CN103415338B - 准分子光源 - Google Patents

准分子光源 Download PDF

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Publication number
CN103415338B
CN103415338B CN201180051962.4A CN201180051962A CN103415338B CN 103415338 B CN103415338 B CN 103415338B CN 201180051962 A CN201180051962 A CN 201180051962A CN 103415338 B CN103415338 B CN 103415338B
Authority
CN
China
Prior art keywords
quasi
electrodes
lamp
molecule
excimer lamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201180051962.4A
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English (en)
Chinese (zh)
Other versions
CN103415338A (zh
Inventor
詹姆士·兰德尔·库珀
罗纳德·W·查非
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ultraviolet Sciences Inc
Original Assignee
Ultraviolet Sciences Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ultraviolet Sciences Inc filed Critical Ultraviolet Sciences Inc
Priority to CN201910748148.6A priority Critical patent/CN110459460B/zh
Publication of CN103415338A publication Critical patent/CN103415338A/zh
Application granted granted Critical
Publication of CN103415338B publication Critical patent/CN103415338B/zh
Active legal-status Critical Current
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
    • G01N23/12—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the material being a flowing fluid or a flowing granular solid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325—Irradiation devices or lamp constructions
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/08—Holders for targets or for other objects to be irradiated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/067—Main electrodes for low-pressure discharge lamps
    • H01J61/0675—Main electrodes for low-pressure discharge lamps characterised by the material of the electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/073—Main electrodes for high-pressure discharge lamps
    • H01J61/0735—Main electrodes for high-pressure discharge lamps characterised by the material of the electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
    • H01J61/16—Selection of substances for gas fillings; Specified operating pressure or temperature having helium, argon, neon, krypton, or xenon as the principle constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14—Circuit arrangements
    • H05B41/24—Circuit arrangements in which the lamp is fed by high frequency AC, or with separate oscillator frequency
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14—Circuit arrangements
    • H05B41/30—Circuit arrangements in which the lamp is fed by pulses, e.g. flash lamp
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/30—Organic compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/322—Lamp arrangement
    • C02F2201/3227—Units with two or more lamps

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • General Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Discharge Lamp (AREA)
  • Physical Water Treatments (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CN201180051962.4A 2010-09-29 2011-09-28 准分子光源 Active CN103415338B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910748148.6A CN110459460B (zh) 2010-09-29 2011-09-28 准分子光源

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US38785610P 2010-09-29 2010-09-29
US61/387,856 2010-09-29
PCT/US2011/053751 WO2012050916A2 (en) 2010-09-29 2011-09-28 Excimer light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201910748148.6A Division CN110459460B (zh) 2010-09-29 2011-09-28 准分子光源

Publications (2)

Publication Number Publication Date
CN103415338A CN103415338A (zh) 2013-11-27
CN103415338B true CN103415338B (zh) 2019-09-10

Family

ID=45938874

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201180051962.4A Active CN103415338B (zh) 2010-09-29 2011-09-28 准分子光源
CN201910748148.6A Active CN110459460B (zh) 2010-09-29 2011-09-28 准分子光源

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201910748148.6A Active CN110459460B (zh) 2010-09-29 2011-09-28 准分子光源

Country Status (10)

Country Link
US (2) US8946662B2 (enExample)
EP (1) EP2622623A4 (enExample)
JP (1) JP6096118B2 (enExample)
KR (1) KR102106293B1 (enExample)
CN (2) CN103415338B (enExample)
AU (2) AU2011314069B2 (enExample)
CA (2) CA3123418C (enExample)
MX (1) MX2013003437A (enExample)
RU (1) RU2592538C2 (enExample)
WO (1) WO2012050916A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012017779A1 (de) * 2012-09-07 2014-03-13 Karlsruher Institut für Technologie Dielektrisch behinderte Entladungs-Lampe
CN103227098A (zh) * 2013-05-15 2013-07-31 王颂 282nm、222nm无极准分子灯
JP6241971B2 (ja) * 2015-02-03 2017-12-06 合同会社紫光技研 ガス放電装置とそれを使用した平面光源およびそれらの駆動方法
CN205191526U (zh) * 2015-11-06 2016-04-27 东莞莹辉灯饰有限公司 Led净化节能灯
US11614407B2 (en) 2020-04-20 2023-03-28 Denovo Lighting, Llc Devices for instant detection and disinfection of aerosol droplet particles using UV light sources
US11786622B2 (en) 2020-05-08 2023-10-17 Ultra-Violet Solutions, Llc Far UV-C light apparatus
JP6948606B1 (ja) * 2020-08-28 2021-10-13 ウシオ電機株式会社 エキシマランプ及び光照射装置
WO2022116366A1 (zh) * 2020-12-04 2022-06-09 广明源光科技股份有限公司 准分子灯
CN113270309A (zh) * 2021-06-21 2021-08-17 深圳市大博实业有限公司 一种uv准分子灯

Citations (3)

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JP2005317555A (ja) * 2005-07-12 2005-11-10 Quark Systems Co Ltd エキシマランプ及びエキシマ照射装置
CN101489939A (zh) * 2006-07-13 2009-07-22 皇家飞利浦电子股份有限公司 包括辐射源模块和冷却装置的流体处理系统
WO2009139908A1 (en) * 2008-05-15 2009-11-19 Rutgers, The State University Fluorescent excimer lamps

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JPH04303549A (ja) * 1991-03-30 1992-10-27 Toshiba Lighting & Technol Corp 高周波点灯式放電ランプ
JP3291809B2 (ja) * 1993-01-20 2002-06-17 ウシオ電機株式会社 誘電体バリヤ放電ランプを使用した処理方法
JPH09259834A (ja) * 1996-03-26 1997-10-03 Toshiba Corp 真空紫外光源
JPH1021880A (ja) * 1996-07-08 1998-01-23 Toshiba Lighting & Technol Corp 放電ランプ、照射装置、殺菌装置および水処理装置
RU2120152C1 (ru) * 1996-12-16 1998-10-10 Общество с ограниченной ответственностью "Микроэлектронные системы" - ООО "МИКС" Газоразрядная лампа
US7006546B2 (en) * 2000-03-15 2006-02-28 Komatsu Ltd. Gas laser electrode, laser chamber employing the electrode, and gas laser device
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CN2592631Y (zh) * 2002-08-28 2003-12-17 中国科学院等离子体物理研究所 准分子紫外光源
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CN101489939A (zh) * 2006-07-13 2009-07-22 皇家飞利浦电子股份有限公司 包括辐射源模块和冷却装置的流体处理系统
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Also Published As

Publication number Publication date
CA3123418C (en) 2023-10-10
AU2011314069B2 (en) 2015-04-30
RU2013118110A (ru) 2014-11-10
JP2013541816A (ja) 2013-11-14
EP2622623A2 (en) 2013-08-07
EP2622623A4 (en) 2016-08-31
MX2013003437A (es) 2014-02-27
CN110459460B (zh) 2023-03-21
AU2015206251A1 (en) 2015-08-20
AU2015206251B2 (en) 2017-03-02
US8946662B2 (en) 2015-02-03
CA3123418A1 (en) 2012-04-19
KR20140038340A (ko) 2014-03-28
CA2812947C (en) 2021-06-29
JP6096118B2 (ja) 2017-03-15
CN103415338A (zh) 2013-11-27
RU2592538C2 (ru) 2016-07-20
KR102106293B1 (ko) 2020-06-02
US20130175454A1 (en) 2013-07-11
US20150136999A1 (en) 2015-05-21
US9865448B2 (en) 2018-01-09
CN110459460A (zh) 2019-11-15
WO2012050916A3 (en) 2012-07-19
AU2011314069A1 (en) 2013-05-02
CA2812947A1 (en) 2012-04-19
WO2012050916A2 (en) 2012-04-19

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