DE112012003809B4 - Untersuchungs- und Betrachtungsvorrichtung und Probenuntersuchungs- und Betrachtungsverfahren - Google Patents

Untersuchungs- und Betrachtungsvorrichtung und Probenuntersuchungs- und Betrachtungsverfahren Download PDF

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Publication number
DE112012003809B4
DE112012003809B4 DE112012003809.6T DE112012003809T DE112012003809B4 DE 112012003809 B4 DE112012003809 B4 DE 112012003809B4 DE 112012003809 T DE112012003809 T DE 112012003809T DE 112012003809 B4 DE112012003809 B4 DE 112012003809B4
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Germany
Prior art keywords
sample
charged particle
space
optical
observation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE112012003809.6T
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German (de)
English (en)
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DE112012003809T5 (de
Inventor
c/o Hitachi High-Techno. Corp. Kawanishi Shinsuke
c/o Hitachi High-Techno. Corp. Ominami Yusuke
c/o Hitachi High-Techno. Corp. Konomi Mami
c/o Hitachi High-Techno. Corp. Ito Sukehiro
c/o Hitachi High-Techno. Corp. Ohtaki Tomohisa
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
Hitachi High Tech Corp
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Publication of DE112012003809T5 publication Critical patent/DE112012003809T5/de
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Publication of DE112012003809B4 publication Critical patent/DE112012003809B4/de
Expired - Fee Related legal-status Critical Current
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/204—Means for introducing and/or outputting objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE112012003809.6T 2011-10-05 2012-09-03 Untersuchungs- und Betrachtungsvorrichtung und Probenuntersuchungs- und Betrachtungsverfahren Expired - Fee Related DE112012003809B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011220606A JP5825964B2 (ja) 2011-10-05 2011-10-05 検査又は観察装置及び試料の検査又は観察方法
JP2011-220606 2011-10-05
PCT/JP2012/072290 WO2013051357A1 (ja) 2011-10-05 2012-09-03 検査又は観察装置及び試料の検査又は観察方法

Publications (2)

Publication Number Publication Date
DE112012003809T5 DE112012003809T5 (de) 2014-06-05
DE112012003809B4 true DE112012003809B4 (de) 2017-04-13

Family

ID=48043525

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112012003809.6T Expired - Fee Related DE112012003809B4 (de) 2011-10-05 2012-09-03 Untersuchungs- und Betrachtungsvorrichtung und Probenuntersuchungs- und Betrachtungsverfahren

Country Status (6)

Country Link
US (2) US8933400B2 (enExample)
JP (1) JP5825964B2 (enExample)
KR (2) KR101566646B1 (enExample)
CN (1) CN103858204B (enExample)
DE (1) DE112012003809B4 (enExample)
WO (1) WO2013051357A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112014001109B4 (de) * 2013-04-12 2019-11-14 Hitachi High-Technologies Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Filterelement

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* Cited by examiner, † Cited by third party
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JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法
CN105247650A (zh) * 2013-05-30 2016-01-13 株式会社日立高新技术 带电粒子束装置、试样观察方法
JP6302702B2 (ja) * 2014-02-27 2018-03-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡および画像生成方法
DE102014103360A1 (de) 2014-03-12 2015-09-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Vorrichtung für die korrelative Raster-Transmissionselektronenmikroskopie (STEM) und Lichtmikroskopie
JP6255305B2 (ja) * 2014-05-19 2017-12-27 株式会社レナ・システムズ 光学顕微装置
DE102014108331A1 (de) 2014-06-13 2015-12-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Spezifische Proteinmarkierung sowie Verfahren zur Identifizierung der statistischen Verteilung der Proteinstöchiometrie
DE102014108825A1 (de) * 2014-06-24 2015-12-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Vorrichtung und Verfahren für die stöchiometrische Analyse von Proben
CN105651696B (zh) * 2014-11-28 2019-05-14 财团法人工业技术研究院 检测仪器及其检测方法
US10177048B2 (en) * 2015-03-04 2019-01-08 Applied Materials Israel Ltd. System for inspecting and reviewing a sample
US10008361B2 (en) * 2015-04-28 2018-06-26 Hitachi High-Technologies Corporation Charged particle beam device and installation method
CN107710377B (zh) * 2015-06-29 2019-09-06 株式会社日立高新技术 试样高度调整方法及观察系统
CN107664834A (zh) * 2017-11-07 2018-02-06 西北农林科技大学 一种超声电机驱动的光学显微镜及其操作方法
US11294164B2 (en) 2019-07-26 2022-04-05 Applied Materials Israel Ltd. Integrated system and method
WO2021251026A1 (ja) * 2020-06-09 2021-12-16 国立研究開発法人物質・材料研究機構 観測対象ガスの観測装置及び観測対象イオンの観測方法並びに試料ホルダ
JP7493101B2 (ja) * 2021-04-13 2024-05-30 株式会社日立ハイテク 透過型電子顕微鏡

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US20030102436A1 (en) * 2000-03-20 2003-06-05 Gerard Benas-Sayag Column simultaneously focusing a particle beam and an optical beam
US20080296499A1 (en) * 2007-05-31 2008-12-04 Fei Company Charged Particle Instrument Equipped with Optical Microscope
WO2010001399A1 (en) * 2008-07-03 2010-01-07 B-Nano A scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
US20100243888A1 (en) * 2009-03-26 2010-09-30 Jeol Ltd. Apparatus and Method for Inspecting Samples
DE102010011898A1 (de) * 2010-03-18 2011-09-22 Carl Zeiss Nts Gmbh Inspektionssystem

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JP2000228166A (ja) * 1999-02-05 2000-08-15 Horon:Kk 試料観察装置
US6563570B1 (en) * 1999-05-17 2003-05-13 Nikon Corporation Apparatus for evaluating a sample including a self-supporting thin film
US6407373B1 (en) * 1999-06-15 2002-06-18 Applied Materials, Inc. Apparatus and method for reviewing defects on an object
EP1116932A3 (de) 2000-01-14 2003-04-16 Leica Microsystems Wetzlar GmbH Messgerät und Verfahren zun Vermessen von Strukturen auf einem Substrat
US6891170B1 (en) * 2002-06-17 2005-05-10 Zyvex Corporation Modular manipulation system for manipulating a sample under study with a microscope
JP2005026530A (ja) * 2003-07-04 2005-01-27 Jeol Ltd 試料ホルダ移動機構及び真空装置並びに荷電粒子ビーム装置
JP4528014B2 (ja) * 2004-04-05 2010-08-18 株式会社日立ハイテクノロジーズ 試料検査方法
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
TW200639901A (en) * 2005-05-09 2006-11-16 Li Bing Huan Device for operating gas in vacuum or low-pressure environment and for observation of the operation
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JP2008153086A (ja) 2006-12-19 2008-07-03 Jeol Ltd 試料検査装置及び試料検査方法並びに試料検査システム
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JP2010080144A (ja) * 2008-09-25 2010-04-08 Lasertec Corp 複合型顕微鏡装置及び試料観察方法
CN201464332U (zh) * 2009-08-04 2010-05-12 山东理工大学 高安全性扫描电镜样品台
CN101916706B (zh) * 2010-08-03 2013-09-04 深圳市金洲精工科技股份有限公司 一种扫描电镜样品台及扫描电镜
JP5707286B2 (ja) * 2011-09-21 2015-04-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法。
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030102436A1 (en) * 2000-03-20 2003-06-05 Gerard Benas-Sayag Column simultaneously focusing a particle beam and an optical beam
US20080296499A1 (en) * 2007-05-31 2008-12-04 Fei Company Charged Particle Instrument Equipped with Optical Microscope
WO2010001399A1 (en) * 2008-07-03 2010-01-07 B-Nano A scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
US20100243888A1 (en) * 2009-03-26 2010-09-30 Jeol Ltd. Apparatus and Method for Inspecting Samples
DE102010011898A1 (de) * 2010-03-18 2011-09-22 Carl Zeiss Nts Gmbh Inspektionssystem

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112014001109B4 (de) * 2013-04-12 2019-11-14 Hitachi High-Technologies Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Filterelement

Also Published As

Publication number Publication date
KR101589400B1 (ko) 2016-01-29
KR20140071407A (ko) 2014-06-11
US20150083908A1 (en) 2015-03-26
KR20140146233A (ko) 2014-12-24
US9236217B2 (en) 2016-01-12
CN103858204B (zh) 2016-06-08
JP5825964B2 (ja) 2015-12-02
US20140246583A1 (en) 2014-09-04
JP2013080642A (ja) 2013-05-02
DE112012003809T5 (de) 2014-06-05
CN103858204A (zh) 2014-06-11
US8933400B2 (en) 2015-01-13
WO2013051357A1 (ja) 2013-04-11
KR101566646B1 (ko) 2015-11-05

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