JP5825964B2 - 検査又は観察装置及び試料の検査又は観察方法 - Google Patents

検査又は観察装置及び試料の検査又は観察方法 Download PDF

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Publication number
JP5825964B2
JP5825964B2 JP2011220606A JP2011220606A JP5825964B2 JP 5825964 B2 JP5825964 B2 JP 5825964B2 JP 2011220606 A JP2011220606 A JP 2011220606A JP 2011220606 A JP2011220606 A JP 2011220606A JP 5825964 B2 JP5825964 B2 JP 5825964B2
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JP
Japan
Prior art keywords
sample
charged particle
space
unit
observation
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011220606A
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English (en)
Japanese (ja)
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JP2013080642A5 (enExample
JP2013080642A (ja
Inventor
祐介 大南
祐介 大南
麻美 許斐
麻美 許斐
祐博 伊東
祐博 伊東
智久 大瀧
智久 大瀧
晋佐 河西
晋佐 河西
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Priority to JP2011220606A priority Critical patent/JP5825964B2/ja
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to KR1020147034116A priority patent/KR101589400B1/ko
Priority to DE112012003809.6T priority patent/DE112012003809B4/de
Priority to PCT/JP2012/072290 priority patent/WO2013051357A1/ja
Priority to US14/349,630 priority patent/US8933400B2/en
Priority to KR1020147008793A priority patent/KR101566646B1/ko
Priority to CN201280048835.3A priority patent/CN103858204B/zh
Publication of JP2013080642A publication Critical patent/JP2013080642A/ja
Publication of JP2013080642A5 publication Critical patent/JP2013080642A5/ja
Priority to US14/562,260 priority patent/US9236217B2/en
Application granted granted Critical
Publication of JP5825964B2 publication Critical patent/JP5825964B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/204—Means for introducing and/or outputting objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2011220606A 2011-10-05 2011-10-05 検査又は観察装置及び試料の検査又は観察方法 Expired - Fee Related JP5825964B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2011220606A JP5825964B2 (ja) 2011-10-05 2011-10-05 検査又は観察装置及び試料の検査又は観察方法
DE112012003809.6T DE112012003809B4 (de) 2011-10-05 2012-09-03 Untersuchungs- und Betrachtungsvorrichtung und Probenuntersuchungs- und Betrachtungsverfahren
PCT/JP2012/072290 WO2013051357A1 (ja) 2011-10-05 2012-09-03 検査又は観察装置及び試料の検査又は観察方法
US14/349,630 US8933400B2 (en) 2011-10-05 2012-09-03 Inspection or observation apparatus and sample inspection or observation method
KR1020147034116A KR101589400B1 (ko) 2011-10-05 2012-09-03 시료 관찰 방법
KR1020147008793A KR101566646B1 (ko) 2011-10-05 2012-09-03 검사 또는 관찰 장치 및 시료의 검사 또는 관찰 방법
CN201280048835.3A CN103858204B (zh) 2011-10-05 2012-09-03 检查或观察装置及试样的检查或观察方法
US14/562,260 US9236217B2 (en) 2011-10-05 2014-12-05 Inspection or observation apparatus and sample inspection or observation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011220606A JP5825964B2 (ja) 2011-10-05 2011-10-05 検査又は観察装置及び試料の検査又は観察方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015199039A Division JP6118870B2 (ja) 2015-10-07 2015-10-07 試料観察方法

Publications (3)

Publication Number Publication Date
JP2013080642A JP2013080642A (ja) 2013-05-02
JP2013080642A5 JP2013080642A5 (enExample) 2014-05-29
JP5825964B2 true JP5825964B2 (ja) 2015-12-02

Family

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JP2011220606A Expired - Fee Related JP5825964B2 (ja) 2011-10-05 2011-10-05 検査又は観察装置及び試料の検査又は観察方法

Country Status (6)

Country Link
US (2) US8933400B2 (enExample)
JP (1) JP5825964B2 (enExample)
KR (2) KR101566646B1 (enExample)
CN (1) CN103858204B (enExample)
DE (1) DE112012003809B4 (enExample)
WO (1) WO2013051357A1 (enExample)

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JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法
DE112014001109B4 (de) * 2013-04-12 2019-11-14 Hitachi High-Technologies Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Filterelement
CN105247650A (zh) * 2013-05-30 2016-01-13 株式会社日立高新技术 带电粒子束装置、试样观察方法
JP6302702B2 (ja) * 2014-02-27 2018-03-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡および画像生成方法
DE102014103360A1 (de) 2014-03-12 2015-09-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Vorrichtung für die korrelative Raster-Transmissionselektronenmikroskopie (STEM) und Lichtmikroskopie
JP6255305B2 (ja) * 2014-05-19 2017-12-27 株式会社レナ・システムズ 光学顕微装置
DE102014108331A1 (de) 2014-06-13 2015-12-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Spezifische Proteinmarkierung sowie Verfahren zur Identifizierung der statistischen Verteilung der Proteinstöchiometrie
DE102014108825A1 (de) * 2014-06-24 2015-12-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Vorrichtung und Verfahren für die stöchiometrische Analyse von Proben
CN105651696B (zh) * 2014-11-28 2019-05-14 财团法人工业技术研究院 检测仪器及其检测方法
US10177048B2 (en) * 2015-03-04 2019-01-08 Applied Materials Israel Ltd. System for inspecting and reviewing a sample
US10008361B2 (en) * 2015-04-28 2018-06-26 Hitachi High-Technologies Corporation Charged particle beam device and installation method
CN107710377B (zh) * 2015-06-29 2019-09-06 株式会社日立高新技术 试样高度调整方法及观察系统
CN107664834A (zh) * 2017-11-07 2018-02-06 西北农林科技大学 一种超声电机驱动的光学显微镜及其操作方法
US11294164B2 (en) 2019-07-26 2022-04-05 Applied Materials Israel Ltd. Integrated system and method
WO2021251026A1 (ja) * 2020-06-09 2021-12-16 国立研究開発法人物質・材料研究機構 観測対象ガスの観測装置及び観測対象イオンの観測方法並びに試料ホルダ
JP7493101B2 (ja) * 2021-04-13 2024-05-30 株式会社日立ハイテク 透過型電子顕微鏡

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JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法

Also Published As

Publication number Publication date
KR101589400B1 (ko) 2016-01-29
KR20140071407A (ko) 2014-06-11
US20150083908A1 (en) 2015-03-26
KR20140146233A (ko) 2014-12-24
US9236217B2 (en) 2016-01-12
DE112012003809B4 (de) 2017-04-13
CN103858204B (zh) 2016-06-08
US20140246583A1 (en) 2014-09-04
JP2013080642A (ja) 2013-05-02
DE112012003809T5 (de) 2014-06-05
CN103858204A (zh) 2014-06-11
US8933400B2 (en) 2015-01-13
WO2013051357A1 (ja) 2013-04-11
KR101566646B1 (ko) 2015-11-05

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