JP5492289B2 - 成膜装置および成膜方法 - Google Patents

成膜装置および成膜方法 Download PDF

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Publication number
JP5492289B2
JP5492289B2 JP2012507042A JP2012507042A JP5492289B2 JP 5492289 B2 JP5492289 B2 JP 5492289B2 JP 2012507042 A JP2012507042 A JP 2012507042A JP 2012507042 A JP2012507042 A JP 2012507042A JP 5492289 B2 JP5492289 B2 JP 5492289B2
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Japan
Prior art keywords
substrate
solution
film forming
discharging
head
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Expired - Fee Related
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JP2012507042A
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English (en)
Japanese (ja)
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JPWO2011118652A1 (ja
Inventor
博彰 宮浦
唯史 塩崎
宏晃 新畑
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Sharp Corp
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Sharp Corp
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Priority to JP2012507042A priority Critical patent/JP5492289B2/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/21—Ink jet for multi-colour printing
    • B41J2/2132—Print quality control characterised by dot disposition, e.g. for reducing white stripes or banding
    • B41J2/2139—Compensation for malfunctioning nozzles creating dot place or dot size errors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50—Multilayers
    • B05D7/52—Two layers

Landscapes

  • Liquid Crystal (AREA)
  • Coating Apparatus (AREA)
  • Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2012507042A 2010-03-26 2011-03-23 成膜装置および成膜方法 Expired - Fee Related JP5492289B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012507042A JP5492289B2 (ja) 2010-03-26 2011-03-23 成膜装置および成膜方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2010073423 2010-03-26
JP2010073423 2010-03-26
JP2012507042A JP5492289B2 (ja) 2010-03-26 2011-03-23 成膜装置および成膜方法
PCT/JP2011/057028 WO2011118652A1 (fr) 2010-03-26 2011-03-23 Dispositif et procédé de formation de film

Publications (2)

Publication Number Publication Date
JPWO2011118652A1 JPWO2011118652A1 (ja) 2013-07-04
JP5492289B2 true JP5492289B2 (ja) 2014-05-14

Family

ID=44673201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012507042A Expired - Fee Related JP5492289B2 (ja) 2010-03-26 2011-03-23 成膜装置および成膜方法

Country Status (3)

Country Link
JP (1) JP5492289B2 (fr)
CN (1) CN102821869B (fr)
WO (1) WO2011118652A1 (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11975546B2 (en) 2008-06-13 2024-05-07 Kateeva, Inc. Gas enclosure assembly and system
US9048344B2 (en) 2008-06-13 2015-06-02 Kateeva, Inc. Gas enclosure assembly and system
US8899171B2 (en) 2008-06-13 2014-12-02 Kateeva, Inc. Gas enclosure assembly and system
US8383202B2 (en) 2008-06-13 2013-02-26 Kateeva, Inc. Method and apparatus for load-locked printing
US9604245B2 (en) 2008-06-13 2017-03-28 Kateeva, Inc. Gas enclosure systems and methods utilizing an auxiliary enclosure
US12018857B2 (en) 2008-06-13 2024-06-25 Kateeva, Inc. Gas enclosure assembly and system
US10434804B2 (en) 2008-06-13 2019-10-08 Kateeva, Inc. Low particle gas enclosure systems and methods
US10442226B2 (en) 2008-06-13 2019-10-15 Kateeva, Inc. Gas enclosure assembly and system
KR20220124282A (ko) * 2012-11-30 2022-09-13 카티바, 인크. 산업용 프린팅 시스템의 유지 방법
JP6349382B2 (ja) * 2013-03-13 2018-06-27 カティーバ， インコーポレイテッド 補助エンクロージャを利用するガスエンクロージャシステムおよび方法
KR101878084B1 (ko) 2013-12-26 2018-07-12 카티바, 인크. 전자 장치의 열 처리를 위한 장치 및 기술
KR102458181B1 (ko) 2014-01-21 2022-10-21 카티바, 인크. 전자 장치 인캡슐레이션을 위한 기기 및 기술
EP3138123B1 (fr) 2014-04-30 2021-06-02 Kateeva, Inc. Appareil à coussin de gaz et techniques pour revêtement de substrat
KR102068882B1 (ko) 2014-11-26 2020-01-21 카티바, 인크. 환경적으로 제어되는 코팅 시스템
JP6720978B2 (ja) * 2015-09-30 2020-07-08 住友金属鉱山株式会社 有機被膜の製造方法、導電性基板の製造方法、有機被膜製造装置
CN108427223B (zh) * 2018-03-23 2020-11-13 京东方科技集团股份有限公司 彩膜基板和显示面板及其显示方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001170546A (ja) * 1999-12-15 2001-06-26 Toshiba Corp 成膜方法及び成膜装置
JP2004298844A (ja) * 2003-04-01 2004-10-28 Seiko Epson Corp 液滴の塗布方法、コンピュータプログラム、有機ｅｌパネルの製造方法、電気光学パネルの製造方法及び電子機器の製造方法、並びに液滴の塗布装置、電気光学パネル、電気光学装置及び電子機器
JP2005000721A (ja) * 2003-06-09 2005-01-06 Shibaura Mechatronics Corp 成膜方法及び成膜装置
JP2005296854A (ja) * 2004-04-13 2005-10-27 Sharp Corp 膜形成装置及び膜形成方法
JP2008042187A (ja) * 2006-07-18 2008-02-21 Asml Netherlands Bv インプリントリソグラフィ

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3985545B2 (ja) * 2002-02-22 2007-10-03 セイコーエプソン株式会社 薄膜形成装置と薄膜形成方法、液晶装置の製造装置と液晶装置の製造方法と液晶装置、及び薄膜構造体の製造装置と薄膜構造体の製造方法と薄膜構造体、及び電子機器
JP3772873B2 (ja) * 2003-10-28 2006-05-10 セイコーエプソン株式会社 膜形成方法
JP4673417B2 (ja) * 2009-04-06 2011-04-20 芝浦メカトロニクス株式会社 成膜方法及び成膜装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001170546A (ja) * 1999-12-15 2001-06-26 Toshiba Corp 成膜方法及び成膜装置
JP2004298844A (ja) * 2003-04-01 2004-10-28 Seiko Epson Corp 液滴の塗布方法、コンピュータプログラム、有機ｅｌパネルの製造方法、電気光学パネルの製造方法及び電子機器の製造方法、並びに液滴の塗布装置、電気光学パネル、電気光学装置及び電子機器
JP2005000721A (ja) * 2003-06-09 2005-01-06 Shibaura Mechatronics Corp 成膜方法及び成膜装置
JP2005296854A (ja) * 2004-04-13 2005-10-27 Sharp Corp 膜形成装置及び膜形成方法
JP2008042187A (ja) * 2006-07-18 2008-02-21 Asml Netherlands Bv インプリントリソグラフィ

Also Published As

Publication number Publication date
WO2011118652A1 (fr) 2011-09-29
JPWO2011118652A1 (ja) 2013-07-04
CN102821869A (zh) 2012-12-12
CN102821869B (zh) 2015-06-24

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