TWI513972B - Reflectance measuring apparatus reflectivity measurement method, film thickness measuring apparatus and method for measuring film thickness - Google Patents

Reflectance measuring apparatus reflectivity measurement method, film thickness measuring apparatus and method for measuring film thickness Download PDF

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Publication number
TWI513972B
TWI513972B TW100133490A TW100133490A TWI513972B TW I513972 B TWI513972 B TW I513972B TW 100133490 A TW100133490 A TW 100133490A TW 100133490 A TW100133490 A TW 100133490A TW I513972 B TWI513972 B TW I513972B
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TW
Taiwan
Prior art keywords
light
measurement
wavelength
optical waveguide
reflectance
Prior art date
Application number
TW100133490A
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English (en)
Chinese (zh)
Other versions
TW201224430A (en
Inventor
Kenichi Ohtsuka
Tetsuhisa Nakano
Original Assignee
Hamamatsu Photonics Kk
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Application filed by Hamamatsu Photonics Kk filed Critical Hamamatsu Photonics Kk
Publication of TW201224430A publication Critical patent/TW201224430A/zh
Application granted granted Critical
Publication of TWI513972B publication Critical patent/TWI513972B/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0658—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of emissivity or reradiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
TW100133490A 2010-09-17 2011-09-16 Reflectance measuring apparatus reflectivity measurement method, film thickness measuring apparatus and method for measuring film thickness TWI513972B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010209668A JP2012063321A (ja) 2010-09-17 2010-09-17 反射率測定装置、反射率測定方法、膜厚測定装置及び膜厚測定方法

Publications (2)

Publication Number Publication Date
TW201224430A TW201224430A (en) 2012-06-16
TWI513972B true TWI513972B (zh) 2015-12-21

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW100133490A TWI513972B (zh) 2010-09-17 2011-09-16 Reflectance measuring apparatus reflectivity measurement method, film thickness measuring apparatus and method for measuring film thickness

Country Status (7)

Country Link
US (1) US8699023B2 (enExample)
JP (1) JP2012063321A (enExample)
KR (1) KR20130106810A (enExample)
CN (1) CN103140750B (enExample)
DE (1) DE112011103113B4 (enExample)
TW (1) TWI513972B (enExample)
WO (1) WO2012036213A1 (enExample)

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CA3053060C (en) 2013-01-31 2022-04-19 Ventana Medical Systems, Inc. Systems and methods for calibrating, configuring and validating an imaging device or system for multiplex tissue assays
US9909988B2 (en) * 2014-01-09 2018-03-06 Sharp Kabushiki Kaisha Light intensity detector and detection method
KR20190085181A (ko) * 2015-05-12 2019-07-17 코니카 미놀타 가부시키가이샤 식물 생육 지표 측정 장치 및 그의 방법 그리고 식물 생육 지표 측정 시스템
JP6248244B1 (ja) * 2016-08-09 2017-12-20 ナルックス株式会社 位置測定部を備えた部品
JP6533770B2 (ja) * 2016-11-10 2019-06-19 日東電工株式会社 基準器、分光干渉式計測装置、塗布装置、分光干渉式計測装置の計測精度保証方法、及び、塗布膜の製造方法。
JP7076951B2 (ja) * 2017-05-23 2022-05-30 株式会社ディスコ 反射率検出装置
JP7092146B2 (ja) * 2017-11-01 2022-06-28 コニカミノルタ株式会社 膜厚測定方法、膜厚測定システム、光反射フィルムの製造方法及び光反射フィルムの製造システム
TWI848121B (zh) * 2019-06-10 2024-07-11 日商東京威力科創股份有限公司 基板處理裝置、基板檢查方法及記錄媒體
JP7341849B2 (ja) * 2019-10-24 2023-09-11 大塚電子株式会社 光学測定装置および光学測定方法
JP6875489B2 (ja) * 2019-11-06 2021-05-26 株式会社キーエンス 共焦点変位計
CN110806388B (zh) * 2019-11-20 2022-05-27 河南牧业经济学院 柱状镭射纸的暗光柱定位装置、定位方法及颜色测量方法
JP7012900B1 (ja) * 2020-03-11 2022-01-28 株式会社日立ハイテク プラズマ処理装置及びプラズマ処理方法
GB202009640D0 (en) 2020-06-24 2020-08-05 Ams Sensors Singapore Pte Ltd Optical detection system calibration
US11828703B2 (en) * 2020-07-29 2023-11-28 Gemological Institute Of America, Inc. (Gia) Ultraviolet-visible absorption spectroscopy for gemstone identification
JP7264134B2 (ja) * 2020-08-26 2023-04-25 横河電機株式会社 分光分析装置、光学系、及び方法
US20240321400A1 (en) * 2020-12-30 2024-09-26 Seegene, Inc. Optical spectrometry-based method and device for detecting target analyte in sample
JP7379442B2 (ja) 2021-11-01 2023-11-14 キヤノントッキ株式会社 反射率測定装置、成膜装置
CN113720825B (zh) * 2021-11-04 2022-02-08 四川丹诺迪科技有限公司 光学即时检测器及检测方法和应用
WO2024122132A1 (ja) 2022-12-06 2024-06-13 浜松ホトニクス株式会社 膜厚計測装置及び膜厚計測方法
CN116183554B (zh) * 2023-02-24 2025-10-03 河南仕佳光子科技股份有限公司 一种光学镀膜超低反射率的拟合方法
CN120253756B (zh) * 2025-06-09 2025-08-29 南开大学 一种光学薄膜折射率与厚度的测量方法及系统

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Also Published As

Publication number Publication date
US20130169968A1 (en) 2013-07-04
JP2012063321A (ja) 2012-03-29
DE112011103113B4 (de) 2022-11-10
WO2012036213A1 (ja) 2012-03-22
DE112011103113T5 (de) 2013-08-08
TW201224430A (en) 2012-06-16
CN103140750A (zh) 2013-06-05
US8699023B2 (en) 2014-04-15
CN103140750B (zh) 2015-06-03
KR20130106810A (ko) 2013-09-30

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