CN102754029B - 感光性树脂组合物、结构体的制造方法和液体排出头 - Google Patents

感光性树脂组合物、结构体的制造方法和液体排出头 Download PDF

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Publication number
CN102754029B
CN102754029B CN201180008169.6A CN201180008169A CN102754029B CN 102754029 B CN102754029 B CN 102754029B CN 201180008169 A CN201180008169 A CN 201180008169A CN 102754029 B CN102754029 B CN 102754029B
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CN
China
Prior art keywords
group
photoacid generator
resin composition
photosensitive resin
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201180008169.6A
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English (en)
Chinese (zh)
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CN102754029A (zh
Inventor
池龟健
下村雅子
高桥表
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Canon Inc
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Canon Inc
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Publication date
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Publication of CN102754029A publication Critical patent/CN102754029A/zh
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Publication of CN102754029B publication Critical patent/CN102754029B/zh
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/16—Cyclic ethers having four or more ring atoms
    • C08G65/18—Oxetanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L31/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid or of a haloformic acid; Compositions of derivatives of such polymers
    • C08L31/06—Homopolymers or copolymers of esters of polycarboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polyethers (AREA)
CN201180008169.6A 2010-02-05 2011-01-31 感光性树脂组合物、结构体的制造方法和液体排出头 Expired - Fee Related CN102754029B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010-024683 2010-02-05
JP2010024683A JP5473645B2 (ja) 2010-02-05 2010-02-05 感光性樹脂組成物及び液体吐出ヘッド
PCT/JP2011/052457 WO2011096552A1 (en) 2010-02-05 2011-01-31 Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head

Publications (2)

Publication Number Publication Date
CN102754029A CN102754029A (zh) 2012-10-24
CN102754029B true CN102754029B (zh) 2014-07-23

Family

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Family Applications (1)

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CN201180008169.6A Expired - Fee Related CN102754029B (zh) 2010-02-05 2011-01-31 感光性树脂组合物、结构体的制造方法和液体排出头

Country Status (4)

Country Link
US (1) US8944580B2 (https=)
JP (1) JP5473645B2 (https=)
CN (1) CN102754029B (https=)
WO (1) WO2011096552A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5787720B2 (ja) * 2010-12-16 2015-09-30 キヤノン株式会社 感光性ネガ型樹脂組成物
JP6120574B2 (ja) 2012-01-31 2017-04-26 キヤノン株式会社 感光性ネガ型樹脂組成物、微細構造体、微細構造体の製造方法及び液体吐出ヘッド
JP6071718B2 (ja) 2013-04-10 2017-02-01 キヤノン株式会社 感光性ネガ型樹脂組成物
EP3026010A4 (en) * 2013-07-24 2017-04-12 JSR Corporation Microfluidic device and process for producing same, and photosensitive resin composition for forming flow path
JP2016038468A (ja) * 2014-08-07 2016-03-22 キヤノン株式会社 感光性樹脂層のパターニング方法
EP3249469B1 (en) * 2015-03-26 2024-09-11 Tokyo Ohka Kogyo Co., Ltd. Negative photosensitive composition and pattern formation method
AU2020412469A1 (en) * 2019-12-23 2022-01-06 Illumina, Inc. Resin composition and flow cells incorporating the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008020841A (ja) * 2006-07-14 2008-01-31 Nippon Kayaku Co Ltd 感光性樹脂組成物、その積層体、その硬化物及び該組成物を用いたパターン形成方法
JP2008065161A (ja) * 2006-09-08 2008-03-21 Fujifilm Corp カラーフィルタ用硬化性組成物、カラーフィルタ、及びその製造方法
JP2009244779A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp ネガ型レジスト組成物及びパターン形成方法
WO2010001919A1 (ja) * 2008-07-02 2010-01-07 日本化薬株式会社 Ｍｅｍｓ用感光性樹脂組成物及びその硬化物

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4298414B2 (ja) 2002-07-10 2009-07-22 キヤノン株式会社 液体吐出ヘッドの製造方法
JP4537166B2 (ja) 2004-10-06 2010-09-01 キヤノン株式会社 液体吐出ヘッド
US8157347B2 (en) 2005-07-08 2012-04-17 Canon Kabushiki Kaisha Ink jet recording head and ink jet recording head cartridge
JP4262262B2 (ja) 2006-05-31 2009-05-13 キヤノン株式会社 インクジェット用インク保持容器
JP4564977B2 (ja) 2007-04-05 2010-10-20 東京応化工業株式会社 感光性樹脂組成物、レジストパターンの製造方法、積層体、及びデバイス
US8007069B2 (en) * 2007-05-25 2011-08-30 Canon Kabushiki Kaisha Ink jet recording head
JP5039442B2 (ja) * 2007-06-15 2012-10-03 東京応化工業株式会社 感光性樹脂組成物、感光性樹脂積層体、及びパターン形成方法
US8528209B2 (en) 2009-12-15 2013-09-10 Canon Kabushiki Kaisha Method for manufacturing discharge port member and method for manufacturing liquid discharge head
JP5697406B2 (ja) 2010-11-09 2015-04-08 キヤノン株式会社 親水被膜の形成方法および親水被膜、ならびにインクジェット記録ヘッドの製造方法およびインクジェット記録ヘッド
JP5653181B2 (ja) 2010-11-09 2015-01-14 キヤノン株式会社 親水被膜の形成方法および親水被膜、ならびにインクジェット記録ヘッドの製造方法およびインクジェット記録ヘッド

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008020841A (ja) * 2006-07-14 2008-01-31 Nippon Kayaku Co Ltd 感光性樹脂組成物、その積層体、その硬化物及び該組成物を用いたパターン形成方法
JP2008065161A (ja) * 2006-09-08 2008-03-21 Fujifilm Corp カラーフィルタ用硬化性組成物、カラーフィルタ、及びその製造方法
JP2009244779A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp ネガ型レジスト組成物及びパターン形成方法
WO2010001919A1 (ja) * 2008-07-02 2010-01-07 日本化薬株式会社 Ｍｅｍｓ用感光性樹脂組成物及びその硬化物

Also Published As

Publication number Publication date
JP2011164216A (ja) 2011-08-25
US20120229556A1 (en) 2012-09-13
WO2011096552A1 (en) 2011-08-11
US8944580B2 (en) 2015-02-03
CN102754029A (zh) 2012-10-24
JP5473645B2 (ja) 2014-04-16

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Granted publication date: 20140723

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