CN104678714B - 定位装置、光刻装置和物品制造方法 - Google Patents

定位装置、光刻装置和物品制造方法 Download PDF

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Publication number
CN104678714B
CN104678714B CN201410707257.0A CN201410707257A CN104678714B CN 104678714 B CN104678714 B CN 104678714B CN 201410707257 A CN201410707257 A CN 201410707257A CN 104678714 B CN104678714 B CN 104678714B
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China
Prior art keywords
measuring device
moving body
setting value
control parameter
unit
Prior art date
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CN201410707257.0A
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English (en)
Chinese (zh)
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CN104678714A (zh
Inventor
山田雅教
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Canon Inc
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Canon Inc
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Publication of CN104678714A publication Critical patent/CN104678714A/zh
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201410707257.0A 2013-11-29 2014-11-28 定位装置、光刻装置和物品制造方法 Active CN104678714B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-247124 2013-11-29
JP2013247124A JP6109049B2 (ja) 2013-11-29 2013-11-29 処理装置、位置決め装置の制御方法、物品の製造方法

Publications (2)

Publication Number Publication Date
CN104678714A CN104678714A (zh) 2015-06-03
CN104678714B true CN104678714B (zh) 2018-07-10

Family

ID=53265218

Family Applications (1)

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CN201410707257.0A Active CN104678714B (zh) 2013-11-29 2014-11-28 定位装置、光刻装置和物品制造方法

Country Status (4)

Country Link
US (1) US9523569B2 (enExample)
JP (1) JP6109049B2 (enExample)
KR (1) KR101781253B1 (enExample)
CN (1) CN104678714B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6806509B2 (ja) * 2016-09-15 2021-01-06 キヤノン株式会社 露光装置及び物品の製造方法
CN108121166B (zh) * 2016-11-30 2020-01-24 上海微电子装备（集团）股份有限公司 一种主动吸振器及微动台
JP6338647B2 (ja) * 2016-12-21 2018-06-06 キヤノン株式会社 パターニング装置、位置決め装置の制御方法、物品の製造方法
CN107728435B (zh) * 2017-11-14 2020-03-27 扬州扬杰电子科技股份有限公司 一种硅晶片光刻曝光方法
CN108326637A (zh) * 2018-02-09 2018-07-27 江苏瑞苏科技有限公司 一种cnc高速加工中心用传动装置
CN113029009B (zh) * 2021-04-30 2022-08-02 高速铁路建造技术国家工程实验室 一种双视角视觉位移测量系统及方法
CN116934845B (zh) * 2023-07-05 2025-09-16 中国电信股份有限公司技术创新中心 定位方法、装置、设备、系统、存储介质和程序产品

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3762307B2 (ja) * 2001-02-15 2006-04-05 キヤノン株式会社 レーザ干渉干渉計システムを含む露光装置
JP3826042B2 (ja) * 2002-01-30 2006-09-27 キヤノン株式会社 ステージ装置、それを用いた半導体露光装置および位置計測方法
JP3907497B2 (ja) 2002-03-01 2007-04-18 キヤノン株式会社 位置決め装置及びその制御方法、並びに露光装置、並びにその制御方法により制御される露光装置により半導体デバイスを製造する製造方法
JP2004140290A (ja) * 2002-10-21 2004-05-13 Canon Inc ステージ装置
JP2005123255A (ja) 2003-10-14 2005-05-12 Canon Inc 位置決め装置
JP4429037B2 (ja) * 2004-02-27 2010-03-10 キヤノン株式会社 ステージ装置及びその制御方法
JP2006222312A (ja) 2005-02-10 2006-08-24 Canon Inc ステージ制御装置及びその方法、ステージ装置並びに露光装置
EP1983555B1 (en) 2006-01-19 2014-05-28 Nikon Corporation Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus and device manufacturing method
KR101495471B1 (ko) 2006-02-21 2015-02-23 가부시키가이샤 니콘 패턴 형성 장치, 마크 검출 장치, 노광 장치, 패턴 형성 방법, 노광 방법 및 디바이스 제조 방법
TWI622084B (zh) 2006-09-01 2018-04-21 Nikon Corp Mobile body driving method, moving body driving system, pattern forming method and device, exposure method and device, component manufacturing method, and correction method
JP2008108906A (ja) * 2006-10-25 2008-05-08 Canon Inc 位置決め装置
US8547527B2 (en) * 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
JP2010034331A (ja) * 2008-07-29 2010-02-12 Canon Inc 露光装置およびデバイス製造方法

Also Published As

Publication number Publication date
US9523569B2 (en) 2016-12-20
US20150153655A1 (en) 2015-06-04
CN104678714A (zh) 2015-06-03
KR101781253B1 (ko) 2017-10-10
JP6109049B2 (ja) 2017-04-05
KR20150063000A (ko) 2015-06-08
JP2015106606A (ja) 2015-06-08

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