CN102821869B - 成膜装置和成膜方法 - Google Patents

成膜装置和成膜方法 Download PDF

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Publication number
CN102821869B
CN102821869B CN201180015412.7A CN201180015412A CN102821869B CN 102821869 B CN102821869 B CN 102821869B CN 201180015412 A CN201180015412 A CN 201180015412A CN 102821869 B CN102821869 B CN 102821869B
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CN
China
Prior art keywords
mentioned
substrate
drop
head
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201180015412.7A
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English (en)
Chinese (zh)
Other versions
CN102821869A (zh
Inventor
宫浦博彰
盐崎唯史
新畑宏晃
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Sharp Corp
Original Assignee
Sharp Corp
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Publication date
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Publication of CN102821869A publication Critical patent/CN102821869A/zh
Application granted granted Critical
Publication of CN102821869B publication Critical patent/CN102821869B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/21—Ink jet for multi-colour printing
    • B41J2/2132—Print quality control characterised by dot disposition, e.g. for reducing white stripes or banding
    • B41J2/2139—Compensation for malfunctioning nozzles creating dot place or dot size errors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50—Multilayers
    • B05D7/52—Two layers

Landscapes

  • Liquid Crystal (AREA)
  • Coating Apparatus (AREA)
  • Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
CN201180015412.7A 2010-03-26 2011-03-23 成膜装置和成膜方法 Expired - Fee Related CN102821869B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010073423 2010-03-26
JP2010-073423 2010-03-26
PCT/JP2011/057028 WO2011118652A1 (fr) 2010-03-26 2011-03-23 Dispositif et procédé de formation de film

Publications (2)

Publication Number Publication Date
CN102821869A CN102821869A (zh) 2012-12-12
CN102821869B true CN102821869B (zh) 2015-06-24

Family

ID=44673201

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180015412.7A Expired - Fee Related CN102821869B (zh) 2010-03-26 2011-03-23 成膜装置和成膜方法

Country Status (3)

Country Link
JP (1) JP5492289B2 (fr)
CN (1) CN102821869B (fr)
WO (1) WO2011118652A1 (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11975546B2 (en) 2008-06-13 2024-05-07 Kateeva, Inc. Gas enclosure assembly and system
US9048344B2 (en) 2008-06-13 2015-06-02 Kateeva, Inc. Gas enclosure assembly and system
US8899171B2 (en) 2008-06-13 2014-12-02 Kateeva, Inc. Gas enclosure assembly and system
US8383202B2 (en) 2008-06-13 2013-02-26 Kateeva, Inc. Method and apparatus for load-locked printing
US9604245B2 (en) 2008-06-13 2017-03-28 Kateeva, Inc. Gas enclosure systems and methods utilizing an auxiliary enclosure
US12018857B2 (en) 2008-06-13 2024-06-25 Kateeva, Inc. Gas enclosure assembly and system
US10434804B2 (en) 2008-06-13 2019-10-08 Kateeva, Inc. Low particle gas enclosure systems and methods
US10442226B2 (en) 2008-06-13 2019-10-15 Kateeva, Inc. Gas enclosure assembly and system
KR20220124282A (ko) * 2012-11-30 2022-09-13 카티바, 인크. 산업용 프린팅 시스템의 유지 방법
JP6349382B2 (ja) * 2013-03-13 2018-06-27 カティーバ， インコーポレイテッド 補助エンクロージャを利用するガスエンクロージャシステムおよび方法
KR101878084B1 (ko) 2013-12-26 2018-07-12 카티바, 인크. 전자 장치의 열 처리를 위한 장치 및 기술
KR102458181B1 (ko) 2014-01-21 2022-10-21 카티바, 인크. 전자 장치 인캡슐레이션을 위한 기기 및 기술
EP3138123B1 (fr) 2014-04-30 2021-06-02 Kateeva, Inc. Appareil à coussin de gaz et techniques pour revêtement de substrat
KR102068882B1 (ko) 2014-11-26 2020-01-21 카티바, 인크. 환경적으로 제어되는 코팅 시스템
JP6720978B2 (ja) * 2015-09-30 2020-07-08 住友金属鉱山株式会社 有機被膜の製造方法、導電性基板の製造方法、有機被膜製造装置
CN108427223B (zh) * 2018-03-23 2020-11-13 京东方科技集团股份有限公司 彩膜基板和显示面板及其显示方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1304167A (zh) * 1999-12-15 2001-07-18 株式会社东芝 成膜方法和成膜装置
CN1439517A (zh) * 2002-02-22 2003-09-03 精工爱普生株式会社 薄膜形成装置和方法、液晶装置的制造装置和方法
CN1611355A (zh) * 2003-10-28 2005-05-04 精工爱普生株式会社 膜形成方法、电光学装置及电子机器
JP2005296854A (ja) * 2004-04-13 2005-10-27 Sharp Corp 膜形成装置及び膜形成方法
JP2008042187A (ja) * 2006-07-18 2008-02-21 Asml Netherlands Bv インプリントリソグラフィ
JP2009148765A (ja) * 2009-04-06 2009-07-09 Shibaura Mechatronics Corp 成膜方法及び成膜装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4385631B2 (ja) * 2003-04-01 2009-12-16 セイコーエプソン株式会社 液滴の塗布方法、コンピュータプログラム、有機ｅｌパネルの製造方法、電気光学パネルの製造方法及び電子機器の製造方法、並びに液滴の塗布装置、電気光学パネル、電気光学装置及び電子機器
JP4627618B2 (ja) * 2003-06-09 2011-02-09 芝浦メカトロニクス株式会社 成膜方法及び成膜装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1304167A (zh) * 1999-12-15 2001-07-18 株式会社东芝 成膜方法和成膜装置
CN1439517A (zh) * 2002-02-22 2003-09-03 精工爱普生株式会社 薄膜形成装置和方法、液晶装置的制造装置和方法
CN1611355A (zh) * 2003-10-28 2005-05-04 精工爱普生株式会社 膜形成方法、电光学装置及电子机器
JP2005296854A (ja) * 2004-04-13 2005-10-27 Sharp Corp 膜形成装置及び膜形成方法
JP2008042187A (ja) * 2006-07-18 2008-02-21 Asml Netherlands Bv インプリントリソグラフィ
JP2009148765A (ja) * 2009-04-06 2009-07-09 Shibaura Mechatronics Corp 成膜方法及び成膜装置

Also Published As

Publication number Publication date
WO2011118652A1 (fr) 2011-09-29
JPWO2011118652A1 (ja) 2013-07-04
CN102821869A (zh) 2012-12-12
JP5492289B2 (ja) 2014-05-14

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Granted publication date: 20150624

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