CN103147118B - 一种利用直拉区熔法制备太阳能级硅单晶的方法 - Google Patents
一种利用直拉区熔法制备太阳能级硅单晶的方法 Download PDFInfo
- Publication number
- CN103147118B CN103147118B CN201310057877.XA CN201310057877A CN103147118B CN 103147118 B CN103147118 B CN 103147118B CN 201310057877 A CN201310057877 A CN 201310057877A CN 103147118 B CN103147118 B CN 103147118B
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- silicon single
- single crystal
- solar energy
- energy level
- level silicon
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- 239000013078 crystal Substances 0.000 title claims abstract description 54
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 41
- 239000010703 silicon Substances 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 31
- 238000004857 zone melting Methods 0.000 title claims abstract description 11
- 238000006243 chemical reaction Methods 0.000 abstract description 5
- 239000007789 gas Substances 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- 230000002457 bidirectional effect Effects 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 238000003723 Smelting Methods 0.000 description 1
- OBOXTJCIIVUZEN-UHFFFAOYSA-N [C].[O] Chemical compound [C].[O] OBOXTJCIIVUZEN-UHFFFAOYSA-N 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/32—Mechanisms for moving either the charge or the heater
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/08—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone
- C30B13/10—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone with addition of doping materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/26—Stirring of the molten zone
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/28—Controlling or regulating
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/28—Controlling or regulating
- C30B13/30—Stabilisation or shape controlling of the molten zone, e.g. by concentrators, by electromagnetic fields; Controlling the section of the crystal
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
- C30B15/04—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt adding doping materials, e.g. for n-p-junction
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
Claims (1)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310057877.XA CN103147118B (zh) | 2013-02-25 | 2013-02-25 | 一种利用直拉区熔法制备太阳能级硅单晶的方法 |
JP2015558331A JP2016508479A (ja) | 2013-02-25 | 2013-11-01 | チョクラルスキー・ゾーンメルト法を用いたソーラーグレードシリコン単結晶の製造方法 |
US14/769,627 US20160002819A1 (en) | 2013-02-25 | 2013-11-01 | Method for preparing solar grade silicon single crystal using czochralski zone melting method |
EP13875504.6A EP2955252A4 (en) | 2013-02-25 | 2013-11-01 | PROCESS FOR THE PREPARATION OF SOLAR QUALITY SILICON MONOCRYSTAL BY MEANS OF A ZONE FUSION CZOCHRALSKI PROCESS |
PCT/CN2013/086395 WO2014127646A1 (zh) | 2013-02-25 | 2013-11-01 | 一种利用直拉区熔法制备太阳能级硅单晶的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310057877.XA CN103147118B (zh) | 2013-02-25 | 2013-02-25 | 一种利用直拉区熔法制备太阳能级硅单晶的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103147118A CN103147118A (zh) | 2013-06-12 |
CN103147118B true CN103147118B (zh) | 2016-03-30 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201310057877.XA Active CN103147118B (zh) | 2013-02-25 | 2013-02-25 | 一种利用直拉区熔法制备太阳能级硅单晶的方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20160002819A1 (zh) |
EP (1) | EP2955252A4 (zh) |
JP (1) | JP2016508479A (zh) |
CN (1) | CN103147118B (zh) |
WO (1) | WO2014127646A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103147118B (zh) * | 2013-02-25 | 2016-03-30 | 天津市环欧半导体材料技术有限公司 | 一种利用直拉区熔法制备太阳能级硅单晶的方法 |
CN109440183B (zh) * | 2018-12-20 | 2020-11-13 | 天津中环领先材料技术有限公司 | 一种优化型大直径区熔硅单晶收尾方法 |
CN110904496A (zh) * | 2019-11-20 | 2020-03-24 | 浙江法曼工业皮带有限公司 | 一种单晶加热炉及其高效保温方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1865529A (zh) * | 2006-04-26 | 2006-11-22 | 天津市环欧半导体材料技术有限公司 | 气相预掺杂和中子辐照掺杂组合的区熔硅单晶的生产方法 |
CN1865531A (zh) * | 2006-04-21 | 2006-11-22 | 天津市环欧半导体材料技术有限公司 | 气相掺杂区熔硅单晶的生产方法 |
WO2010083818A1 (de) * | 2009-01-21 | 2010-07-29 | Pv Silicon Forschungs Und Produktions Gmbh | Verfahren und vorrichtung zur herstellung von siliziumdünnstäben |
CN102304757A (zh) * | 2011-10-11 | 2012-01-04 | 天津市环欧半导体材料技术有限公司 | 用直拉区熔法制备6英寸p型太阳能硅单晶的方法 |
CN102534749A (zh) * | 2012-02-14 | 2012-07-04 | 天津市环欧半导体材料技术有限公司 | 用直拉区熔法制备6英寸n型太阳能硅单晶的方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3053958B2 (ja) * | 1992-04-10 | 2000-06-19 | 光弘 丸山 | 浮遊帯溶融法による結晶の製造装置 |
DE10137857B4 (de) * | 2001-08-02 | 2006-11-16 | Siltronic Ag | Verfahren zur Herstellung eines Einkristalls |
NO333319B1 (no) * | 2003-12-29 | 2013-05-06 | Elkem As | Silisiummateriale for fremstilling av solceller |
JP5296992B2 (ja) * | 2007-01-31 | 2013-09-25 | Sumco Techxiv株式会社 | シリコン結晶素材及びその製造方法 |
JP5318365B2 (ja) * | 2007-04-24 | 2013-10-16 | Sumco Techxiv株式会社 | シリコン結晶素材及びこれを用いたfzシリコン単結晶の製造方法 |
JP4771989B2 (ja) * | 2007-04-25 | 2011-09-14 | Sumco Techxiv株式会社 | Fz法シリコン単結晶の製造方法 |
JP4831203B2 (ja) * | 2009-04-24 | 2011-12-07 | 信越半導体株式会社 | 半導体単結晶の製造方法および半導体単結晶の製造装置 |
JP5375889B2 (ja) * | 2010-12-28 | 2013-12-25 | 信越半導体株式会社 | 単結晶の製造方法 |
CN103147118B (zh) * | 2013-02-25 | 2016-03-30 | 天津市环欧半导体材料技术有限公司 | 一种利用直拉区熔法制备太阳能级硅单晶的方法 |
-
2013
- 2013-02-25 CN CN201310057877.XA patent/CN103147118B/zh active Active
- 2013-11-01 JP JP2015558331A patent/JP2016508479A/ja active Pending
- 2013-11-01 WO PCT/CN2013/086395 patent/WO2014127646A1/zh active Application Filing
- 2013-11-01 EP EP13875504.6A patent/EP2955252A4/en not_active Withdrawn
- 2013-11-01 US US14/769,627 patent/US20160002819A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1865531A (zh) * | 2006-04-21 | 2006-11-22 | 天津市环欧半导体材料技术有限公司 | 气相掺杂区熔硅单晶的生产方法 |
CN1865529A (zh) * | 2006-04-26 | 2006-11-22 | 天津市环欧半导体材料技术有限公司 | 气相预掺杂和中子辐照掺杂组合的区熔硅单晶的生产方法 |
WO2010083818A1 (de) * | 2009-01-21 | 2010-07-29 | Pv Silicon Forschungs Und Produktions Gmbh | Verfahren und vorrichtung zur herstellung von siliziumdünnstäben |
CN102304757A (zh) * | 2011-10-11 | 2012-01-04 | 天津市环欧半导体材料技术有限公司 | 用直拉区熔法制备6英寸p型太阳能硅单晶的方法 |
CN102534749A (zh) * | 2012-02-14 | 2012-07-04 | 天津市环欧半导体材料技术有限公司 | 用直拉区熔法制备6英寸n型太阳能硅单晶的方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2014127646A1 (zh) | 2014-08-28 |
EP2955252A1 (en) | 2015-12-16 |
EP2955252A4 (en) | 2015-12-16 |
JP2016508479A (ja) | 2016-03-22 |
CN103147118A (zh) | 2013-06-12 |
US20160002819A1 (en) | 2016-01-07 |
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