CN103430282A - 显示面板用基板的制造装置 - Google Patents

显示面板用基板的制造装置 Download PDF

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Publication number
CN103430282A
CN103430282A CN201280013987XA CN201280013987A CN103430282A CN 103430282 A CN103430282 A CN 103430282A CN 201280013987X A CN201280013987X A CN 201280013987XA CN 201280013987 A CN201280013987 A CN 201280013987A CN 103430282 A CN103430282 A CN 103430282A
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CN
China
Prior art keywords
mentioned
air
heat treatment
display panel
treatment chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201280013987XA
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English (en)
Chinese (zh)
Inventor
中村谦太
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of CN103430282A publication Critical patent/CN103430282A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201280013987XA 2011-04-14 2012-04-06 显示面板用基板的制造装置 Pending CN103430282A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011-090107 2011-04-14
JP2011090107 2011-04-14
PCT/JP2012/059455 WO2012141081A1 (ja) 2011-04-14 2012-04-06 表示パネル用基板の製造装置

Publications (1)

Publication Number Publication Date
CN103430282A true CN103430282A (zh) 2013-12-04

Family

ID=47009256

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280013987XA Pending CN103430282A (zh) 2011-04-14 2012-04-06 显示面板用基板的制造装置

Country Status (3)

Country Link
JP (1) JP5639262B2 (ja)
CN (1) CN103430282A (ja)
WO (1) WO2012141081A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014173095A1 (zh) * 2013-04-22 2014-10-30 合肥京东方光电科技有限公司 检测设备
WO2016165285A1 (zh) * 2015-04-15 2016-10-20 京东方科技集团股份有限公司 液晶面板的制造方法及加热装置
CN106647173A (zh) * 2017-02-24 2017-05-10 武汉华星光电技术有限公司 烘烤设备
CN112460995A (zh) * 2019-09-09 2021-03-09 佰世尔科技有限公司 显示面板热处理室装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104385778B (zh) * 2014-10-27 2017-05-17 合肥京东方光电科技有限公司 一种取向膜印刷设备和取向膜印刷系统

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001116458A (ja) * 1999-10-19 2001-04-27 Nec Kagoshima Ltd クリーンオーブン及びその使用方法
JP2002359180A (ja) * 2001-06-01 2002-12-13 Toshiba Corp ガス循環システム
CN101314516A (zh) * 2007-05-29 2008-12-03 爱斯佩克株式会社 热处理装置
JP2009243879A (ja) * 2006-07-13 2009-10-22 Espec Corp 熱処理装置
JP2011023530A (ja) * 2009-07-15 2011-02-03 Tokyo Electron Ltd 基板処理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS64738A (en) * 1988-05-20 1989-01-05 Hitachi Ltd Heat treatment of semiconductor wafer
JP3225344B2 (ja) * 1996-01-26 2001-11-05 東京エレクトロン株式会社 処理装置
JP4341978B2 (ja) * 2007-03-02 2009-10-14 東京エレクトロン株式会社 基板処理装置
JP4542577B2 (ja) * 2007-09-19 2010-09-15 東京エレクトロン株式会社 常圧乾燥装置及び基板処理装置及び基板処理方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001116458A (ja) * 1999-10-19 2001-04-27 Nec Kagoshima Ltd クリーンオーブン及びその使用方法
JP2002359180A (ja) * 2001-06-01 2002-12-13 Toshiba Corp ガス循環システム
JP2009243879A (ja) * 2006-07-13 2009-10-22 Espec Corp 熱処理装置
CN101314516A (zh) * 2007-05-29 2008-12-03 爱斯佩克株式会社 热处理装置
JP2011023530A (ja) * 2009-07-15 2011-02-03 Tokyo Electron Ltd 基板処理装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014173095A1 (zh) * 2013-04-22 2014-10-30 合肥京东方光电科技有限公司 检测设备
WO2016165285A1 (zh) * 2015-04-15 2016-10-20 京东方科技集团股份有限公司 液晶面板的制造方法及加热装置
US9709840B2 (en) 2015-04-15 2017-07-18 Boe Technology Group Co., Ltd. Method for producing liquid crystal panel and heating device
CN106647173A (zh) * 2017-02-24 2017-05-10 武汉华星光电技术有限公司 烘烤设备
CN112460995A (zh) * 2019-09-09 2021-03-09 佰世尔科技有限公司 显示面板热处理室装置

Also Published As

Publication number Publication date
WO2012141081A1 (ja) 2012-10-18
JP5639262B2 (ja) 2014-12-10
JPWO2012141081A1 (ja) 2014-07-28

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Application publication date: 20131204