CN102208335B - 模板的表面处理方法及装置以及图案形成方法 - Google Patents

模板的表面处理方法及装置以及图案形成方法 Download PDF

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Publication number
CN102208335B
CN102208335B CN201110052481.7A CN201110052481A CN102208335B CN 102208335 B CN102208335 B CN 102208335B CN 201110052481 A CN201110052481 A CN 201110052481A CN 102208335 B CN102208335 B CN 102208335B
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China
Prior art keywords
template
surface treatment
reaction chamber
aforementioned
coupling agent
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Expired - Fee Related
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CN201110052481.7A
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English (en)
Chinese (zh)
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CN102208335A (zh
Inventor
河村嘉久
小林克稔
伊藤信一
林秀和
富田宽
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Kioxia Corp
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Toshiba Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Micromachines (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
CN201110052481.7A 2010-03-31 2011-03-04 模板的表面处理方法及装置以及图案形成方法 Expired - Fee Related CN102208335B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2010081019 2010-03-31
JP081019/2010 2010-03-31
JP280514/2010 2010-12-16
JP2010280514A JP5693941B2 (ja) 2010-03-31 2010-12-16 テンプレートの表面処理方法及び装置並びにパターン形成方法

Publications (2)

Publication Number Publication Date
CN102208335A CN102208335A (zh) 2011-10-05
CN102208335B true CN102208335B (zh) 2013-09-18

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US (1) US20110244131A1 (enExample)
JP (1) JP5693941B2 (enExample)
KR (1) KR101226289B1 (enExample)
CN (1) CN102208335B (enExample)
TW (1) TWI500071B (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5350424B2 (ja) * 2011-03-24 2013-11-27 東京エレクトロン株式会社 表面処理方法
JP5898549B2 (ja) * 2012-03-29 2016-04-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
CN102866582B (zh) * 2012-09-29 2014-09-10 兰红波 一种用于高亮度led图形化的纳米压印装置和方法
JP2015149390A (ja) * 2014-02-06 2015-08-20 キヤノン株式会社 インプリント装置、型、および物品の製造方法
JP6532419B2 (ja) * 2015-03-31 2019-06-19 芝浦メカトロニクス株式会社 インプリント用のテンプレート製造装置
WO2016159312A1 (ja) * 2015-03-31 2016-10-06 芝浦メカトロニクス株式会社 インプリント用のテンプレート製造装置
JP6486206B2 (ja) * 2015-03-31 2019-03-20 芝浦メカトロニクス株式会社 インプリント用のテンプレート製造装置
WO2016159310A1 (ja) * 2015-03-31 2016-10-06 芝浦メカトロニクス株式会社 インプリント用のテンプレート製造装置
JP6529843B2 (ja) * 2015-07-14 2019-06-12 芝浦メカトロニクス株式会社 インプリント用のテンプレート製造装置及びテンプレート製造方法
JP6441181B2 (ja) 2015-08-04 2018-12-19 東芝メモリ株式会社 インプリント用テンプレートおよびその製造方法、および半導体装置の製造方法
CN109804275B (zh) 2016-08-26 2023-08-25 分子印记公司 制造单片光子器件的方法、光子器件
JP6698489B2 (ja) * 2016-09-26 2020-05-27 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
CN111526838B (zh) 2017-11-02 2022-03-22 奇跃公司 制备和分配聚合物材料并从其生产聚合物制品
JP2019220647A (ja) * 2018-06-22 2019-12-26 株式会社アルバック 表面処理方法、プリント配線板の製造方法、および、表面処理装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5626820A (en) * 1988-12-12 1997-05-06 Kinkead; Devon A. Clean room air filtering
US5690749A (en) * 1996-03-18 1997-11-25 Motorola, Inc. Method for removing sub-micron particles from a semiconductor wafer surface by exposing the wafer surface to clean room adhesive tape material
WO2003021642A2 (en) * 2001-08-31 2003-03-13 Applied Materials, Inc. Method and apparatus for processing a wafer
JP3892460B2 (ja) 2002-06-20 2007-03-14 オブデュキャット、アクチボラグ 成形工具を製造するための方法およびその成形工具を用いて形成された記憶媒体
WO2006041115A1 (ja) * 2004-10-13 2006-04-20 Central Glass Company, Limited 含フッ素重合性単量体及びそれを用いた高分子化合物
KR100815372B1 (ko) * 2005-03-31 2008-03-19 삼성전기주식회사 인쇄회로기판용 임프린트 몰드의 이형처리방법
KR100815081B1 (ko) * 2006-09-05 2008-03-20 삼성전기주식회사 스탬퍼 이형처리 방법
KR100763349B1 (ko) 2006-09-14 2007-10-04 삼성전기주식회사 금속 스탬프 제조방법
US20100009290A1 (en) * 2006-12-03 2010-01-14 Central Glass Co., Ltd. Photosensitive Polybenzoxazines and Methods of Making the Same
JP4999069B2 (ja) * 2007-01-23 2012-08-15 株式会社日立製作所 ナノインプリント用スタンパ、ナノインプリント用スタンパの製造方法、およびナノインプリント用スタンパの表面処理剤
WO2009099191A1 (ja) * 2008-02-07 2009-08-13 Sumitomo Bakelite Company Limited 半導体用フィルム、半導体装置の製造方法および半導体装置
JP4695679B2 (ja) * 2008-08-21 2011-06-08 株式会社東芝 テンプレートの洗浄方法及びパターン形成方法

Also Published As

Publication number Publication date
TWI500071B (zh) 2015-09-11
TW201140653A (en) 2011-11-16
JP2011224965A (ja) 2011-11-10
CN102208335A (zh) 2011-10-05
JP5693941B2 (ja) 2015-04-01
KR101226289B1 (ko) 2013-01-24
US20110244131A1 (en) 2011-10-06
KR20110109845A (ko) 2011-10-06

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Effective date of registration: 20170802

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Granted publication date: 20130918

Termination date: 20190304