CN102912375A - 从酸性蚀刻液中回收铜的方法及其专用装置 - Google Patents
从酸性蚀刻液中回收铜的方法及其专用装置 Download PDFInfo
- Publication number
- CN102912375A CN102912375A CN201210438732XA CN201210438732A CN102912375A CN 102912375 A CN102912375 A CN 102912375A CN 201210438732X A CN201210438732X A CN 201210438732XA CN 201210438732 A CN201210438732 A CN 201210438732A CN 102912375 A CN102912375 A CN 102912375A
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- plate
- electrolyzer
- etching liquid
- anolyte compartment
- copper
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- 239000010949 copper Substances 0.000 title claims abstract description 53
- 238000005530 etching Methods 0.000 title claims abstract description 42
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 35
- 239000007788 liquid Substances 0.000 title claims abstract description 34
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 title claims abstract description 27
- 239000002253 acid Substances 0.000 title abstract description 5
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 26
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 17
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000010936 titanium Substances 0.000 claims abstract description 16
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 8
- 230000002378 acidificating effect Effects 0.000 claims description 27
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 14
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims description 14
- 230000001105 regulatory effect Effects 0.000 claims description 13
- 125000002091 cationic group Chemical group 0.000 claims description 12
- 239000012528 membrane Substances 0.000 claims description 12
- 239000000243 solution Substances 0.000 claims description 9
- 238000010790 dilution Methods 0.000 claims description 7
- 239000012895 dilution Substances 0.000 claims description 7
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 claims description 6
- 230000001376 precipitating effect Effects 0.000 claims description 5
- 241000370738 Chlorion Species 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 238000003780 insertion Methods 0.000 claims 1
- 230000037431 insertion Effects 0.000 claims 1
- 239000002699 waste material Substances 0.000 abstract description 10
- 230000008901 benefit Effects 0.000 abstract description 5
- 238000011084 recovery Methods 0.000 abstract description 5
- 238000003487 electrochemical reaction Methods 0.000 abstract description 2
- 238000005341 cation exchange Methods 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000002912 waste gas Substances 0.000 description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229960000355 copper sulfate Drugs 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- LBJNMUFDOHXDFG-UHFFFAOYSA-N copper;hydrate Chemical compound O.[Cu].[Cu] LBJNMUFDOHXDFG-UHFFFAOYSA-N 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Images
Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- Electrolytic Production Of Metals (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210438732.XA CN102912375B (zh) | 2012-11-06 | 2012-11-06 | 从酸性蚀刻液中回收铜的方法及其专用装置 |
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CN201210438732.XA CN102912375B (zh) | 2012-11-06 | 2012-11-06 | 从酸性蚀刻液中回收铜的方法及其专用装置 |
Publications (2)
Publication Number | Publication Date |
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CN102912375A true CN102912375A (zh) | 2013-02-06 |
CN102912375B CN102912375B (zh) | 2016-01-13 |
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CN201210438732.XA Expired - Fee Related CN102912375B (zh) | 2012-11-06 | 2012-11-06 | 从酸性蚀刻液中回收铜的方法及其专用装置 |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103290415A (zh) * | 2013-06-09 | 2013-09-11 | 赣州聚环科技有限公司 | 酸性蚀刻液的处理工艺及系统 |
CN103334123A (zh) * | 2013-07-24 | 2013-10-02 | 阳谷祥光铜业有限公司 | 一种铜电解系统及运行方法 |
CN103757635A (zh) * | 2013-12-13 | 2014-04-30 | 陶克(苏州)机械设备有限公司 | 电解槽及使用该电解槽的再生酸性蚀刻液设备及再生方法 |
CN106661738A (zh) * | 2014-04-01 | 2017-05-10 | 西格玛工程集团 | 通过使用氧气和/或空气作为氧化剂在铜蚀刻溶液中氧化铜 |
CN106884185A (zh) * | 2017-03-28 | 2017-06-23 | 苏碧云 | 一种回收酸性蚀刻液中铜的工艺及系统装置 |
CN107059012A (zh) * | 2017-05-02 | 2017-08-18 | 广州合凯环保科技有限公司 | 一种电解反应系统、酸性蚀刻液再生及提铜工艺 |
CN108796545A (zh) * | 2017-05-05 | 2018-11-13 | 深圳市憬泰晖科技有限公司 | 电路板酸性蚀刻液电解再生盐酸的方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63307291A (ja) * | 1987-06-05 | 1988-12-14 | Sumitomo Metal Mining Co Ltd | 高純度銅の製造方法 |
CN101768742A (zh) * | 2009-12-31 | 2010-07-07 | 惠州市雄越保环科技有限公司 | 一种再生酸性蚀刻液和回收铜的方法及其专用装置 |
CN101988200A (zh) * | 2009-08-04 | 2011-03-23 | 章晓冬 | 含酸性氯化物蚀刻剂的循环再生及金属回收设备 |
CN202246872U (zh) * | 2011-07-01 | 2012-05-30 | 东莞市海力环保设备科技有限公司 | 一种印制板酸性蚀刻废液的再生和铜回收系统 |
CN102732888A (zh) * | 2012-07-19 | 2012-10-17 | 湖南万容科技股份有限公司 | 酸性蚀刻废液的再生回收方法及系统 |
-
2012
- 2012-11-06 CN CN201210438732.XA patent/CN102912375B/zh not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63307291A (ja) * | 1987-06-05 | 1988-12-14 | Sumitomo Metal Mining Co Ltd | 高純度銅の製造方法 |
CN101988200A (zh) * | 2009-08-04 | 2011-03-23 | 章晓冬 | 含酸性氯化物蚀刻剂的循环再生及金属回收设备 |
CN101768742A (zh) * | 2009-12-31 | 2010-07-07 | 惠州市雄越保环科技有限公司 | 一种再生酸性蚀刻液和回收铜的方法及其专用装置 |
CN202246872U (zh) * | 2011-07-01 | 2012-05-30 | 东莞市海力环保设备科技有限公司 | 一种印制板酸性蚀刻废液的再生和铜回收系统 |
CN102732888A (zh) * | 2012-07-19 | 2012-10-17 | 湖南万容科技股份有限公司 | 酸性蚀刻废液的再生回收方法及系统 |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103290415A (zh) * | 2013-06-09 | 2013-09-11 | 赣州聚环科技有限公司 | 酸性蚀刻液的处理工艺及系统 |
CN103290415B (zh) * | 2013-06-09 | 2015-05-27 | 孟辉 | 酸性蚀刻液的处理工艺及系统 |
CN103334123A (zh) * | 2013-07-24 | 2013-10-02 | 阳谷祥光铜业有限公司 | 一种铜电解系统及运行方法 |
CN103334123B (zh) * | 2013-07-24 | 2015-12-02 | 阳谷祥光铜业有限公司 | 一种铜电解系统及运行方法 |
CN103757635A (zh) * | 2013-12-13 | 2014-04-30 | 陶克(苏州)机械设备有限公司 | 电解槽及使用该电解槽的再生酸性蚀刻液设备及再生方法 |
CN103757635B (zh) * | 2013-12-13 | 2016-11-23 | 陶克(苏州)机械设备有限公司 | 电解槽及使用该电解槽的再生酸性蚀刻液设备及再生方法 |
CN106661738A (zh) * | 2014-04-01 | 2017-05-10 | 西格玛工程集团 | 通过使用氧气和/或空气作为氧化剂在铜蚀刻溶液中氧化铜 |
CN106661738B (zh) * | 2014-04-01 | 2019-11-19 | 西格玛工程集团 | 通过使用氧气和/或空气作为氧化剂在铜蚀刻溶液中氧化铜 |
CN106884185A (zh) * | 2017-03-28 | 2017-06-23 | 苏碧云 | 一种回收酸性蚀刻液中铜的工艺及系统装置 |
CN106884185B (zh) * | 2017-03-28 | 2018-08-21 | 苏碧云 | 一种回收酸性蚀刻液中铜的工艺及系统装置 |
CN107059012A (zh) * | 2017-05-02 | 2017-08-18 | 广州合凯环保科技有限公司 | 一种电解反应系统、酸性蚀刻液再生及提铜工艺 |
CN108796545A (zh) * | 2017-05-05 | 2018-11-13 | 深圳市憬泰晖科技有限公司 | 电路板酸性蚀刻液电解再生盐酸的方法 |
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CN102912375B (zh) | 2016-01-13 |
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Owner name: MENG HUI Free format text: FORMER OWNER: GANZHOU JUHUAN TECHNOLOGY CO., LTD. Effective date: 20150507 |
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Effective date of registration: 20150507 Address after: 150010, 8, lot street, Daoli District, Heilongjiang, Harbin Applicant after: Meng Hui Address before: 341000 north of Industrial Road, Hongkong Industrial Zone, Ganzhou Development Zone, Jiangxi Applicant before: Ganzhou Juhuan Technology Co.,Ltd. |
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