CN102110698B - 闪烁体板、放射线成像装置和系统及其制造方法 - Google Patents
闪烁体板、放射线成像装置和系统及其制造方法 Download PDFInfo
- Publication number
- CN102110698B CN102110698B CN2010105883811A CN201010588381A CN102110698B CN 102110698 B CN102110698 B CN 102110698B CN 2010105883811 A CN2010105883811 A CN 2010105883811A CN 201010588381 A CN201010588381 A CN 201010588381A CN 102110698 B CN102110698 B CN 102110698B
- Authority
- CN
- China
- Prior art keywords
- plate
- scintillator
- substrate
- radiation imaging
- protrusions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 37
- 238000003384 imaging method Methods 0.000 title claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 238000000034 method Methods 0.000 title claims description 11
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 229910052782 aluminium Inorganic materials 0.000 claims description 20
- 229920005989 resin Polymers 0.000 claims description 19
- 239000011347 resin Substances 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 3
- 238000004049 embossing Methods 0.000 claims description 3
- 238000001746 injection moulding Methods 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 241000264877 Hippospongia communis Species 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000007769 metal material Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 42
- 239000011241 protective layer Substances 0.000 description 18
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 16
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 7
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000012943 hotmelt Substances 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 229920002050 silicone resin Polymers 0.000 description 4
- 239000007790 solid phase Substances 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 229920002396 Polyurea Polymers 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- XQPRBTXUXXVTKB-UHFFFAOYSA-M caesium iodide Chemical compound [I-].[Cs+] XQPRBTXUXXVTKB-UHFFFAOYSA-M 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- -1 polyparaxylylene Polymers 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 235000009518 sodium iodide Nutrition 0.000 description 2
- 229910052716 thallium Inorganic materials 0.000 description 2
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/189—X-ray, gamma-ray or corpuscular radiation imagers
- H10F39/1898—Indirect radiation image sensors, e.g. using luminescent members
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1002—Methods of surface bonding and/or assembly therefor with permanent bending or reshaping or surface deformation of self sustaining lamina
- Y10T156/1039—Surface deformation only of sandwich or lamina [e.g., embossed panels]
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Measurement Of Radiation (AREA)
- Conversion Of X-Rays Into Visible Images (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009296524A JP2011137665A (ja) | 2009-12-26 | 2009-12-26 | シンチレータパネル及び放射線撮像装置とその製造方法、ならびに放射線撮像システム |
| JP2009-296524 | 2009-12-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102110698A CN102110698A (zh) | 2011-06-29 |
| CN102110698B true CN102110698B (zh) | 2013-12-11 |
Family
ID=44174802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010105883811A Expired - Fee Related CN102110698B (zh) | 2009-12-26 | 2010-12-15 | 闪烁体板、放射线成像装置和系统及其制造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20110155917A1 (https=) |
| JP (1) | JP2011137665A (https=) |
| CN (1) | CN102110698B (https=) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012145537A (ja) * | 2011-01-14 | 2012-08-02 | Canon Inc | 放射線検出装置、放射線検出システム、及び放射線検出装置の製造方法 |
| DE102011017789B3 (de) * | 2011-04-29 | 2012-04-05 | Siemens Aktiengesellschaft | Leuchtstoffplatte |
| JP2013029384A (ja) * | 2011-07-27 | 2013-02-07 | Canon Inc | 放射線検出装置、その製造方法および放射線検出システム |
| GB201119257D0 (en) | 2011-11-08 | 2011-12-21 | Eshtech Ltd | X-ray detection apparatus |
| JP6000680B2 (ja) | 2012-06-20 | 2016-10-05 | キヤノン株式会社 | 放射線検出装置、その製造方法及び撮像システム |
| JP2014074595A (ja) * | 2012-10-02 | 2014-04-24 | Canon Inc | 放射線撮像装置、放射線撮像システム、及び、放射線撮像装置の製造方法 |
| JP2015049123A (ja) * | 2013-08-30 | 2015-03-16 | 株式会社東芝 | 検出器モジュール製造方法、検出器モジュール及び医用画像診断装置 |
| JP6179925B2 (ja) * | 2014-08-27 | 2017-08-16 | 国立研究開発法人理化学研究所 | 放射線検出素子、放射線検出装置および放射線検出素子の製造方法 |
| CN105988131B (zh) * | 2015-02-09 | 2019-03-19 | 通用电气公司 | 激光雕刻系统、各向异性的闪烁体及其制造方法 |
| US10871581B2 (en) | 2017-02-17 | 2020-12-22 | Yasu Medical Imaging Technology Co., Ltd. | Scintillator module, scintillator sensor unit, and scintillator module production method |
| JP2018189933A (ja) * | 2017-05-12 | 2018-11-29 | コニカミノルタ株式会社 | 格子及びx線タルボ撮影装置、格子の製造方法 |
| JP7011283B2 (ja) * | 2017-07-20 | 2022-01-26 | 国立研究開発法人理化学研究所 | 放射線イメージング装置用光学素子、光学素子の製造方法、放射線イメージング装置及びx線イメージング装置 |
| CN114639689B (zh) * | 2020-12-15 | 2025-03-18 | 京东方科技集团股份有限公司 | 平板探测器、其制作方法及x射线成像系统 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101002110A (zh) * | 2004-08-10 | 2007-07-18 | 佳能株式会社 | 放射线探测装置、闪烁体板及其制造方法和放射线探测系统 |
Family Cites Families (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58177637A (ja) * | 1982-04-14 | 1983-10-18 | 株式会社東芝 | 放射線用グリツドの製造方法 |
| FR2567276B1 (fr) * | 1984-07-06 | 1988-02-19 | Labo Electronique Physique | Perfectionnement apporte a une camera pour la detection de rayonnements x et g, camera dont le bloc scintillateur possede une fenetre d'entree formee d'une structure-support mecaniquement rigide et tres faiblement absorbante auxdits rayonnements |
| JPS6290599A (ja) * | 1985-10-16 | 1987-04-25 | 富士写真フイルム株式会社 | 放射線像変換パネル |
| JP2514952B2 (ja) * | 1987-03-13 | 1996-07-10 | 株式会社東芝 | X線イメ−ジ管 |
| JPH08184937A (ja) * | 1994-12-28 | 1996-07-16 | Fujitsu Ltd | 輝尽蛍光体板の製造方法 |
| JP3580879B2 (ja) * | 1995-01-19 | 2004-10-27 | 浜松ホトニクス株式会社 | 電子管デバイス |
| WO1998012731A1 (fr) * | 1996-09-18 | 1998-03-26 | Kabushiki Kaisha Toshiba | Tube a image radiologique et son procede de fabrication |
| JP3815766B2 (ja) * | 1998-01-28 | 2006-08-30 | キヤノン株式会社 | 二次元撮像装置 |
| US6369867B1 (en) * | 1998-03-12 | 2002-04-09 | Gl Displays, Inc. | Riveted liquid crystal display comprising at least one plastic rivet formed by laser drilling through a pair of plastic plates |
| US7034306B2 (en) * | 1998-06-18 | 2006-04-25 | Hamamatsu Photonics K.K. | Scintillator panel and radiation image sensor |
| JP3566926B2 (ja) * | 1998-06-18 | 2004-09-15 | 浜松ホトニクス株式会社 | シンチレータパネル及び放射線イメージセンサ |
| JP4442833B2 (ja) * | 1998-08-04 | 2010-03-31 | キヤノン株式会社 | 光電変換装置 |
| AU3168199A (en) * | 1999-04-09 | 2000-11-14 | Hamamatsu Photonics K.K. | Scintillator panel and radiation ray image sensor |
| DE60135206D1 (de) * | 2000-02-25 | 2008-09-18 | Hamamatsu Photonics Kk | Röntgenabbildungseinrichtung und verfahren zu ihrer herstellung |
| JP4447752B2 (ja) * | 2000-08-03 | 2010-04-07 | 浜松ホトニクス株式会社 | 放射線検出器 |
| JP4283427B2 (ja) * | 2000-08-03 | 2009-06-24 | 浜松ホトニクス株式会社 | 放射線検出器およびシンチレータパネル |
| US6835936B2 (en) * | 2001-02-07 | 2004-12-28 | Canon Kabushiki Kaisha | Scintillator panel, method of manufacturing scintillator panel, radiation detection device, and radiation detection system |
| US6847041B2 (en) * | 2001-02-09 | 2005-01-25 | Canon Kabushiki Kaisha | Scintillator panel, radiation detector and manufacture methods thereof |
| JP2002333848A (ja) * | 2001-05-10 | 2002-11-22 | Sharp Corp | 複合アクティブマトリクス基板、その製造方法、及び電磁波撮像装置 |
| JP2003263119A (ja) * | 2002-03-07 | 2003-09-19 | Fuji Xerox Co Ltd | リブ付き電極およびその製造方法 |
| US7199379B2 (en) * | 2002-06-28 | 2007-04-03 | Agfa-Gevaert | Binderless storage phosphor screen |
| JP2004093848A (ja) * | 2002-08-30 | 2004-03-25 | Toppan Printing Co Ltd | 光拡散性スクリーンおよびこのスクリーンを用いた表示装置 |
| US20040056366A1 (en) * | 2002-09-25 | 2004-03-25 | Maiz Jose A. | A method of forming surface alteration of metal interconnect in integrated circuits for electromigration and adhesion improvement |
| JP2004226269A (ja) * | 2003-01-23 | 2004-08-12 | Fuji Photo Film Co Ltd | 放射線像変換器およびその製造方法 |
| GB2403023A (en) * | 2003-06-20 | 2004-12-22 | Sharp Kk | Organic light emitting device |
| US7067817B2 (en) * | 2004-01-29 | 2006-06-27 | Hamamatsu Photonics K.K. | Radiation image sensor and making method of same |
| US7573035B2 (en) * | 2004-10-29 | 2009-08-11 | Koninklijke Philips Electronics N.V. | GOS ceramic scintillating fiber optics x-ray imaging plate for use in medical DF and RF imaging and in CT |
| US7453065B2 (en) * | 2004-11-10 | 2008-11-18 | Canon Kabushiki Kaisha | Sensor and image pickup device |
| EP1681584B1 (en) * | 2005-01-13 | 2009-09-09 | Aloka Co., Ltd. | Scintillator member and manufacturing method thereof, and radiation measuring device |
| JP4176138B2 (ja) * | 2005-01-27 | 2008-11-05 | 旭化成エレクトロニクス株式会社 | 大型ペリクル収納容器 |
| JP2007240306A (ja) * | 2006-03-08 | 2007-09-20 | Toshiba Corp | シンチレータパネルおよび平面検出器 |
| JP2008026013A (ja) * | 2006-07-18 | 2008-02-07 | Toshiba Corp | シンチレータパネルおよび放射線検出器 |
| DE102006038969B4 (de) * | 2006-08-21 | 2013-02-28 | Siemens Aktiengesellschaft | Röntgenkonverterelement und Verfahren zu dessen Herstellung |
| JP2008122275A (ja) * | 2006-11-14 | 2008-05-29 | Konica Minolta Medical & Graphic Inc | シンチレータパネル、その製造方法及び放射線イメージセンサ |
| JP2008190929A (ja) * | 2007-02-02 | 2008-08-21 | Konica Minolta Medical & Graphic Inc | 放射線用シンチレータプレートの製造方法及び放射線画像撮影装置 |
| JP5597354B2 (ja) * | 2007-03-27 | 2014-10-01 | 株式会社東芝 | シンチレータパネル及び放射線検出器 |
| US7732788B2 (en) * | 2007-10-23 | 2010-06-08 | Hamamatsu Photonics K.K. | Radiation image converting panel, scintillator panel and radiation image sensor |
| US20080311484A1 (en) * | 2007-06-15 | 2008-12-18 | Hamamatsu Photonicfs K.K. | Radiation image conversion panel, scintillator panel, and radiation image sensor |
| US7468514B1 (en) * | 2007-06-15 | 2008-12-23 | Hamamatsu Photonics K.K. | Radiation image conversion panel, scintillator panel, and radiation image sensor |
| JP2009025075A (ja) * | 2007-07-18 | 2009-02-05 | Konica Minolta Medical & Graphic Inc | 放射線用シンチレータパネルおよびフラットパネルディテクター |
-
2009
- 2009-12-26 JP JP2009296524A patent/JP2011137665A/ja not_active Ceased
-
2010
- 2010-12-15 CN CN2010105883811A patent/CN102110698B/zh not_active Expired - Fee Related
- 2010-12-21 US US12/975,273 patent/US20110155917A1/en not_active Abandoned
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101002110A (zh) * | 2004-08-10 | 2007-07-18 | 佳能株式会社 | 放射线探测装置、闪烁体板及其制造方法和放射线探测系统 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20110155917A1 (en) | 2011-06-30 |
| JP2011137665A (ja) | 2011-07-14 |
| CN102110698A (zh) | 2011-06-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102110698B (zh) | 闪烁体板、放射线成像装置和系统及其制造方法 | |
| US8648312B2 (en) | Radiation detection apparatus, manufacturing method thereof, and radiation detection system | |
| US9081104B2 (en) | Radiation detection apparatus and radiation detection system | |
| CN101657737B (zh) | 放射线检测装置和放射线检测系统 | |
| US20140091225A1 (en) | Radiation imaging apparatus, radiation imaging system, and radiation imaging apparatus manufacturing method | |
| US9568614B2 (en) | Radiation detection apparatus, method of manufacturing the same, and imaging system | |
| JP2011247822A (ja) | 放射線検出装置及び放射線撮像システム | |
| JP6310216B2 (ja) | 放射線検出装置及びその製造方法並びに放射線検出システム | |
| JP7342184B2 (ja) | 放射線検出器、放射線画像撮影装置及び放射線検出器の製造方法 | |
| JP2014077735A (ja) | 放射線検出装置及び放射線検出システム | |
| CN101542635A (zh) | 闪烁器板和射线检测器 | |
| US20120318990A1 (en) | Radiation detection panel and radiation imaging apparatus | |
| US20120187298A1 (en) | Scintillator panel, method of manufacturing the same, and radiation detection apparatus | |
| US10345455B2 (en) | Radiation detection apparatus, radiation imaging system, and method of manufacturing radiation detection apparatus | |
| JP2006189377A (ja) | シンチレータパネル、放射線検出装置、及び放射線検出システム | |
| JP2010101640A (ja) | 放射線検出器 | |
| JP5908212B2 (ja) | 放射線検出器及びその製造方法 | |
| JP7125502B2 (ja) | 放射線検出器、放射線画像撮影装置、及び製造方法 | |
| CN111819471B (zh) | 放射线成像装置和放射线成像系统 | |
| JP2003262678A (ja) | 放射線検出装置用シンチレーターパネルおよびその製造方法 | |
| JP2004061116A (ja) | 放射線検出装置及びシステム | |
| JP4136416B2 (ja) | シンチレーターパネルおよびその製造方法 | |
| JP2007057428A (ja) | 放射線検出装置及び放射線撮像システム | |
| JPWO2008108186A1 (ja) | 放射線画像撮影装置 | |
| WO2019244610A1 (ja) | 放射線検出器及び放射線画像撮影装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131211 Termination date: 20141215 |
|
| EXPY | Termination of patent right or utility model |