CN102747353A - 镁合金壳体及其制作方法 - Google Patents
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Abstract
本发明公开一种镁合金壳体及其制作方法，该镁合金壳体包括镁合金基体、形成在镁合金基体上的转化膜、及形成在转化膜上的复合膜层。该转化膜为复合物膜，主要含有Mg、Al、O、P、Mn。该镁合金壳体的制作方法包括：提供一镁合金基体；在镁合金基体上进行化学转化膜处理形成转化膜，该转化膜为复合物膜，其主要含有Mg、Al、O、P、Mn；在转化膜表面进行PVD镀形成复合膜层。通过上述方法制作的镁合金壳体，耐磨损、耐腐蚀。
Description
技术领域
本发明是关于一种镁合金壳体及其制作方法。
背景技术
镁合金具有质量轻、强度高、外观华丽的特点，目前在通讯电子，汽车等领域得到日益广泛的应用。现有的镁合金壳体中，镀层一般通过PVD技术直接镀在镁合金基体的表面，然而由于镁合金基体表面组织凹凸不平，镀层与镁合金基体之间难以获得良好的结合力。如此，限制了镁合金在其使用范围内发挥优势。同时由于PVD技术的特点，镀层大部分呈柱状晶结构，镀层表面不可避免地存在针孔等一些典型的缺陷，使其耐腐蚀、耐磨损性能有限。另外，该种单层的PVD亦难以有效地保护镁合金基体。
发明内容
鉴于此，有必要提供一种镀层结合力良好、耐腐蚀、耐磨损性能好的镁合金壳体。
另外，还有必要提供一种上述镁合金壳体的制作方法。
一种镁合金壳体，包括镁合金基体与复合膜层，该镁合金基体与该复合膜层之间还形成有转化膜，其主要含有Mg、Al、O、P、Mn，所述复合膜层形成于该转化膜上，且依次包括第一膜层、第二膜层及第三膜层，其中第一膜层为MgxOy层，第二膜层为MgxNz，第三膜层为MgxOyNz。
一种镁合金壳体的制作方法，包括以下步骤：
提供一镁合金基体；
在镁合金基体上进行化学转化膜处理形成一转化膜，其主要含有Mg、Al、O、P、Mn；
在转化膜表面进行PVD镀形成复合膜层，所述复合膜层形成于该转化膜上，且依次包括第一膜层、第二膜层及第三膜层，其中第一膜层为MgxOy层，第二膜层为MgxNz，第三膜层为MgxOyNz。
相较于现有技术，本镁合金壳体在镁合金基体与复合膜层之间形成有转化膜，该转化膜与镁合金基体结合牢固，且转化膜与复合膜层结合的表面平整，大大提高了与复合膜层的结合力，并且该复合膜层中三层不同的含镁的氧化或氮化膜层相互叠加，使得镁合金壳体表面耐磨损、耐腐蚀。
附图说明
图1是本发明较佳实施例镁合金制品的剖面示意图；
图2是镁合金制品的制作方法流程图。
图3是图1产品的制作过程中所用镀膜机的俯视示意图。
主要元件符号说明
镁合金壳体 10
镁合金基体 11
转化膜 12
复合膜层 13
第一膜层 131
第二膜层 132
第三膜层 133
镀膜机 100
镀膜室 20
轨迹 21
镁靶 22
真空泵 30
如下具体实施方式将结合上述附图进一步说明本发明。
具体实施方式
请参阅图1，本发明较佳实施例镁合金壳体10，包括镁合金基体11、形成在镁合金基体11上的转化膜12、以及形成在转化膜12上的复合膜层13。所述转化膜12的厚度为0.2～5μm，为复合物膜，其主要含有Mg、Al、O、P、Mn。所述复合膜层13的厚度为2μm～5μm。该复合膜层13包括第一膜层131、第二膜层132和第三膜层133，第一膜层131为MgxOy层；第二膜层132为MgxNz层，第三膜层133MgxOyNz层，其中x，y，z的取值范围均在1～10之间。
请参阅图2，该镁合金壳体10的制作方法包括以下步骤：
S1：提供一镁合金基体11，该镁合金基体11为Mg、Al等金属材料的合金。将该镁合金基体11进行化学除油清洗，达到去除镁合金基体11表面细孔、盲孔中油污的目的。化学除油的过程如下：提供一种清洗溶液，该清洗溶液由Na2CO3、Na3PO4·12H2O、辛基酚聚氧乙烯、及H2O配成，且Na2CO3的浓度为25-30g/l，Na3PO4·12H2O的浓度为20-25g/l，辛基酚聚氧乙烯的浓度为1-3g/l。将镁合金基体11置入该清洗溶液中清洗，维持溶液温度在60-80℃，清洗时间为30-60s。
S2：对化学除油后的镁合金基体11进行水洗，以去除除油清洗后附着在镁合金基体11表面的除油药剂。该水洗可为喷淋冲洗，时间20-60s。
S3：对水洗后的镁合金基体11进行碱蚀处理，以消低镁合金基体11表面的凸出部位。该凸出部位为镁合金基体11表面的一些毛刺，该毛刺在来料工序的冲压或压铸中形成。碱蚀过程如下：提供一种碱蚀溶液，该碱蚀溶液由NaOH、Na3PO4·12H2O、Na2CO3、NaF、及H2O配成，且NaOH的浓度在40-70g/l之间，Na3PO4·12H2O的浓度在10-20g/l之间，Na2CO3的浓度为25-30g/l，NaF的浓度在40-50g/l之间。将镁合金基体11置入该碱蚀溶液中进行碱蚀处理，维持溶液温度在40-50℃，碱蚀处理时间为3-5s。碱蚀过程中，由于凸出部位接触碱蚀溶液的面积大，从而可以将凸出部位削平。
S4：对碱蚀后的镁合金基体11进行活化处理，以提高镁合金基体11表面分子的活性，利于增强与转化膜12的结合力。活化处理过程如下：提供一种活化溶液，该活化溶液由HNO3、HF、及H2O配成，其中HNO3与HF的质量比值为3∶1，且配成后HNO3占溶液的质量百分含量为1-10％，HF占溶液的质量百分含量为1-8％。将镁合金基体11置入该活化溶液中，活化温度可为室温，活化时间为3-20s。
S5：对活化后的镁合金基体11进行化学转化膜处理，以在镁合金基体11表面形成转化膜12。提供一种转化膜溶液，该转化膜溶液由磷酸二氢氨、高锰酸钾、添加剂及水配成。所述添加剂包括硫化物与氨系有机物，且各占添加剂成分比重的10-20％。该转化膜溶液中，磷酸二氢氨的浓度为60-100g/l，高锰酸钾的浓度为1-40g/l，添加剂的浓度为1-6g/l。将镁合金基体11置入该转化膜溶液中，维持溶液温度在30℃，反应时间为20min。如此，将在镁合金基体11表面形成转化膜12。该转化膜12平整地形成在镁合金基体11表面，转化膜12的厚度在0.2～5μm，转化膜12为一复合物膜，其主要含有Mg、Al、O、P、Mn，且Mg、Al、O、P、Mn的原子个数比范围为(1～5)∶(1～5)∶(2～10)∶(1～10)∶(3～10)。所述转化膜12为在上述反应条件下，转化膜溶液中的Mn，P，O元素与基材表面的Mg，Al元素发生杂合反应而形成。
S6：将化学转化膜处理后的镁合金基体11进行烘干处理。
S7：将烘干后的镁合金基体进行PVD镀膜，以在转化膜12表面形成复合膜层13。请参阅图2，提供一镀膜机100，该镀膜机100包括一镀膜室20及连接于镀膜室20的一真空泵30，真空泵30用以对镀膜室20抽真空。该镀膜室20内设有转架(未图示)、二镁靶22，转架带动镁或镁合金基体11沿圆形的轨迹21公转，且镁或镁合金基体11在沿轨迹21公转时亦自转。
形成所述复合膜层13的的具体操作及工艺参数如下：首先，形成复合膜层13中的第一膜层131，提供镁靶22并置于镀膜机100的溅射源上，将镁合金基体11的偏压调控在-150～-300V，镁合金基体11的温度控制在120℃，通入流量为150～300sccm(标准状态毫升/分钟)的氩气、流量为1-50sccm的氧气，开启镁靶22溅镀，设定镁靶22的功率在8～16kw，转架转速为0.5r/min(转/分钟)，溅镀30min。如此，镁合金基体11的表面将镀覆有所述复合膜层13中的第一膜层131即MgxOy层。
形成复合膜层13中第二膜层132，关闭氧气，开启氮气，设置流量为1～50sccm，设定基材的偏压-150～-300V，开启镁靶22溅镀，设定镁靶22的功率在8～16kw，转架转速为0.5r/min(转/分钟)，溅镀40min。如此，在复合膜层13中第一膜层131即MgxOy上形成第二膜层132即MgxNz。
形成复合膜层13中最外层第三膜层133，通入流量为1～50sccm的氮气和1-50sccm的氧气，开启镁靶22溅镀，设定镁靶22的功率在8～16kw，设定基材的偏压-150～-300V，转架转速为0.5r/min(转/分钟)，溅镀60min。然后关闭镁靶，如此，镁合金基体11的表面将镀覆有所述复合膜层13的第三膜层133及MgxOyNz。
上述复合膜层13中的三个膜层是由远离镁合金基体11的方向依次形成，且复合膜层13的MgxOy层、MgxNz和MgxOyNz层中x，y，z的取值范围均在1～10。第一膜层131用以增强转化膜12与第二膜层132与第三膜层133的结合力。该复合膜层13与转化膜12具有良好的结合力，且复合膜层13表面几乎无孔隙。
本镁合金壳体10在镁合金基体11与复合膜层13之间形成有转化膜12，该转化膜12与镁合金基体11结合牢固，且转化膜12与复合膜层13结合的表面平整，大大提高了与复合膜层13的结合力；同时，转化膜12与复合膜层13形成的多层结构可很好地保护镁合金基体11，使得镁合金壳体10表面耐磨损、耐腐蚀。
Claims (10)
1.一种镁合金壳体，包括镁合金基体与复合膜层，其特征在于：该镁合金基体与该复合膜层之间还形成有转化膜，其主要含有Mg、Al、O、P、Mn，所述复合膜层形成于该转化膜上，且依次包括第一膜层、第二膜层及第三膜层，其中第一膜层为MgxOy层，第二膜层为MgxNz，第三膜层为MgxOyNz。
2.如权利要求1所述的镁合金壳体，其特征在于：所述转化膜的厚度为0.2～5μm。
3.如权利要求1所述的镁合金壳体，其特征在于：所述复合膜层的厚度为2～5μm。
4.如权利要求1所述的镁合金壳体，其特征在于：所述复合膜层中各膜层中x，y，z的取值范围均在1～10之间。
5.如权利要求1所述的镁合金壳体，其特征在于：所述转化膜中Mg、Al、O、P、Mn的原子个数比范围为(1～5)∶(1～5)∶(2～10)∶(1～10)∶(3～10)。
6.一种镁合金壳体的制作方法，包括以下步骤：
提供一镁合金基体；
在镁合金基体上进行化学转化膜处理形成一转化膜，其主要含有Mg、Al、O、P、Mn；
在转化膜表面进行PVD镀形成复合膜层，所述复合膜层形成于该转化膜上，且依次包括第一膜层、第二膜层及第三膜层，其中第一膜层为MgxOy层，第二膜层为MgxNz，第三膜层为MgxOyNz。
7.如权利要求6所述的镁合金壳体的制作方法，其特征在于：所述化学转化膜处理在一转化膜溶液中进行，该转化膜溶液由磷酸二氢氨、高锰酸钾、添加剂、及水配成，所述添加剂包括硫化物与氨系有机物，且各占添加剂成分比重的10～20％。
8.如权利要求6所述的镁合金壳体，其特征在于：所述复合膜层中形成MgxOy层的参数为：开启镁靶，设定镁靶的功率在8～16kw，设定基材的偏压-150～-300V，通入流量为1-50sccm的氧气，溅镀30min。
9.如权利要求6所述的镁合金壳体的制作方法，其特征在于：所述复合膜层中形成MgxNz的参数为：开启氮气，设置流量为1～50sccm，设定基材的偏压-150～-300V，开启镁靶，设定镁靶的功率8～16kw，溅镀40min。
10.如权利要求6所述的镁合金壳体的制作方法，其特征在于：所述复合膜层中形成MgxOyNz的参数为：通入流量为1～50sccm的氮气和1-50sccm的氧气，设定基材的偏压-150～-300V，开启镁靶，设定镁靶的功率在8～16kw，溅镀60min。
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| TW100114216A TWI496951B (zh) | 2011-04-22 | 2011-04-25 | 鎂合金殼體及其製作方法 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103726059A (zh) * | 2013-12-30 | 2014-04-16 | 北方工业大学 | 一种镁合金表面复合膜的制备方法 |
| CN105543919A (zh) * | 2015-12-18 | 2016-05-04 | 沈阳理工大学 | 镁合金表面通过物理气相沉积形成电镀用导电涂层的方法 |
| CN111020505A (zh) * | 2019-12-16 | 2020-04-17 | 上海交通大学 | 在镁合金表面用氩离子刻蚀制备高耐腐蚀Al薄膜的方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102534616B (zh) * | 2010-12-16 | 2015-03-11 | 鸿富锦精密工业（深圳）有限公司 | 镁合金制品及其制作方法 |
| TWI487809B (zh) * | 2014-01-06 | 2015-06-11 | Univ Nat Taiwan | 化成皮膜及其製造方法 |
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| US20070020396A1 (en) * | 2005-07-19 | 2007-01-25 | Analisi Tecnologica Innovadora Per A Processos. | Process for applying coatings with metallic or ceramic finish |
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| CN111020505A (zh) * | 2019-12-16 | 2020-04-17 | 上海交通大学 | 在镁合金表面用氩离子刻蚀制备高耐腐蚀Al薄膜的方法 |
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| US20120270035A1 (en) | 2012-10-25 |
| TWI496951B (zh) | 2015-08-21 |
| TW201243107A (en) | 2012-11-01 |
| US8790497B2 (en) | 2014-07-29 |
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