KR101566646B1 - 검사 또는 관찰 장치 및 시료의 검사 또는 관찰 방법 - Google Patents

검사 또는 관찰 장치 및 시료의 검사 또는 관찰 방법 Download PDF

Info

Publication number
KR101566646B1
KR101566646B1 KR1020147008793A KR20147008793A KR101566646B1 KR 101566646 B1 KR101566646 B1 KR 101566646B1 KR 1020147008793 A KR1020147008793 A KR 1020147008793A KR 20147008793 A KR20147008793 A KR 20147008793A KR 101566646 B1 KR101566646 B1 KR 101566646B1
Authority
KR
South Korea
Prior art keywords
sample
charged particle
space
housing
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020147008793A
Other languages
English (en)
Korean (ko)
Other versions
KR20140071407A (ko
Inventor
유스께 오미나미
마미 고노미
스께히로 이또
도모히사 오따끼
신스께 가와니시
Original Assignee
가부시키가이샤 히다치 하이테크놀로지즈
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 히다치 하이테크놀로지즈 filed Critical 가부시키가이샤 히다치 하이테크놀로지즈
Publication of KR20140071407A publication Critical patent/KR20140071407A/ko
Application granted granted Critical
Publication of KR101566646B1 publication Critical patent/KR101566646B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/204—Means for introducing and/or outputting objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020147008793A 2011-10-05 2012-09-03 검사 또는 관찰 장치 및 시료의 검사 또는 관찰 방법 Expired - Fee Related KR101566646B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2011-220606 2011-10-05
JP2011220606A JP5825964B2 (ja) 2011-10-05 2011-10-05 検査又は観察装置及び試料の検査又は観察方法
PCT/JP2012/072290 WO2013051357A1 (ja) 2011-10-05 2012-09-03 検査又は観察装置及び試料の検査又は観察方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020147034116A Division KR101589400B1 (ko) 2011-10-05 2012-09-03 시료 관찰 방법

Publications (2)

Publication Number Publication Date
KR20140071407A KR20140071407A (ko) 2014-06-11
KR101566646B1 true KR101566646B1 (ko) 2015-11-05

Family

ID=48043525

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020147008793A Expired - Fee Related KR101566646B1 (ko) 2011-10-05 2012-09-03 검사 또는 관찰 장치 및 시료의 검사 또는 관찰 방법
KR1020147034116A Expired - Fee Related KR101589400B1 (ko) 2011-10-05 2012-09-03 시료 관찰 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020147034116A Expired - Fee Related KR101589400B1 (ko) 2011-10-05 2012-09-03 시료 관찰 방법

Country Status (6)

Country Link
US (2) US8933400B2 (enExample)
JP (1) JP5825964B2 (enExample)
KR (2) KR101566646B1 (enExample)
CN (1) CN103858204B (enExample)
DE (1) DE112012003809B4 (enExample)
WO (1) WO2013051357A1 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法
DE112014001109B4 (de) * 2013-04-12 2019-11-14 Hitachi High-Technologies Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Filterelement
CN105247650A (zh) * 2013-05-30 2016-01-13 株式会社日立高新技术 带电粒子束装置、试样观察方法
JP6302702B2 (ja) * 2014-02-27 2018-03-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡および画像生成方法
DE102014103360A1 (de) 2014-03-12 2015-09-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Vorrichtung für die korrelative Raster-Transmissionselektronenmikroskopie (STEM) und Lichtmikroskopie
JP6255305B2 (ja) * 2014-05-19 2017-12-27 株式会社レナ・システムズ 光学顕微装置
DE102014108331A1 (de) 2014-06-13 2015-12-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Spezifische Proteinmarkierung sowie Verfahren zur Identifizierung der statistischen Verteilung der Proteinstöchiometrie
DE102014108825A1 (de) * 2014-06-24 2015-12-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Vorrichtung und Verfahren für die stöchiometrische Analyse von Proben
CN105651696B (zh) * 2014-11-28 2019-05-14 财团法人工业技术研究院 检测仪器及其检测方法
US10177048B2 (en) * 2015-03-04 2019-01-08 Applied Materials Israel Ltd. System for inspecting and reviewing a sample
US10008361B2 (en) * 2015-04-28 2018-06-26 Hitachi High-Technologies Corporation Charged particle beam device and installation method
CN107710377B (zh) * 2015-06-29 2019-09-06 株式会社日立高新技术 试样高度调整方法及观察系统
CN107664834A (zh) * 2017-11-07 2018-02-06 西北农林科技大学 一种超声电机驱动的光学显微镜及其操作方法
US11294164B2 (en) 2019-07-26 2022-04-05 Applied Materials Israel Ltd. Integrated system and method
WO2021251026A1 (ja) * 2020-06-09 2021-12-16 国立研究開発法人物質・材料研究機構 観測対象ガスの観測装置及び観測対象イオンの観測方法並びに試料ホルダ
JP7493101B2 (ja) * 2021-04-13 2024-05-30 株式会社日立ハイテク 透過型電子顕微鏡

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005026530A (ja) * 2003-07-04 2005-01-27 Jeol Ltd 試料ホルダ移動機構及び真空装置並びに荷電粒子ビーム装置
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
JP2010509709A (ja) * 2006-10-24 2010-03-25 ビー・ナノ・リミテッド インターフェース、非真空環境内で物体を観察する方法、および走査型電子顕微鏡
JP2010080144A (ja) * 2008-09-25 2010-04-08 Lasertec Corp 複合型顕微鏡装置及び試料観察方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6172363B1 (en) * 1996-03-05 2001-01-09 Hitachi, Ltd. Method and apparatus for inspecting integrated circuit pattern
JP2000228166A (ja) * 1999-02-05 2000-08-15 Horon:Kk 試料観察装置
US6563570B1 (en) * 1999-05-17 2003-05-13 Nikon Corporation Apparatus for evaluating a sample including a self-supporting thin film
US6407373B1 (en) * 1999-06-15 2002-06-18 Applied Materials, Inc. Apparatus and method for reviewing defects on an object
EP1116932A3 (de) 2000-01-14 2003-04-16 Leica Microsystems Wetzlar GmbH Messgerät und Verfahren zun Vermessen von Strukturen auf einem Substrat
FR2806527B1 (fr) * 2000-03-20 2002-10-25 Schlumberger Technologies Inc Colonne a focalisation simultanee d'un faisceau de particules et d'un faisceau optique
US6891170B1 (en) * 2002-06-17 2005-05-10 Zyvex Corporation Modular manipulation system for manipulating a sample under study with a microscope
JP4528014B2 (ja) * 2004-04-05 2010-08-18 株式会社日立ハイテクノロジーズ 試料検査方法
TW200639901A (en) * 2005-05-09 2006-11-16 Li Bing Huan Device for operating gas in vacuum or low-pressure environment and for observation of the operation
JP2008153086A (ja) 2006-12-19 2008-07-03 Jeol Ltd 試料検査装置及び試料検査方法並びに試料検査システム
EP2365321B1 (en) 2006-12-19 2013-10-02 JEOL Ltd. Sample inspection apparatus, sample inspection method, and sample inspection system
JP2008300354A (ja) * 2007-05-31 2008-12-11 Fei Co 荷電粒子装置内での試料キャリアの使用、当該試料キャリアの使用方法、及び当該試料キャリアを用いるように備えられた装置
WO2010001399A1 (en) * 2008-07-03 2010-01-07 B-Nano A scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
JP2010230417A (ja) * 2009-03-26 2010-10-14 Jeol Ltd 試料の検査装置及び検査方法
CN201464332U (zh) * 2009-08-04 2010-05-12 山东理工大学 高安全性扫描电镜样品台
DE102010011898A1 (de) * 2010-03-18 2011-09-22 Carl Zeiss Nts Gmbh Inspektionssystem
CN101916706B (zh) * 2010-08-03 2013-09-04 深圳市金洲精工科技股份有限公司 一种扫描电镜样品台及扫描电镜
JP5707286B2 (ja) * 2011-09-21 2015-04-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法。
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005026530A (ja) * 2003-07-04 2005-01-27 Jeol Ltd 試料ホルダ移動機構及び真空装置並びに荷電粒子ビーム装置
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
JP2010509709A (ja) * 2006-10-24 2010-03-25 ビー・ナノ・リミテッド インターフェース、非真空環境内で物体を観察する方法、および走査型電子顕微鏡
JP2010080144A (ja) * 2008-09-25 2010-04-08 Lasertec Corp 複合型顕微鏡装置及び試料観察方法

Also Published As

Publication number Publication date
KR101589400B1 (ko) 2016-01-29
KR20140071407A (ko) 2014-06-11
US20150083908A1 (en) 2015-03-26
KR20140146233A (ko) 2014-12-24
US9236217B2 (en) 2016-01-12
DE112012003809B4 (de) 2017-04-13
CN103858204B (zh) 2016-06-08
JP5825964B2 (ja) 2015-12-02
US20140246583A1 (en) 2014-09-04
JP2013080642A (ja) 2013-05-02
DE112012003809T5 (de) 2014-06-05
CN103858204A (zh) 2014-06-11
US8933400B2 (en) 2015-01-13
WO2013051357A1 (ja) 2013-04-11

Similar Documents

Publication Publication Date Title
KR101566646B1 (ko) 검사 또는 관찰 장치 및 시료의 검사 또는 관찰 방법
KR101519283B1 (ko) 하전 입자선 장치
KR101514190B1 (ko) 하전 입자선 장치
KR101840232B1 (ko) 주사 전자 현미경 및 화상 생성 방법
US9466457B2 (en) Observation apparatus and optical axis adjustment method
KR20150016349A (ko) 하전 입자선 장치
KR20150022983A (ko) 하전 입자선 장치 및 시료 관찰 방법
JP6118870B2 (ja) 試料観察方法
JP5923632B2 (ja) 荷電粒子線装置
JP6272384B2 (ja) 荷電粒子線装置

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A107 Divisional application of patent
PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A18-div-PA0104

St.27 status event code: A-0-1-A10-A16-div-PA0104

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20181023

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20211031

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20211031