CN102770465B - 大分子光引发剂及其可固化组合物 - Google Patents
大分子光引发剂及其可固化组合物 Download PDFInfo
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- CN102770465B CN102770465B CN201180010476.8A CN201180010476A CN102770465B CN 102770465 B CN102770465 B CN 102770465B CN 201180010476 A CN201180010476 A CN 201180010476A CN 102770465 B CN102770465 B CN 102770465B
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Classifications
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/56—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton containing six-membered aromatic rings
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
- C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
- C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP
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| US31619010P | 2010-03-22 | 2010-03-22 | |
| US61/316,190 | 2010-03-22 | ||
| PCT/US2011/025153 WO2011119272A2 (en) | 2010-03-22 | 2011-02-17 | Macro-photoinitiators and curable compositions thereof |
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| Publication Number | Publication Date |
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| CN102770465A CN102770465A (zh) | 2012-11-07 |
| CN102770465B true CN102770465B (zh) | 2015-04-22 |
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| CN201180010476.8A Expired - Fee Related CN102770465B (zh) | 2010-03-22 | 2011-02-17 | 大分子光引发剂及其可固化组合物 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9097979B2 (en) | 2013-03-13 | 2015-08-04 | Wisconsin Alumni Research Foundation | Block copolymer-based mask structures for the growth of nanopatterned polymer brushes |
| JP6227150B2 (ja) * | 2014-08-29 | 2017-11-08 | 三菱電機株式会社 | 半導体装置及び多相用半導体装置 |
| US9587062B2 (en) * | 2014-12-15 | 2017-03-07 | Henkel IP & Holding GmbH and Henkel AG & Co. KGaA | Photocrosslinkable block copolymers for hot-melt adhesives |
| WO2016111743A1 (en) * | 2015-01-08 | 2016-07-14 | Henkel IP & Holding GmbH | Process for preparing high molecular weight polyacrylates having narrow polydispersity indices |
| US11208527B2 (en) * | 2016-04-15 | 2021-12-28 | Beckman Coulter, Inc. | Photoactive macromolecules and uses thereof |
| EP3481872B1 (en) * | 2016-07-11 | 2020-04-08 | 3M Innovative Properties Company | Polymeric material and methods of making using controlled radical initiators |
| JP6946443B2 (ja) | 2017-09-15 | 2021-10-06 | 富士フイルム株式会社 | 組成物、膜、積層体、赤外線透過フィルタ、固体撮像素子および赤外線センサ |
| KR20210003915A (ko) | 2018-05-04 | 2021-01-12 | 얼라인 테크널러지, 인크. | 고온 석판인쇄-기반 광중합 공정에서 사용하기 위한 경화형 조성물 및 이로부터 가교 중합체를 제조하는 방법 |
| CA3098622A1 (en) * | 2018-05-04 | 2019-11-07 | Align Technology, Inc. | Polymerizable monomers and method of polymerizing the same |
| WO2020059509A1 (ja) | 2018-09-20 | 2020-03-26 | 富士フイルム株式会社 | 硬化性組成物、硬化膜、赤外線透過フィルタ、積層体、固体撮像素子、センサ、及び、パターン形成方法 |
| JP7260847B2 (ja) | 2019-02-26 | 2023-04-19 | 株式会社リコー | 活性エネルギー線重合性開始剤、活性エネルギー線重合性組成物、活性エネルギー線重合性インク、インク収容容器、画像形成方法および画像形成装置 |
| JPWO2020262270A1 (US20040106767A1-20040603-C00005.png) | 2019-06-27 | 2020-12-30 | ||
| WO2021039205A1 (ja) | 2019-08-29 | 2021-03-04 | 富士フイルム株式会社 | 組成物、膜、近赤外線カットフィルタ、パターン形成方法、積層体、固体撮像素子、赤外線センサ、画像表示装置、カメラモジュール、及び、化合物 |
| KR20220035458A (ko) | 2019-08-30 | 2022-03-22 | 후지필름 가부시키가이샤 | 조성물, 막, 광학 필터 및 그 제조 방법, 고체 촬상 소자, 적외선 센서, 및, 센서 모듈 |
| CN110981995B (zh) * | 2019-12-27 | 2021-12-07 | 阜阳欣奕华材料科技有限公司 | 一种低迁移型光引发剂及其制备方法和应用 |
| WO2021199748A1 (ja) | 2020-03-30 | 2021-10-07 | 富士フイルム株式会社 | 組成物、膜及び光センサ |
| JP7477628B2 (ja) | 2020-09-28 | 2024-05-01 | 富士フイルム株式会社 | 積層体の製造方法、アンテナインパッケージの製造方法、及び積層体 |
| CN112430279A (zh) * | 2020-11-23 | 2021-03-02 | 濮阳展辰新材料有限公司 | 一种酰化法制备大分子光引发剂的方法及其应用 |
| EP4266094A1 (en) | 2020-12-16 | 2023-10-25 | FUJIFILM Corporation | Composition, membrane, optical filter, solid image pickup element, image display apparatus, and infrared ray sensor |
| EP4266093A1 (en) | 2020-12-17 | 2023-10-25 | FUJIFILM Corporation | Composition, film, optical filter, solid-state imaging element, image display device, and infrared sensor |
| EP4310556A1 (en) | 2021-03-19 | 2024-01-24 | FUJIFILM Corporation | Film and photosensor |
| TW202248755A (zh) | 2021-03-22 | 2022-12-16 | 日商富士軟片股份有限公司 | 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件 |
| EP4318057A1 (en) | 2021-03-29 | 2024-02-07 | FUJIFILM Corporation | Black photosensitive composition, manufacturing method of black photosensitive composition, cured film, color filter, light-shielding film, optical element, solid-state image capturing element, and headlight unit |
| JP7259141B1 (ja) | 2021-08-31 | 2023-04-17 | 富士フイルム株式会社 | 硬化物の製造方法、積層体の製造方法、及び、半導体デバイスの製造方法、並びに、処理液 |
| JPWO2023054142A1 (US20040106767A1-20040603-C00005.png) | 2021-09-29 | 2023-04-06 | ||
| WO2023120037A1 (ja) | 2021-12-23 | 2023-06-29 | 富士フイルム株式会社 | 接合体の製造方法、接合体、積層体の製造方法、積層体、デバイスの製造方法、及び、デバイス、並びに、ポリイミド含有前駆体部形成用組成物 |
Citations (1)
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| US6458864B1 (en) * | 1998-05-29 | 2002-10-01 | Ciba Specialty Chemicals Corporation | Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| IE45626B1 (en) | 1976-07-14 | 1982-10-20 | Loctite Ltd | Filled cyanoacrylate adhesive compositions |
| IE45111B1 (en) | 1976-07-14 | 1982-06-30 | Loctite Ltd | Cyanoacrylate adhesive paste compositions |
| US6673850B1 (en) | 1999-05-10 | 2004-01-06 | Ciba Specialty Chemicals Corporation | Photoinitiators and their applications |
| CN1324081C (zh) * | 2002-07-03 | 2007-07-04 | 宝洁公司 | 辐射固化性低应力弛豫弹性体材料 |
| JP2009209275A (ja) * | 2008-03-05 | 2009-09-17 | Fujifilm Corp | 光硬化性コーティング組成物、オーバープリント及びその製造方法 |
| US9243083B2 (en) * | 2008-04-03 | 2016-01-26 | Henkel IP & Holding GmbH | Thiol-ene cured oil-resistant polyacrylate sealants for in-place gasketing applications |
-
2011
- 2011-02-17 CN CN201180010476.8A patent/CN102770465B/zh not_active Expired - Fee Related
- 2011-02-17 ES ES11759867.2T patent/ES2657710T3/es active Active
- 2011-02-17 EP EP11759867.2A patent/EP2550307B1/en not_active Not-in-force
- 2011-02-17 WO PCT/US2011/025153 patent/WO2011119272A2/en active Application Filing
- 2011-02-17 JP JP2013501267A patent/JP5955832B2/ja not_active Expired - Fee Related
- 2011-02-17 KR KR1020127024701A patent/KR101437751B1/ko active IP Right Grant
- 2011-02-17 CA CA2786630A patent/CA2786630C/en not_active Expired - Fee Related
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2012
- 2012-09-21 US US13/623,982 patent/US8748503B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6458864B1 (en) * | 1998-05-29 | 2002-10-01 | Ciba Specialty Chemicals Corporation | Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers |
Non-Patent Citations (1)
| Title |
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| Synthesis of block copolymers by combination of ATRP and photoiniferter processes;Yasemin Yuksel Durmaz et.al;《Polymer International》;20080813;第57卷(第10期);第1182-1187页 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011119272A3 (en) | 2012-01-05 |
| ES2657710T3 (es) | 2018-03-06 |
| CA2786630C (en) | 2016-02-02 |
| EP2550307B1 (en) | 2017-11-22 |
| JP5955832B2 (ja) | 2016-07-20 |
| CA2786630A1 (en) | 2011-09-29 |
| CN102770465A (zh) | 2012-11-07 |
| US8748503B2 (en) | 2014-06-10 |
| KR20130018702A (ko) | 2013-02-25 |
| JP2013522445A (ja) | 2013-06-13 |
| EP2550307A4 (en) | 2014-03-19 |
| KR101437751B1 (ko) | 2014-09-03 |
| US20130018122A1 (en) | 2013-01-17 |
| EP2550307A2 (en) | 2013-01-30 |
| WO2011119272A2 (en) | 2011-09-29 |
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