CN104054171B - 用于基板接合的平坦化基板表面 - Google Patents
用于基板接合的平坦化基板表面 Download PDFInfo
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- CN104054171B CN104054171B CN201280053476.0A CN201280053476A CN104054171B CN 104054171 B CN104054171 B CN 104054171B CN 201280053476 A CN201280053476 A CN 201280053476A CN 104054171 B CN104054171 B CN 104054171B
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Classifications
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- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13062—Junction field-effect transistor [JFET]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2924/15788—Glasses, e.g. amorphous oxides, nitrides or fluorides
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Geometry (AREA)
- Ceramic Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Wire Bonding (AREA)
Abstract
Description
Claims (20)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/285,443 | 2011-10-31 | ||
US13/285,443 US8778737B2 (en) | 2011-10-31 | 2011-10-31 | Flattened substrate surface for substrate bonding |
PCT/US2012/049414 WO2013066455A2 (en) | 2011-10-31 | 2012-08-03 | Flattened substrate surface for substrate bonding |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104054171A CN104054171A (zh) | 2014-09-17 |
CN104054171B true CN104054171B (zh) | 2017-11-07 |
Family
ID=48171554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201280053476.0A Active CN104054171B (zh) | 2011-10-31 | 2012-08-03 | 用于基板接合的平坦化基板表面 |
Country Status (5)
Country | Link |
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US (2) | US8778737B2 (zh) |
CN (1) | CN104054171B (zh) |
DE (1) | DE112012004106B4 (zh) |
GB (1) | GB2509683B (zh) |
WO (1) | WO2013066455A2 (zh) |
Families Citing this family (19)
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US20130193489A1 (en) * | 2012-01-30 | 2013-08-01 | Globalfoundries Inc. | Integrated circuits including copper local interconnects and methods for the manufacture thereof |
US8907488B2 (en) * | 2012-12-28 | 2014-12-09 | Broadcom Corporation | Microbump and sacrificial pad pattern |
US9263511B2 (en) * | 2013-02-11 | 2016-02-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | Package with metal-insulator-metal capacitor and method of manufacturing the same |
US9691686B2 (en) | 2014-05-28 | 2017-06-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Contact pad for semiconductor device |
US10043769B2 (en) | 2015-06-03 | 2018-08-07 | Micron Technology, Inc. | Semiconductor devices including dummy chips |
US9679772B2 (en) | 2015-10-15 | 2017-06-13 | International Business Machines Corporation | Method for handling thin brittle films |
US10050102B2 (en) * | 2016-01-15 | 2018-08-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor device and manufacturing method thereof |
DE102017127920A1 (de) | 2017-01-26 | 2018-07-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Erhöhte Durchkontaktierung für Anschlüsse auf unterschiedlichen Ebenen |
US10297494B2 (en) | 2017-01-26 | 2019-05-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Raised via for terminal connections on different planes |
DE102018124695A1 (de) * | 2017-11-15 | 2019-05-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | Integrieren von Passivvorrichtungen in Package-Strukturen |
US10535636B2 (en) * | 2017-11-15 | 2020-01-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Integrating passive devices in package structures |
US10515874B2 (en) | 2017-11-30 | 2019-12-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and method of manufacture |
US10622302B2 (en) | 2018-02-14 | 2020-04-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Via for semiconductor device connection and methods of forming the same |
DE102018126130B4 (de) | 2018-06-08 | 2023-08-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Halbleitervorrichtung und -verfahren |
US11158775B2 (en) | 2018-06-08 | 2021-10-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and method |
US10992100B2 (en) | 2018-07-06 | 2021-04-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and method |
US20200194459A1 (en) * | 2018-12-18 | 2020-06-18 | Vanguard International Semiconductor Corporation | Semiconductor devices and methods for fabricating the same |
US11308257B1 (en) | 2020-12-15 | 2022-04-19 | International Business Machines Corporation | Stacked via rivets in chip hotspots |
FR3126542A1 (fr) * | 2021-08-27 | 2023-03-03 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Procédé de fabrication d'un circuit électronique pour auto-assemblage à un autre circuit électronique |
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2011
- 2011-10-31 US US13/285,443 patent/US8778737B2/en active Active
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2012
- 2012-08-03 CN CN201280053476.0A patent/CN104054171B/zh active Active
- 2012-08-03 DE DE112012004106.2T patent/DE112012004106B4/de not_active Expired - Fee Related
- 2012-08-03 WO PCT/US2012/049414 patent/WO2013066455A2/en active Application Filing
- 2012-08-03 GB GB1408711.8A patent/GB2509683B/en not_active Expired - Fee Related
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2014
- 2014-04-01 US US14/242,203 patent/US9355936B2/en active Active
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CN1387237A (zh) * | 2001-05-22 | 2002-12-25 | 华邦电子股份有限公司 | 薄膜沉积与平坦化工艺 |
CN101431058A (zh) * | 2007-11-09 | 2009-05-13 | 株式会社瑞萨科技 | 半导体器件及其制造方法 |
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Also Published As
Publication number | Publication date |
---|---|
US20130105981A1 (en) | 2013-05-02 |
WO2013066455A2 (en) | 2013-05-10 |
CN104054171A (zh) | 2014-09-17 |
GB201408711D0 (en) | 2014-07-02 |
DE112012004106B4 (de) | 2018-06-14 |
WO2013066455A3 (en) | 2014-05-08 |
GB2509683A (en) | 2014-07-09 |
US9355936B2 (en) | 2016-05-31 |
US20140209908A1 (en) | 2014-07-31 |
US8778737B2 (en) | 2014-07-15 |
DE112012004106T5 (de) | 2014-07-10 |
GB2509683B (en) | 2015-07-29 |
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