CN102140116B - 一种端基为乙烯基醚和烯丙基醚的含硅聚合单体的合成方法 - Google Patents
一种端基为乙烯基醚和烯丙基醚的含硅聚合单体的合成方法 Download PDFInfo
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- CN102140116B CN102140116B CN201110053569A CN201110053569A CN102140116B CN 102140116 B CN102140116 B CN 102140116B CN 201110053569 A CN201110053569 A CN 201110053569A CN 201110053569 A CN201110053569 A CN 201110053569A CN 102140116 B CN102140116 B CN 102140116B
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- vinyl ether
- monomer
- allyl ethers
- end group
- hydroxyalkyl
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- AKHFPMPBQLJADD-UHFFFAOYSA-N CC(CCOCC=C)O[Si+](C)(C)[Si+](C)(C)OCC(CC1)CCC1OC=C Chemical compound CC(CCOCC=C)O[Si+](C)(C)[Si+](C)(C)OCC(CC1)CCC1OC=C AKHFPMPBQLJADD-UHFFFAOYSA-N 0.000 description 1
- BOHYPYLHKHPJJQ-UHFFFAOYSA-N C[Si+](c1ccccc1)(OCCCCOC=C)[Si+](C)(c1ccccc1)OCC=C Chemical compound C[Si+](c1ccccc1)(OCCCCOC=C)[Si+](C)(c1ccccc1)OCC=C BOHYPYLHKHPJJQ-UHFFFAOYSA-N 0.000 description 1
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- Silicon Polymers (AREA)
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CN201110053569A CN102140116B (zh) | 2011-03-07 | 2011-03-07 | 一种端基为乙烯基醚和烯丙基醚的含硅聚合单体的合成方法 |
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CN201110053569A CN102140116B (zh) | 2011-03-07 | 2011-03-07 | 一种端基为乙烯基醚和烯丙基醚的含硅聚合单体的合成方法 |
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CN102140116A CN102140116A (zh) | 2011-08-03 |
CN102140116B true CN102140116B (zh) | 2012-09-19 |
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CN103692800B (zh) * | 2012-09-28 | 2016-04-13 | 北京师范大学 | 一种具有单层含硅乙烯基醚结构的阳图无水胶印版及其制备方法 |
KR102235263B1 (ko) * | 2018-02-06 | 2021-04-01 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치 |
CN108690068A (zh) * | 2018-04-10 | 2018-10-23 | 珠海市赛纬电子材料股份有限公司 | 一种二苯基二烷氧基硅烷的制备方法 |
CN113423767B (zh) * | 2018-12-26 | 2024-01-09 | 迈图高新材料公司 | 基于有机硅的固化性组合物和其应用 |
CN111826024A (zh) * | 2020-07-29 | 2020-10-27 | 杭州福斯特应用材料股份有限公司 | 墨水组合物、封装结构及半导体器件 |
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JP5669396B2 (ja) * | 2006-12-13 | 2015-02-12 | ノバルティス アーゲー | 化学線硬化性シリコーンヒドロゲルコポリマーおよびその使用 |
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2011
- 2011-03-07 CN CN201110053569A patent/CN102140116B/zh active Active
Non-Patent Citations (2)
Title |
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M. Urbala et al..The synthesis of allyl ether functionalized siloxane monomers under ultrasonic irradiation at ambient conditions.《Ultrasonics Sonochemistry》.2003,第11卷(第6期),第409-414页. * |
肖时卓等.含硅乙烯基醚单体的合成及光聚合反应.《高等学校化学学报》.2011,第32卷(第2期),第383至388页. * |
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Effective date of registration: 20160523 Address after: 448000 chemical recycling industry park, Jingmen, Hubei (207 National Road, double track) Patentee after: Hubei Gurun Technology Co., Ltd. Address before: 100087, 19, Xinjie street, Haidian District, Beijing Patentee before: Beijing Normal University |
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Denomination of invention: A synthetic method of silicon containing polymeric monomer with vinyl ether and allyl ether as end groups Effective date of registration: 20211210 Granted publication date: 20120919 Pledgee: China Construction Bank Jingmen jinlongquan sub branch Pledgor: HUBEI GURUN TECHNOLOGY Co.,Ltd. Registration number: Y2021420000138 |
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