CN103140750B - 反射率测定装置、反射率测定方法、膜厚测定装置及膜厚测定方法 - Google Patents

反射率测定装置、反射率测定方法、膜厚测定装置及膜厚测定方法 Download PDF

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Publication number
CN103140750B
CN103140750B CN201180044880.7A CN201180044880A CN103140750B CN 103140750 B CN103140750 B CN 103140750B CN 201180044880 A CN201180044880 A CN 201180044880A CN 103140750 B CN103140750 B CN 103140750B
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measurement
light
wavelength
optical waveguide
irradiation light
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CN103140750A (zh
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大塚贤一
中野哲寿
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Hamamatsu Photonics KK
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Hamamatsu Photonics KK
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0658—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of emissivity or reradiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
CN201180044880.7A 2010-09-17 2011-09-14 反射率测定装置、反射率测定方法、膜厚测定装置及膜厚测定方法 Active CN103140750B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010-209668 2010-09-17
JP2010209668A JP2012063321A (ja) 2010-09-17 2010-09-17 反射率測定装置、反射率測定方法、膜厚測定装置及び膜厚測定方法
PCT/JP2011/071020 WO2012036213A1 (ja) 2010-09-17 2011-09-14 反射率測定装置、反射率測定方法、膜厚測定装置及び膜厚測定方法

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CN103140750A CN103140750A (zh) 2013-06-05
CN103140750B true CN103140750B (zh) 2015-06-03

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US (1) US8699023B2 (enExample)
JP (1) JP2012063321A (enExample)
KR (1) KR20130106810A (enExample)
CN (1) CN103140750B (enExample)
DE (1) DE112011103113B4 (enExample)
TW (1) TWI513972B (enExample)
WO (1) WO2012036213A1 (enExample)

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WO2014038090A1 (ja) * 2012-09-10 2014-03-13 株式会社シンクロン 測定装置及び成膜装置
AU2014211384A1 (en) 2013-01-31 2015-07-02 Ventana Medical Systems, Inc. Systems and methods for calibrating, configuring and validating an imaging device or system for multiplex tissue assays
US9909988B2 (en) * 2014-01-09 2018-03-06 Sharp Kabushiki Kaisha Light intensity detector and detection method
KR102109245B1 (ko) * 2015-05-12 2020-05-11 코니카 미놀타 가부시키가이샤 식물 생육 지표 측정 장치 및 그의 방법 그리고 식물 생육 지표 측정 시스템
JP6248244B1 (ja) * 2016-08-09 2017-12-20 ナルックス株式会社 位置測定部を備えた部品
JP6533770B2 (ja) * 2016-11-10 2019-06-19 日東電工株式会社 基準器、分光干渉式計測装置、塗布装置、分光干渉式計測装置の計測精度保証方法、及び、塗布膜の製造方法。
JP7076951B2 (ja) * 2017-05-23 2022-05-30 株式会社ディスコ 反射率検出装置
WO2019087848A1 (ja) * 2017-11-01 2019-05-09 コニカミノルタ株式会社 膜厚測定方法、膜厚測定システム、光反射フィルムの製造方法及び光反射フィルムの製造システム
TWI848121B (zh) * 2019-06-10 2024-07-11 日商東京威力科創股份有限公司 基板處理裝置、基板檢查方法及記錄媒體
JP7341849B2 (ja) * 2019-10-24 2023-09-11 大塚電子株式会社 光学測定装置および光学測定方法
JP6875489B2 (ja) * 2019-11-06 2021-05-26 株式会社キーエンス 共焦点変位計
CN110806388B (zh) * 2019-11-20 2022-05-27 河南牧业经济学院 柱状镭射纸的暗光柱定位装置、定位方法及颜色测量方法
US12074076B2 (en) * 2020-03-11 2024-08-27 Hitachi High-Tech Corporation Plasma processing apparatus and plasma processing method
GB202009640D0 (en) 2020-06-24 2020-08-05 Ams Sensors Singapore Pte Ltd Optical detection system calibration
CN116157658A (zh) * 2020-07-29 2023-05-23 美国杰莫洛吉克尔研究所有限公司 (Gia) 用于宝石鉴定的紫外线-可见光吸收光谱法
JP7264134B2 (ja) * 2020-08-26 2023-04-25 横河電機株式会社 分光分析装置、光学系、及び方法
KR102654984B1 (ko) * 2020-11-25 2024-04-08 주식회사 필로포스 분광영역 광비선형성 단층촬영장치
US20240321400A1 (en) * 2020-12-30 2024-09-26 Seegene, Inc. Optical spectrometry-based method and device for detecting target analyte in sample
JP7379442B2 (ja) 2021-11-01 2023-11-14 キヤノントッキ株式会社 反射率測定装置、成膜装置
CN113720825B (zh) * 2021-11-04 2022-02-08 四川丹诺迪科技有限公司 光学即时检测器及检测方法和应用
JPWO2024122132A1 (enExample) 2022-12-06 2024-06-13
CN116183554B (zh) * 2023-02-24 2025-10-03 河南仕佳光子科技股份有限公司 一种光学镀膜超低反射率的拟合方法
CN120253756B (zh) * 2025-06-09 2025-08-29 南开大学 一种光学薄膜折射率与厚度的测量方法及系统

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JP2000212773A (ja) * 1999-01-20 2000-08-02 Hamamatsu Photonics Kk ウエットエッチング終点検出装置
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CN101017254A (zh) * 2006-02-09 2007-08-15 三菱电机株式会社 反射率测定装置、反射率测定方法及显示面板的制造方法
CN101802543A (zh) * 2008-02-13 2010-08-11 株式会社Snu精密 厚度测定装置

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JP2000212773A (ja) * 1999-01-20 2000-08-02 Hamamatsu Photonics Kk ウエットエッチング終点検出装置
CN1664493A (zh) * 2004-03-04 2005-09-07 大日本网目版制造株式会社 膜厚测定方法和装置
CN101017254A (zh) * 2006-02-09 2007-08-15 三菱电机株式会社 反射率测定装置、反射率测定方法及显示面板的制造方法
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Also Published As

Publication number Publication date
TWI513972B (zh) 2015-12-21
JP2012063321A (ja) 2012-03-29
KR20130106810A (ko) 2013-09-30
DE112011103113T5 (de) 2013-08-08
TW201224430A (en) 2012-06-16
US8699023B2 (en) 2014-04-15
WO2012036213A1 (ja) 2012-03-22
CN103140750A (zh) 2013-06-05
DE112011103113B4 (de) 2022-11-10
US20130169968A1 (en) 2013-07-04

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