CN104231192A - 聚(环己基乙烯)-聚丙烯酸酯嵌段共聚物,其制造方法及包括其的制品 - Google Patents

聚(环己基乙烯)-聚丙烯酸酯嵌段共聚物,其制造方法及包括其的制品 Download PDF

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Publication number
CN104231192A
CN104231192A CN201410235367.1A CN201410235367A CN104231192A CN 104231192 A CN104231192 A CN 104231192A CN 201410235367 A CN201410235367 A CN 201410235367A CN 104231192 A CN104231192 A CN 104231192A
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CN
China
Prior art keywords
block
block copolymer
copolymer
pche
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410235367.1A
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English (en)
Chinese (zh)
Inventor
P·D·胡斯塔德
F·S·贝茨
M·A·希尔姆耶
J·G·肯纳姆
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Minnesota Twin Cities
Dow Global Technologies LLC
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University of Minnesota Twin Cities
Dow Global Technologies LLC
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Filing date
Publication date
Application filed by University of Minnesota Twin Cities, Dow Global Technologies LLC filed Critical University of Minnesota Twin Cities
Publication of CN104231192A publication Critical patent/CN104231192A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/12—Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
CN201410235367.1A 2013-06-07 2014-05-29 聚(环己基乙烯)-聚丙烯酸酯嵌段共聚物,其制造方法及包括其的制品 Pending CN104231192A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/912,797 US10202479B2 (en) 2013-06-07 2013-06-07 Poly(cyclohexylethylene)-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same
US13/912,797 2013-06-07

Publications (1)

Publication Number Publication Date
CN104231192A true CN104231192A (zh) 2014-12-24

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410235367.1A Pending CN104231192A (zh) 2013-06-07 2014-05-29 聚(环己基乙烯)-聚丙烯酸酯嵌段共聚物,其制造方法及包括其的制品

Country Status (5)

Country Link
US (1) US10202479B2 (https=)
JP (1) JP6574083B2 (https=)
KR (1) KR101631561B1 (https=)
CN (1) CN104231192A (https=)
TW (1) TWI525117B (https=)

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CN112203750A (zh) * 2018-06-01 2021-01-08 3M创新有限公司 包含三嵌段共聚物的多孔膜
CN116284517A (zh) * 2022-09-08 2023-06-23 上海八亿时空先进材料有限公司 一种分子量窄分布且高透光性phs树脂及其合成方法与应用

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JP6446195B2 (ja) * 2013-07-31 2018-12-26 東京応化工業株式会社 相分離構造体の製造方法、パターン形成方法及び微細パターン形成方法
KR20160060223A (ko) * 2014-11-19 2016-05-30 삼성디스플레이 주식회사 미세 패턴 형성 방법
US10780685B2 (en) 2015-03-18 2020-09-22 Riken Technos Corporation Hard coat laminated film
CN107428143B (zh) * 2015-03-18 2019-09-20 理研科技株式会社 硬涂层层叠膜
EP3272513B1 (en) 2015-03-18 2022-06-01 Riken Technos Corporation Molded body
US11352473B2 (en) 2015-03-18 2022-06-07 Riken Technos Corporation Hard coat laminated film and method for producing same
US11433651B2 (en) 2015-03-18 2022-09-06 Riken Technos Corporation Hard coat laminated film
PH12017501474B1 (en) 2015-03-18 2024-05-15 Riken Technos Corp Anti-glare hard coat laminated film
WO2016147716A1 (ja) 2015-03-18 2016-09-22 リケンテクノス株式会社 粘着フィルム
CN107849201B (zh) * 2015-08-21 2021-05-14 株式会社日本触媒 嵌段共聚物
KR102402958B1 (ko) 2015-11-11 2022-05-27 삼성전자주식회사 반도체 장치의 패턴 형성 방법 및 반도체 장치의 제조 방법
JP6599789B2 (ja) * 2015-11-25 2019-10-30 リケンテクノス株式会社 ハードコート積層フィルム
US11774166B2 (en) 2015-11-25 2023-10-03 Riken Technos Corporation Door body
TWI745316B (zh) 2015-11-25 2021-11-11 日商理研科技股份有限公司 門體
JP6644534B2 (ja) 2015-12-08 2020-02-12 リケンテクノス株式会社 ハードコート積層フィルム
US10414953B2 (en) 2016-02-19 2019-09-17 Avery Dennison Corporation Two stage methods for processing adhesives and related compositions
EP3808800B1 (en) 2016-09-14 2022-01-05 Riken Technos Corporation Hard coat laminated film
CN110099939B (zh) 2016-10-25 2022-09-06 艾利丹尼森公司 在主链中具有光引发剂基团的嵌段聚合物及其用于粘合剂组合物中的用途
JP7064313B2 (ja) 2016-11-25 2022-05-10 リケンテクノス株式会社 ハードコート積層フィルム
CN110291124B (zh) 2017-02-17 2021-06-25 3M创新有限公司 三嵌段共聚物
JP2018154760A (ja) * 2017-03-17 2018-10-04 東芝メモリ株式会社 パターン形成材料及びパターン形成方法
AU2018392478B2 (en) 2017-12-19 2023-03-16 Avery Dennison Corporation Post-polymerization functionalization of pendant functional groups

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CN112203750A (zh) * 2018-06-01 2021-01-08 3M创新有限公司 包含三嵌段共聚物的多孔膜
CN116284517A (zh) * 2022-09-08 2023-06-23 上海八亿时空先进材料有限公司 一种分子量窄分布且高透光性phs树脂及其合成方法与应用

Also Published As

Publication number Publication date
TW201509970A (zh) 2015-03-16
JP2014237817A (ja) 2014-12-18
KR101631561B1 (ko) 2016-06-20
US20140360975A1 (en) 2014-12-11
TWI525117B (zh) 2016-03-11
JP6574083B2 (ja) 2019-09-11
US10202479B2 (en) 2019-02-12
KR20140143715A (ko) 2014-12-17

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Application publication date: 20141224