date Title
CN1049045C (zh) 监测薄膜厚度的方法和设备
US20180145628A1 (en) Sensor for Measuring Reflected Light for Optimizing Deposited Performance Enhancement Coatings on Substrates
KR100716704B1 (ko) 퇴적 두께 측정 방법, 재료층의 형성 방법, 퇴적 두께 측정장치 및 재료층의 형성 장치
RU2427821C2 (ru) Устройство и способ для угловой колориметрии
CN108474739B (zh) 测量基材上沉积的涂层的厚度的光学方法
CN1430073A (zh) 形成薄膜的工艺及设备
GB2155173A (en) Spectrophotometer apparatus
WO2010148385A2 (en) Thin film temperature measurement using optical absorption edge wavelength
EP3146087B1 (en) A cover with a sensor system for a configurable measuring system for a configurable sputtering system
EP2090674A1 (en) Vacuum coating installation and method of producing a coating layer on a substrate
JP3944693B2 (ja) 膜厚測定装置
DE69119259T2 (de) Regeln von Öfen zur Wärmebehandlung
US20050078187A1 (en) Combination of response adapting filter and detector
CN116997672A (zh) 非化学计量金属化合物层的沉积
JP2006071402A (ja) 多層膜の膜厚制御方法及び成膜装置
ITTO960479A1 (it) Pannello di vetratura avente proprieta' di schermatura solare.
JP3866933B2 (ja) 膜厚測定装置
JP6765327B2 (ja) 放射温度測定装置及び放射温度測定方法
JPH10206238A (ja) 塗膜焼き付け温度の測定方法
CN114942226A (zh) 一种用于滤光片镀膜面检测方法、装置及应用
JP2001272342A (ja) 薄膜の特性評価方法
CN111665577A (zh) 一种可以直观识别雪地伪装的检验镜及制备方法
List et al. On‐line Quality Control of Coated Glass. On‐line Qualitätskontrolle von beschichtetem Glas
DE102008040879A1 (de) Verfahren zur optischen In-Situ-Prozesskontrolle des Herstellungsprozesses eines Halbleiterbauelements

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C19 Lapse of patent right due to non-payment of the annual fee
CF01 Termination of patent right due to non-payment of annual fee