JP6096118B2 - エキシマ光源 - Google Patents

エキシマ光源 Download PDF

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Publication number
JP6096118B2
JP6096118B2 JP2013531778A JP2013531778A JP6096118B2 JP 6096118 B2 JP6096118 B2 JP 6096118B2 JP 2013531778 A JP2013531778 A JP 2013531778A JP 2013531778 A JP2013531778 A JP 2013531778A JP 6096118 B2 JP6096118 B2 JP 6096118B2
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JP
Japan
Prior art keywords
excimer
electrodes
gas
ultraviolet
light source
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Active
Application number
JP2013531778A
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English (en)
Japanese (ja)
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JP2013541816A (ja
JP2013541816A5 (enExample
Inventor
ジェイムズ・ランダル・クーパー
ロナルド・ダブリュ・チャッフェ
Original Assignee
ネオ・テック・アクア・ソリューションズ・インコーポレーテッド
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Publication of JP2013541816A publication Critical patent/JP2013541816A/ja
Publication of JP2013541816A5 publication Critical patent/JP2013541816A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
    • G01N23/12—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the material being a flowing fluid or a flowing granular solid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325—Irradiation devices or lamp constructions
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/08—Holders for targets or for other objects to be irradiated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/067—Main electrodes for low-pressure discharge lamps
    • H01J61/0675—Main electrodes for low-pressure discharge lamps characterised by the material of the electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/073—Main electrodes for high-pressure discharge lamps
    • H01J61/0735—Main electrodes for high-pressure discharge lamps characterised by the material of the electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
    • H01J61/16—Selection of substances for gas fillings; Specified operating pressure or temperature having helium, argon, neon, krypton, or xenon as the principle constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14—Circuit arrangements
    • H05B41/24—Circuit arrangements in which the lamp is fed by high frequency AC, or with separate oscillator frequency
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14—Circuit arrangements
    • H05B41/30—Circuit arrangements in which the lamp is fed by pulses, e.g. flash lamp
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/30—Organic compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/322—Lamp arrangement
    • C02F2201/3227—Units with two or more lamps

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • General Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Discharge Lamp (AREA)
  • Physical Water Treatments (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2013531778A 2010-09-29 2011-09-28 エキシマ光源 Active JP6096118B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US38785610P 2010-09-29 2010-09-29
US61/387,856 2010-09-29
PCT/US2011/053751 WO2012050916A2 (en) 2010-09-29 2011-09-28 Excimer light source

Publications (3)

Publication Number Publication Date
JP2013541816A JP2013541816A (ja) 2013-11-14
JP2013541816A5 JP2013541816A5 (enExample) 2014-11-13
JP6096118B2 true JP6096118B2 (ja) 2017-03-15

Family

ID=45938874

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013531778A Active JP6096118B2 (ja) 2010-09-29 2011-09-28 エキシマ光源

Country Status (10)

Country Link
US (2) US8946662B2 (enExample)
EP (1) EP2622623A4 (enExample)
JP (1) JP6096118B2 (enExample)
KR (1) KR102106293B1 (enExample)
CN (2) CN103415338B (enExample)
AU (2) AU2011314069B2 (enExample)
CA (2) CA3123418C (enExample)
MX (1) MX2013003437A (enExample)
RU (1) RU2592538C2 (enExample)
WO (1) WO2012050916A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012017779A1 (de) * 2012-09-07 2014-03-13 Karlsruher Institut für Technologie Dielektrisch behinderte Entladungs-Lampe
CN103227098A (zh) * 2013-05-15 2013-07-31 王颂 282nm、222nm无极准分子灯
JP6241971B2 (ja) * 2015-02-03 2017-12-06 合同会社紫光技研 ガス放電装置とそれを使用した平面光源およびそれらの駆動方法
CN205191526U (zh) * 2015-11-06 2016-04-27 东莞莹辉灯饰有限公司 Led净化节能灯
US11614407B2 (en) 2020-04-20 2023-03-28 Denovo Lighting, Llc Devices for instant detection and disinfection of aerosol droplet particles using UV light sources
US11786622B2 (en) 2020-05-08 2023-10-17 Ultra-Violet Solutions, Llc Far UV-C light apparatus
JP6948606B1 (ja) * 2020-08-28 2021-10-13 ウシオ電機株式会社 エキシマランプ及び光照射装置
WO2022116366A1 (zh) * 2020-12-04 2022-06-09 广明源光科技股份有限公司 准分子灯
CN113270309A (zh) * 2021-06-21 2021-08-17 深圳市大博实业有限公司 一种uv准分子灯

Family Cites Families (24)

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Publication number Priority date Publication date Assignee Title
US3927342A (en) * 1969-04-28 1975-12-16 Owens Illinois Inc Capillary tube gas discharge device
JPH03503821A (ja) * 1988-04-25 1991-08-22 シーメンス、アクチエンゲゼルシヤフト 放電励起ガスレーザにおける予備電離、特にｘ線予備電離のための装置
JPH04303549A (ja) * 1991-03-30 1992-10-27 Toshiba Lighting & Technol Corp 高周波点灯式放電ランプ
JP3291809B2 (ja) * 1993-01-20 2002-06-17 ウシオ電機株式会社 誘電体バリヤ放電ランプを使用した処理方法
JPH09259834A (ja) * 1996-03-26 1997-10-03 Toshiba Corp 真空紫外光源
JPH1021880A (ja) * 1996-07-08 1998-01-23 Toshiba Lighting & Technol Corp 放電ランプ、照射装置、殺菌装置および水処理装置
RU2120152C1 (ru) * 1996-12-16 1998-10-10 Общество с ограниченной ответственностью "Микроэлектронные системы" - ООО "МИКС" Газоразрядная лампа
US7006546B2 (en) * 2000-03-15 2006-02-28 Komatsu Ltd. Gas laser electrode, laser chamber employing the electrode, and gas laser device
CA2466953A1 (en) * 2001-11-14 2003-08-14 Blacklight Power, Inc. Hydrogen power, plasma, and reactor for lasing, and power conversion
CN2592631Y (zh) * 2002-08-28 2003-12-17 中国科学院等离子体物理研究所 准分子紫外光源
WO2004033756A1 (ja) * 2002-10-10 2004-04-22 Kansai Paint Co., Ltd. 半導体膜の形成方法及び半導体膜の用途
CA2511554C (en) 2003-01-02 2013-07-09 Ultraviolet Sciences, Inc. Micro-discharge devices and applications
GB2399216B (en) * 2003-03-06 2007-05-09 Quay Technologies Ltd Ultraviolet light source
JP4013923B2 (ja) * 2003-09-04 2007-11-28 ウシオ電機株式会社 エキシマランプ
WO2005098903A1 (ja) * 2004-04-08 2005-10-20 Sen Engineering Co., Ltd. 誘電体バリア放電エキシマ光源
KR20080002851A (ko) * 2005-04-22 2008-01-04 호야 칸데오 옵트로닉스 가부시키가이샤 엑시머 램프
JP2006302720A (ja) * 2005-04-22 2006-11-02 Ｈｏｙａ Ｃａｎｄｅｏ Ｏｐｔｒｏｎｉｃｓ株式会社 エキシマランプ
JP2005317555A (ja) * 2005-07-12 2005-11-10 Quark Systems Co Ltd エキシマランプ及びエキシマ照射装置
JP2007088116A (ja) * 2005-09-21 2007-04-05 Harison Toshiba Lighting Corp 紫外光照射装置および光洗浄装置
EP2046687B1 (en) * 2006-07-13 2010-02-10 Philips Intellectual Property & Standards GmbH Fluid treatment system comprising radiation source module and cooling means
JP4424394B2 (ja) * 2007-08-31 2010-03-03 ウシオ電機株式会社 エキシマランプ
US8946993B2 (en) * 2008-05-15 2015-02-03 Rutgers, The State University Fluorescent excimer lamps
JP2010056008A (ja) * 2008-08-29 2010-03-11 Ehime Univ 無水銀殺菌ランプおよび殺菌装置
CN102870235B (zh) * 2009-11-10 2016-11-23 免疫之光有限责任公司 用于从包括用于上变频的射频、微波能量和磁感应源的各种能量源产生发射光的上下变频系统

Also Published As

Publication number Publication date
CA3123418C (en) 2023-10-10
AU2011314069B2 (en) 2015-04-30
RU2013118110A (ru) 2014-11-10
JP2013541816A (ja) 2013-11-14
EP2622623A2 (en) 2013-08-07
EP2622623A4 (en) 2016-08-31
MX2013003437A (es) 2014-02-27
CN110459460B (zh) 2023-03-21
AU2015206251A1 (en) 2015-08-20
AU2015206251B2 (en) 2017-03-02
CN103415338B (zh) 2019-09-10
US8946662B2 (en) 2015-02-03
CA3123418A1 (en) 2012-04-19
KR20140038340A (ko) 2014-03-28
CA2812947C (en) 2021-06-29
CN103415338A (zh) 2013-11-27
RU2592538C2 (ru) 2016-07-20
KR102106293B1 (ko) 2020-06-02
US20130175454A1 (en) 2013-07-11
US20150136999A1 (en) 2015-05-21
US9865448B2 (en) 2018-01-09
CN110459460A (zh) 2019-11-15
WO2012050916A3 (en) 2012-07-19
AU2011314069A1 (en) 2013-05-02
CA2812947A1 (en) 2012-04-19
WO2012050916A2 (en) 2012-04-19

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