CN103792707B - 支撑机台 - Google Patents
支撑机台 Download PDFInfo
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- CN103792707B CN103792707B CN201410050194.6A CN201410050194A CN103792707B CN 103792707 B CN103792707 B CN 103792707B CN 201410050194 A CN201410050194 A CN 201410050194A CN 103792707 B CN103792707 B CN 103792707B
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- 238000005096 rolling process Methods 0.000 claims abstract description 9
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 11
- 238000005452 bending Methods 0.000 abstract description 4
- 239000000758 substrate Substances 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 238000004026 adhesive bonding Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
Abstract
本发明涉及一种支撑机台,包括若干个销孔,销孔中容纳有可以上下移动的支撑销,销孔的孔壁上设置有至少一个凹槽,凹槽容纳有滚珠,所述滚珠在凹槽内自由滚动,所述滚珠位于容纳在销孔中的支撑销周围,并且凹槽的形状和大小使得每个滚珠可以在凹槽中滚动并使每个滚珠始终有一部分突出于销孔的孔壁。本发明提供的支撑机台,在销孔中设置滚珠,将支撑销偏折或弯曲时与销孔壁的滑动摩擦转化为与滚珠的滚动摩擦,这样可以减少微粒的产生,使吸附到液晶面板的微粒大为减少,从而防止液晶面板产生Shell?Mura,提高产品的良率。
Description
技术领域
本发明涉及液晶显示制造技术领域,特别涉及支撑机台。
背景技术
液晶显示技术发展至今已经相当成熟,各个面板公司的主要竞争越来越趋向于良率的提升和成本的下降。
在液晶制造的光刻(ArrayPhoto)工序采用线性涂胶机(LinearCoater)进行涂胶,为保证光刻胶膜厚需要将玻璃基板(Glass)真空吸附在涂胶机台(CoaterStage)并保证平稳。在涂胶机台中一般设置有在厚度方向贯穿的销槽,支撑销(LiftPin)就位于销孔中,在取放玻璃基板时将玻璃基板顶起。
支撑销作为取放玻璃基板的重要器件,容易受到外力而弯曲,以至于在升降过程里中与销孔发生滑动摩擦,产生微粒(Particle),Particle被带到涂胶机台的表面,从而可能吸附到玻璃基板上,造成液晶面板的ShellMura,并且当玻璃基板上吸附的微粒过大过多时甚至会引起防护性报警(DefectAlarm),影响良品率。
发明内容
(一)要解决的技术问题
本发明是为了克服现有技术中涂胶机台的支撑销与销槽发生滑动摩擦而产生微粒的问题,从而防止液晶面板产生ShellMura。
(二)技术方案
为了解决上述技术问题,本发明提供了一种支撑机台,包括若干个销孔,销孔中容纳有可以上下移动的支撑销,销孔的孔壁上设置有至少一个凹槽,凹槽容纳有滚珠,所述滚珠在凹槽内自由滚动,所述滚珠位于容纳在销孔中的支撑销周围,并且凹槽的形状和大小使得每个滚珠可以在凹槽中滚动并使每个滚珠始终有一部分突出于销孔的孔壁。
优选地,凹槽为互不连通的不完整球窝状,且每个凹槽中容纳一个滚珠。
优选地,凹槽为水平的圆环槽道,且每个圆环槽道容纳多个滚珠。
优选地,所述滚珠的直径大于圆环槽道的宽度。
优选地,每个销孔中设置有多条所述的圆环槽道,每条圆环槽道上容纳有多个滚珠。
优选地,在每个销孔两端附近的孔壁上分别设置有一条所述的圆环槽道。
优选地,凹槽为与销孔壁一体成型。
优选地,滚珠和支撑销之间存在缝隙,使得支撑销在不受力偏折时,滚珠和支撑销不发生接触。
优选地,每个滚珠的大小相同。
优选地,滚珠由陶瓷制成。
(三)有益效果
本发明提供的支撑机台,在销孔壁中设置凹槽和在凹槽中可以自由滚动的滚珠,将支撑销偏折或弯曲时与销孔壁的滑动摩擦转化为与滚珠的滚动摩擦,这样可以减少微粒的产生,使吸附到液晶面板的微粒大为减少,从而防止液晶面板产生ShellMura,提高液晶面板产品的良率。
附图说明
图1为本发明的支撑机台的竖直方向局部剖视图;
图2为根据本发明一个实施例的支撑机台的一个销孔在其圆环槽道处的水平方向的局部剖视图。
图3为根据本发明又一个实施例本发明的支撑机台的一个销孔在其圆环槽道处的水平方向的局部剖视图。
具体实施方式
下面结合附图和实施例,对本发明的具体实施方式作进一步详细描述。以下实施例用于说明本发明,但不能用来限制本发明的范围。
图1为本发明的支撑机台的竖直方向局部剖视图,图2为本发明的支撑机台的一个销孔在其圆环槽道处的水平方向的局部剖视图。支撑机台1表面水平,用于放置基板。本发明相对于现有技术的改进之处在于销孔的构造,因此在下面重点介绍销孔的构造。
支撑机台1包括至少一个销孔2,销孔2中容纳有可以上下移动的支撑销3,销孔2的孔壁上设置有凹槽4,凹槽4容纳有若干个滚珠5,所述滚珠5在凹槽4内自由滚动,所述凹槽4设置在支撑销3周围,并且凹槽4的形状和大小使得每个滚珠5可以在凹槽4中滚动并使每个滚珠5始终有一部分突出于销孔2的孔壁。在图1中还示出了支撑销3安装在一个升降机6上,通过升降机6可以控制支撑销3的升降。
由于在销孔2的凹槽中设置有可以滚动的滚珠5,当支撑销3在受到外力使其运动轨迹发生倾斜时,可以通过滚珠5将支撑销与销孔壁接触时的滑动摩擦转化为与滚珠5的滚动摩擦,这样可以减少微粒的产生,使吸附到基板上的微粒大为减少,从而防止液晶面板产生ShellMura,提高液晶面板产品的良率。
当然,本支撑机台也可以应用到其他产品的生产过程中,均可以起到减少生产过程中由于摩擦产生的微粒,减小对产品的污染和影响。
优选地,凹槽4与销孔壁一体成型。如图2和3所示,滚珠5和支撑销3之间最好存在缝隙,使得支撑销3在运动轨迹不发生倾斜时,滚珠5和支撑销3不发生接触,这样可以避免额外的摩擦。每个滚珠5的大小最好相同。滚珠5优选由陶瓷制成,陶瓷的耐摩擦性能较好,能够更有效的减少微粒的产生。
在一个实施例中,如图2所示,凹槽4为互不连通的不完整球窝状,且每个滚珠5容纳在一个凹槽4中。
在另一个实施例中,如图3所示,凹槽4为水平的圆环槽道4,且每个圆环槽道4容纳多个滚珠5。滚珠5的直径大于圆环槽道4的宽度,这样,支撑销3偏折或弯曲时不会触碰到销孔壁,而是接触到滚珠5,从而将现有技术的滑动摩擦转化为滚动摩擦。优选每个销孔3中设置有多条圆环槽道4,每条圆环槽道4上均容纳有若干个滚珠5。这样可以防止支撑销3弯曲过大时触碰到销孔壁。一种优选方式是在每个销孔2两端附近的孔壁上分别设置一条圆环槽道4。
当然,支撑机台1还包括其他的部分,由于与本发明相对于现有技术的改进之处无关,在此不再赘述。
以上所述仅是本发明的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明技术原理的前提下,还可以做出若干改进和变型,这些改进和变型也应视为本发明的保护范围。
Claims (9)
1.一种支撑机台,其特征在于,包括至少一个销孔,销孔中容纳有可以上下移动的支撑销,销孔的孔壁上设置有至少一个凹槽,凹槽容纳有滚珠,所述滚珠在凹槽内自由滚动,所述凹槽设置在支撑销周围,并且凹槽的形状和大小使得每个滚珠可以在凹槽中滚动并使每个滚珠始终有一部分突出于销孔的孔壁;滚珠和支撑销之间存在缝隙,使得支撑销在不受力偏折时,滚珠和支撑销不发生接触。
2.权利要求1所述的支撑机台,其特征在于,凹槽为互不连通的不完整球窝状,且每个凹槽中容纳一个滚珠。
3.权利要求1所述的支撑机台,其特征在于,凹槽为水平的圆环槽道,且每个圆环槽道容纳多个滚珠。
4.权利要求3所述的支撑机台,其特征在于,所述滚珠的直径大于圆环槽道的直径。
5.权利要求3所述的支撑机台,其特征在于,每个销孔中设置有多条所述的圆环槽道,每条圆环槽道上容纳有多个滚珠。
6.权利要求5所述的支撑机台,其特征在于,在每个销孔两端附近的孔壁上分别设置有一条所述的圆环槽道。
7.权利要求1所述的支撑机台,其特征在于,凹槽与销孔壁一体成型。
8.权利要求1所述的支撑机台,其特征在于,每个滚珠的大小相同。
9.权利要求1至8其中任一项所述的支撑机台,其特征在于,滚珠由陶瓷制成。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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CN201410050194.6A CN103792707B (zh) | 2014-02-13 | 2014-02-13 | 支撑机台 |
US14/445,340 US9411233B2 (en) | 2014-02-13 | 2014-07-29 | Support stage |
Applications Claiming Priority (1)
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CN201410050194.6A CN103792707B (zh) | 2014-02-13 | 2014-02-13 | 支撑机台 |
Publications (2)
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CN103792707A CN103792707A (zh) | 2014-05-14 |
CN103792707B true CN103792707B (zh) | 2016-04-13 |
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CN201410050194.6A Expired - Fee Related CN103792707B (zh) | 2014-02-13 | 2014-02-13 | 支撑机台 |
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US (1) | US9411233B2 (zh) |
CN (1) | CN103792707B (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103792707B (zh) * | 2014-02-13 | 2016-04-13 | 北京京东方显示技术有限公司 | 支撑机台 |
CN104834188B (zh) * | 2015-05-25 | 2019-02-01 | 南京中电熊猫液晶显示科技有限公司 | 一种支撑销及烘烤机台 |
CN104950508B (zh) * | 2015-06-17 | 2019-03-26 | 深圳市华星光电技术有限公司 | 液晶显示面板 |
KR101729124B1 (ko) * | 2015-10-16 | 2017-04-24 | 세메스 주식회사 | 지지 유닛, 기판 처리 장치 및 방법 |
CN108063082A (zh) * | 2017-12-29 | 2018-05-22 | 信利(惠州)智能显示有限公司 | 基板干法刻蚀装置 |
CN108382251A (zh) * | 2018-04-11 | 2018-08-10 | 东莞市趣电智能科技有限公司 | 一种便于置枪的插枪座 |
IT201800006668A1 (it) * | 2018-06-26 | 2019-12-26 | Massimiliano Bisson | Dispositivo di supporto per tubi radianti |
KR102640172B1 (ko) | 2019-07-03 | 2024-02-23 | 삼성전자주식회사 | 기판 처리 장치 및 이의 구동 방법 |
KR20210086748A (ko) * | 2019-12-30 | 2021-07-09 | 세메스 주식회사 | 기판 리프팅 방법 및 기판 처리 장치 |
CN114526283B (zh) * | 2022-01-14 | 2023-08-29 | 浙江零跑科技股份有限公司 | 一种用于汽车四轮定位的偏心调整组件 |
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CN202049933U (zh) * | 2011-03-23 | 2011-11-23 | 京东方科技集团股份有限公司 | 一种玻璃板支撑装置 |
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JPWO2007145142A1 (ja) * | 2006-06-13 | 2009-10-29 | 株式会社コスメック | 旋回式クランプ |
KR20070119386A (ko) * | 2006-06-15 | 2007-12-20 | 세메스 주식회사 | 평판 디스플레이 제조용 장비 |
JP5750053B2 (ja) * | 2010-01-22 | 2015-07-15 | 株式会社コスメック | クランプ装置 |
CN103792707B (zh) * | 2014-02-13 | 2016-04-13 | 北京京东方显示技术有限公司 | 支撑机台 |
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2014
- 2014-02-13 CN CN201410050194.6A patent/CN103792707B/zh not_active Expired - Fee Related
- 2014-07-29 US US14/445,340 patent/US9411233B2/en active Active
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US5520038A (en) * | 1994-07-22 | 1996-05-28 | Seagate Technology, Inc. | Device for manufacturing a groove bearing |
CN1721933A (zh) * | 2004-07-09 | 2006-01-18 | 应用材料股份有限公司 | 可单独移动的基材支撑件 |
CN201836344U (zh) * | 2010-11-02 | 2011-05-18 | 许晓华 | 一种活动销操作杆固定结构 |
CN102094961A (zh) * | 2010-11-02 | 2011-06-15 | 许晓华 | 一种活动销操作杆固定结构 |
CN202049933U (zh) * | 2011-03-23 | 2011-11-23 | 京东方科技集团股份有限公司 | 一种玻璃板支撑装置 |
Also Published As
Publication number | Publication date |
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CN103792707A (zh) | 2014-05-14 |
US9411233B2 (en) | 2016-08-09 |
US20150227044A1 (en) | 2015-08-13 |
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