CN104730863A - 一种干膜抗蚀剂 - Google Patents
一种干膜抗蚀剂 Download PDFInfo
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- CN104730863A CN104730863A CN201410610604.8A CN201410610604A CN104730863A CN 104730863 A CN104730863 A CN 104730863A CN 201410610604 A CN201410610604 A CN 201410610604A CN 104730863 A CN104730863 A CN 104730863A
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- 229920001230 polyarylate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
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- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN105573056A (zh) * | 2015-12-18 | 2016-05-11 | 杭州福斯特光伏材料股份有限公司 | 一种感光干膜抗蚀剂 |
CN105629662A (zh) * | 2015-12-31 | 2016-06-01 | 杭州福斯特光伏材料股份有限公司 | 一种干膜光致抗蚀剂 |
CN109031889A (zh) * | 2018-09-03 | 2018-12-18 | 浙江福斯特新材料研究院有限公司 | 一种低泡型高附着性感光干膜抗蚀剂 |
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US4925768A (en) * | 1986-12-11 | 1990-05-15 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition containing a tetrapolymer binder |
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JPH07333846A (ja) * | 1994-06-09 | 1995-12-22 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びこれを用いた感光性フィルム |
US6180323B1 (en) * | 1997-08-27 | 2001-01-30 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions having improved sidewall geometry and development latitude |
CN1734351A (zh) * | 2004-08-09 | 2006-02-15 | 东进世美肯株式会社 | 隔离物用感光性树脂组合物 |
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US4876173A (en) * | 1985-01-23 | 1989-10-24 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition on polyethylene terephthalate film support |
US4925768A (en) * | 1986-12-11 | 1990-05-15 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition containing a tetrapolymer binder |
US5419998A (en) * | 1991-08-30 | 1995-05-30 | Hercules Incorporated | Photopolymerizable composition for use in an alkaline-etch resistant dry film photoresist |
JPH06214382A (ja) * | 1993-01-18 | 1994-08-05 | Sekisui Chem Co Ltd | 感光性画像受容シート |
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US6180323B1 (en) * | 1997-08-27 | 2001-01-30 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions having improved sidewall geometry and development latitude |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105573056A (zh) * | 2015-12-18 | 2016-05-11 | 杭州福斯特光伏材料股份有限公司 | 一种感光干膜抗蚀剂 |
CN105573056B (zh) * | 2015-12-18 | 2019-08-20 | 杭州福斯特应用材料股份有限公司 | 一种感光干膜抗蚀剂 |
CN105629662A (zh) * | 2015-12-31 | 2016-06-01 | 杭州福斯特光伏材料股份有限公司 | 一种干膜光致抗蚀剂 |
CN105629662B (zh) * | 2015-12-31 | 2019-09-10 | 杭州福斯特应用材料股份有限公司 | 一种干膜光致抗蚀剂 |
CN109031889A (zh) * | 2018-09-03 | 2018-12-18 | 浙江福斯特新材料研究院有限公司 | 一种低泡型高附着性感光干膜抗蚀剂 |
CN109031889B (zh) * | 2018-09-03 | 2021-08-24 | 杭州福斯特电子材料有限公司 | 一种低泡型高附着性感光干膜抗蚀剂 |
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