CN103350108B - 利用倾斜轧制控制板材和片材织构的方法和设备 - Google Patents
利用倾斜轧制控制板材和片材织构的方法和设备 Download PDFInfo
- Publication number
- CN103350108B CN103350108B CN201310268498.5A CN201310268498A CN103350108B CN 103350108 B CN103350108 B CN 103350108B CN 201310268498 A CN201310268498 A CN 201310268498A CN 103350108 B CN103350108 B CN 103350108B
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- CN
- China
- Prior art keywords
- rolling
- workpiece
- texture
- rolls
- degrees
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005096 rolling process Methods 0.000 title claims abstract description 200
- 238000000034 method Methods 0.000 title claims abstract description 57
- 239000000463 material Substances 0.000 title description 38
- 229910052751 metal Inorganic materials 0.000 claims abstract description 26
- 239000002184 metal Substances 0.000 claims abstract description 26
- 230000009467 reduction Effects 0.000 claims description 27
- 230000000694 effects Effects 0.000 claims description 15
- 238000001953 recrystallisation Methods 0.000 claims description 11
- 238000002788 crimping Methods 0.000 claims description 5
- 238000001887 electron backscatter diffraction Methods 0.000 claims description 5
- 238000004663 powder metallurgy Methods 0.000 claims description 5
- 230000008859 change Effects 0.000 claims description 4
- 238000007514 turning Methods 0.000 claims description 2
- 238000012546 transfer Methods 0.000 abstract description 4
- 238000004088 simulation Methods 0.000 description 21
- 239000010408 film Substances 0.000 description 12
- 150000002739 metals Chemical class 0.000 description 8
- 230000001186 cumulative effect Effects 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 229910000976 Electrical steel Inorganic materials 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052715 tantalum Inorganic materials 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 238000005555 metalworking Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000005477 sputtering target Methods 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 238000012935 Averaging Methods 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009694 cold isostatic pressing Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000001513 hot isostatic pressing Methods 0.000 description 1
- 238000005098 hot rolling Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000011158 quantitative evaluation Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
- B21B1/227—Surface roughening or texturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/18—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces by using pressure rollers
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
- C22F1/18—High-melting or refractory metals or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B2265/00—Forming parameters
- B21B2265/24—Forming parameters asymmetric rolling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B2267/00—Roll parameters
- B21B2267/02—Roll dimensions
- B21B2267/06—Roll diameter
- B21B2267/065—Top and bottom roll have different diameters; Asymmetrical rolling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B2273/00—Path parameters
- B21B2273/02—Vertical deviation, e.g. slack, looper height
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B39/00—Arrangements for moving, supporting, or positioning work, or controlling its movement, combined with or arranged in, or specially adapted for use in connection with, metal-rolling mills
- B21B39/02—Feeding or supporting work; Braking or tensioning arrangements, e.g. threading arrangements
- B21B39/04—Lifting or lowering work for conveying purposes, e.g. tilting tables arranged immediately in front of or behind the pass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12458—All metal or with adjacent metals having composition, density, or hardness gradient
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Metal Rolling (AREA)
- Powder Metallurgy (AREA)
- Control Of Metal Rolling (AREA)
- Forging (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US96361607P | 2007-08-06 | 2007-08-06 | |
| US60/963616 | 2007-08-06 | ||
| US60/963,616 | 2007-08-06 | ||
| CN2008801019474A CN101772385B (zh) | 2007-08-06 | 2008-08-06 | 利用倾斜轧制控制板材和片材织构的方法和设备 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008801019474A Division CN101772385B (zh) | 2007-08-06 | 2008-08-06 | 利用倾斜轧制控制板材和片材织构的方法和设备 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103350108A CN103350108A (zh) | 2013-10-16 |
| CN103350108B true CN103350108B (zh) | 2016-12-28 |
Family
ID=40020260
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310268498.5A Expired - Fee Related CN103350108B (zh) | 2007-08-06 | 2008-08-06 | 利用倾斜轧制控制板材和片材织构的方法和设备 |
| CN2008801019474A Expired - Fee Related CN101772385B (zh) | 2007-08-06 | 2008-08-06 | 利用倾斜轧制控制板材和片材织构的方法和设备 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008801019474A Expired - Fee Related CN101772385B (zh) | 2007-08-06 | 2008-08-06 | 利用倾斜轧制控制板材和片材织构的方法和设备 |
Country Status (7)
| Country | Link |
|---|---|
| US (5) | US9095885B2 (https=) |
| EP (3) | EP2185300B1 (https=) |
| JP (6) | JP5389802B2 (https=) |
| KR (3) | KR101201577B1 (https=) |
| CN (2) | CN103350108B (https=) |
| CA (1) | CA2694355A1 (https=) |
| WO (2) | WO2009020587A1 (https=) |
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| US7837929B2 (en) * | 2005-10-20 | 2010-11-23 | H.C. Starck Inc. | Methods of making molybdenum titanium sputtering plates and targets |
| EP2185300B1 (en) | 2007-08-06 | 2018-10-24 | H. C. Starck, Inc. | Refractory metal plates with improved uniformity of texture |
| KR101626286B1 (ko) * | 2008-11-03 | 2016-06-01 | 토소우 에스엠디, 인크 | 스퍼터 타겟 제조 방법 및 이에 의해 제조된 스퍼터 타겟 |
| US8449817B2 (en) | 2010-06-30 | 2013-05-28 | H.C. Stark, Inc. | Molybdenum-containing targets comprising three metal elements |
| US8449818B2 (en) | 2010-06-30 | 2013-05-28 | H. C. Starck, Inc. | Molybdenum containing targets |
| KR20160021299A (ko) | 2011-05-10 | 2016-02-24 | 에이치. 씨. 스타아크 아이앤씨 | 멀티-블록 스퍼터링 타겟 및 이에 관한 제조방법 및 물품 |
| US9216445B2 (en) | 2011-08-03 | 2015-12-22 | Ut-Battelle, Llc | Method of forming magnesium alloy sheets |
| CN103105776B (zh) * | 2011-11-15 | 2015-03-04 | 宝山钢铁股份有限公司 | 无取向硅钢酸洗剪边控制方法 |
| US9334565B2 (en) | 2012-05-09 | 2016-05-10 | H.C. Starck Inc. | Multi-block sputtering target with interface portions and associated methods and articles |
| CN102719772B (zh) * | 2012-07-04 | 2013-08-07 | 北京科技大学 | 有两表面不同粗糙度和非对称梯度组织的铜材及成形方法 |
| JP2014110276A (ja) | 2012-11-30 | 2014-06-12 | Samsung Display Co Ltd | 有機電界発光素子用正孔輸送材料及びそれを用いた有機電界発光素子 |
| CN104690088A (zh) * | 2013-12-05 | 2015-06-10 | 北京有色金属研究总院 | 一种轧制工艺的模拟实验方法 |
| CN104801541A (zh) * | 2014-01-23 | 2015-07-29 | 大连理工大学 | 一种制备高室温塑性镁合金板材的轧制方法 |
| WO2015146516A1 (ja) * | 2014-03-27 | 2015-10-01 | Jx日鉱日石金属株式会社 | タンタルスパッタリングターゲット及びその製造方法 |
| WO2015157421A1 (en) * | 2014-04-11 | 2015-10-15 | H.C. Starck Inc. | High purity refractory metal sputtering targets which have a uniform random texture manufactured by hot isostatic pressing high purity refractory metal powders |
| JP6602550B2 (ja) | 2014-04-28 | 2019-11-06 | 株式会社アライドマテリアル | スパッタリングターゲット用材料 |
| CN104226565B (zh) * | 2014-08-27 | 2016-04-06 | 史建平 | Uv固化机用压平防撞结构 |
| CN104646416B (zh) * | 2015-01-16 | 2016-08-17 | 湖南科技大学 | 一种金属板材强剪切轧制成形方法与装置 |
| DE102015101580B3 (de) | 2015-02-04 | 2016-06-02 | Hydro Aluminium Rolled Products Gmbh | Verfahren und Vorrichtung zum Prägewalzen eines Bandes |
| JP6293929B2 (ja) * | 2015-05-22 | 2018-03-14 | Ｊｘ金属株式会社 | タンタルスパッタリングターゲット及びその製造方法 |
| WO2016190159A1 (ja) * | 2015-05-22 | 2016-12-01 | Ｊｘ金属株式会社 | タンタルスパッタリングターゲット及びその製造方法 |
| JP6638639B2 (ja) * | 2016-12-19 | 2020-01-29 | トヨタ自動車株式会社 | 差厚金属板の製造方法、プレス部品の製造方法及び加工機 |
| CN106756832B (zh) * | 2016-12-27 | 2019-03-12 | 宁夏东方钽业股份有限公司 | 一种靶材的制备方法 |
| US11062889B2 (en) | 2017-06-26 | 2021-07-13 | Tosoh Smd, Inc. | Method of production of uniform metal plates and sputtering targets made thereby |
| CN109213086B (zh) * | 2017-06-29 | 2020-10-23 | 台湾积体电路制造股份有限公司 | 制程系统与制程方法 |
| CN108465700B (zh) * | 2018-03-13 | 2020-09-08 | 重庆大学 | 一种获得均匀组织和织构的溅射靶材用钽板轧制方法 |
| WO2020018710A1 (en) * | 2018-07-17 | 2020-01-23 | Viaderm Llc | Indwelling hyper-dimensional cardiac physiologic data logging and transmission system and method of doing business |
| CN110586942B (zh) * | 2018-12-17 | 2020-08-14 | 南京中科煜宸激光技术有限公司 | 3d打印制造梯度管材及微观组织调控的方法 |
| CN115116857B (zh) * | 2022-07-01 | 2024-08-02 | 江西蓝微电子科技有限公司 | 一种绝缘覆合金键合丝及其制备方法 |
| WO2025006859A1 (en) | 2023-06-29 | 2025-01-02 | Materion Corporation | Metals and metal alloys for sputtering targets |
| US20250179624A1 (en) * | 2023-12-05 | 2025-06-05 | Tosoh Smd, Inc. | Tantalum sputtering target with improved performance and predictability and method of manufacturing |
| TW202544262A (zh) | 2023-12-15 | 2025-11-16 | 美商萬騰榮公司 | 耐火金屬板 |
| CN117947248A (zh) * | 2024-01-30 | 2024-04-30 | 太原理工大学 | 一种强立方织构高硅无取向硅钢的制备方法 |
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