CN102400092A - 壳体及其制造方法 - Google Patents
壳体及其制造方法 Download PDFInfo
- Publication number
- CN102400092A CN102400092A CN2010102784496A CN201010278449A CN102400092A CN 102400092 A CN102400092 A CN 102400092A CN 2010102784496 A CN2010102784496 A CN 2010102784496A CN 201010278449 A CN201010278449 A CN 201010278449A CN 102400092 A CN102400092 A CN 102400092A
- Authority
- CN
- China
- Prior art keywords
- housing
- alno
- layer
- aluminium lamination
- alloy matrix
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0676—Oxynitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12736—Al-base component
- Y10T428/12764—Next to Al-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201010278449.6A CN102400092B (zh) | 2010-09-10 | 2010-09-10 | 壳体及其制造方法 |
US12/966,031 US20120064366A1 (en) | 2010-09-10 | 2010-12-13 | Housing and method for manufacturing housing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201010278449.6A CN102400092B (zh) | 2010-09-10 | 2010-09-10 | 壳体及其制造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102400092A true CN102400092A (zh) | 2012-04-04 |
CN102400092B CN102400092B (zh) | 2014-07-09 |
Family
ID=45807002
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201010278449.6A Expired - Fee Related CN102400092B (zh) | 2010-09-10 | 2010-09-10 | 壳体及其制造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20120064366A1 (zh) |
CN (1) | CN102400092B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102820418A (zh) * | 2012-08-28 | 2012-12-12 | 广州有色金属研究院 | 一种半导体照明用绝缘导热膜层材料及其制备方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6144532B2 (ja) * | 2013-05-01 | 2017-06-07 | 株式会社デンソー | ブレージングシートのろう付け方法、及び熱交換器の製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4769291A (en) * | 1987-02-02 | 1988-09-06 | The Boc Group, Inc. | Transparent coatings by reactive sputtering |
CN1056159A (zh) * | 1991-06-18 | 1991-11-13 | 北京市太阳能研究所 | 太阳能选择性吸收膜及制备 |
US20100086775A1 (en) * | 2008-10-06 | 2010-04-08 | Bruce Lairson | Optical spectrally selective coatings |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL43910C (zh) * | 1933-10-11 | |||
US4331737A (en) * | 1978-04-01 | 1982-05-25 | Zaidan Hojin Handotai Kenkyu Shinkokai | Oxynitride film and its manufacturing method |
DE2851584B2 (de) * | 1978-11-29 | 1980-09-04 | Fried. Krupp Gmbh, 4300 Essen | Verbundkörper |
US8372250B2 (en) * | 2007-07-23 | 2013-02-12 | National Science And Technology Development Agency | Gas-timing method for depositing oxynitride films by reactive R.F. magnetron sputtering |
-
2010
- 2010-09-10 CN CN201010278449.6A patent/CN102400092B/zh not_active Expired - Fee Related
- 2010-12-13 US US12/966,031 patent/US20120064366A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4769291A (en) * | 1987-02-02 | 1988-09-06 | The Boc Group, Inc. | Transparent coatings by reactive sputtering |
CN1056159A (zh) * | 1991-06-18 | 1991-11-13 | 北京市太阳能研究所 | 太阳能选择性吸收膜及制备 |
US20100086775A1 (en) * | 2008-10-06 | 2010-04-08 | Bruce Lairson | Optical spectrally selective coatings |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102820418A (zh) * | 2012-08-28 | 2012-12-12 | 广州有色金属研究院 | 一种半导体照明用绝缘导热膜层材料及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
US20120064366A1 (en) | 2012-03-15 |
CN102400092B (zh) | 2014-07-09 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Free format text: FORMER OWNER: HONGFUJIN PRECISE INDUSTRY CO., LTD. Effective date: 20141204 Owner name: NANTONG ORIENT TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: BEIJING ZHONGCAI WYSE EDUCATION TECHNOLOGY CO., LTD. Effective date: 20141204 Owner name: BEIJING ZHONGCAI WYSE EDUCATION TECHNOLOGY CO., LT Free format text: FORMER OWNER: HONGFUJIN PRECISE INDUSTRY (SHENZHEN) CO., LTD. Effective date: 20141204 |
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C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 100083 HAIDIAN, BEIJING TO: 226363 NANTONG, JIANGSU PROVINCE Free format text: CORRECT: ADDRESS; FROM: 518109 SHENZHEN, GUANGDONG PROVINCE TO: 100083 HAIDIAN, BEIJING |
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TR01 | Transfer of patent right |
Effective date of registration: 20141204 Address after: 226363, Jiangsu, Nantong province Tongzhou District Liu Zhen industrial concentration area Patentee after: NANTONG DONGFANG SCIENCE & TECHNOLOGY CO.,LTD. Address before: 100083 Beijing Haidian District Zhongguancun Road No. 18 smartfortune International Building B706 Patentee before: Beijing Zhongcai Wyse Education Technology Co.,Ltd. Effective date of registration: 20141204 Address after: 100083 Beijing Haidian District Zhongguancun Road No. 18 smartfortune International Building B706 Patentee after: Beijing Zhongcai Wyse Education Technology Co.,Ltd. Address before: 518109 Guangdong city of Shenzhen province Baoan District Longhua Town Industrial Zone tabulaeformis tenth East Ring Road No. 2 two Patentee before: HONG FU JIN PRECISION INDUSTRY (SHENZHEN) Co.,Ltd. Patentee before: HON HAI PRECISION INDUSTRY Co.,Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140709 Termination date: 20190910 |
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CF01 | Termination of patent right due to non-payment of annual fee |