CN103426806B - 黏着带的粘贴方法 - Google Patents

黏着带的粘贴方法 Download PDF

Info

Publication number
CN103426806B
CN103426806B CN201310174284.1A CN201310174284A CN103426806B CN 103426806 B CN103426806 B CN 103426806B CN 201310174284 A CN201310174284 A CN 201310174284A CN 103426806 B CN103426806 B CN 103426806B
Authority
CN
China
Prior art keywords
band
chip
central portion
sticking together
stickup
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201310174284.1A
Other languages
English (en)
Other versions
CN103426806A (zh
Inventor
樋田美玲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Disco Corp
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of CN103426806A publication Critical patent/CN103426806A/zh
Application granted granted Critical
Publication of CN103426806B publication Critical patent/CN103426806B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/48Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using adhesives, i.e. using supplementary joining material; solvent bonding
    • B29C65/50Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using adhesives, i.e. using supplementary joining material; solvent bonding using adhesive tape, e.g. thermoplastic tape; using threads or the like
    • B29C65/5064Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using adhesives, i.e. using supplementary joining material; solvent bonding using adhesive tape, e.g. thermoplastic tape; using threads or the like of particular form, e.g. being C-shaped, T-shaped
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67132Apparatus for placing on an insulating substrate, e.g. tape
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68318Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/6834Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386Separation by peeling
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

本发明提供一种黏着带的粘贴方法,用于在配设有环状黏着层的黏着带粘贴于晶片时,实现将环状黏着层配置于最适合的位置的状态。所述黏着带的粘贴方法具有:位置对准步骤,将晶片的中央部定位到黏着带的中央部的正下方;部分粘贴步骤,通过粘贴用辊子将黏着带按压到晶片的表面,并在黏着带的中央部与晶片的中央部重叠的位置将黏着带的一部分粘贴到晶片来进行固定,其中所述粘贴用辊子以通过黏着带的中央部并覆盖黏着带的直径的方式被定位;以及粘贴步骤,在部分粘贴步骤后,使粘贴用辊子从晶片的中央部向外周部旋转移动来将黏着带粘贴到晶片。

Description

黏着带的粘贴方法
技术领域
本发明涉及只在晶片的围绕器件区域的外周剩余区域具有黏着层的黏着带的贴附方法。
背景技术
伴随着半导体装置的高密度安装化,使用由焊锡等构成的凸块(bump)来接合半导体芯片与基板。例如,在对半导体芯片与基板进行直接接合时,使用直径100μm左右的球状凸块较多。
针对在表面侧形成有凸块的晶片,通过磨削晶片的背面侧来进行薄化加工,并且在薄化后进行分割,由此制造出配置有凸块的半导体芯片。
在利用磨削进行薄化加工时,通过黏着带来保护配置有凸块的晶片的表面侧,隔着黏着带通过吸引保持面等来保持晶片,对露出的晶片背面进行磨削。
在该薄化加工时若凸块的高度高(例如,直径为100μm左右),则没有凸块的地方被吸附到吸引保持面等,从而在晶片的背面侧产生凹凸。也就是说,晶片表面的凸块的凹凸对晶片的背面产生影响。
在晶片的背面侧形成有凹凸时,黏着带呈现出的缓冲性不能完全吸收磨削时产生的负荷,成为磨削工序中晶片破损的不良情况、和形成有凹坑(背面生成的凹陷)而损坏所完成的器件的可靠性性的不良情况的主要原因。
以往通过将薄化后的完成高度设定得比较厚以避免引起晶片的破损来进行应对。
另外,在需要完成得较薄的情况下,做出这样的应对:使用收纳凸块的黏着层(糊层)的厚的表面保护用的黏着带,使凸块没入黏着层来进行磨削。
但是,存在这样的问题:在使用使凸块没入的黏着带的情况下,无论如何黏着层会作为残渣残留在凸块或器件的表面。
因此,提出了这样的技术:只在晶片的围绕形成有器件的区域(器件区域)的区域,即只在外周剩余区域配置环状黏着层,将比较密地排列的凸块反过来代替黏着层作为支撑部件来使用,不会残留残渣地固定晶片并实施磨削(参照专利文献1、2)。
现有技术文献
专利文献1:日本专利第4462997号说明书
专利文献2:日本专利第4447280号说明书
发明内容
但是,与单纯地将在整个面配设有黏着层的黏着带粘贴到晶片上相比,在将环状的黏着层无偏差地确实地配置于晶片的外周剩余区域这一特定区域的同时将晶片与黏着带粘贴在一起就要求更高精度的位置对准。
本发明是鉴于上述问题而完成的发明,其目的在于提供一种技术:用于在配设有环状黏着层的黏着带粘贴于晶片时,实现将环状黏着层配置于最适合的位置的状态。
根据记载于本发明第一方面的发明,提供一种黏着带的粘贴方法,其是在晶片的表面粘贴黏着带的方法,所述晶片的表面具有形成有多个器件的器件区域与围绕器件区域的外周剩余区域,所述黏着带具有与外周剩余区域对应的环状的黏着层,所述黏着带的粘贴方法具有:晶片装载步骤,将晶片露出表面地装载到卡盘工作台;位置对准步骤,使黏着带面对面地朝向装载于卡盘工作台的晶片的表面,将晶片的中央部定位到黏着带的中央部的正下方,其中所述黏着带构成为在直径与晶片同等的基材的单面的周缘配设有与外周剩余区域对应的环状的黏着层;部分粘贴步骤,通过粘贴用辊子将黏着带按压到晶片的表面,在黏着带的中央部与晶片的中央部重叠的位置将黏着带的一部分粘贴到晶片来进行固定,其中所述粘贴用辊子以通过黏着带的中央部并覆盖黏着带的直径的方式被定位;以及粘贴步骤,在部分粘贴步骤后,使粘贴用辊子从晶片的中央部向外周部旋转移动,将黏着带粘贴至晶片。
根据本发明,在配设有环状黏着层的黏着带粘贴于晶片时,能够实现将环状黏着层配置于最适合的位置的状态。
即,在本发明的黏着带的粘贴方法中,预先将配设有环状黏着层的圆形黏着带的中央部与晶片的中央部对准位置地进行重叠后,首先,通过粘贴用辊子进行按压使得彼此的中央部不会产生偏差后(部分粘贴步骤),开始使粘贴用辊子向着晶片(黏着带)的外周部旋转移动(粘贴步骤),然后,适当使粘贴用辊子旋转移动以在整个区域中进行粘贴。因此,例如即使由于黏着带的延长而产生偏差,与从晶片(黏着带)的直径方向的一端侧开始利用粘贴用辊子进行粘贴,使粘贴用辊子移动到另一端来一口气地实施粘贴的现有的方法相比较,能够将黏着带的中央部与晶片的中央部的偏差量抑制成很小。
附图说明
图1是表示晶片与黏着带的立体图。
图2是表示带供给装置的实施方式的立体图。
图3是针对晶片与黏着带的位置关系进行说明的图。
图4是表示粘贴用辊子与晶片的位置关系的立体图。
图5中,(A)是表示粘贴用辊子与晶片的位置关系的侧视局部剖视图,(B)是表示部分粘贴步骤的侧视局部剖视图。
图6是表示粘贴步骤的立体图。
图7是表示粘贴步骤后的外周剩余区域与黏着层的位置关系的侧视剖视图。
标号说明
11 晶片
11C 中央部
11L 外周部
11R 外周部
14 凸块
15 器件
17 器件区域
19 外周剩余区域
20 黏着带
20C 中央部
22 黏着层
24 基材
30 卡盘工作台
40 带供给装置
41 隔离纸
46 粘贴用辊子
46a 旋转轴心
具体实施方式
如图1所示,本发明涉及在晶片11的表面粘贴黏着带20的黏着带的粘贴方法,所述晶片11的表面具有形成有多个器件15、15的器件区域17以及围绕器件区域17的外周剩余区域19,所述黏着带20具有与外周剩余区域19对应的环状黏着层22。
如图1所示,成为被加工物的晶片11例如由厚度为700μm的硅晶片构成,多条交叉的分割预定线(间隔道)13、13呈格子状地形成于表面11a,并且在通过多条分割预定线13、13而划分出的多个区域分别形成有器件15、15。在各器件15、15的表面配设有成为电极的凸块14、14。像这样构成的晶片11在其表面11a具有:形成有器件15的器件区域17;以及围绕器件区域17的环状外周剩余区域19。
另外,成为被加工物的晶片11的形状不限于图1所示的圆盘状,也可以想定为四边形(正方形,长方形)等矩形。在矩形的情况下,想定外周剩余区域也构成为矩形的环状。另外,除了半导体晶片外,光器件晶片等也被想定为被加工物。另外,关于晶片11的器件15,想定为配置没有配设凸块14、14的器件、或是在凸块14的基础上或代替凸块14在器件表面形成有凹凸的器件。
针对如上所述的晶片11实施本发明涉及的黏着带的粘贴方法。首先,如图2所示,实施晶片装载步骤:使表面11a露出地将晶片11装载到卡盘工作台30。
卡盘工作台30的上表面构成为吸引保持晶片11的背面侧的保持面,在朝上侧露出晶片11的表面11a的状态下,将晶片11保持到卡盘工作台30。
接下来,如图1到图3所示,实施位置对准步骤:使黏着带20面对面地朝向装载于卡盘工作台30的晶片11的表面11a,将晶片11的中央部11C定位到黏着带20的中央部20C的正下方,其中所述黏着带20在直径与晶片11相同的基材24的单面的周缘配设有与晶片11的外周剩余区域19对应的环状黏着层22。
在本实施方式中,俯视观察,在与晶片11构成为同一形状的基材24的背面24b(图3)侧形成有环状黏着层22,将该黏着层22定位到晶片11的外周剩余区域19,从而进行黏着带20与晶片11的位置对准。
另外,基材24不被特别限定,但考虑使用例如厚度为70~200μm左右的聚烯烃等柔软的树脂制基材片。另外,黏着层22可考虑呈环状地涂布5~100μm左右的粘着剂而构成的结构。
通过用于连续性地供给黏着带20的带供给装置40来供给黏着带20。在卷为滚筒形状的隔离纸41的背面41b中,在隔离纸41的长边方向隔开间隔地配置黏着带20,通过适当展开(巻き出す,放开)隔离纸41以黏着带20的背面24b面向卡盘工作台30侧的方式进行供给。
带供给装置40配置成在Y轴方向中卡盘工作台30的中心位置与黏着带20的中心位置一致。另外,带供给装置40构成为适当展开隔离纸41以使得在X轴方向卡盘工作台30的中心位置与黏着带20的中心位置一致。除此之外,也可以构成为:设置对卡盘工作台30的中心位置与黏着带20的中心位置进行检测的摄像装置等,从而在中心位置彼此错开的情况下,适当实施位置对准。
如上所述,在位置对准步骤中为这样的状态:使黏着带20的基材24的背面24a面对面地朝向装载于卡盘工作台30的晶片11的表面11a,将晶片11的中央部11C定位到黏着带20的中央部20C的正下方。
另外,所谓“黏着带20的中央部20C”是包括黏着带20的基材24的中心位置的概念,所谓“晶片11的中央部11C”是包括晶片11的中心位置的概念。该位置对准步骤是为了将黏着带20的黏着层22与晶片11的外周剩余区域19的位置对准而进行的步骤,在由相同直径的圆形构成黏着带20与晶片11的本实施方式中,能够通过对准中心位置来高精度地进行该位置对准。
接下来,如图4以及图5的(A)、(B)所示,实施部分粘贴步骤:通过粘贴用辊子46将黏着带20按压到晶片11的表面11a,并在黏着带20的中央部20C与晶片11的中央部11C重叠的位置20M将黏着带20的一部分粘贴到晶片11来进行固定,其中所述粘贴用辊子46以通过黏着带20的中央部20C并覆盖黏着带20的直径的方式被定位。
粘贴用辊子46构成为接触隔离纸41的表面41a侧,以便将隔离纸41的背面41b侧的黏着带20压靠于晶片11。粘贴用辊子46构成为能够旋转,其旋转轴心46a覆盖黏着带20的直径,即,以通过黏着带20的中央部20C(晶片11的中央部11C)的方式被定位。
由此,如图5的(A)所示,将粘贴用辊子46的旋转轴心46a、黏着带20的中央部20C、以及晶片11的中央部11C在侧面观察时配置于同一直线上(在X轴方向为同一位置)。
在完成了这样的定位的状态下,如图的5(B)所示,通过使粘贴用辊子46向下方移动,黏着带20的中央部20C重叠于晶片11的中央部11C,从而黏着带20的黏着层22的一部分被粘贴到晶片11的表面11a。
这时,因为通过上述的位置对准步骤而将黏着层22定位到晶片11的外周剩余区域19的上方,所以将黏着层22的一部分即黏着层22中的配置于粘贴用辊子46下方的部位被粘贴到晶片11的外周剩余区域19的部位。
接下来,实施粘贴步骤:在部分粘贴步骤后,如图6所示,使粘贴用辊子46从晶片11的中央部11C向着外周部11L、11R旋转移动,将黏着带20粘贴到晶片11。
该粘贴步骤中,在完成了前面的部分粘贴步骤的阶段中,通过粘贴用辊子46按压成了黏着带20与晶片11彼此的中央部20C、11C不会发生偏差,因此,在使粘贴用辊子46从晶片11的中央部11C向着外周部11L、11R移动时,能够抑制黏着带20(基材24)的延长而导致的中央部20C、11C彼此的偏差的产生。
并且,通过像这样抑制偏差的产生,能够抑制与外周剩余区域19相对应的黏着层22的位置偏差的产生,如图7所示,在配设有环状的黏着层22的黏着带20粘贴于晶片11时,能够实现这样的状态:将环状的黏着层22配置于最适当的位置即与外周剩余区域19相对应的位置。
假设,在从晶片11(黏着带20)的直径方向的一端(外周部11L)开始使用粘贴用辊子46进行粘贴,使粘贴用辊子46移动到另一端(外周部11R)来一口气实施粘贴的方法中,粘贴用辊子46的移动距离增长,在黏着带20(基材24)延长时,担心中央部20C、11C彼此产生偏差。并且,由于产生该偏差,会导致黏着层22配设在从外周剩余区域19偏离的位置。
对于使粘贴用辊子46旋转移动的方式,只要粘贴用辊子46的移动为从与晶片11的中央部11C相对应的位置朝向外周部11L、11R移动即可,例如,考虑以下等路径:如图6中路径1A所示设定为这样的路径,中央部11C→外周部11L→外周部11R,或者,如路径1B所示设定为这样的路径:在进行了中央部11C→外周部11L后,从中央部11C→外周部11R。
通过使粘贴用辊子46按这样的路径来移动,与使粘贴用辊子46从外周部11R移动到外周部11L地一口气进行粘贴的情况进行比较,例如能够将中央部20C、11C彼此的偏差抑制在一半以下,与此同时,能够抑制黏着层22相对于外周剩余区域19的位置偏差。
另外,如图7所示,本实施方式为这样的位置关系:利用黏着层22来围绕晶片11的器件区域17,在该围出的空间23中收纳有形成于器件15的表面的凸块14、14。因此黏着层22不会附着于凸块14、14,剥离了黏着带20后黏着层22的残渣不会残留于器件15的表面。
假设中央部20C、11C之间偏差较大时,在图7所示的结构中,将黏着层22定位到器件区域17,粘着层22与凸块14接触,在剥离了黏着带20后会产生黏着层22的残渣残留于器件15的表面的不良情况。
另外,如图7所示,比较密集地排列凸块14、14时,当在后工序中进行晶片11背面的磨削加工时,能够将凸块14作为支撑部件来利用。

Claims (1)

1.一种黏着带的粘贴方法,是在晶片的表面粘贴黏着带的方法,所述晶片的表面具有形成有多个器件的器件区域与围绕该器件区域的外周剩余区域,所述黏着带具有与所述外周剩余区域对应的环状的黏着层,
所述黏着带的粘贴方法的特征在于,具有:
晶片装载步骤,将所述晶片露出表面地装载到卡盘工作台;
位置对准步骤,使黏着带面对面地朝向装载于所述卡盘工作台的所述晶片的表面,将所述晶片的中央部定位到所述黏着带的中央部的正下方,其中所述黏着带构成为在直径与所述晶片同等的基材的单面的周缘配设有与所述外周剩余区域对应的环状的黏着层;
部分粘贴步骤,通过粘贴用辊子将所述黏着带按压到所述晶片的表面,在所述黏着带的中央部与所述晶片的中央部重叠的位置将所述黏着带的一部分粘贴到所述晶片来进行固定,其中所述粘贴用辊子以通过所述黏着带的中央部并覆盖所述黏着带的直径的方式被定位;以及
粘贴步骤,在部分粘贴步骤后,使所述粘贴用辊子从所述晶片的中央部向外周部旋转移动,将所述黏着带粘贴至所述晶片,从而抑制黏着带的延长而导致的黏着带的中央部与晶片的中央部的偏差。
CN201310174284.1A 2012-05-15 2013-05-13 黏着带的粘贴方法 Active CN103426806B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012111411A JP6037655B2 (ja) 2012-05-15 2012-05-15 粘着テープの貼着方法
JP2012-111411 2012-05-15

Publications (2)

Publication Number Publication Date
CN103426806A CN103426806A (zh) 2013-12-04
CN103426806B true CN103426806B (zh) 2018-02-16

Family

ID=49511141

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310174284.1A Active CN103426806B (zh) 2012-05-15 2013-05-13 黏着带的粘贴方法

Country Status (4)

Country Link
US (1) US20130306215A1 (zh)
JP (1) JP6037655B2 (zh)
CN (1) CN103426806B (zh)
DE (1) DE102013208835A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6297873B2 (ja) * 2014-03-24 2018-03-20 リンテック株式会社 シート貼付装置
KR20170016547A (ko) 2015-08-03 2017-02-14 삼성전자주식회사 척 테이블 및 그를 포함하는 기판 제조 장치
CN110663106B (zh) * 2017-05-18 2023-09-22 株式会社迪思科 在加工晶圆中使用的保护片、用于晶圆的处理系统以及晶圆与保护片的组合体
WO2020196794A1 (ja) * 2019-03-27 2020-10-01 三井化学東セロ株式会社 保護フィルム及びその貼着方法並びに半導体部品の製造方法
JP7451028B2 (ja) 2019-12-27 2024-03-18 株式会社ディスコ 保護シートの配設方法
USD947802S1 (en) 2020-05-20 2022-04-05 Applied Materials, Inc. Replaceable substrate carrier interfacing film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101060073A (zh) * 2006-04-19 2007-10-24 株式会社迪斯科 保护带粘贴方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005109433A (ja) * 2004-03-31 2005-04-21 Disco Abrasive Syst Ltd 半導体ウエーハの切削方法および研削用のバンプ保護部材
JP2008270543A (ja) * 2007-04-20 2008-11-06 Disco Abrasive Syst Ltd 接着フィルムの貼着方法
JP5324319B2 (ja) * 2009-05-26 2013-10-23 日東電工株式会社 ウエハマウント方法とウエハマウント装置
JP5586093B2 (ja) * 2010-09-09 2014-09-10 リンテック株式会社 シート貼付装置及び貼付方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101060073A (zh) * 2006-04-19 2007-10-24 株式会社迪斯科 保护带粘贴方法

Also Published As

Publication number Publication date
JP6037655B2 (ja) 2016-12-07
DE102013208835A1 (de) 2013-11-21
JP2013239564A (ja) 2013-11-28
CN103426806A (zh) 2013-12-04
US20130306215A1 (en) 2013-11-21

Similar Documents

Publication Publication Date Title
CN103426806B (zh) 黏着带的粘贴方法
JP6281825B2 (ja) チャック装置
KR100538158B1 (ko) 웨이퍼 레벨 적층 칩 접착 방법
JP4964107B2 (ja) 剥離装置
US8557635B2 (en) Stacked semiconductor device and manufacturing method thereof
WO2009006284A3 (en) Semiconductor die having a redistribution layer
JP2014067970A (ja) 表面保護部材および加工方法
JP6824583B2 (ja) ウェーハの加工方法
JP2009158879A (ja) 基板への接着シートの貼付け装置
WO2017154304A1 (ja) 基板転写方法および基板転写装置
KR20050033000A (ko) 반도체 장치의 제조 방법, 반도체 장치의 제조 장치 및접착 필름
JP6033116B2 (ja) 積層ウェーハの加工方法および粘着シート
JP4853872B2 (ja) チップの製造方法
TW202218029A (zh) 鍵合機台的對準機構及對準方法
JP2013021109A (ja) 粘着シート及び粘着シートを用いた円板状被加工物の加工方法
JP6008576B2 (ja) 表面保護テープの貼着方法
TWM613900U (zh) 半導體加工裝置
JP2013243310A (ja) 表面保護テープ及びウエーハの加工方法
CN205111538U (zh) 抛光设备
WO2007040032A1 (ja) 転着装置及び転着方法
TWI797532B (zh) 半導體加工的方法及裝置
US11222808B2 (en) Method of removing carrier plate
JP6021432B2 (ja) 表面保護テープ貼着システム
CN107442943A (zh) 扩展片
JP2010067688A (ja) 半導体ウェハの支持装置および支持方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant