CN102414826B - 具有反射层系统的光电子半导体本体 - Google Patents
具有反射层系统的光电子半导体本体 Download PDFInfo
- Publication number
- CN102414826B CN102414826B CN201080018792.5A CN201080018792A CN102414826B CN 102414826 B CN102414826 B CN 102414826B CN 201080018792 A CN201080018792 A CN 201080018792A CN 102414826 B CN102414826 B CN 102414826B
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- CN
- China
- Prior art keywords
- layer
- radiation
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- radiation transmission
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/60—Arrangements for cooling, heating, ventilating or compensating for temperature fluctuations
- H10F77/63—Arrangements for cooling directly associated or integrated with photovoltaic cells, e.g. heat sinks directly associated with the photovoltaic cells or integrated Peltier elements for active cooling
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/84—Coatings, e.g. passivation layers or antireflective coatings
- H10H20/841—Reflective coatings, e.g. dielectric Bragg reflectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/855—Optical field-shaping means, e.g. lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18369—Structure of the reflectors, e.g. hybrid mirrors based on dielectric materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Led Devices (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009019524.6A DE102009019524B4 (de) | 2009-04-30 | 2009-04-30 | Optoelektronischer Halbleiterkörper mit einem reflektierenden Schichtsystem |
| DE102009019524.6 | 2009-04-30 | ||
| PCT/EP2010/055546 WO2010125028A2 (de) | 2009-04-30 | 2010-04-26 | Optoelektronischer halbleiterkörper mit einem reflektierenden schichtsystem |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102414826A CN102414826A (zh) | 2012-04-11 |
| CN102414826B true CN102414826B (zh) | 2017-04-26 |
Family
ID=42813710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201080018792.5A Active CN102414826B (zh) | 2009-04-30 | 2010-04-26 | 具有反射层系统的光电子半导体本体 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9012940B2 (enExample) |
| JP (1) | JP2012525693A (enExample) |
| KR (1) | KR101689413B1 (enExample) |
| CN (1) | CN102414826B (enExample) |
| DE (1) | DE102009019524B4 (enExample) |
| TW (1) | TW201101535A (enExample) |
| WO (1) | WO2010125028A2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014139997A (ja) | 2013-01-21 | 2014-07-31 | Rohm Co Ltd | 発光素子および発光素子パッケージ |
| DE102015107657A1 (de) * | 2015-05-15 | 2016-12-01 | Alanod Gmbh & Co. Kg | Verfahren zur Herstellung eines Anschlussträgers, Anschlussträger sowie optoelektronisches Halbleiterbauteil mit einem Anschlussträger |
| JP6806446B2 (ja) * | 2016-01-25 | 2021-01-06 | 日亜化学工業株式会社 | 半導体素子及びその製造方法 |
| JP6892909B2 (ja) * | 2017-11-16 | 2021-06-23 | ローム株式会社 | 発光素子および発光素子パッケージ |
| JP2018026597A (ja) * | 2017-11-16 | 2018-02-15 | ローム株式会社 | 発光素子および発光素子パッケージ |
| DE102018107673A1 (de) | 2018-03-15 | 2019-09-19 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip und Herstellungsverfahren für einen optoelektronischen Halbleiterchip |
| US12113279B2 (en) | 2020-09-22 | 2024-10-08 | Oti Lumionics Inc. | Device incorporating an IR signal transmissive region |
| US20230413649A1 (en) * | 2020-10-09 | 2023-12-21 | Oti Lumionics Inc. | Device including a low-index coating and a radiation-modifying layer |
| JP2023553379A (ja) | 2020-12-07 | 2023-12-21 | オーティーアイ ルミオニクス インコーポレーテッド | 核形成抑制被膜及び下地金属被膜を用いた導電性堆積層のパターニング |
| CN117080343A (zh) * | 2021-11-19 | 2023-11-17 | 厦门市三安光电科技有限公司 | 发光二极管及其制备方法 |
| DE102023106511A1 (de) | 2023-03-15 | 2024-09-19 | Ams-Osram International Gmbh | Optoelektronischer Halbleiterchip mit reflektierendem Schichtsystem |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60254750A (ja) * | 1984-05-31 | 1985-12-16 | Fujitsu Ltd | 金配線の形成方法 |
| DE19640240A1 (de) * | 1996-09-30 | 1998-04-02 | Siemens Ag | Halbleiteranordnung mit einer Schicht aus einem Edelmetall und Verfahren zum Herstellen derselben |
| US6587263B1 (en) * | 2000-03-31 | 2003-07-01 | Lockheed Martin Corporation | Optical solar reflectors |
| US20050040410A1 (en) * | 2002-02-12 | 2005-02-24 | Nl-Nanosemiconductor Gmbh | Tilted cavity semiconductor optoelectronic device and method of making same |
| KR20050001425A (ko) | 2003-06-27 | 2005-01-06 | 아사히 가라스 가부시키가이샤 | 고반사경 |
| DE102004040277B4 (de) | 2004-06-30 | 2015-07-30 | Osram Opto Semiconductors Gmbh | Reflektierendes Schichtsystem mit einer Mehrzahl von Schichten zur Aufbringung auf ein III/V-Verbindungshalbleitermaterial |
| CN100442557C (zh) * | 2004-06-30 | 2008-12-10 | 奥斯兰姆奥普托半导体有限责任公司 | 用于施加到ⅲ/ⅴ化合物半导体材料上的具有多个层的反射层系统 |
| FR2876841B1 (fr) * | 2004-10-19 | 2007-04-13 | Commissariat Energie Atomique | Procede de realisation de multicouches sur un substrat |
| JP4453515B2 (ja) | 2004-10-22 | 2010-04-21 | 豊田合成株式会社 | 半導体発光素子 |
| DE102005047168A1 (de) * | 2005-09-30 | 2007-04-12 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
| DE102006030094A1 (de) * | 2006-02-21 | 2007-08-30 | Von Ardenne Anlagentechnik Gmbh | Hochreflektierendes Schichtsystem und Verfahren zur Herstellung des Schichtsystems |
| JP5048960B2 (ja) | 2006-03-20 | 2012-10-17 | パナソニック株式会社 | 半導体発光素子 |
| KR20080017180A (ko) * | 2006-08-21 | 2008-02-26 | 삼성전기주식회사 | 반도체 발광장치 |
| FR2913146B1 (fr) * | 2007-02-23 | 2009-05-01 | Saint Gobain | Electrode discontinue, dispositif electroluminescent organique l'incorporant, et leurs fabrications |
| CN101276863B (zh) * | 2007-03-29 | 2011-02-09 | 晶元光电股份有限公司 | 发光二极管及其制造方法 |
| DE102007022947B4 (de) | 2007-04-26 | 2022-05-05 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronischer Halbleiterkörper und Verfahren zur Herstellung eines solchen |
| DE102007019776A1 (de) | 2007-04-26 | 2008-10-30 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement und Verfahren zur Herstellung einer Mehrzahl optoelektronischer Bauelemente |
| JP2008277651A (ja) | 2007-05-02 | 2008-11-13 | Mitsubishi Chemicals Corp | 発光ダイオード |
| DE102007029370A1 (de) | 2007-05-04 | 2008-11-06 | Osram Opto Semiconductors Gmbh | Halbleiterchip und Verfahren zur Herstellung eines Halbleiterchips |
| GB2451334B (en) * | 2007-07-19 | 2011-07-13 | Photonstar Led Ltd | Vertical led with conductive vias |
| KR100910964B1 (ko) * | 2007-08-09 | 2009-08-05 | 포항공과대학교 산학협력단 | 오믹 전극 및 이의 형성 방법 |
| DE102007043181A1 (de) | 2007-09-11 | 2009-03-12 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement |
| DE102008021403A1 (de) | 2007-09-28 | 2009-04-02 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterkörper und Verfahren zu dessen Herstellung |
| JP5634003B2 (ja) * | 2007-09-29 | 2014-12-03 | 日亜化学工業株式会社 | 発光装置 |
| JP2009135188A (ja) | 2007-11-29 | 2009-06-18 | Sony Corp | 光センサーおよび表示装置 |
-
2009
- 2009-04-30 DE DE102009019524.6A patent/DE102009019524B4/de active Active
-
2010
- 2010-04-26 US US13/255,341 patent/US9012940B2/en active Active
- 2010-04-26 KR KR1020117028382A patent/KR101689413B1/ko active Active
- 2010-04-26 JP JP2012507708A patent/JP2012525693A/ja active Pending
- 2010-04-26 CN CN201080018792.5A patent/CN102414826B/zh active Active
- 2010-04-26 WO PCT/EP2010/055546 patent/WO2010125028A2/de not_active Ceased
- 2010-04-28 TW TW099113404A patent/TW201101535A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012525693A (ja) | 2012-10-22 |
| WO2010125028A2 (de) | 2010-11-04 |
| DE102009019524B4 (de) | 2023-07-06 |
| US9012940B2 (en) | 2015-04-21 |
| KR101689413B1 (ko) | 2016-12-23 |
| DE102009019524A1 (de) | 2010-11-04 |
| KR20120030394A (ko) | 2012-03-28 |
| TW201101535A (en) | 2011-01-01 |
| CN102414826A (zh) | 2012-04-11 |
| WO2010125028A3 (de) | 2011-04-07 |
| US20120049228A1 (en) | 2012-03-01 |
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Legal Events
| Date | Code | Title | Description |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |