CN103858204B - 检查或观察装置及试样的检查或观察方法 - Google Patents

检查或观察装置及试样的检查或观察方法 Download PDF

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Publication number
CN103858204B
CN103858204B CN201280048835.3A CN201280048835A CN103858204B CN 103858204 B CN103858204 B CN 103858204B CN 201280048835 A CN201280048835 A CN 201280048835A CN 103858204 B CN103858204 B CN 103858204B
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China
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sample
charged particle
space
optical
profile type
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Expired - Fee Related
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CN201280048835.3A
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English (en)
Chinese (zh)
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CN103858204A (zh
Inventor
大南祐介
许斐麻美
伊东祐博
大泷智久
河西晋佐
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Hitachi Ltd
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Hitachi Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/204—Means for introducing and/or outputting objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN201280048835.3A 2011-10-05 2012-09-03 检查或观察装置及试样的检查或观察方法 Expired - Fee Related CN103858204B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011220606A JP5825964B2 (ja) 2011-10-05 2011-10-05 検査又は観察装置及び試料の検査又は観察方法
JP2011-220606 2011-10-05
PCT/JP2012/072290 WO2013051357A1 (ja) 2011-10-05 2012-09-03 検査又は観察装置及び試料の検査又は観察方法

Publications (2)

Publication Number Publication Date
CN103858204A CN103858204A (zh) 2014-06-11
CN103858204B true CN103858204B (zh) 2016-06-08

Family

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Family Applications (1)

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CN201280048835.3A Expired - Fee Related CN103858204B (zh) 2011-10-05 2012-09-03 检查或观察装置及试样的检查或观察方法

Country Status (6)

Country Link
US (2) US8933400B2 (enExample)
JP (1) JP5825964B2 (enExample)
KR (2) KR101566646B1 (enExample)
CN (1) CN103858204B (enExample)
DE (1) DE112012003809B4 (enExample)
WO (1) WO2013051357A1 (enExample)

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JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法
DE112014001109B4 (de) * 2013-04-12 2019-11-14 Hitachi High-Technologies Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Filterelement
CN105247650A (zh) * 2013-05-30 2016-01-13 株式会社日立高新技术 带电粒子束装置、试样观察方法
JP6302702B2 (ja) * 2014-02-27 2018-03-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡および画像生成方法
DE102014103360A1 (de) 2014-03-12 2015-09-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Vorrichtung für die korrelative Raster-Transmissionselektronenmikroskopie (STEM) und Lichtmikroskopie
JP6255305B2 (ja) * 2014-05-19 2017-12-27 株式会社レナ・システムズ 光学顕微装置
DE102014108331A1 (de) 2014-06-13 2015-12-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Spezifische Proteinmarkierung sowie Verfahren zur Identifizierung der statistischen Verteilung der Proteinstöchiometrie
DE102014108825A1 (de) * 2014-06-24 2015-12-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Vorrichtung und Verfahren für die stöchiometrische Analyse von Proben
CN105651696B (zh) * 2014-11-28 2019-05-14 财团法人工业技术研究院 检测仪器及其检测方法
US10177048B2 (en) * 2015-03-04 2019-01-08 Applied Materials Israel Ltd. System for inspecting and reviewing a sample
US10008361B2 (en) * 2015-04-28 2018-06-26 Hitachi High-Technologies Corporation Charged particle beam device and installation method
CN107710377B (zh) * 2015-06-29 2019-09-06 株式会社日立高新技术 试样高度调整方法及观察系统
CN107664834A (zh) * 2017-11-07 2018-02-06 西北农林科技大学 一种超声电机驱动的光学显微镜及其操作方法
US11294164B2 (en) 2019-07-26 2022-04-05 Applied Materials Israel Ltd. Integrated system and method
WO2021251026A1 (ja) * 2020-06-09 2021-12-16 国立研究開発法人物質・材料研究機構 観測対象ガスの観測装置及び観測対象イオンの観測方法並びに試料ホルダ
JP7493101B2 (ja) * 2021-04-13 2024-05-30 株式会社日立ハイテク 透過型電子顕微鏡

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CN1662839A (zh) * 2002-06-17 2005-08-31 塞威公司 用于对由显微镜进行研究的试样执行操作的模块操作系统
US20050218325A1 (en) * 2004-04-05 2005-10-06 Hidetoshi Nishiyama Inspection method and inspection system using charged particle beam
CN201464332U (zh) * 2009-08-04 2010-05-12 山东理工大学 高安全性扫描电镜样品台
US20100140470A1 (en) * 2006-10-24 2010-06-10 Dov Shachal Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
CN101916706A (zh) * 2010-08-03 2010-12-15 深圳市金洲精工科技股份有限公司 一种扫描电镜样品台及扫描电镜

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JP2008300354A (ja) * 2007-05-31 2008-12-11 Fei Co 荷電粒子装置内での試料キャリアの使用、当該試料キャリアの使用方法、及び当該試料キャリアを用いるように備えられた装置
WO2010001399A1 (en) * 2008-07-03 2010-01-07 B-Nano A scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
JP2010080144A (ja) * 2008-09-25 2010-04-08 Lasertec Corp 複合型顕微鏡装置及び試料観察方法
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JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020027440A1 (en) * 1996-03-05 2002-03-07 Hitachi, Ltd. Method and apparatus for inspecting integrated circuit pattern
CN1662839A (zh) * 2002-06-17 2005-08-31 塞威公司 用于对由显微镜进行研究的试样执行操作的模块操作系统
US20050218325A1 (en) * 2004-04-05 2005-10-06 Hidetoshi Nishiyama Inspection method and inspection system using charged particle beam
US20100140470A1 (en) * 2006-10-24 2010-06-10 Dov Shachal Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
CN201464332U (zh) * 2009-08-04 2010-05-12 山东理工大学 高安全性扫描电镜样品台
CN101916706A (zh) * 2010-08-03 2010-12-15 深圳市金洲精工科技股份有限公司 一种扫描电镜样品台及扫描电镜

Also Published As

Publication number Publication date
KR101589400B1 (ko) 2016-01-29
KR20140071407A (ko) 2014-06-11
US20150083908A1 (en) 2015-03-26
KR20140146233A (ko) 2014-12-24
US9236217B2 (en) 2016-01-12
DE112012003809B4 (de) 2017-04-13
JP5825964B2 (ja) 2015-12-02
US20140246583A1 (en) 2014-09-04
JP2013080642A (ja) 2013-05-02
DE112012003809T5 (de) 2014-06-05
CN103858204A (zh) 2014-06-11
US8933400B2 (en) 2015-01-13
WO2013051357A1 (ja) 2013-04-11
KR101566646B1 (ko) 2015-11-05

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