CN102498559B - 基板保持架系统、基板接合装置以及器件的制造方法 - Google Patents

基板保持架系统、基板接合装置以及器件的制造方法 Download PDF

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Publication number
CN102498559B
CN102498559B CN201080041652.XA CN201080041652A CN102498559B CN 102498559 B CN102498559 B CN 102498559B CN 201080041652 A CN201080041652 A CN 201080041652A CN 102498559 B CN102498559 B CN 102498559B
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CN
China
Prior art keywords
substrate
substrate holder
contact
contact portion
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201080041652.XA
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English (en)
Chinese (zh)
Other versions
CN102498559A (zh
Inventor
菅谷功
长南纯一
前田荣裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of CN102498559A publication Critical patent/CN102498559A/zh
Application granted granted Critical
Publication of CN102498559B publication Critical patent/CN102498559B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/185—Joining of semiconductor bodies for junction formation
    • H01L21/187—Joining of semiconductor bodies for junction formation by direct bonding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
    • Y10T156/1702—For plural parts or plural areas of single part
    • Y10T156/1744—Means bringing discrete articles into assembled relationship

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)
CN201080041652.XA 2009-07-21 2010-07-21 基板保持架系统、基板接合装置以及器件的制造方法 Expired - Fee Related CN102498559B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2009170513 2009-07-21
JP2009-170513 2009-07-21
JP2009253438 2009-11-04
JP2009-253438 2009-11-04
PCT/JP2010/004659 WO2011010452A1 (ja) 2009-07-21 2010-07-21 基板ホルダシステム、基板接合装置およびデバイスの製造方法

Publications (2)

Publication Number Publication Date
CN102498559A CN102498559A (zh) 2012-06-13
CN102498559B true CN102498559B (zh) 2016-03-02

Family

ID=43498934

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080041652.XA Expired - Fee Related CN102498559B (zh) 2009-07-21 2010-07-21 基板保持架系统、基板接合装置以及器件的制造方法

Country Status (8)

Country Link
US (1) US9054140B2 (enExample)
EP (1) EP2458628A4 (enExample)
JP (1) JP5810914B2 (enExample)
KR (1) KR20120037999A (enExample)
CN (1) CN102498559B (enExample)
IN (1) IN2012DN01481A (enExample)
TW (1) TW201131689A (enExample)
WO (1) WO2011010452A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011115498A1 (de) * 2011-10-11 2012-12-20 Carl Zeiss Smt Gmbh Lagervorrichtung zur Lagerung eines Substrats und mikrolithographische Projektionsbelichtungsanlage mit einer solchen Lagervorrichtung
WO2014154272A1 (de) 2013-03-27 2014-10-02 Ev Group E. Thallner Gmbh Aufnahmeeinrichtung, vorrichtung und verfahren zur handhabung von substratstapeln
US9947637B2 (en) 2013-11-01 2018-04-17 Nikon Corporation System and method for clamping wafers together in alignment using pressure
EP3312871B1 (de) * 2014-02-03 2024-09-25 EV Group E. Thallner GmbH Aufnahmeeinrichtung zur aufnahme eines substratstapels
JP6378942B2 (ja) 2014-06-12 2018-08-22 東京エレクトロン株式会社 載置台及びプラズマ処理装置
SG11201603148VA (en) * 2014-12-18 2016-07-28 Ev Group E Thallner Gmbh Method for bonding substrates
CN115954300A (zh) 2016-09-29 2023-04-11 Ev 集团 E·索尔纳有限责任公司 用于结合两个基板的装置和方法
JP6516889B2 (ja) * 2018-01-29 2019-05-22 エーファウ・グループ・エー・タルナー・ゲーエムベーハー 基板スタックを取り扱うための、収容システム及び装置及び方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005251972A (ja) * 2004-03-04 2005-09-15 Nikon Corp ウェハ重ね合わせ方法及びウェハ重ね合わせ装置
JP2005339706A (ja) * 2004-05-28 2005-12-08 Tsubaki Seiko:Kk 基板接合装置、基板接合方法および記録ディスク製造方法
CN101190724A (zh) * 2006-12-01 2008-06-04 村田机械株式会社 单片板输送用托盘
WO2009057710A1 (ja) * 2007-10-30 2009-05-07 Nikon Corporation 基板保持部材、基板接合装置、積層基板製造装置、基板接合方法、積層基板製造方法および積層型半導体装置製造方法

Family Cites Families (14)

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Publication number Priority date Publication date Assignee Title
US4038599A (en) 1974-12-30 1977-07-26 International Business Machines Corporation High density wafer contacting and test system
JP2673239B2 (ja) * 1988-11-07 1997-11-05 東京エレクトロン株式会社 処理装置
US5133491A (en) * 1990-12-20 1992-07-28 Die Tech, Inc. Substrate breaker
JP3296108B2 (ja) * 1994-08-08 2002-06-24 神鋼電機株式会社 電子基板用コンテナ
JPH11261000A (ja) 1998-03-13 1999-09-24 Japan Science & Technology Corp ３次元半導体集積回路装置の製造方法
JP3693972B2 (ja) * 2002-03-19 2005-09-14 富士通株式会社 貼合せ基板製造装置及び基板貼合せ方法
CN1325981C (zh) * 2002-03-20 2007-07-11 Lg.菲利浦Lcd株式会社 粘合机中的工作台结构及其控制方法
US7040525B2 (en) * 2002-03-20 2006-05-09 Lg.Philips Lcd Co., Ltd. Stage structure in bonding machine and method for controlling the same
KR20040073087A (ko) * 2003-02-13 2004-08-19 삼성전자주식회사 웨이퍼 홀더
JP4548239B2 (ja) * 2005-06-21 2010-09-22 パナソニック株式会社 基板接合方法および基板接合装置
JP4107316B2 (ja) 2005-09-02 2008-06-25 株式会社日立プラントテクノロジー 基板貼合装置
JP2007115978A (ja) 2005-10-21 2007-05-10 Nikon Corp 加圧装置及び半導体装置の製造方法
US7245350B2 (en) * 2005-11-11 2007-07-17 Canon Kabushiki Kaisha Exposure apparatus
JP2008087847A (ja) * 2006-10-05 2008-04-17 Clean Surface Gijutsu:Kk 基板収納ケース

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005251972A (ja) * 2004-03-04 2005-09-15 Nikon Corp ウェハ重ね合わせ方法及びウェハ重ね合わせ装置
JP2005339706A (ja) * 2004-05-28 2005-12-08 Tsubaki Seiko:Kk 基板接合装置、基板接合方法および記録ディスク製造方法
CN101190724A (zh) * 2006-12-01 2008-06-04 村田机械株式会社 单片板输送用托盘
WO2009057710A1 (ja) * 2007-10-30 2009-05-07 Nikon Corporation 基板保持部材、基板接合装置、積層基板製造装置、基板接合方法、積層基板製造方法および積層型半導体装置製造方法

Also Published As

Publication number Publication date
JPWO2011010452A1 (ja) 2012-12-27
US9054140B2 (en) 2015-06-09
EP2458628A4 (en) 2016-12-21
US20120205024A1 (en) 2012-08-16
EP2458628A1 (en) 2012-05-30
TW201131689A (en) 2011-09-16
WO2011010452A1 (ja) 2011-01-27
IN2012DN01481A (enExample) 2015-06-05
CN102498559A (zh) 2012-06-13
JP5810914B2 (ja) 2015-11-11
KR20120037999A (ko) 2012-04-20

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Granted publication date: 20160302