CN102140116A - 一种端基为乙烯基醚和烯丙基醚的含硅聚合单体的合成方法 - Google Patents
一种端基为乙烯基醚和烯丙基醚的含硅聚合单体的合成方法 Download PDFInfo
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- CN102140116A CN102140116A CN 201110053569 CN201110053569A CN102140116A CN 102140116 A CN102140116 A CN 102140116A CN 201110053569 CN201110053569 CN 201110053569 CN 201110053569 A CN201110053569 A CN 201110053569A CN 102140116 A CN102140116 A CN 102140116A
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- Prior art keywords
- vinyl ether
- ether
- allyl
- silicon
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000178 monomer Substances 0.000 title claims abstract description 63
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 title claims abstract description 22
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 229910052710 silicon Inorganic materials 0.000 title claims abstract 15
- 239000010703 silicon Substances 0.000 title claims abstract 15
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 title claims abstract 14
- 230000002194 synthesizing effect Effects 0.000 title description 9
- 238000000034 method Methods 0.000 title description 2
- 230000000379 polymerizing effect Effects 0.000 title 1
- -1 chlorosiloxane Chemical class 0.000 claims abstract description 38
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000005046 Chlorosilane Substances 0.000 claims abstract description 11
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000002360 preparation method Methods 0.000 claims abstract description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 74
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 37
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 claims description 36
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 27
- 238000006116 polymerization reaction Methods 0.000 claims description 26
- 238000003756 stirring Methods 0.000 claims description 19
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 18
- 239000000706 filtrate Substances 0.000 claims description 16
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 14
- 238000010189 synthetic method Methods 0.000 claims description 13
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 239000012535 impurity Substances 0.000 claims description 9
- 239000000047 product Substances 0.000 claims description 9
- 239000007787 solid Substances 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 9
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 claims description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 4
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 claims description 4
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 claims description 4
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 claims description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 4
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 claims description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 4
- 239000012043 crude product Substances 0.000 claims description 4
- 239000003054 catalyst Substances 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 claims description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 claims description 2
- ISRXMEYARGEVIU-UHFFFAOYSA-N n-methyl-n-propan-2-ylpropan-2-amine Chemical compound CC(C)N(C)C(C)C ISRXMEYARGEVIU-UHFFFAOYSA-N 0.000 claims description 2
- 150000007530 organic bases Chemical class 0.000 claims description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 2
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 claims description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims 2
- 239000000284 extract Substances 0.000 claims 2
- 239000011259 mixed solution Substances 0.000 claims 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 11
- 239000000463 material Substances 0.000 abstract description 11
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 238000003912 environmental pollution Methods 0.000 abstract description 2
- 238000003786 synthesis reaction Methods 0.000 abstract description 2
- 238000003384 imaging method Methods 0.000 abstract 1
- 239000002994 raw material Substances 0.000 abstract 1
- 238000001308 synthesis method Methods 0.000 abstract 1
- 239000007788 liquid Substances 0.000 description 21
- 238000000967 suction filtration Methods 0.000 description 14
- HMBNQNDUEFFFNZ-UHFFFAOYSA-N 4-ethenoxybutan-1-ol Chemical compound OCCCCOC=C HMBNQNDUEFFFNZ-UHFFFAOYSA-N 0.000 description 12
- 239000005457 ice water Substances 0.000 description 11
- 239000003153 chemical reaction reagent Substances 0.000 description 10
- 150000003254 radicals Chemical class 0.000 description 9
- 238000004821 distillation Methods 0.000 description 8
- 238000000605 extraction Methods 0.000 description 8
- 238000001816 cooling Methods 0.000 description 7
- 230000008030 elimination Effects 0.000 description 7
- 238000003379 elimination reaction Methods 0.000 description 7
- 239000003921 oil Substances 0.000 description 7
- WULAHPYSGCVQHM-UHFFFAOYSA-N 2-(2-ethenoxyethoxy)ethanol Chemical compound OCCOCCOC=C WULAHPYSGCVQHM-UHFFFAOYSA-N 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- 238000001723 curing Methods 0.000 description 4
- RSNQKPMXXVDJFG-UHFFFAOYSA-N tetrasiloxane Chemical compound [SiH3]O[SiH2]O[SiH2]O[SiH3] RSNQKPMXXVDJFG-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 238000000016 photochemical curing Methods 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- XNEFRJJUNNEAGR-UHFFFAOYSA-N C(CCC)OC[Si]1(O[Si](O[Si](O1)(C)C)(C)C)C Chemical compound C(CCC)OC[Si]1(O[Si](O[Si](O1)(C)C)(C)C)C XNEFRJJUNNEAGR-UHFFFAOYSA-N 0.000 description 2
- QQOUTSDGVPOETC-UHFFFAOYSA-N CCCCO[SiH](C)[Si](C)(C)C Chemical compound CCCCO[SiH](C)[Si](C)(C)C QQOUTSDGVPOETC-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- BMUULIYWEMBHKQ-UHFFFAOYSA-N [butoxy(methyl)silyl]oxy-trimethylsilane Chemical compound CCCCO[SiH](C)O[Si](C)(C)C BMUULIYWEMBHKQ-UHFFFAOYSA-N 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- SOKKGFZWZZLHEK-UHFFFAOYSA-N butoxy(dimethyl)silane Chemical compound CCCCO[SiH](C)C SOKKGFZWZZLHEK-UHFFFAOYSA-N 0.000 description 2
- 238000012663 cationic photopolymerization Methods 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- JHUUPUMBZGWODW-UHFFFAOYSA-N 3,6-dihydro-1,2-dioxine Chemical compound C1OOCC=C1 JHUUPUMBZGWODW-UHFFFAOYSA-N 0.000 description 1
- BNBYHZFQNKIYIH-UHFFFAOYSA-N CC(CCOCC=C)O[N-](C)(C)OCCOC=C Chemical compound CC(CCOCC=C)O[N-](C)(C)OCCOC=C BNBYHZFQNKIYIH-UHFFFAOYSA-N 0.000 description 1
- GUGHBWBPYJURQO-UHFFFAOYSA-N CC(CCOCC=C)O[N](C)(C)OCCOCCOC=C Chemical compound CC(CCOCC=C)O[N](C)(C)OCCOCCOC=C GUGHBWBPYJURQO-UHFFFAOYSA-N 0.000 description 1
- MNPIEIFKKADGRN-UHFFFAOYSA-N C[N](C)(OCCCCOC=C)O[N](C)(C)OCC=C Chemical compound C[N](C)(OCCCCOC=C)O[N](C)(C)OCC=C MNPIEIFKKADGRN-UHFFFAOYSA-N 0.000 description 1
- ZGKBTJGSAVBTOV-UHFFFAOYSA-N C[Si+](C)(O[Si+](C)(C)O[Si+](C)(c1ccccc1)OCCOC=C)O[Si+](C)(c1ccccc1)OCCOCC=C Chemical compound C[Si+](C)(O[Si+](C)(C)O[Si+](C)(c1ccccc1)OCCOC=C)O[Si+](C)(c1ccccc1)OCCOCC=C ZGKBTJGSAVBTOV-UHFFFAOYSA-N 0.000 description 1
- PKFOKOWDDNJXOX-UHFFFAOYSA-N C[Si+](C)(O[Si+](C)(C)O[Si+](C)(c1ccccc1)OCCOCC=C)O[Si+](C)(c1ccccc1)OCCCCOC=C Chemical compound C[Si+](C)(O[Si+](C)(C)O[Si+](C)(c1ccccc1)OCCOCC=C)O[Si+](C)(c1ccccc1)OCCCCOC=C PKFOKOWDDNJXOX-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- YVZMZKMLLCMBGR-UHFFFAOYSA-N butoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[SiH](OCCCC)C1=CC=CC=C1 YVZMZKMLLCMBGR-UHFFFAOYSA-N 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- SMLBKDGWTWVRBJ-UHFFFAOYSA-N chloro-dimethylsilyl-dimethylsilane Chemical compound C[SiH](C)[Si](C)(C)Cl SMLBKDGWTWVRBJ-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 150000003233 pyrroles Chemical class 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- VIPCDVWYAADTGR-UHFFFAOYSA-N trimethyl(methylsilyl)silane Chemical compound C[SiH2][Si](C)(C)C VIPCDVWYAADTGR-UHFFFAOYSA-N 0.000 description 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 1
- SYQNIEVPXRJBMQ-UHFFFAOYSA-N trimethyl(trimethylsilyloxysilyloxysilyloxy)silane Chemical compound C[Si](O[SiH2]O[SiH2]O[Si](C)(C)C)(C)C SYQNIEVPXRJBMQ-UHFFFAOYSA-N 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
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- Silicon Polymers (AREA)
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CN201110053569A CN102140116B (zh) | 2011-03-07 | 2011-03-07 | 一种端基为乙烯基醚和烯丙基醚的含硅聚合单体的合成方法 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103692800A (zh) * | 2012-09-28 | 2014-04-02 | 北京师范大学 | 一种具有单层含硅乙烯基醚结构的阳图无水胶印版及其制备方法 |
CN108690068A (zh) * | 2018-04-10 | 2018-10-23 | 珠海市赛纬电子材料股份有限公司 | 一种二苯基二烷氧基硅烷的制备方法 |
KR20190094936A (ko) * | 2018-02-06 | 2019-08-14 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치 |
CN111826024A (zh) * | 2020-07-29 | 2020-10-27 | 杭州福斯特应用材料股份有限公司 | 墨水组合物、封装结构及半导体器件 |
CN113423767A (zh) * | 2018-12-26 | 2021-09-21 | 迈图高新材料公司 | 基于有机硅的固化性组合物和其应用对相关申请的交叉引用 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080143003A1 (en) * | 2006-12-13 | 2008-06-19 | John Christopher Phelan | Actinically curable silicone hydrogel copolymers and uses thereof |
-
2011
- 2011-03-07 CN CN201110053569A patent/CN102140116B/zh active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080143003A1 (en) * | 2006-12-13 | 2008-06-19 | John Christopher Phelan | Actinically curable silicone hydrogel copolymers and uses thereof |
Non-Patent Citations (2)
Title |
---|
《Ultrasonics Sonochemistry》 20031118 M. Urbala et al. The synthesis of allyl ether functionalized siloxane monomers under ultrasonic irradiation at ambient conditions 第409-414页 1-10 第11卷, 第6期 * |
《高等学校化学学报》 20110228 肖时卓等 含硅乙烯基醚单体的合成及光聚合反应 第383至388页 1-10 第32卷, 第2期 * |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103692800A (zh) * | 2012-09-28 | 2014-04-02 | 北京师范大学 | 一种具有单层含硅乙烯基醚结构的阳图无水胶印版及其制备方法 |
CN103692800B (zh) * | 2012-09-28 | 2016-04-13 | 北京师范大学 | 一种具有单层含硅乙烯基醚结构的阳图无水胶印版及其制备方法 |
KR20190094936A (ko) * | 2018-02-06 | 2019-08-14 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치 |
KR102235263B1 (ko) * | 2018-02-06 | 2021-04-01 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치 |
CN108690068A (zh) * | 2018-04-10 | 2018-10-23 | 珠海市赛纬电子材料股份有限公司 | 一种二苯基二烷氧基硅烷的制备方法 |
CN113423767A (zh) * | 2018-12-26 | 2021-09-21 | 迈图高新材料公司 | 基于有机硅的固化性组合物和其应用对相关申请的交叉引用 |
CN113423767B (zh) * | 2018-12-26 | 2024-01-09 | 迈图高新材料公司 | 基于有机硅的固化性组合物和其应用 |
CN111826024A (zh) * | 2020-07-29 | 2020-10-27 | 杭州福斯特应用材料股份有限公司 | 墨水组合物、封装结构及半导体器件 |
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