CN103025911B - 自钝化机械稳定的气密性薄膜 - Google Patents

自钝化机械稳定的气密性薄膜 Download PDF

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Publication number
CN103025911B
CN103025911B CN201180036263.2A CN201180036263A CN103025911B CN 103025911 B CN103025911 B CN 103025911B CN 201180036263 A CN201180036263 A CN 201180036263A CN 103025911 B CN103025911 B CN 103025911B
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inorganic layer
air
film
layer
oxygen
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CN103025911A (zh
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C·P·安
M·A·凯斯达
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Corning Inc
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Corning Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/087—Oxides of copper or solid solutions thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/12—Silica-free oxide glass compositions
    • C03C3/23—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron
    • C03C3/247—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron containing fluorine and phosphorus
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/08—Frit compositions, i.e. in a powdered or comminuted form containing phosphorus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H10K50/8445—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/322—Oxidation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/351—Thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Electroluminescent Light Sources (AREA)
  • Sealing Material Composition (AREA)
  • Surface Treatment Of Glass (AREA)
CN201180036263.2A 2010-07-27 2011-07-13 自钝化机械稳定的气密性薄膜 Expired - Fee Related CN103025911B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US36801110P 2010-07-27 2010-07-27
US61/368,011 2010-07-27
US12/879,578 2010-09-10
US12/879,578 US20120028011A1 (en) 2010-07-27 2010-09-10 Self-passivating mechanically stable hermetic thin film
PCT/US2011/043772 WO2012018487A1 (en) 2010-07-27 2011-07-13 Self-passivating mechanically stable hermetic thin film

Publications (2)

Publication Number Publication Date
CN103025911A CN103025911A (zh) 2013-04-03
CN103025911B true CN103025911B (zh) 2016-07-13

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CN201180036263.2A Expired - Fee Related CN103025911B (zh) 2010-07-27 2011-07-13 自钝化机械稳定的气密性薄膜

Country Status (7)

Country Link
US (1) US20120028011A1 (enExample)
EP (1) EP2598667A1 (enExample)
JP (2) JP5816281B2 (enExample)
KR (1) KR101801425B1 (enExample)
CN (1) CN103025911B (enExample)
TW (1) TWI550111B (enExample)
WO (1) WO2012018487A1 (enExample)

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US10158057B2 (en) 2010-10-28 2018-12-18 Corning Incorporated LED lighting devices
KR101931177B1 (ko) * 2012-03-02 2018-12-21 삼성디스플레이 주식회사 유기 발광 표시 장치
TW201343940A (zh) * 2012-03-14 2013-11-01 Corning Inc 用於形成密封阻障層之濺射靶材與相關濺射方法
JP5776630B2 (ja) * 2012-06-01 2015-09-09 日立金属株式会社 銅系材料及びその製造方法
DE102012109207B4 (de) 2012-09-28 2018-05-09 Osram Oled Gmbh Verfahren und Vorrichtung zum Herstellen eines optoelektronischen Bauelementes
US10017849B2 (en) * 2012-11-29 2018-07-10 Corning Incorporated High rate deposition systems and processes for forming hermetic barrier layers
US9202996B2 (en) 2012-11-30 2015-12-01 Corning Incorporated LED lighting devices with quantum dot glass containment plates
US9666763B2 (en) 2012-11-30 2017-05-30 Corning Incorporated Glass sealing with transparent materials having transient absorption properties
JP5765323B2 (ja) * 2012-12-07 2015-08-19 日立金属株式会社 銅ボンディングワイヤ及びその製造方法
KR20140077020A (ko) * 2012-12-13 2014-06-23 삼성디스플레이 주식회사 스퍼터링 장치
KR101434367B1 (ko) * 2012-12-14 2014-08-27 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조방법
US8754434B1 (en) 2013-01-28 2014-06-17 Corning Incorporated Flexible hermetic thin film with light extraction layer
KR20140120541A (ko) * 2013-04-03 2014-10-14 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
KR101428378B1 (ko) 2013-04-05 2014-08-07 현대자동차주식회사 커먼레일 시스템용 고압펌프의 윤활장치
KR102072805B1 (ko) 2013-04-15 2020-02-04 삼성디스플레이 주식회사 유기발광표시장치 및 그의 제조방법
KR102096053B1 (ko) * 2013-07-25 2020-04-02 삼성디스플레이 주식회사 유기발광표시장치의 제조방법
KR20150012540A (ko) * 2013-07-25 2015-02-04 삼성디스플레이 주식회사 유기발광표시장치의 제조방법.
KR102093392B1 (ko) * 2013-07-25 2020-03-26 삼성디스플레이 주식회사 유기 발광 표시 장치 및 유기 발광 표시 장치 제조 방법
KR20150012541A (ko) * 2013-07-25 2015-02-04 삼성디스플레이 주식회사 대향 타겟 스퍼터링 장치, 이를 이용한 유기발광표시장치 및 그 제조방법
CN106029592B (zh) 2014-02-13 2019-09-03 康宁股份有限公司 超低熔点玻璃料和玻璃纤维
JP6020972B2 (ja) * 2015-06-11 2016-11-02 日立金属株式会社 銅ボンディングワイヤ
WO2017066261A2 (en) * 2015-10-13 2017-04-20 Alphabet Energy, Inc. Oxidation and sublimation prevention for thermoelectric devices
FR3061404B1 (fr) * 2016-12-27 2022-09-23 Packaging Sip Procede de fabrication collective de modules electroniques hermetiques
CN110077073B (zh) * 2019-04-03 2021-09-14 乐凯胶片股份有限公司 一种聚烯烃膜、制备方法及太阳能电池背板

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CN1910040A (zh) * 2004-01-27 2007-02-07 三菱树脂株式会社 阻气性膜以及阻气性叠层体
EP1833089A2 (en) * 2003-04-16 2007-09-12 Shinko Electric Industries Co., Ltd. Method of producing a conductor substrate for mounting a semiconductor element
CN101589454A (zh) * 2006-12-12 2009-11-25 跃进封装公司 电子元件的塑料封装体
CN101689614A (zh) * 2007-06-21 2010-03-31 康宁股份有限公司 密封技术和气密密封的装置
CN101772989A (zh) * 2007-07-31 2010-07-07 住友化学株式会社 有机电致发光装置的制造方法

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JP4371539B2 (ja) * 2000-05-31 2009-11-25 電気化学工業株式会社 酸化けい素質蒸着膜の製造方法
US7132373B2 (en) * 2001-10-02 2006-11-07 Toto Ltd. Thin metal oxide film and process for producing the same
EP1466997B1 (en) * 2003-03-10 2012-02-22 OSRAM Opto Semiconductors GmbH Method for forming and arrangement of barrier layers on a polymeric substrate
US20070040501A1 (en) 2005-08-18 2007-02-22 Aitken Bruce G Method for inhibiting oxygen and moisture degradation of a device and the resulting device
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EP1833089A2 (en) * 2003-04-16 2007-09-12 Shinko Electric Industries Co., Ltd. Method of producing a conductor substrate for mounting a semiconductor element
CN1910040A (zh) * 2004-01-27 2007-02-07 三菱树脂株式会社 阻气性膜以及阻气性叠层体
CN101589454A (zh) * 2006-12-12 2009-11-25 跃进封装公司 电子元件的塑料封装体
CN101689614A (zh) * 2007-06-21 2010-03-31 康宁股份有限公司 密封技术和气密密封的装置
CN101772989A (zh) * 2007-07-31 2010-07-07 住友化学株式会社 有机电致发光装置的制造方法

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Publication number Publication date
CN103025911A (zh) 2013-04-03
JP6180472B2 (ja) 2017-08-16
KR101801425B1 (ko) 2017-11-24
JP5816281B2 (ja) 2015-11-18
WO2012018487A1 (en) 2012-02-09
KR20130037220A (ko) 2013-04-15
JP2013539502A (ja) 2013-10-24
EP2598667A1 (en) 2013-06-05
TW201217556A (en) 2012-05-01
US20120028011A1 (en) 2012-02-02
JP2015231948A (ja) 2015-12-24
TWI550111B (zh) 2016-09-21

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