201229270六、發明說明： 【發明所屬之技術領域】 [0001] 本發明涉及一種鎂合金表面 電越遮罩處理方法及其製品 ❹ [先前技術] 鎂合金由於質量輕、散熱性隹、電磁遮罩性好等優點， 廣泛應用於3C電子產品的鎂合金製品，但隨著3C電子產 品的迅速發展，對產品的電磁遮罩性能提出了更高的要 求，因此，未經電磁遮罩處理的鎂合金電子產品已不能 滿足要求。 [〇〇〇3]此外，由於鎂及鎂合金最明顯的缺點為耐腐蝕差，暴露 於自然環境中會引起表面快速腐钱，如此亦將景多響錢合 金的電磁遮罩性能。 [_]採用磁控濺射鍍膜技術於鎂合金基體表面形成的保護性 塗層具有高硬度、高耐磨性、良好:的化學惠定性以及與 鎂合金基體結合牢固等優點，租隹於鳾控濺射技術本身 的特點，以該方法形成的保護性塗省無法完全填充鎂厶 金基體表面的裂紋、孔洞等，因而對鎂合金鎂合、δ 耐腐蝕性能的提高有限。 〇金製品 [0002] [0005] 【發明内容】 鑒於此，提供一種可有效解決上述問 磁遮罩處理方法。 題的鎂合金表面電 [0006] 另外，還有必要提供一種經由上述電 理後而製得的鎂合金製品。 磁遮罩處 理方法處 100100573 表單編號Α0101 第3頁/共16頁 201229270 [0007] 一種鎂合金表面電磁遮罩處理方法，其包括如下步驟： [0008] 提供鎂合金基體； [0009] 採用磁控濺射鍍膜法，依次於所述鎂合金基體上形成鉻 金屬層、欽金屬層； [0010] 採用喷塗法，於所述鈦金屬層上形成防護層，該防護層 為環氧樹脂塗層。 [0011] 一種經由上述電磁遮罩處理方法處理後而製得的鎂合金 製品，包括鎂合金基體、依次形成於該鎂合金基體上的 鉻金屬層、鈦金屬層及防護層，所述防護層為環氧樹脂 塗層。 [0012] 本發明的鎂合金表面電磁遮罩處理方法，在所述鎂合金 基體上採用磁控濺射鍍膜法依次於鎂合金基體上形成鉻 金屬層及鈦金屬層，再在鈦金屬層上進行喷塗形成防護 層。所述鉻金屬層與鈦金屬層形成的複合層大大提高了 鎂合金基體的電磁遮罩效果。該防護層不僅可提高鎂合 金基體的耐腐蝕性，同時還可避免鈦金屬層劃傷而影響 鎮合金製品的電磁遮罩性能。此外，經所述鎮合金表面 電磁遮罩處理方法製得的鎂合金製品還具有良好的耐高 溫高濕性。 【實施方式】 [0013] 請參閱圖1及圖2，本發明一較佳實施方式鎂合金表面電 磁遮罩處理方法主要包括如下步驟： [0014] ( 1 ) 鍍膜前處理 100100573 表單編號A0101 第4頁/共16頁 1002001008-0 201229270 [0015] [0016] [0017] Ο [0018] Ο 知:供一鎮合金基體11，該錢合金基體Η可以藉由沖壓成 型得到，其具有待製得的鎂合金製品丨〇的結構。 將所述鎂合金基體11無水乙醇或異丙酮放入盛裝有無水 乙醇或異丙酮溶液的超聲波清洗器中進行震動清洗，以 除去鎂合金基體11表面的雜質和油污。該超聲波清洗時 間為1 0 ~ 3 0 m i η。清洗完畢後共乾備用。 提供一真空鍍膜機100，將所述鎂合金基體n置於該鍍膜 機100内，對鎂合金基體11的表面進行電漿清洗，進一步 去除鎖合金基體11表面的:油:亏以改善鎮合金基體丨1表 面與後續塗層的結合力。 該真空鍍膜機100包括一鍍膜室2〇及連接在鍵膜室2〇的一 真空泵30，真空泵30用以對鑛膜室2〇抽真空。該嫉媒室 20内設有轉架（未圖示）、二第一把持22及二第二粑材 23 °轉架帶動鎂合金基體11沿圓形軌跡21作公轉，立鎮 合金基體11在沿轨跡21作公轉時亦自轉>:^_第一敦•材22 與二第一乾材23關於軌跡21的”中.心對_哎置，且二第一 粗材22相對地設置在軌跡21的内外，側，_„第二把材23相 對地設置在軌跡21的内外侧。每一第一把材22及每一第 二靶材23的兩端均設有氣源通道24，氣體經該氣源通道 24進入所述鍍膜室20中。當鎂合金基體Η穿過二第一乾 材22之間時，將鍍上第一靶材22表面濺射出的粒子，當 媒合金基體11穿過二第二乾材23之間時，將鑛上第二把 材23表面濺射出的粒子。本發明中，所述第一把材22為 鉻把，所述第二靶材23為鈦把。 100100573 表單編號A0101 第5頁/共16頁 1002001008-0 201229270 [〇〇19]該電衆清洗的具體操作及工藝參數為：如圖2所示，將鎂 合金基體lit裝於鍍膜室20内，真空泵3〇對所述鍍膜室 2〇進行抽真空處理至真空度為丨.〇χ1〇-3〜3 〇xl〇-3Pa， 然後以100〜30〇sccm (標準狀態毫升/分鐘）的流量向鍍 膜室20内通入純度為99.999%的氬氣（工作氣體），於 鎂合金基體11上施加-150〜-200V的偏壓，對鎂合金基體 11表面進行電漿清洗，清洗時間為5〜1〇min。 [0020] (2)磁控濺射鉻金屬層13 [0021 ]在所述電漿清洗完成後，調節工作氣體氬氣流量至 100~300sccm，加熱所述鍍膜室2〇至150〜2〇〇。(：（即鍍 膜溫度為150〜200。(3 );開啟所述第一靶材22的電源， 並設定其功率為20〜40kW ’於鎂合金基體π上施加-150〜-200V的偏壓，沉積鉻金屬層13。沉積該鉻金屬層 13的時間為1〇〜15miη。沉積完成該鉻金屬層13後關閉所 述第一乾材2 2的電源。 [0022] (3)磁控濺射鈦金屬層1 5 [0023] 調卽工作氣體复氣流量至100~300sccm，維持鑛膜溫度 為1 50-200°C ;開啟所述第二靶材23的電源，並設定其 功率為20~40kW，於鎂合金基體11上施加-150〜-2〇〇v的 偏壓，沉積鈦金屬層15。沉積該鈦金屬層15的時間為 45〜60min 。 [0024] [0025] (4) 喷塗防護層17 該防護層17為環氧樹脂塗層。喷塗防護層17採用直徑為 2mm的噴搶，設置喷塗氣壓為2. 026xl(T5Pa，將主要成 100100573 表單編號A0101 第6頁/共16頁 1002001008-0 201229270 [0026]201229270 VI. Description of the Invention: [Technical Field] [0001] The present invention relates to a magnesium alloy surface electric over-mask treatment method and a product thereof [Prior Art] Magnesium alloy due to light weight, heat dissipation, electromagnetic shielding Good properties, etc., widely used in magnesium alloy products of 3C electronic products, but with the rapid development of 3C electronic products, higher requirements are placed on the electromagnetic shielding performance of the products. Therefore, magnesium without electromagnetic shielding treatment Alloy electronic products are no longer sufficient. [〇〇〇3] In addition, since the most obvious shortcomings of magnesium and magnesium alloys are poor corrosion resistance, exposure to the natural environment will cause rapid surface corruption, which will also make the electromagnetic shielding performance of the multi-note money. [_]The protective coating formed on the surface of magnesium alloy substrate by magnetron sputtering coating technology has high hardness, high wear resistance, good chemical compatibility and strong bonding with magnesium alloy matrix. The characteristics of the controlled sputtering technology itself, the protective coating formed by this method can not completely fill the cracks, holes and the like on the surface of the magnesium-gold substrate, and thus the improvement of the magnesium alloy and δ corrosion resistance of the magnesium alloy is limited. Sheet metal product [0002] [0005] In view of the above, a magnetic magnetic mask processing method capable of effectively solving the above problem is provided. Magnesium alloy surface electric power [0006] In addition, it is also necessary to provide a magnesium alloy product obtained by the above-mentioned electric power. Magnetic mask processing method 100100573 Form No. Α0101 Page 3 / Total 16 pages 201229270 [0007] A magnesium alloy surface electromagnetic mask processing method, comprising the following steps: [0008] providing a magnesium alloy substrate; [0009] using magnetic control a sputter coating method, sequentially forming a chromium metal layer and a metal layer on the magnesium alloy substrate; [0010] forming a protective layer on the titanium metal layer by spraying, the protective layer is epoxy resin coating . [0011] A magnesium alloy article obtained by the above-described electromagnetic mask processing method, comprising a magnesium alloy substrate, a chromium metal layer, a titanium metal layer and a protective layer sequentially formed on the magnesium alloy substrate, the protective layer It is coated with epoxy resin. [0012] The magnesium alloy surface electromagnetic shielding treatment method of the present invention, the chrome metal layer and the titanium metal layer are sequentially formed on the magnesium alloy substrate by magnetron sputtering coating on the magnesium alloy substrate, and then on the titanium metal layer. Spraying to form a protective layer. The composite layer formed by the chrome metal layer and the titanium metal layer greatly enhances the electromagnetic shielding effect of the magnesium alloy substrate. The protective layer not only improves the corrosion resistance of the magnesium alloy matrix, but also avoids the scratching of the titanium metal layer and affects the electromagnetic shielding performance of the alloyed article. In addition, the magnesium alloy product obtained by the surface treatment of the alloy surface by the electromagnetic mask has good high temperature and high humidity resistance. [Embodiment] [0013] Referring to FIG. 1 and FIG. 2, a method for processing an electromagnetic shielding surface of a magnesium alloy according to a preferred embodiment of the present invention mainly comprises the following steps: [0014] (1) Pre-coating treatment 100100573 Form No. A0101 No. 4 [0017] [0018] [0018] : [A] for a town alloy substrate 11, the carbon alloy matrix Η can be obtained by stamping, which has to be made The structure of the magnesium alloy product. The magnesium alloy substrate 11 anhydrous ethanol or isopropanone is placed in an ultrasonic cleaner containing an anhydrous ethanol or iso-acetone solution for vibration cleaning to remove impurities and oil stains on the surface of the magnesium alloy substrate 11. The ultrasonic cleaning time is 10 to 30 m i η. After cleaning, a total of spare. A vacuum coating machine 100 is provided, and the magnesium alloy substrate n is placed in the coating machine 100, and the surface of the magnesium alloy substrate 11 is plasma-cleaned to further remove the surface of the lock alloy substrate 11: oil: loss to improve the town alloy The bond between the surface of the substrate 丨1 and the subsequent coating. The vacuum coater 100 includes a coating chamber 2A and a vacuum pump 30 connected to the membrane chamber 2, and a vacuum pump 30 for evacuating the membrane chamber 2〇. The retort chamber 20 is provided with a turret (not shown), two first handles 22 and two second girders 23 ° turret to drive the magnesium alloy substrate 11 to revolve along the circular trajectory 21, and the standing alloy substrate 11 is When the trajectory 21 is revolved, it also rotates >: ^ _ first material · 22 and two first dry materials 23 with respect to the trajectory 21 of the trajectory 21, and the two first slabs 22 are oppositely disposed On the inner and outer sides of the trajectory 21, the second material 23 is disposed oppositely on the inner and outer sides of the trajectory 21. A gas source passage 24 is disposed at each end of each of the first material 22 and each of the second targets 23, and the gas enters the coating chamber 20 through the gas source passage 24. When the magnesium alloy matrix crucible passes between the two first dry materials 22, the particles sputtered on the surface of the first target 22 will be plated, and when the intercalation alloy substrate 11 passes between the second and second dry materials 23, the ore will be Particles sputtered on the surface of the second material 23. In the present invention, the first material 22 is a chrome handle and the second target 23 is a titanium handle. 100100573 Form No. A0101 Page 5 of 16 1002001008-0 201229270 [〇〇19] The specific operation and process parameters of the electric cleaning are as follows: as shown in FIG. 2, the magnesium alloy base is installed in the coating chamber 20, The vacuum pump 3 抽 vacuums the coating chamber 2 to a vacuum of 丨.〇χ1〇-3~3 〇xl〇-3Pa, and then flows at a flow rate of 100 to 30 〇sccm (standard state ML/min) An argon gas (working gas) having a purity of 99.999% is introduced into the coating chamber 20, and a bias voltage of -150 to -200 V is applied to the magnesium alloy substrate 11, and the surface of the magnesium alloy substrate 11 is plasma-cleaned for 5 hours. 1〇min. [0020] (2) Magnetron Sputtering Chromium Metal Layer 13 [0021] After the plasma cleaning is completed, the working gas argon gas flow rate is adjusted to 100~300 sccm, and the coating chamber is heated to 2 to 150~2. . (: (ie, the coating temperature is 150 to 200. (3); turn on the power of the first target 22, and set its power to 20 to 40 kW' to apply a bias of -150 to -200 V on the magnesium alloy substrate π Depositing a chrome metal layer 13. The time for depositing the chrome metal layer 13 is 1 〇 15 15 η. After the chrome metal layer 13 is deposited, the power of the first dry material 2 2 is turned off. [0022] (3) Magnetron splash Shooting titanium metal layer 1 5 [0023] adjusting the working gas regas flow rate to 100~300sccm, maintaining the film temperature of 1 50-200 ° C; turning on the power of the second target 23, and setting its power to 20 ~40 kW, a bias of -150 to -2 〇〇v is applied to the magnesium alloy substrate 11 to deposit a titanium metal layer 15. The time for depositing the titanium metal layer 15 is 45 to 60 min. [0024] (4) Spraying protective layer 17 The protective layer 17 is made of epoxy resin. The sprayed protective layer 17 is sprayed with a diameter of 2 mm, and the spray pressure is set to 2. 026xl (T5Pa, which will be mainly 100100573. Form No. A0101, page 6 / Total 16 pages 1002001008-0 201229270 [0026]
GG
[0027][0027]
[0028] [0029] [0030] [0031] [0032] [0033] [0034] [0035] 分為環氧樹脂的液態塗料喷塗於鈦金屬層1 5上形成防護 層17。防護層17的厚度為50〜80/zm。 本發明較佳實施方式鎂合金表面電磁遮罩處理方法在所 述鎂合金基體11上採用磁控濺射鍍膜法依次於鎂合金基 體11上形成鉻金屬層13及鈦金屬層15，再在鈦金屬層15 上進行喷塗形成防護層17。所述鉻金屬層13與鈦金屬層 15形成的複合層大大提高了鎂合金基體11的電磁遮罩效 果。該防護層17不僅可提高鎂合金基體11的耐腐蝕性， 同時還可避免鈦金屬層15劃傷而影響鎂合金製品10的電 磁遮罩性能。此外，該鎂合金製品10還具有良好的耐高 溫高濕性。 一種經由上述鎂合金表面電磁遮罩處理方法製得的鎂合 金製品10包括鎂合金基體11、依次形成於該鎂合金基體 11表面的絡金屬層13、鈦金屬層15及防護層17。 所述鉻金屬層13的厚度為100~5.00nm_。 所述鈦金屬層15的厚度為100~1000mn。 所述防護層17為環氧樹脂塗層，其厚度為50〜80/ζιη。 所述鎂合金製品的電磁遮罩效能可達60〜7OdB。 下面藉由實施例來對本發明進行具體說明。 實施例1 (1) 鍍膜前處理 採用無水乙醇或異丙酮對鎂合金基體11進行超聲波清洗 100100573 表單編號A0101 第7頁/共16頁 1002001008-0 201229270 大約2 5 m i η ° [0036] 將清洗好的鎂合金基體11放入所述真空鍍膜機100的轉架 上。對鎂合金基體11的表面採用電漿清洗。對鍍膜室20 進行抽真空處理至真空度為1. 5x1 (T3Pa，氬氣流量為 150sscm，施加鎂合金基體11的偏壓為-200V，該電漿清 洗時間為5miη。本實施例所使用的真空鍍膜機為北京丹 普表面技術有限公司生產，型號為AS600DMTX05-X。 [0037] (2) 磁控濺射鉻金屬層13 [0038] 保持所述氬氣的流量及施加於鎂合金基體11上的偏壓不 變，加熱鍍膜室至150°C (即鍍膜溫度為150°C )，設置 第一靶材22的電源功率為30kW，沉積該鉻金屬層13的時 間為1 0m i η。 [0039] (3) 磁控濺射鈦金屬層15 [0040] 保持所述氬氣的流量、施加於鎂合金基體11上的偏壓及 鍍膜溫度不變，設置第二靶材23的電源功率為30kW，沉 積該鉻金屬層13的時間為50min。 [0041] ( 4 ) 噴塗防護層1 7 [0042] 該防護層17為環氧樹脂塗層。採用直徑為2nm的噴搶，設 置喷塗氣壓為2. 026xl0_5Pa，將主要成分為環氧樹脂塗 料的液態塗料喷塗於鈦金屬層15上形成防護層17。該防 護層17的厚度為50〜80/zm。本實施例中，液態塗料為環 氧樹脂塗料，液態塗料的溶劑為二甲苯。其中，環氧樹 脂佔液態塗料的質量百分比約為85%。 100100573 表單編號A0101 第8頁/共16頁 1002001008-0 201229270 [0043] [0044] [0045] [0046] [0047][0035] [0035] [0035] A liquid coating that is divided into epoxy resins is sprayed onto the titanium metal layer 15 to form a protective layer 17. The thickness of the protective layer 17 is 50 to 80/zm. In the preferred embodiment of the present invention, a magnesium alloy surface electromagnetic shielding treatment method is formed on the magnesium alloy substrate 11 by a magnetron sputtering coating method to form a chromium metal layer 13 and a titanium metal layer 15 on the magnesium alloy substrate 11, and then in titanium. The metal layer 15 is sprayed to form a protective layer 17. The composite layer formed of the chromium metal layer 13 and the titanium metal layer 15 greatly enhances the electromagnetic shielding effect of the magnesium alloy substrate 11. The protective layer 17 not only improves the corrosion resistance of the magnesium alloy substrate 11, but also prevents the titanium metal layer 15 from being scratched and affects the electromagnetic masking properties of the magnesium alloy article 10. Further, the magnesium alloy article 10 also has good high temperature and high humidity resistance. A magnesium alloy article 10 obtained by the above-described magnesium alloy surface electromagnetic mask treatment method comprises a magnesium alloy substrate 11, a complex metal layer 13, a titanium metal layer 15, and a protective layer 17 which are sequentially formed on the surface of the magnesium alloy substrate 11. The chromium metal layer 13 has a thickness of 100 to 5.00 nm. The titanium metal layer 15 has a thickness of 100 to 1000 nm. The protective layer 17 is an epoxy resin coating having a thickness of 50 to 80/inch. The electromagnetic shielding effectiveness of the magnesium alloy product can reach 60~7OdB. The invention will now be specifically described by way of examples. Example 1 (1) Pre-coating treatment Ultrasonic cleaning of magnesium alloy substrate 11 using absolute ethanol or iso-acetone 100100573 Form No. A0101 Page 7 of 16 1002001008-0 201229270 Approx. 2 5 mi η ° [0036] Will be cleaned The magnesium alloy substrate 11 is placed on the turret of the vacuum coater 100. The surface of the magnesium alloy substrate 11 is cleaned by plasma. The coating chamber 20 is evacuated to a vacuum of 1. 5x1 (T3Pa, argon flow rate is 150sscm, the bias voltage of the applied magnesium alloy substrate 11 is -200V, and the plasma cleaning time is 5miη. The use of this embodiment The vacuum coating machine is produced by Beijing Demp Surface Technology Co., Ltd., model AS600DMTX05-X. [0037] (2) Magnetron Sputtering Chromium Metal Layer 13 [0038] Maintaining the flow rate of the argon gas and applying it to the magnesium alloy substrate 11 The upper bias voltage is constant, the coating chamber is heated to 150 ° C (ie, the coating temperature is 150 ° C), the power supply of the first target 22 is set to 30 kW, and the time for depositing the chromium metal layer 13 is 10 μ η. (3) Magnetron Sputtering Titanium Metal Layer 15 [0040] The flow rate of the argon gas, the bias voltage applied to the magnesium alloy substrate 11 and the coating temperature are maintained, and the power of the second target 23 is set. For 30 kW, the time for depositing the chrome metal layer 13 is 50 min. [0041] (4) Spraying the protective layer 17 [0042] The protective layer 17 is an epoxy resin coating. Spraying is performed with a diameter of 2 nm. The air pressure is 2. 026xl0_5Pa, and the liquid paint with the main component of epoxy resin coating is sprayed on the titanium metal. A protective layer 17 is formed on the layer 15. The protective layer 17 has a thickness of 50 to 80 / zm. In this embodiment, the liquid coating is an epoxy resin coating, and the solvent of the liquid coating is xylene. The mass percentage is about 85%. 100100573 Form No. A0101 Page 8 / Total 16 Page 1002001008-0 201229270 [0044] [0046] [0047]
[0048] [0049] ο [0050] [0051] [0052] [0053] 喷塗後，對防護層17進行UV照射固化及後烘烤處理。 實施例2 (1) 鍍膜前處理 採用無水乙醇或異丙酮對鎂合金基體11進行超聲波清洗 大約2 5 m i η。 將清洗好的鎂合金基體11放入真空鍍膜機100的轉架上。 對鎂合金基體11的表面採用電漿清洗。對鍍膜室20進行 抽真空處理至真空度為2xlO_3Pa，氬氣流量為200sscm ，施加鎂合金基體11的偏壓為-150V，該電漿清洗時間為 5miη。本實施例所使用的真空鍍膜機100為北京丹普表面 技術有限公司生產，型號為AS600.DMTX05-X。 (2) 磁控濺射鉻金屬層13 保持所述氬氣的流量及施加於鎂合金基體11上的偏壓不 變，加熱鍍膜室20至200°C (即鍍膜溫度為200°C )，設 置第一靶材22的電源功率為30kW，沉積該鉻金屬層13的 時間為1 5 m i η。 (3) 磁控濺射鈦金屬層15 保持所述氬氣的流量、施加於鎂合金基體11上的偏壓及 鍍膜溫度不變，設置第二靶材23的電源功率為30kW，沉 積該鉻金屬層13的時間為60min。 (4) 喷塗防護層17 該防護層17為環氧樹脂塗層。採用直徑為2mm的喷槍，設 100100573 表單編號A0101 第9頁/共16頁 1002001008-0 201229270 置喷塗氣塵為2· 026χ10、，將主要成分為環 料的液態塗料喷塗於欽金屬層15上形成防護層17。該曰防 護層17的厚度為50~80/zm。本實施例中，液態塗料為環 氧樹脂塗料，液態塗料的溶劑為二甲苯。其中，環氧樹< 脂佔液態塗料的質量百分比約為85%。 [_喷塗後，對防護層17進行ϋν照射固化及後洪烤處理。 [0055] 性能測試 酬將上述製㈣鎂合金製心進行電磁鮮聽測試百 格測試、鹽霧測試和高溫高濕測試，具競測試方法及結 果如下： [0057] ( 1 )表面最大電阻測試 * 圃採㈣電阻測試儀為廣州四探針科技有限公司生產其 型號為RTS_8。測試表明，由本發明實施例1及2方法所製 備的鎮合金製品1〇的最大電阻值分別為〇 .3Ω、〇· 5Ω。 [0059] ( 2 )電磁遮罩效能測試 _]採用的電磁遮罩測試儀為安捷倫公司生產，其型號為 5073。測试表明，在0. 5GHz〜3GHz的頻率範圍，由本 發明實施例1及2方法所製備的鎮合金製品1〇的電磁遮罩 效能分別為68dB、62dB。 [0061] 由 、測試結果可見，項所述之鎂合金製品 10具有良好的電磁料效能。 [0062] ( 3 )鹽霧測試 100100573 表早編號A0101 第10頁/共16頁 1002001008-0 201229270 剛進行机中性鹽霧（NaC1濃度為5%)測試。結果表明， 由本發明實施例1和實施例2的方法所製備的鎮合金製品 10在72小賴才出現腐㈣象，錄所述表面處理方法 形成於鎮合金基體u表㈣鉻金制13、欽金屬層15及 - 防制17均完好、未發生脫落現象。可見，所述鎮合金 製品1 0具有良好的耐腐蝕性。 [0064] ( 4 )百格測試 [_肖由本發明實施例i和實施例2的方法所製得關合金製 〇 °σ1()進行百格，収，其測試結果均為5B，即沒有膜層脫 落可見，依-人形成於鎂合金基體u上的絡金屬層13、 鈦金屬層15及防護層17具有良好的附著力。 _] (5)高溫高濕測試 剛採用KTHB-615TBS型咖高溫高濕試驗箱，測試參數如 下‘先在溫度為25°C、相對濕度為95則（Relative[0054] [0053] After spraying, the protective layer 17 is subjected to UV irradiation curing and post-baking treatment. Example 2 (1) Pre-coating treatment The magnesium alloy substrate 11 was ultrasonically cleaned with anhydrous ethanol or isopropanone to about 2 5 m i η. The cleaned magnesium alloy substrate 11 is placed on a turret of the vacuum coater 100. The surface of the magnesium alloy substrate 11 is cleaned by plasma. The coating chamber 20 was evacuated to a vacuum of 2 x 10 -3 Pa, an argon flow rate of 200 sscm, a bias voltage of -150 V applied to the magnesium alloy substrate 11, and a plasma cleaning time of 5 mi?. The vacuum coater 100 used in this embodiment is produced by Beijing Demp Surface Technology Co., Ltd., model AS600.DMTX05-X. (2) The magnetron sputtering chromium metal layer 13 maintains the flow rate of the argon gas and the bias voltage applied to the magnesium alloy substrate 11 unchanged, and heats the coating chamber at 20 to 200 ° C (ie, the coating temperature is 200 ° C). The power source of the first target 22 is set to 30 kW, and the time for depositing the chrome metal layer 13 is 15 mil. (3) The magnetron sputtering titanium metal layer 15 maintains the flow rate of the argon gas, the bias voltage applied to the magnesium alloy substrate 11 and the coating temperature are constant, and the power supply of the second target 23 is set to 30 kW, and the chromium is deposited. The time of the metal layer 13 was 60 min. (4) Spraying the protective layer 17 The protective layer 17 is an epoxy resin coating. Spray gun with a diameter of 2mm, set 100100573 Form No. A0101 Page 9 / Total 16 pages 1002001008-0 201229270 Spray dust is 2·026χ10, spray the liquid paint with the main component as a ring material on the metal layer A protective layer 17 is formed on 15. The thickness of the protective layer 17 is 50 to 80/zm. In this embodiment, the liquid coating material is an epoxy resin coating, and the solvent of the liquid coating material is xylene. Among them, the epoxy resin < grease accounts for about 85% by mass of the liquid coating. [_ After spraying, the protective layer 17 is subjected to ϋν irradiation curing and post-boiling treatment. [0055] Performance test will be the above-mentioned system (four) magnesium alloy core for electromagnetic sound test 100 grid test, salt spray test and high temperature and high humidity test, with competitive test methods and results are as follows: [0057] (1) surface maximum resistance test * The 圃 (4) resistance tester is manufactured by Guangzhou Four Probe Technology Co., Ltd. and its model number is RTS_8. Tests have shown that the maximum resistance values of the bismuth alloys prepared by the methods of the first and second embodiments of the present invention are 〇3 Ω, 〇·5 Ω, respectively. [0059] (2) Electromagnetic mask performance test _] The electromagnetic mask tester used was produced by Agilent, and its model number was 5073. Tests have shown that in the frequency range of 0.5 GHz to 3 GHz, the electromagnetic shielding effectiveness of the 1 镇 alloy alloy article prepared by the methods of the first and second embodiments of the present invention is 68 dB and 62 dB, respectively. [0061] As can be seen from the test results, the magnesium alloy article 10 described in the item has good electromagnetic efficiency. (3) Salt spray test 100100573 Table early No. A0101 Page 10 of 16 1002001008-0 201229270 Just tested with a neutral salt spray (NaC1 concentration of 5%). The results show that the sinter alloy article 10 prepared by the methods of the first embodiment and the second embodiment of the present invention exhibits a rot (four) image at 72 Å, and the surface treatment method is formed on the town alloy matrix (4) chrome gold. The metal layer 15 and the control system 17 were all intact and did not fall off. It can be seen that the town alloy article 10 has good corrosion resistance. [0064] (4) Hundreds of tests [ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The layer peeling is visible, and the complex metal layer 13, the titanium metal layer 15, and the protective layer 17 formed on the magnesium alloy substrate u have good adhesion. _] (5) High temperature and high humidity test Just use KTHB-615TBS type coffee high temperature and high humidity test chamber, the test parameters are as follows: first at temperature 25 ° C, relative humidity is 95 (Relative
Humidity)的條件下保持3h，再於相對濕丨度為95讓、 Ο ㈣度為55G的條件下保持S後在溫度為2 5 °c 、相對 濕度為97%RH的條件下保持3h，最後在溫度為飢相對 濕度為97%RH的條件下保持处，如此共計⑽為一個循環 〇 [_測試表明，由本發明實，1及2的方法所製得_合金 製品10均可達到18彳_環以上的測試要求 。可見，所述 鎮合金製品U)具有良好的耐高溫高濕性。 【圖式簡單說明】 卿]圖1為本發明較佳實施方式鎮合金製品的剖視示意圖 1002001008-0 100100573 表單編號議 第U _心 201229270 [0070] 圖2為製造圖1中鎂合金製品所用真空鍍膜機的示意圖。 [0071] 【主要元件符號說明】 鎂合金製品：10 [0072] 鎂合金基體：11 [0073] 鉻金屬層：13 [0074] 鈦金屬層：15 [0075] 防護層：17 [0076] 鍍膜機：100 [0077] 鍍膜室：20 [0078] 真空泵：30 [0079] 軌跡：21 [0080] 第一靶材：22 [0081] 第二靶材：23 [0082] 氣源通道：24 100100573 表單編號A0101 第12頁/共16頁 1002001008-0Under the condition of Humidity), keep it for 3h, and then keep S for 3h under the condition of relative wetness of 95, Ο (four) degree of 55G, and maintain the temperature for 25h and relative humidity of 97% RH for 3h. The temperature is maintained at a relative humidity of 97% RH, so that the total (10) is a cycle 〇 [_ test shows that the alloy article 10 obtained by the method of the present invention, 1 and 2 can reach 18 彳Test requirements above the ring. It can be seen that the town alloy product U) has good high temperature and high humidity resistance. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view showing a preferred embodiment of a town alloy article according to a preferred embodiment of the present invention. 1002001008-0 100100573 Form No. U _ heart 201229270 [0070] FIG. 2 is a view for manufacturing the magnesium alloy product of FIG. Schematic diagram of a vacuum coating machine. [Main component symbol description] Magnesium alloy product: 10 [0072] Magnesium alloy substrate: 11 [0073] Chromium metal layer: 13 [0074] Titanium metal layer: 15 [0075] Protective layer: 17 [0076] Coating machine :100 [0077] Coating chamber: 20 [0078] Vacuum pump: 30 [0079] Track: 21 [0080] First target: 22 [0081] Second target: 23 [0082] Air source channel: 24 100100573 Form number A0101 Page 12 of 16 1002001008-0