CN1032339C - 半导体器件 - Google Patents

半导体器件 Download PDF

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Publication number
CN1032339C
CN1032339C CN93104442A CN93104442A CN1032339C CN 1032339 C CN1032339 C CN 1032339C CN 93104442 A CN93104442 A CN 93104442A CN 93104442 A CN93104442 A CN 93104442A CN 1032339 C CN1032339 C CN 1032339C
Authority
CN
China
Prior art keywords
region
voltage
jfet
transistor
channel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN93104442A
Other languages
English (en)
Chinese (zh)
Other versions
CN1082254A (zh
Inventor
F·A·C·M·舒夫斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronics NV filed Critical Philips Electronics NV
Publication of CN1082254A publication Critical patent/CN1082254A/zh
Application granted granted Critical
Publication of CN1032339C publication Critical patent/CN1032339C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/87—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of PN-junction gate FETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/025—Manufacture or treatment of FETs having insulated gates [IGFET] of vertical IGFETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0223—Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate
    • H10D30/0227—Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate having both lightly-doped source and drain extensions and source and drain regions self-aligned to the sides of the gate, e.g. lightly-doped drain [LDD] MOSFET or double-diffused drain [DDD] MOSFET
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/202—FETs having static field-induced regions, e.g. static-induction transistors [SIT] or permeable base transistors [PBT]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/80—FETs having rectifying junction gate electrodes
    • H10D30/83—FETs having PN junction gate electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]

Landscapes

  • Junction Field-Effect Transistors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Noodles (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Bipolar Transistors (AREA)
CN93104442A 1992-04-14 1993-04-08 半导体器件 Expired - Fee Related CN1032339C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP92201046.7 1992-04-14
EP92201046 1992-04-14

Publications (2)

Publication Number Publication Date
CN1082254A CN1082254A (zh) 1994-02-16
CN1032339C true CN1032339C (zh) 1996-07-17

Family

ID=8210549

Family Applications (1)

Application Number Title Priority Date Filing Date
CN93104442A Expired - Fee Related CN1032339C (zh) 1992-04-14 1993-04-08 半导体器件

Country Status (7)

Country Link
US (1) US5338949A (https=)
JP (1) JP3509896B2 (https=)
KR (1) KR100263602B1 (https=)
CN (1) CN1032339C (https=)
AT (1) ATE195037T1 (https=)
DE (1) DE69329083T2 (https=)
TW (1) TW287307B (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11191596A (ja) * 1997-04-02 1999-07-13 Sony Corp 半導体メモリセル及びその製造方法
JP3858332B2 (ja) * 1997-04-09 2006-12-13 ソニー株式会社 電界効果トランジスタのピンチオフ電圧の測定回路、測定用トランジスタ、測定方法および製造方法
CN1147935C (zh) * 2000-12-18 2004-04-28 黄敞 互补偶载场效应晶体管及其片上系统
US7829941B2 (en) * 2006-01-24 2010-11-09 Alpha & Omega Semiconductor, Ltd. Configuration and method to form MOSFET devices with low resistance silicide gate and mesa contact regions
CN100570885C (zh) * 2006-06-30 2009-12-16 崇贸科技股份有限公司 具有高击穿电压的电压夹断装置及其制造方法
TWI405332B (zh) 2010-03-10 2013-08-11 Macronix Int Co Ltd 接面場效應電晶體元件
US9159710B2 (en) * 2010-12-01 2015-10-13 Cornell University Structures and methods for electrically and mechanically linked monolithically integrated transistor and NEMS/MEMS device
US9214457B2 (en) 2011-09-20 2015-12-15 Alpha & Omega Semiconductor Incorporated Method of integrating high voltage devices
CN103137686B (zh) * 2011-11-24 2016-01-06 中芯国际集成电路制造(北京)有限公司 半导体器件及其制造方法
CN103137685B (zh) 2011-11-24 2015-09-30 中芯国际集成电路制造(北京)有限公司 半导体器件及其制造方法
CN103904078A (zh) * 2012-12-28 2014-07-02 旺宏电子股份有限公司 高电压接面场效晶体管结构

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3450963A (en) * 1966-12-30 1969-06-17 Westinghouse Electric Corp Field effect semiconductor devices of the junction type and method of making
US3967305A (en) * 1969-03-27 1976-06-29 Mcdonnell Douglas Corporation Multichannel junction field-effect transistor and process
JPS53139987A (en) * 1977-05-13 1978-12-06 Nec Corp Monolithic impedance converting circuit
JPS5425175A (en) * 1977-07-27 1979-02-24 Nippon Gakki Seizo Kk Integrated circuit device
FR2411512A1 (fr) * 1977-12-06 1979-07-06 Lardy Jean Louis Porte logique a transistor mos multidrain
US4516037A (en) * 1978-12-20 1985-05-07 At&T Bell Laboratories Control circuitry for high voltage solid-state switches
JPS5740983A (en) * 1980-08-26 1982-03-06 Nec Corp Semiconductor device and manufacture thereof
JPS61112381A (ja) * 1984-11-07 1986-05-30 Hitachi Ltd 半導体装置
US4816881A (en) * 1985-06-27 1989-03-28 United State Of America As Represented By The Secretary Of The Navy A TiW diffusion barrier for AuZn ohmic contacts to p-type InP
JPH0244413A (ja) * 1988-08-05 1990-02-14 Nec Corp 定電流供給回路
US4951114A (en) * 1988-12-05 1990-08-21 Raytheon Company Complementary metal electrode semiconductor device

Also Published As

Publication number Publication date
JP3509896B2 (ja) 2004-03-22
US5338949A (en) 1994-08-16
KR100263602B1 (ko) 2000-08-01
KR930022604A (ko) 1993-11-24
ATE195037T1 (de) 2000-08-15
CN1082254A (zh) 1994-02-16
TW287307B (https=) 1996-10-01
DE69329083T2 (de) 2001-08-02
DE69329083D1 (de) 2000-08-31
JPH0855860A (ja) 1996-02-27

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C53 Correction of patent of invention or patent application
COR Change of bibliographic data

Free format text: CORRECT: PATENTEE; FROM: N.V. PHILIPS OPTICAL LAMP LTD., CO. TO: ROYAL PHILIPS ELECTRONICS CO., LTD.

CP01 Change in the name or title of a patent holder

Patentee after: Koninklike Philips Electronics N. V.

Patentee before: Philips Electronics N. V.

ASS Succession or assignment of patent right

Owner name: NXP CO., LTD.

Free format text: FORMER OWNER: ROYAL PHILIPS ELECTRONICS CO., LTD.

Effective date: 20070824

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20070824

Address after: Holland Ian Deho Finn

Patentee after: Koninkl Philips Electronics NV

Address before: Holland Ian Deho Finn

Patentee before: Koninklike Philips Electronics N. V.

C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 19960717

Termination date: 20110408