CN104698222B - Three axle single-chip integration resonant capacitance formula silicon micro accerometers and its processing method - Google Patents
Three axle single-chip integration resonant capacitance formula silicon micro accerometers and its processing method Download PDFInfo
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Abstract
本发明公开一种三轴单片集成谐振电容式硅微加速度计，包括玻璃基底以及键合锚点悬浮设置于玻璃基底表面中心位置的主结构；主结构包括敏感质量块框、安装于敏感质量块框中心位置的两个扭摆式质量块、电容梳齿组和四个谐振器；两个扭摆式质量块纵向排列放置，且每个扭摆式质量块均由两个质量摆横向连接构成，且每个扭摆式质量块的左右两侧分别设置有电容梳齿组；四个谐振器分别通过杠杆机构安装于敏感质量块框四个顶角的外侧；玻璃基底上设有与主结构电极相连的信号引线。本发明在X、Y、Z三个方向的加速度测量时均进行了差分输出，提高检测精度，并且X、Y轴采用谐振式，Z轴采用电容式成本低，本发明中的加工方法简单可大批量生产。
The invention discloses a three-axis single-chip integrated resonant capacitive silicon micro-accelerometer, which includes a glass substrate and a main structure with a bonding anchor point suspended at the center of the surface of the glass substrate; the main structure includes a sensitive mass frame and is installed on the sensitive mass. Two torsion-type masses, capacitor comb groups and four resonators at the center of the block frame; two torsion-type masses are arranged vertically, and each torsion-type mass is composed of two mass pendulums connected horizontally, and The left and right sides of each torsion-type mass block are respectively provided with capacitor comb groups; the four resonators are respectively installed on the outer sides of the four corners of the sensitive mass block frame through lever mechanisms; the glass substrate is provided with electrodes connected to the main structure Signal leads. The present invention performs differential output when measuring the accelerations in the three directions of X, Y, and Z to improve the detection accuracy, and the X and Y axes adopt the resonant type, and the Z axis adopts the capacitive type with low cost. The processing method in the present invention is simple and reliable. Mass production.
Description
技术领域technical field
本发明涉及微机电和惯性传感器领域，具体涉及一种三轴单片集成谐振电容式硅微加速度计及其加工方法。The invention relates to the field of micro-electromechanical and inertial sensors, in particular to a three-axis single-chip integrated resonant capacitive silicon micro-accelerometer and a processing method thereof.
背景技术Background technique
微机械加速度计是一种重要的微惯性导航传感器，随着微电子机械系统(MEMS)的不断发展，利用MEMS制造而成的硅微加速度计具有体积小，重量轻，成本低，可靠性高，功耗小，可批量生产等优点。在惯性导航领域，硅微机械加速度计研究现在已受到越来越多的科研院所和高校的重视。Micromachined accelerometer is an important micro-inertial navigation sensor. With the continuous development of micro-electro-mechanical systems (MEMS), silicon micro-accelerometers made of MEMS have the advantages of small size, light weight, low cost and high reliability. , low power consumption, mass production and other advantages. In the field of inertial navigation, research on silicon micromachined accelerometers has now attracted more and more attention from research institutes and universities.
电容式微加速度计的尺寸较小，灵敏度和分辨率高，稳定性和温度线性度好。硅微谐振式加速度计是一种高精度的微加速度计，将被测加速度信号转化为谐振频率的变化，直接输出数字信号，具有很高的灵敏度和分辨率，并且还具有动态范围宽、抗干扰能力强、稳定性好等优点。电容式和谐振式的微加速度计因为其固有的特点和优势，已成为研究的主要方向。Capacitive microaccelerometers are small in size, high in sensitivity and resolution, and good in stability and temperature linearity. Silicon micro-resonant accelerometer is a high-precision micro-accelerometer, which converts the measured acceleration signal into the change of resonance frequency, and directly outputs a digital signal. It has high sensitivity and resolution, and also has a wide dynamic range, anti- It has the advantages of strong interference ability and good stability. Capacitive and resonant micro-accelerometers have become the main direction of research because of their inherent characteristics and advantages.
2005年，韩国汉城国立大学的Hyeon Cheol Kim等人设计出了一种三轴加速度计，该加速度计是将两个同平面的X、Y轴谐振加速度计和垂直平面的Z轴谐振加速度计集成在同一硅片上。因而体积较大，加工工艺复杂，安装误差大。In 2005, Hyeon Cheol Kim of Seoul National University in South Korea and others designed a three-axis accelerometer, which integrated two co-planar X, Y-axis resonant accelerometers and a vertical Z-axis resonant accelerometer on the same silicon wafer. Therefore, the volume is large, the processing technology is complicated, and the installation error is large.
2008年,奥克兰大学报道了单质量块的单片集成的的电容检测式三轴加速度计。2010年，台湾国立清华大学报道了一种采用阵列结构的单质量块三轴MEMS加速度计。2011年德克萨斯大学报道了一种采用表面为机械加工技术在聚酰亚胺柔性衬底上制作的三轴电容式MEMS加速度计。该加速度计的质量块采用紫外光刻工艺和镍电镀技术加工而成。上述的三个三轴加速度计没有实现各检测方向的完全解耦，因此很难达到较高的性能。In 2008, the University of Auckland reported a single-mass monolithic integrated capacitive detection three-axis accelerometer. In 2010, National Tsing Hua University in Taiwan reported a single-mass three-axis MEMS accelerometer with an array structure. In 2011, the University of Texas reported a three-axis capacitive MEMS accelerometer fabricated on a polyimide flexible substrate using surface machining technology. The mass block of the accelerometer is processed by ultraviolet lithography technology and nickel electroplating technology. The above-mentioned three three-axis accelerometers do not achieve complete decoupling of each detection direction, so it is difficult to achieve high performance.
目前，微加速度计研究主要还是针对单轴微加速度计并且也已经比较成熟，但三轴微加速度计的研究较少。已有的三轴微机械加速度计大部分是将多个单轴或双轴加速度计集成在一个芯片上，它们的敏感轴相互垂直，从而实现测量三个方向的加速度。这种加速度计，结构简单，加工简单，技术成熟，但总体尺寸较大，交叉轴干扰都比较严重，也存在较大的安装误差和线路干扰，影响硅微加速度计的发展和使用。随着科技的不断发展和市场的进一步需求，为了更全面的了解物体的运动信息，需要同时测量三个方向的加速度信息，三轴加速度的研发已成为必然趋势。At present, the research on micro-accelerometers is mainly aimed at uniaxial micro-accelerometers and has been relatively mature, but the research on three-axis micro-accelerometers is less. Most of the existing three-axis micromachined accelerometers integrate multiple uniaxial or biaxial accelerometers on one chip, and their sensitive axes are perpendicular to each other, so as to measure the acceleration in three directions. This kind of accelerometer has simple structure, simple processing, and mature technology, but its overall size is large, cross-axis interference is relatively serious, and there are also large installation errors and line interference, which affect the development and use of silicon micro-accelerometers. With the continuous development of science and technology and the further demand of the market, in order to more comprehensively understand the motion information of objects, it is necessary to measure the acceleration information in three directions at the same time, and the research and development of three-axis acceleration has become an inevitable trend.
发明内容Contents of the invention
发明目的：本发明的目的在于解决现有技术中存在的不足，提供一种三轴单片集成谐振电容式硅微加速度计及其加工方法。Purpose of the invention: The purpose of the present invention is to solve the deficiencies in the prior art and provide a three-axis monolithic integrated resonant capacitive silicon micro-accelerometer and its processing method.
技术方案：本发明的一种三轴单片集成谐振电容式硅微加速度计，包括玻璃基底以及键合锚点悬浮设置于玻璃基底表面中心位置的主结构；所述主结构包括敏感质量块框、安装于敏感质量块框中心位置的两个扭摆式质量块、电容梳齿组和四个谐振器；所述两个扭摆式质量块纵向排列放置，且每个扭摆式质量块均由两个质量摆横向连接构成，且每个扭摆式质量块的左右两侧分别设置有电容梳齿组；所述四个谐振器分别通过杠杆机构安装于敏感质量块框四个顶角的外侧；所述玻璃基底上设有与主结构电极相连的信号引线。其中，谐振器可以测量X轴和Y轴方向上的加速度，电容梳齿组可测量Z轴方向上的加速度。Technical solution: A three-axis monolithic integrated resonant capacitive silicon micro-accelerometer of the present invention includes a glass substrate and a main structure with a bonded anchor point suspended at the center of the surface of the glass substrate; the main structure includes a sensitive mass frame , two torsion-type masses installed in the center of the sensitive mass frame, capacitor comb groups and four resonators; the two torsion-type masses are arranged vertically, and each torsion-type mass is composed of two The mass pendulum is connected horizontally, and the left and right sides of each torsion-type mass block are respectively provided with capacitor comb groups; the four resonators are respectively installed on the outside of the four corners of the sensitive mass frame through a lever mechanism; the The glass substrate is provided with signal leads connected with the electrodes of the main structure. Among them, the resonator can measure the acceleration in the X-axis and Y-axis directions, and the capacitor comb group can measure the acceleration in the Z-axis direction.
电容梳齿组包括连接于扭摆式质量块的活动电容梳齿、以及通过支撑锚点键合于玻璃基底的固定电容梳齿，所述固定电容梳齿和活动电容梳齿的高度不同且共同构成变面积式电容检测，固定电容梳齿下方的玻璃基底上设有信号引线。同一扭摆式质量块两侧的活动电容梳齿关于Y轴对称，不同扭摆式质量块两侧的活动电容梳齿关于X轴对称；两个扭摆式质量块上对角线上的电容梳齿组的电容相互差分，能够提高检测精度；且同一扭摆式质量块的两个质量摆之间通过扭杆连接，所述扭杆通过锚点固定于玻璃基底，两个质量摆与扭杆之间的力矩不等。谐振器包括支撑梁、安装于支撑梁两端部的台肩、以及梳齿架，所述支撑梁由两个横向设置的谐振梁组成，上谐振梁的上端和下谐振梁的下端对称设置有横向放置的活动梳齿，活动梳齿的两端分别设有通过支撑锚点键合于玻璃基底上的外固定梳齿和侧固定梳齿。杠杆机构包括杠杆以及通过固定锚点设置于玻璃基底上的U型梁；所述X轴方向上的杠杆纵向放置，且该方向上的杠杆的一端通过梁杆连接于敏感质量块框的外侧，另一端连接于纵向放置的U型梁，进而X轴方向上的杠杆可在X方向上移动；所述Y轴方向的杠杆横向放置，且该方向上的杠杆的一端通过梁杆连接于敏感质量块框的外侧，另一端连接于横向放置的U型梁，进而Y轴方向上的杠杆可在Y方向上移动。The capacitor comb group includes movable capacitor combs connected to the torsion-type mass, and fixed capacitor combs bonded to the glass substrate through support anchor points. The heights of the fixed capacitor combs and the movable capacitor combs are different and together form a Variable area capacitive detection, signal leads are arranged on the glass substrate under the fixed capacitive comb teeth. The movable capacitor combs on both sides of the same torsion-mass are symmetrical about the Y axis, and the movable capacitor combs on both sides of different torsion-mass are symmetrical about the X-axis; the capacitor combs on the diagonal of the two torsion-mass The capacitances are different from each other, which can improve the detection accuracy; and the two mass pendulums of the same torsion-type mass are connected by a torsion bar, and the torsion bar is fixed to the glass substrate through an anchor point, and the connection between the two mass pendulums and the torsion bar Torques vary. The resonator includes a support beam, shoulders installed at both ends of the support beam, and a comb frame. The support beam is composed of two horizontally arranged resonant beams, and the upper end of the upper resonant beam and the lower end of the lower resonant beam are symmetrically arranged with The movable comb teeth placed horizontally, the two ends of the movable comb teeth are respectively provided with external fixed comb teeth and side fixed comb teeth bonded to the glass substrate through support anchor points. The lever mechanism includes a lever and a U-shaped beam arranged on the glass substrate through a fixed anchor point; the lever in the X-axis direction is placed longitudinally, and one end of the lever in this direction is connected to the outside of the sensitive mass frame through a beam rod, The other end is connected to a U-shaped beam placed longitudinally, so that the lever in the X-axis direction can move in the X direction; the lever in the Y-axis direction is placed horizontally, and one end of the lever in this direction is connected to the sensitive mass through a beam rod The outer side of the block frame and the other end are connected to the U-shaped beam placed horizontally, so that the lever in the Y-axis direction can move in the Y-direction.
其中，由于梁杆很窄，沿其宽度和高度方向的刚度小，在与U型梁的共同作用下，能够实现三个正交方向的自解耦，提高加速度的灵敏度和分辨率。Among them, because the beam is very narrow, the stiffness along its width and height directions is small, and under the joint action of the U-shaped beam, it can realize self-decoupling in three orthogonal directions, and improve the sensitivity and resolution of acceleration.
其中，两个谐振梁之间的间距较小，且外固定梳齿为驱动端，而内固定梳齿为检测端。Among them, the distance between the two resonant beams is small, and the outer fixed comb is the driving end, while the inner fixed comb is the detecting end.
进一步的，在所述四个谐振器中，同一对角线上的两个谐振器中心对称进而形成差分检测，提高检测精度；一侧的台肩通过支撑锚点键合安装于玻璃基底，另一侧的台肩连接于杠杆机构。Further, among the four resonators, the two resonators on the same diagonal are center-symmetrical to form differential detection and improve detection accuracy; the shoulder on one side is mounted on the glass substrate through support anchor point bonding, and the other The shoulder on one side is connected to the lever mechanism.
进一步的，所述玻璃基底由硼硅酸盐玻璃制成，所述主结构均由单晶硅材料制成。Further, the glass substrate is made of borosilicate glass, and the main structure is made of single crystal silicon material.
本发明还公开了一种三轴单片集成谐振电容式硅微加速度计的加工方法，包括以下步骤：The invention also discloses a processing method for a three-axis single-chip integrated resonant capacitive silicon micro-accelerometer, which includes the following steps:
(1)使用第一块掩膜板在玻璃基底上光刻，将有信号引线的地方暴露出来；(1) Use the first mask plate to photoetch on the glass substrate to expose the place where there are signal leads;
(2)溅射金属铝作为信号引线，然后采用剥离技术去除光刻胶；(2) Sputter metal aluminum as the signal lead, and then remove the photoresist by stripping technology;
(3)在一块单晶硅片的背面使用第二块掩膜板进行光刻，并利用Bosch工艺刻蚀出锚点，然后去除光刻胶；(3) Use a second mask to perform photolithography on the back of a single crystal silicon wafer, and use the Bosch process to etch the anchor points, and then remove the photoresist;
(4)在通过步骤(3)刻蚀的硅结构层的背面利用第三块掩膜板进行光刻，并利用Bosch工艺刻蚀出一定深度的凹槽，然后去除光刻胶；(4) Utilize the third mask to carry out photolithography on the back side of the silicon structure layer etched by step (3), and utilize the Bosch process to etch a groove of a certain depth, and then remove the photoresist;
(5)将通过步骤(4)刻蚀的硅结构层与玻璃基底上的锚点直接键合；(5) directly bonding the silicon structure layer etched by step (4) to the anchor point on the glass substrate;
(6)在硅结构层上利用第四块掩膜板部分遮光进行光刻，并采用Bosch工艺刻蚀刻蚀深槽，深槽的深度与步骤(3)中刻蚀的锚点厚度相同；(6) On the silicon structure layer, the fourth mask plate is used to partially shield light for photolithography, and the Bosch process is used to etch a deep groove, and the depth of the deep groove is the same as the thickness of the anchor point etched in step (3);
(7)将第五块掩膜板进行光刻，并采用Bosch工艺直到硅结构层上的深槽完全刻通停止，释放结构，最后去除光刻胶。(7) Perform photolithography on the fifth mask plate, and use the Bosch process until the deep grooves on the silicon structure layer are completely cut through to stop, release the structure, and finally remove the photoresist.
有益效果：与现有技术相比，本发明具有以下优点：Beneficial effect: compared with the prior art, the present invention has the following advantages:
(1)本发明在X、Y、Z三个方向的加速度测量时均进行了差分输出，提高了精度，并且X、Y轴采用谐振式，Z轴采用电容式，使得加速度计既有谐振式直接输出数字信号的优点(在X、Y轴)，又有电容式在Z轴检测容易的好处；(1) The present invention has all carried out differential output when measuring the acceleration of three directions of X, Y, Z, has improved precision, and X, Y axis adopts resonant type, Z axis adopts capacitive type, makes accelerometer existing resonant type The advantage of directly outputting digital signals (in the X and Y axes), and the advantage of capacitive detection in the Z axis;
(2)本发明的主结构采用硅材料制成，硅具有很好的实现电学性能和机械性能的优点，通过MEMS(微机电系统)工艺加工，成本低，制造工艺简单，能大批量生产；不存在安装误差，保证了测量精度。(2) The main structure of the present invention is made of silicon material, and silicon has the advantages of good electrical properties and mechanical properties. It is processed by MEMS (micro-electromechanical system) technology, has low cost, simple manufacturing process, and can be mass-produced; There is no installation error, which ensures the measurement accuracy.
(3)本发明不存在单片集成三轴机械加速度计总体尺寸较大，交叉轴干扰都比较严重，也不存在较大的安装误差和线路干扰的缺点，体积小，易收纳和运输。(3) The present invention does not have the disadvantages of large overall size of the single-chip integrated three-axis mechanical accelerometer, serious cross-axis interference, large installation error and line interference, and is small in size and easy to store and transport.
附图说明Description of drawings
图1为本发明的结构俯视图；Fig. 1 is a structural top view of the present invention;
图2为本发明中谐振器的结构俯视图；Fig. 2 is the top view of the structure of the resonator in the present invention;
图3为本发明中加工方法的流程图；Fig. 3 is the flowchart of processing method among the present invention;
图4为本发明的测量原理图。Fig. 4 is a measurement schematic diagram of the present invention.
具体实施方式detailed description
下面对本发明技术方案进行详细说明，但是本发明的保护范围不局限于所述实施例。The technical solutions of the present invention will be described in detail below, but the protection scope of the present invention is not limited to the embodiments.
如图1和图2所示，本发明的一种三轴单片集成谐振电容式硅微加速度计，包括玻璃基底1以及键合锚点悬浮设置于玻璃基底1表面中心位置的主结构；主结构包括敏感质量块框2、安装于敏感质量块框2中心位置的两个扭摆式质量块3、电容梳齿组4和四个谐振器5；两个扭摆式质量块3纵向排列放置，且每个扭摆式质量块3均由两个质量摆31横向连接构成，且每个扭摆式质量块3的左右两侧分别设置有电容梳齿组4；四个谐振器5分别通过杠杆机构6安装于敏感质量块框2四个顶角的外侧；玻璃基底1上设有与主结构电极相连的信号引线。As shown in Figures 1 and 2, a three-axis monolithic integrated resonant capacitive silicon micro-accelerometer of the present invention includes a glass substrate 1 and a main structure in which the bonding anchor point is suspended at the center of the surface of the glass substrate 1; The structure includes a sensitive mass frame 2, two torsion-type masses 3 installed in the center of the sensitive-mass frame 2, a capacitor comb group 4 and four resonators 5; the two torsion-type masses 3 are arranged vertically, and Each torsion-type mass 3 is composed of two mass pendulums 31 connected laterally, and the left and right sides of each torsion-type mass 3 are respectively provided with capacitor comb groups 4; the four resonators 5 are respectively installed through a lever mechanism 6 On the outer sides of the four vertices of the sensitive mass frame 2; the glass substrate 1 is provided with signal leads connected with the electrodes of the main structure.
其中，谐振器5可以测量X轴和Y轴方向上的加速度，电容梳齿组4可测量Z轴方向上的加速度。Wherein, the resonator 5 can measure the acceleration in the direction of the X axis and the Y axis, and the capacitor comb set 4 can measure the acceleration in the direction of the Z axis.
电容梳齿组4包括连接于扭摆式质量块3的活动电容梳齿41、以及通过支撑锚点键合于玻璃基底1的固定电容梳齿42，固定电容梳齿42和活动电容梳齿41的高度不同且共同构成变面积式电容检测，固定电容梳齿42下方的玻璃基底1上设有信号引线。The capacitor comb group 4 includes movable capacitor combs 41 connected to the torsion-type mass 3, fixed capacitor combs 42 bonded to the glass substrate 1 through support anchor points, fixed capacitor combs 42 and movable capacitor combs 41 The heights are different and together constitute a variable-area capacitive detection. Signal leads are provided on the glass substrate 1 below the fixed capacitance comb teeth 42 .
同一扭摆式质量块3两侧的活动电容梳齿41关于Y轴对称，不同扭摆式质量块3两侧的活动电容梳齿41关于X轴对称；两个扭摆式质量块3上对角线上的电容梳齿组4的电容相互差分，能够提高检测精度；且同一扭摆式质量块3的两个质量摆31之间通过扭杆32连接，所述扭杆32通过锚点固定于玻璃基底1。The movable capacitor combs 41 on both sides of the same torsion-type mass 3 are symmetrical about the Y axis, and the movable capacitor combs 41 on both sides of different torsion-type masses 3 are symmetrical about the X-axis; The capacitance of the capacitance comb group 4 is different from each other, which can improve the detection accuracy; and the two mass pendulums 31 of the same torsion-type mass 3 are connected by a torsion bar 32, and the torsion bar 32 is fixed to the glass substrate 1 through an anchor point .
谐振器5包括支撑梁、安装于支撑梁两端部的台肩52、以及梳齿架53，支撑梁由两个横向设置的谐振梁51组成，上谐振梁51的上端和下谐振梁51的下端对称设置有横向放置的活动梳齿53，活动梳齿53的上下两端分别设有通过支撑锚点键合于玻璃基底1上的外固定梳齿55和内固定梳齿54。The resonator 5 includes a support beam, shoulders 52 installed at both ends of the support beam, and a comb frame 53. The support beam is composed of two resonant beams 51 arranged transversely. The upper end of the upper resonant beam 51 and the bottom of the lower resonant beam 51 The lower end is symmetrically provided with laterally placed movable combs 53, and the upper and lower ends of the movable combs 53 are respectively provided with outer fixed combs 55 and inner fixed combs 54 bonded to the glass substrate 1 through supporting anchor points.
并且，两个谐振梁51之间的间距较小，外固定梳齿55为驱动端，而内固定梳齿54为检测端。Moreover, the distance between the two resonant beams 51 is small, the outer fixed comb 55 is the driving end, and the inner fixed comb 54 is the detecting end.
在四个谐振器5中，同一对角线上的两个谐振器5中心对称进而形成差分检测，提高检测精度；一侧的台肩52通过支撑锚点键合安装于玻璃基底1，另一侧的台肩52连接于杠杆61，而杠杆61属于整体杠杆机构6。Among the four resonators 5, the center of the two resonators 5 on the same diagonal is symmetrical to form a differential detection, which improves the detection accuracy; the shoulder 52 on one side is mounted on the glass substrate 1 through support anchor point bonding, and the other The lateral shoulder 52 is connected to the lever 61 which belongs to the integral lever mechanism 6 .
杠杆机构6包括杠杆61以及通过固定锚点设置于玻璃基底1上的U型梁62；X轴方向上的杠杆61纵向放置，且该方向上的杠杆61的一端通过梁杆8连接于敏感质量块框2的外侧，另一端连接于纵向放置的U型梁62，进而X轴方向上的杠杆61可在X方向上移动；同理，Y轴方向的杠杆61横向放置，且该方向上的杠杆61的一端通过梁杆8连接于敏感质量块框2的外侧，另一端连接于横向放置的U型梁62，进而Y轴方向上的杠杆61可在Y方向上移动。杠杆61上还设置有支杆7。The lever mechanism 6 includes a lever 61 and a U-shaped beam 62 arranged on the glass substrate 1 through a fixed anchor point; the lever 61 in the X-axis direction is placed longitudinally, and one end of the lever 61 in this direction is connected to the sensitive mass through the beam rod 8 The outside of the block frame 2, the other end is connected to the U-shaped beam 62 placed vertically, and then the lever 61 in the X-axis direction can move in the X direction; in the same way, the lever 61 in the Y-axis direction is placed horizontally, and the lever 61 in this direction One end of the lever 61 is connected to the outside of the sensitive mass frame 2 through the beam rod 8, and the other end is connected to the U-shaped beam 62 placed transversely, so that the lever 61 in the Y-axis direction can move in the Y-direction. A strut 7 is also arranged on the lever 61 .
其中，由于梁杆8很窄，沿其宽度和高度方向的刚度小，在与U型梁62的共同作用下，能够实现三个正交方向的自解耦，提高加速度的灵敏度和分辨率。Wherein, since the beam 8 is very narrow, the stiffness along its width and height directions is small, and under the joint action of the U-shaped beam 62, self-decoupling in three orthogonal directions can be realized, and the sensitivity and resolution of acceleration can be improved.
玻璃基底1由硼硅酸盐玻璃制成，主结构均由单晶硅材料制成。The glass substrate 1 is made of borosilicate glass, and the main structure is made of single crystal silicon material.
如图3所示，上述三轴单片集成谐振电容式硅微加速度计的加工方法，包括以下步骤：As shown in Figure 3, the processing method of the above-mentioned three-axis monolithic integrated resonant capacitive silicon micro-accelerometer includes the following steps:
(1)使用第一块掩膜板在玻璃基底1上光刻，将有信号引线的地方暴露出来；(1) use the first mask plate to photoetch on the glass substrate 1, and expose the place where there are signal leads;
(2)溅射金属铝作为信号引线，然后采用剥离技术去除光刻胶；(2) Sputter metal aluminum as the signal lead, and then remove the photoresist by stripping technology;
(3)在一块单晶硅片的背面使用第二块掩膜板进行光刻，并利用Bosch工艺刻蚀出锚点，然后去除光刻胶；(3) Use a second mask to perform photolithography on the back of a single crystal silicon wafer, and use the Bosch process to etch the anchor points, and then remove the photoresist;
(4)在通过步骤(3)刻蚀的硅结构层的背面利用第三块掩膜板进行光刻，并利用Bosch工艺刻蚀出一定深度的凹槽，然后去除光刻胶；(4) Utilize the third mask to carry out photolithography on the back side of the silicon structure layer etched by step (3), and utilize the Bosch process to etch a groove of a certain depth, and then remove the photoresist;
(5)将通过步骤(4)刻蚀的硅结构层与玻璃基底1上的锚点直接键合；(5) directly bonding the silicon structure layer etched by step (4) to the anchor point on the glass substrate 1;
(6)在硅结构层上利用第四块掩膜板部分遮光进行光刻，并采用Bosch工艺刻蚀刻蚀深槽，深槽的深度与步骤(3)中刻蚀的锚点厚度相同；(6) On the silicon structure layer, the fourth mask plate is used to partially shield light for photolithography, and the Bosch process is used to etch a deep groove, and the depth of the deep groove is the same as the thickness of the anchor point etched in step (3);
(7)将第五块掩膜板进行光刻，并采用Bosch工艺直到硅结构层上的深槽完全刻通停止，释放结构，最后去除光刻胶。(7) Perform photolithography on the fifth mask plate, and use the Bosch process until the deep grooves on the silicon structure layer are completely cut through to stop, release the structure, and finally remove the photoresist.
如图4所示，本发明中的三轴单片集成谐振电容式硅微加速度计的工作原理为：As shown in Figure 4, the operating principle of the three-axis monolithic integrated resonant capacitive silicon micro-accelerometer among the present invention is:
在X方向的线性谐振器5的外侧驱动固定电极上施加带直流偏置的交流驱动电压后，产生交变驱动力，在交变驱动力的作用下，谐振梁51将沿Y轴发生相向的简谐振动，接着将内侧的固定电极简谐振动信号检测出来，然后再将该信号反馈给驱动电压，形成闭环自激控制系统，该闭环自激控制系统的频率将锁定在谐振梁51的固有频率f0。After the AC driving voltage with DC bias is applied to the outer driving fixed electrode of the linear resonator 5 in the X direction, an alternating driving force is generated, and under the action of the alternating driving force, the resonant beam 51 will be opposite to each other along the Y axis. Simple harmonic vibration, then detect the simple harmonic vibration signal of the inner fixed electrode, and then feed back the signal to the driving voltage to form a closed-loop self-excited control system, the frequency of which will be locked at the inherent frequency of the resonant beam 51 frequency f 0 .
当敏感质量块框2受到沿X轴方向有加速度作用时，沿X轴方向运动，敏感质量块框2把加速度转换成惯性力，通过梁杆8传递到杠杆结构6进而放大输入力，被放大的输入力作用于谐振梁51上，使得谐振梁51的谐振频率fx发生变化。When the sensitive mass block frame 2 is subjected to acceleration along the X-axis direction, it moves along the X-axis direction, and the sensitive mass block frame 2 converts the acceleration into an inertial force, which is transmitted to the lever structure 6 through the beam rod 8 to amplify the input force and is amplified The input force acts on the resonant beam 51, so that the resonant frequency f x of the resonant beam 51 changes.
由于对角线上的两个谐振器5结构是对称的，因此当一个谐振器5受到拉力，谐振频率fx+增大，则另一个肯定是受到压力，谐振频率fx-减小。通过检测频率的变化量，并将这两个谐振器5结构的频率信号fx+与fx-差分得到fx，进而可以得到需要测量的沿X轴方向输入加速度ax的大小。这种完全对称的结构设计可以提高标度因数，并能消除温度等共模误差的影响。Since the structures of the two resonators 5 on the diagonal are symmetrical, when one resonator 5 is under tension, the resonant frequency f x+ increases, and the other must be under pressure, and the resonant frequency f x- decreases. By detecting the variation of the frequency and taking the difference between the frequency signals f x+ and f x- of the two resonator 5 structures to obtain f x , the magnitude of the input acceleration a x along the X-axis direction that needs to be measured can be obtained. This fully symmetrical structure design improves the scale factor and eliminates the effects of common-mode errors such as temperature.
本发明对Y轴方向的加速度的测量原理和X轴方向的加速度的测量原理是相同的。通过检测频率的变化量，并将这两个谐振器5结构的频率信号fy+与fy-差分得到fy，进而可以得到需要测量的沿Y轴方向输入加速度ay的大小。In the present invention, the measurement principle of the acceleration in the Y-axis direction is the same as the measurement principle of the acceleration in the X-axis direction. By detecting the variation of the frequency and taking the difference between the frequency signals f y+ and f y- of the two resonator 5 structures to obtain f y , the magnitude of the input acceleration a y along the Y-axis direction that needs to be measured can be obtained.
其中，由于U型梁62通过梁杆8与杠杆61相连，当Y轴方向有输入加速度时，扭摆式质量块3不会对X轴方向的谐振器5结构产生影响。同样，当X轴方向有输入加速度时，扭摆式质量块3不会对Y轴方向的谐振器5结构产生影响，因此这种全解耦的三轴集成谐振、电容式硅微加速度计能很好地隔离三个轴向的交叉耦合影响，使得测量信号更准确。Wherein, since the U-shaped beam 62 is connected to the lever 61 through the beam rod 8, when there is an input acceleration in the Y-axis direction, the torsion-type mass 3 will not affect the structure of the resonator 5 in the X-axis direction. Similarly, when there is an input acceleration in the X-axis direction, the torsion-type mass 3 will not affect the structure of the resonator 5 in the Y-axis direction, so this fully decoupled three-axis integrated resonant, capacitive silicon micro-accelerometer can be easily Good isolation of the cross-coupling effects of the three axes makes the measurement signal more accurate.
在Z方向有加速度时，对称的扭摆式质量块3的两个质量摆31绕连接于其之间的扭杆32转动，非对称的扭摆式质量块3的两个质量摆31绕扭杆32转动，从而导致第一、三象限的两个电容梳齿的变化量C3+C4和第二、四象限的两个电容梳齿组4的变化量C1+C2大小相等，方向相反，便于差分，通过检测电容的变化Vz来检测加速度az。When there is acceleration in the Z direction, the two mass pendulums 31 of the symmetrical torsion-type mass block 3 rotate around the torsion bar 32 connected therebetween, and the two mass pendulums 31 of the asymmetric torsion-type mass block 3 rotate around the torsion bar 32 Rotate, so that the variation C3+C4 of the two capacitance comb teeth in the first and third quadrants and the variation C1+C2 of the two capacitance comb teeth groups 4 in the second and fourth quadrants are equal in size and opposite in direction, which is convenient for difference. Acceleration az is detected by detecting the change in capacitance Vz .
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